JP5214116B2 - Sti技術により実現された高解像度のcmosイメージセンサのための成層型フォトダイオード - Google Patents
Sti技術により実現された高解像度のcmosイメージセンサのための成層型フォトダイオード Download PDFInfo
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- JP5214116B2 JP5214116B2 JP2006157217A JP2006157217A JP5214116B2 JP 5214116 B2 JP5214116 B2 JP 5214116B2 JP 2006157217 A JP2006157217 A JP 2006157217A JP 2006157217 A JP2006157217 A JP 2006157217A JP 5214116 B2 JP5214116 B2 JP 5214116B2
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- 238000005516 engineering process Methods 0.000 title description 2
- 239000004065 semiconductor Substances 0.000 claims description 15
- 238000012546 transfer Methods 0.000 claims description 11
- 239000003990 capacitor Substances 0.000 claims description 5
- 230000000295 complement effect Effects 0.000 claims 2
- 239000004020 conductor Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 11
- 238000003860 storage Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000007667 floating Methods 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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- 238000004886 process control Methods 0.000 description 1
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- 239000002210 silicon-based material Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14603—Special geometry or disposition of pixel-elements, address-lines or gate-electrodes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
Description
Claims (18)
- 第1導電型の半導体層と、
前記半導体層内で互いに異なる深さで形成された複数の第2導電型のドープ領域と、
前記半導体層内で前記複数の第2導電型のドープ領域の間に形成され、フォトダイオードの空乏のための電圧の印加時に、完全に空乏されずに複数の接合キャパシタを形成する複数の第1導電型のドープ領域と、
酸化膜の表面下に形成されたピニング層と、
前記複数の第1導電型のドープ領域のうちの1つの一部に形成され、該第1導電型のドープ領域の上下部に位置する前記第2導電型のドープ領域間の相互連結を提供するカウンタドープ領域と、
を備える、CMOSイメージセンサのピクセルのためのフォトダイオード。 - 前記第1導電型のドープ領域が、前記半導体層及び前記複数の第2導電型のドープ領域より相対的に高いドープ濃度を有する、請求項1に記載の、CMOSイメージセンサのピクセルのためのフォトダイオード。
- 前記複数の第2導電型のドープ領域が、前記複数の第1導電型のドープ領域の一方のエッジ部で互いに連結される、請求項1に記載の、CMOSイメージセンサのピクセルのためのフォトダイオード。
- 前記カウンタドープ領域に隣接して形成され、前記第1導電型のドープ領域の上部及び下部に位置する前記複数の第2導電型のドープ領域のうちの1つの一部に形成される他のカウンタドープ領域をさらに含む、請求項1に記載の、CMOSイメージセンサのピクセルのためのフォトダイオード。
- 前記ピニング層が、第1導電型である、請求項1〜4のいずれか1項に記載の、CMOSイメージセンサのピクセルのためのフォトダイオード。
- 前記第1導電型と前記第2導電型が互いに相補的なp型またはn型である、請求項1〜4のいずれか1項に記載の、CMOSイメージセンサのピクセルのためのフォトダイオード。
- 前記ピクセルは、4T(4トランジスタ)−ピクセルである、請求項1〜4のいずれか1項に記載の、CMOSイメージセンサのピクセルのためのフォトダイオード。
- 前記ピクセルは、3T(3トランジスタ)−ピクセルである、請求項1〜4のいずれか1項に記載の、CMOSイメージセンサのピクセルのためのフォトダイオード。
- 前記第1導電型の半導体層が、エピタキシャル層である、請求項1〜4のいずれか1項に記載の、CMOSイメージセンサのピクセルのためのフォトダイオード。
- 第1導電型の半導体層と、
前記半導体層に局部的に形成されたSTI領域と、
前記半導体層内に形成されたピンドフォトダイオードと、
前記ピンドフォトダイオードに生成された光電荷をセンシングノードに伝達するためのトランスファーゲートと、
を備え、
前記ピンドフォトダイオードは、
前記半導体層内で互いに異なる深さに形成された複数の第2導電型のドープ領域と、
前記半導体層内で前記複数の第2導電型のドープ領域の間に形成され、フォトダイオードの空乏のための電圧印加時にも完全に空乏されずに複数の接合キャパシタを形成する複数の第1導電型のドープ領域と、
酸化膜の表面下に形成されたピニング層と、
前記複数の第1導電型のドープ領域のうちの1つの一部に形成され、該第1導電型のドープ領域の上下部に位置する前記第2導電型のドープ領域間の相互連結を提供するカウンタドープ領域と、
を備える、CMOSイメージセンサのピクセル。 - 前記第1導電型のドープ領域が、前記半導体層及び前記複数の第2導電型のドープ領域より相対的に高いドープ濃度を有する、請求項10に記載の、CMOSイメージセンサのピクセル。
- 前記複数の第2導電型のドープ領域が、前記トランスファーゲートの一方のエッジ下部領域で互いに連結される、請求項10に記載の、CMOSイメージセンサのピクセル。
- 前記STI領域の前記半導体層の表面の下部に形成された第1導電型のフィールドストップドープ領域を更に備え、
前記フィールドストップドープ領域は、前記ピニング層及び前記複数の第1導電型のドープ領域と互いに連結されて形成される、請求項10に記載の、CMOSイメージセンサのピクセル。 - 前記カウンタドープ領域に隣接して形成され、前記第1導電型のドープ領域の上部及び下部に位置する前記複数の第2導電型のドープ領域のうちの1つの一部に形成される他のカウンタドープ領域をさらに含む、請求項13に記載の、CMOSイメージセンサのピクセル。
- 前記カウンタドープ領域及び他のカウンタドープ領域は、前記STI領域の近傍に形成される、請求項14に記載の、CMOSイメージセンサのピクセル。
- 前記ピニング層が、第1導電型である、請求項10〜15のいずれか1項に記載の、CMOSイメージセンサのピクセル。
- 前記第1導電型と前記第2導電型が、互いに相補的なp型またはn型である、請求項10〜15のいずれか1項に記載の、CMOSイメージセンサのピクセル。
- 前記第1導電型の半導体層が、エピタキシャル層である、請求項10〜15の、いずれか1項に記載のCMOSイメージセンサのピクセル。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20050134243 | 2005-12-29 | ||
KR10-2005-0134243 | 2005-12-29 | ||
KR1020060038536A KR100790224B1 (ko) | 2005-12-29 | 2006-04-28 | Sti 기술로 구현된 고해상도 cmos 이미지 센서를위한 성층형 포토다이오드 |
KR10-2006-0038536 | 2006-04-28 |
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JP2007184520A JP2007184520A (ja) | 2007-07-19 |
JP5214116B2 true JP5214116B2 (ja) | 2013-06-19 |
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US (4) | US7633134B2 (ja) |
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