JP5214091B2 - 測定で求めた電気的特性に基づいて製造プロセスを制御するための方法および装置 - Google Patents

測定で求めた電気的特性に基づいて製造プロセスを制御するための方法および装置 Download PDF

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JP5214091B2
JP5214091B2 JP2004541555A JP2004541555A JP5214091B2 JP 5214091 B2 JP5214091 B2 JP 5214091B2 JP 2004541555 A JP2004541555 A JP 2004541555A JP 2004541555 A JP2004541555 A JP 2004541555A JP 5214091 B2 JP5214091 B2 JP 5214091B2
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recipe
operation recipe
electrical performance
parameter
target value
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JP2006501674A5 (https=
JP2006501674A (ja
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ジェイ． チョン ロバート
ワン ジン
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Advanced Micro Devices Inc
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Advanced Micro Devices Inc
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/23—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by multiple measurements, corrections, marking or sorting processes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/20—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties
    • H10P74/203—Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects

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  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • General Factory Administration (AREA)
JP2004541555A 2002-09-30 2003-09-19 測定で求めた電気的特性に基づいて製造プロセスを制御するための方法および装置 Expired - Lifetime JP5214091B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/262,620 2002-09-30
US10/262,620 US6912437B2 (en) 2002-09-30 2002-09-30 Method and apparatus for controlling a fabrication process based on a measured electrical characteristic
PCT/US2003/029037 WO2004032224A1 (en) 2002-09-30 2003-09-19 Method and apparatus for controlling a fabrication process based on a measured electrical characteristic

Publications (3)

Publication Number Publication Date
JP2006501674A JP2006501674A (ja) 2006-01-12
JP2006501674A5 JP2006501674A5 (https=) 2009-01-15
JP5214091B2 true JP5214091B2 (ja) 2013-06-19

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JP2004541555A Expired - Lifetime JP5214091B2 (ja) 2002-09-30 2003-09-19 測定で求めた電気的特性に基づいて製造プロセスを制御するための方法および装置

Country Status (9)

Country Link
US (1) US6912437B2 (https=)
JP (1) JP5214091B2 (https=)
KR (1) KR101165791B1 (https=)
CN (1) CN100345270C (https=)
AU (1) AU2003270675A1 (https=)
DE (1) DE10393371T5 (https=)
GB (1) GB2410377B (https=)
TW (1) TWI327644B (https=)
WO (1) WO2004032224A1 (https=)

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DE102007035833B3 (de) * 2007-07-31 2009-03-12 Advanced Micro Devices, Inc., Sunnyvale Fortgeschrittene automatische Abscheideprofilzielsteuerung und Kontrolle durch Anwendung von fortgeschrittener Polierendpunktsystemrückkopplung
US8338192B2 (en) * 2008-05-13 2012-12-25 Stmicroelectronics, Inc. High precision semiconductor chip and a method to construct the semiconductor chip
US8606379B2 (en) * 2008-09-29 2013-12-10 Fisher-Rosemount Systems, Inc. Method of generating a product recipe for execution in batch processing
US8224475B2 (en) * 2009-03-13 2012-07-17 Taiwan Semiconductor Manufacturing Company, Ltd. Method and apparatus for advanced process control
US8112168B2 (en) * 2009-07-29 2012-02-07 Texas Instruments Incorporated Process and method for a decoupled multi-parameter run-to-run controller
US20110195636A1 (en) * 2010-02-11 2011-08-11 United Microelectronics Corporation Method for Controlling Polishing Wafer
KR101121858B1 (ko) * 2010-04-27 2012-03-21 주식회사 하이닉스반도체 반도체 소자의 제조 방법
US8832634B2 (en) * 2012-09-05 2014-09-09 Lsi Corporation Integrated circuit characterization based on measured and static apparent resistances
JP2014053505A (ja) * 2012-09-07 2014-03-20 Toshiba Corp 半導体装置の製造方法、半導体ウェーハ及び半導体装置の製造装置
US9405289B2 (en) 2012-12-06 2016-08-02 Tokyo Electron Limited Method and apparatus for autonomous identification of particle contamination due to isolated process events and systematic trends
US9879968B2 (en) * 2014-10-23 2018-01-30 Caterpillar Inc. Component measurement system having wavelength filtering
TWI553436B (zh) * 2015-06-10 2016-10-11 A control system that monitors and obtains production information through a remote mobile device
KR20170136225A (ko) 2016-06-01 2017-12-11 엘에스산전 주식회사 시뮬레이션 장치
US11346882B2 (en) * 2017-11-03 2022-05-31 Tokyo Electron Limited Enhancement of yield of functional microelectronic devices
US11244873B2 (en) * 2018-10-31 2022-02-08 Tokyo Electron Limited Systems and methods for manufacturing microelectronic devices
CN113053767B (zh) * 2021-03-09 2022-09-06 普迪飞半导体技术(上海)有限公司 栅极结构中氮化钛层厚度的确定方法、装置、设备与介质
US11868119B2 (en) 2021-09-24 2024-01-09 Tokyo Electron Limited Method and process using fingerprint based semiconductor manufacturing process fault detection
KR102760991B1 (ko) * 2022-02-25 2025-01-24 포항공과대학교 산학협력단 반도체 파라미터 설정 장치 및 방법

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JP3727103B2 (ja) * 1996-04-05 2005-12-14 三菱電機株式会社 半導体素子の試験方法
JPH10173021A (ja) * 1996-12-12 1998-06-26 Mitsubishi Electric Corp 製造ライン解析方法及び製造ライン解析装置
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Also Published As

Publication number Publication date
CN1685495A (zh) 2005-10-19
AU2003270675A1 (en) 2004-04-23
TW200408807A (en) 2004-06-01
US6912437B2 (en) 2005-06-28
WO2004032224A1 (en) 2004-04-15
KR101165791B1 (ko) 2012-07-17
GB2410377B (en) 2006-08-16
GB0505102D0 (en) 2005-04-20
KR20050055729A (ko) 2005-06-13
JP2006501674A (ja) 2006-01-12
GB2410377A (en) 2005-07-27
DE10393371T5 (de) 2005-10-20
TWI327644B (en) 2010-07-21
CN100345270C (zh) 2007-10-24
US20040093110A1 (en) 2004-05-13

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