JP5209284B2 - Abrasive sheet and method for producing abrasive sheet - Google Patents

Abrasive sheet and method for producing abrasive sheet Download PDF

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JP5209284B2
JP5209284B2 JP2007307730A JP2007307730A JP5209284B2 JP 5209284 B2 JP5209284 B2 JP 5209284B2 JP 2007307730 A JP2007307730 A JP 2007307730A JP 2007307730 A JP2007307730 A JP 2007307730A JP 5209284 B2 JP5209284 B2 JP 5209284B2
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abrasive grains
abrasive
temporary
film
base material
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JP2009131909A (en
JP2009131909A5 (en
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信義 渡辺
和憲 谷
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Nihon Micro Coating Co Ltd
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Nihon Micro Coating Co Ltd
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Priority to JP2007307730A priority Critical patent/JP5209284B2/en
Priority to US12/744,551 priority patent/US20100293865A1/en
Priority to PCT/JP2008/071082 priority patent/WO2009069526A1/en
Priority to KR1020107011573A priority patent/KR20100103473A/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/001Manufacture of flexible abrasive materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • B24D18/0054Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for by impressing abrasive powder in a matrix

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Polishing Bodies And Polishing Tools (AREA)

Description

本発明は磁気ディスク基板、シリコンウェーハー、表示装置用ガラス基板、光ファイバーの端面やレンズ等の各種被研磨体の表面を平滑に研磨するための研磨シートに関し、特に被研磨体を超精密に研磨するための研磨シート及びその製造方法に関するものである。   The present invention relates to a polishing sheet for smoothly polishing the surface of various objects to be polished such as a magnetic disk substrate, a silicon wafer, a glass substrate for a display device, an end face of an optical fiber and a lens, and in particular, polishes the object to be polished very precisely. The present invention relates to a polishing sheet and a method for producing the same.

被研磨体の表面を平滑かつ平坦に研磨するためには極力細粒の研磨砥粒を用いて研磨が行われるが、研磨方法には大別して研磨砥粒を外部から被研磨体に供給して研磨する遊離砥粒方式と、基板に研磨砥粒を固着した研磨シートを用いて研磨する固定砥粒方式とがある。この内、固定砥粒方式は遊離砥粒方式のように大量の研磨材を必要とせず、また研磨材を固着する基板シートも様々な形状のものが実現できることから広く活用されている方法である。   In order to polish the surface of the object to be polished smoothly and flatly, polishing is performed using fine abrasive grains as much as possible, but the polishing method is roughly divided to supply the abrasive grains to the object to be polished from the outside. There are a free-abrasive method for polishing and a fixed-abrasive method for polishing using a polishing sheet in which the polishing abrasive is fixed to a substrate. Of these, the fixed abrasive method does not require a large amount of abrasive as the free abrasive method, and the substrate sheet to which the abrasive is fixed can be realized in various shapes, and thus is widely used. .

固定砥粒方式の研磨シートは、基板としてポリエチレンテレフタレートのような有機樹脂、織布、不織布等の材料が選択され、この基板の上にアルミナ、シリカ、ダイヤモンド等の無機研磨材の微粒子が樹脂等のバインダーで固着されるという構成からなる。   In the fixed abrasive grain type polishing sheet, an organic resin such as polyethylene terephthalate, a woven fabric, a non-woven fabric, or the like is selected as a substrate, and fine particles of an inorganic abrasive such as alumina, silica, diamond, etc. are placed on the substrate. It is configured to be fixed with a binder.

研磨シートの研磨性能は、研磨砥粒そのものや樹脂との混合比、固着厚さ等により定まるが、中でも研磨砥粒の性状に著しく左右される。研磨砥粒の性状としては砥粒の材質、粒度、形状等が重要な因子であるが、砥粒そのものを最適化しても、性能を充分に発揮させるためには砥粒が固着された固着層において個々の砥粒がどのような配列で固着されているかという点がもう一つの重要な因子となる。   The polishing performance of the polishing sheet is determined by the mixing ratio of the abrasive grains themselves and the resin, the fixing thickness, and the like, but particularly depends on the properties of the abrasive grains. The abrasive grain material, grain size, shape, etc. are important factors for the properties of the abrasive grains. However, even if the abrasive grains themselves are optimized, the fixed layer to which the abrasive grains are secured in order to fully demonstrate the performance. In other words, the arrangement of the individual abrasive grains is another important factor.

特に被研磨体を超精密に研磨するためには個々の砥粒が凝集した状態で基板に固着されたような砥粒の配列は好ましくない。微視的に見ると個々の砥粒は一様には配列していない場合が多く、凝集を引き起こしていわば固まりが点在するような配列を招きやすい。   In particular, in order to polish the object to be polished with high precision, an arrangement of abrasive grains such that individual abrasive grains are agglomerated and fixed to a substrate is not preferable. When viewed microscopically, the individual abrasive grains are often not arranged in a uniform manner, and if they cause agglomeration, it is easy to invite an arrangement in which clusters are scattered.

このような砥粒の配列では研磨シートの表面粗さが不揃いになり、被研磨体の表面に傷が発生するような好ましくない研磨しか達成できない。   With such an array of abrasive grains, the surface roughness of the polishing sheet becomes uneven, and only unfavorable polishing that causes scratches on the surface of the object to be polished can be achieved.

そこで上記のような傷の発生を無くすために砥粒の粒径を極力均一なものとして、かつ砥粒が単一の層で固着された研磨シートが考案されている(特許文献1、2)。例えば特許文献1の第2図に示された砥粒単一層や、特許文献2の第1図に記載されたダイヤモンド砥粒単一層の研磨シートが知られている。   Therefore, in order to eliminate the occurrence of scratches as described above, a polishing sheet has been devised in which the grain size of the abrasive grains is made as uniform as possible and the abrasive grains are fixed in a single layer (Patent Documents 1 and 2). . For example, an abrasive single layer shown in FIG. 2 of Patent Literature 1 and a diamond abrasive grain single layer abrasive sheet shown in FIG. 1 of Patent Literature 2 are known.

特許文献1ではバインダーと砥粒とを混合して基材に塗布するだけで容易に砥粒単一層が得られると記載されており、格別に工夫を要した塗布方法には触れていない。一方、特許文献2では砥粒単一層を得るための格別な方法が記載されており、砥粒を分散した電解液中で電着法により砥粒を固定するか、あるいは有機バインダーと砥粒を混合したものをロールコーティングする方法が開示されている。   Patent Document 1 describes that an abrasive single layer can be easily obtained simply by mixing a binder and abrasive grains and applying the mixture to a base material, and does not mention any specially devised application method. On the other hand, Patent Document 2 describes a special method for obtaining a single layer of abrasive grains. In the electrolytic solution in which abrasive grains are dispersed, the abrasive grains are fixed by electrodeposition, or an organic binder and abrasive grains are bonded. A method of roll coating the blend is disclosed.

上記のように砥粒を単一層とした研磨テープが開示されているが、微視的に見ると従来例では個々の砥粒は被研磨体と接触する方の砥粒表面がバインダーで覆われている構成であった。例えば特許文献1に記載されている方法では、砥粒とバインダーを混合したものを塗布しただけなので、特許文献1の第2図を見ると砥粒の被研磨体と接触する方の表面は点線で示されているバインダーで覆れた状態のままであることが判る。このように砥粒が研磨に寄与しないバインダーで覆われていると研磨性能が著しく低下する。   As described above, a polishing tape having a single layer of abrasive grains is disclosed. However, when viewed microscopically, in the conventional example, the surface of each abrasive grain that comes into contact with the object to be polished is covered with a binder. It was a configuration that. For example, in the method described in Patent Document 1, since only a mixture of abrasive grains and a binder is applied, the surface of the abrasive grain contacting the object to be polished is shown by a dotted line in FIG. It can be seen that it remains covered with the binder shown in. As described above, when the abrasive grains are covered with a binder that does not contribute to polishing, the polishing performance is remarkably deteriorated.

また特許文献2では図中に砥粒がバインダーで覆われていないように記述されているものの、発明者が検討したところ単にバインダーと砥粒の混合物を塗布しただけでは砥粒表面にバインダーが残存することが課題であることが判明した。   In addition, although Patent Document 2 describes that the abrasive grains are not covered with a binder in the figure, the inventors have studied and the binder remains on the abrasive grain surface simply by applying a mixture of the binder and the abrasive grains. It turned out to be a challenge.

また、たとえ砥粒の大きさを一様に揃える分級を施したところでその分級度には限界があり、砥粒は一定の粒度分布を有する。このような粒度分布を有する砥粒を塗布したのみでは被研磨体と接触する方の砥粒の最先端部(すなわち被研磨体と接触する部分)は微視的に見ると完全直線上には無くその高さはまちまちである。このことは被研磨体を研磨する際に、被研磨体と接触して研磨に寄与する砥粒と、接触しないで研磨にあまり寄与しない砥粒とが混在することになり好ましくない。なお本特許では上記被研磨体と接触する方の砥粒の最先端部を切り刃と称し、該切り刃が一直線上にあることを切り刃が揃うと称することにする。   Moreover, there is a limit to the degree of classification when the classification is performed so that the size of the abrasive grains is uniform, and the abrasive grains have a certain particle size distribution. When the abrasive grains having such a particle size distribution are only applied, the most advanced portion of the abrasive grains that come into contact with the object to be polished (that is, the part that comes into contact with the object to be polished) is not perfectly linear when viewed microscopically. There is no difference in its height. This is not preferable because, when the object to be polished is polished, abrasive grains that come into contact with the object to be polished and contribute to the polishing are mixed with abrasive grains that do not come into contact with the polishing object and do not contribute much to the polishing. In this patent, the most advanced part of the abrasive grains that come into contact with the object to be polished is referred to as a cutting blade, and the fact that the cutting blade is in a straight line is referred to as the cutting blades being aligned.

そこで砥粒を単一層で固着出来てかつ個々の砥粒の切り刃が研磨性能を低下させるバインダーや電着材等の砥粒以外のもので覆われていない状態を実現するために、砥粒単一層を形成した後に砥粒表面に付着したバインダーを除去する方法が考案され、開示されている(特許文献3)。この特許文献3に記載されている方法では、砥粒とバインダーの混合体を塗布した後紫外線を照射して砥粒表面のバインダーを除去することで単一層砥粒の表面を露出させて研磨性能の低下を防いでいる。   Therefore, in order to realize a state in which the abrasive grains can be fixed in a single layer and the cutting edges of the individual abrasive grains are not covered with anything other than abrasive grains such as a binder and an electrodeposition material that degrade the polishing performance. A method for removing the binder adhering to the abrasive grain surface after forming a single layer has been devised and disclosed (Patent Document 3). In the method described in Patent Document 3, the surface of the single-layer abrasive is exposed by removing the binder on the surface of the abrasive by irradiating ultraviolet rays after applying a mixture of the abrasive and binder, and polishing performance. Is preventing the decline.

しかしながら該方法では砥粒表面のバインダー除去に長時間を要し量産性に乏しい。また紫外線は砥粒表面のみではなく砥粒の側面にも回りこむので、砥粒を強固に保持する役割を果たすべき砥粒側面のバインダーも除去され、結果として砥粒の脱落を生じやすい。   However, this method requires a long time to remove the binder on the surface of the abrasive grains and is poor in mass productivity. Further, since the ultraviolet rays wrap around not only the surface of the abrasive grains but also the side faces of the abrasive grains, the binder on the side faces of the abrasive grains that should serve to hold the abrasive grains firmly is also removed, and as a result, the abrasive grains are liable to fall off.

砥粒表面が露出した単一層を形成する方法としては、上記の他にも開示された方法がある(特許文献4)。特許文献4の場合について説明すると砥粒はまず低粘度の第一のバインダーと混合したスラリー状にされ該スラリーが基材上に砥粒が単一層になるように塗布される。次いで乾燥させることによりバインダーが収縮して各々の砥粒表面がバインダー部よりも突出する。次に該突出部を被うように高粘度の第二のバインダーに該突出部を押し込む。第二のバインダーを乾燥すると、各々の砥粒は第一の低粘度バインダーよりも第二の高粘度バインダーにより強固に保持される。そこで第一のバインダーを剥離することにより砥粒は第二のバインダーに保持され、かつ砥粒表面が露出した単一層が得られる。   In addition to the above, there is a disclosed method as a method for forming a single layer with the abrasive grain surface exposed (Patent Document 4). In the case of Patent Document 4, the abrasive grains are first made into a slurry mixed with a low-viscosity first binder, and the slurry is applied on the substrate so that the abrasive grains form a single layer. Next, by drying, the binder shrinks and the surface of each abrasive grain protrudes beyond the binder part. Next, the protrusion is pushed into the second binder having a high viscosity so as to cover the protrusion. When the second binder is dried, each abrasive grain is held more firmly by the second high viscosity binder than by the first low viscosity binder. Therefore, by peeling the first binder, the abrasive grains are held by the second binder, and a single layer with the abrasive grain surface exposed is obtained.

しかしながらこの方法では第一のバインダーが容易に砥粒と剥離するとは限らず、第一のバインダーが残存したまま砥粒表面をいまだに覆う研磨シートになりやすいという欠点を生じる。   However, in this method, the first binder is not always easily separated from the abrasive grains, and there is a disadvantage that the first binder tends to be a polishing sheet that still covers the abrasive grain surface with the first binder remaining.

一方、特許文献5に記載されている研磨用品は、基材シートの表面上に複数の研磨コンポジットを露出させ、かつ均一な間隔で配置するようにしたものであるが、装置構成が複雑となる一方、研磨コンポジットの先端が揃うように形成できるとは限らないという欠点がある。
特開平1−234169号公報 特開平4−129660号公報 特開平2−243271号公報 特許3314154号公報 特開平5−253852号公報
On the other hand, the polishing article described in Patent Document 5 is such that a plurality of polishing composites are exposed on the surface of the base sheet and arranged at a uniform interval, but the apparatus configuration is complicated. On the other hand, there is a drawback in that it cannot always be formed so that the tips of the abrasive composites are aligned.
JP-A-1-234169 Japanese Patent Laid-Open No. 4-129660 JP-A-2-243271 Japanese Patent No. 3314154 Japanese Patent Laid-Open No. 5-253852

以上述べたように砥粒を単一層に形成し、かつ切り刃の表面がバインダーで覆われていない完全露出部を呈する研磨シートを得るためには、従来の方法では、単一層は得られるものの切り刃の表面にバインダーが残存するものとなってしまう。あるいは該残存バインダーを除去する従来方法では、その除去は量産性に乏しくかつ完全ではなかった。   As described above, in order to obtain an abrasive sheet that forms abrasive grains in a single layer and exhibits a completely exposed portion in which the surface of the cutting blade is not covered with a binder, the conventional method can obtain a single layer. The binder remains on the surface of the cutting blade. Alternatively, in the conventional method for removing the residual binder, the removal is poor in mass productivity and not complete.

また切り刃が揃っていないので本来の砥粒の研磨性能を充分に発揮できるものではなかった。さらに付け加えると従来の方法で作成された研磨シートでは、各々の砥粒が平面方向に見て隣同士の砥粒が接触する場合が多い。研磨に当って問題となる研磨傷の発生メカニズムとして被研磨材の研磨残渣が被研磨材を傷つけることが原因の一つであることが判っている。このようなメカニズムによる研磨傷を無くすには研磨残渣を効率よく排出させる必要がある。通常研磨は研磨シートあるいは被研磨体に一定の荷重をかけるので被研磨体と研磨シートは密着し研磨残渣が排出され難い状態にある。従来例では平面方向に見て研磨砥粒が隣同士接触しており研磨残渣が一層排出され難かった。   Further, since the cutting blades are not aligned, the original polishing performance of the abrasive grains cannot be fully exhibited. In addition, in a polishing sheet prepared by a conventional method, adjacent abrasive grains often come into contact with each other when viewed in the plane direction. It has been found that one of the causes is that a polishing residue of a material to be polished damages the material to be polished as a generation mechanism of a polishing scratch that becomes a problem in polishing. In order to eliminate polishing scratches caused by such a mechanism, it is necessary to efficiently discharge polishing residues. In normal polishing, a constant load is applied to the polishing sheet or the object to be polished, so that the object to be polished and the polishing sheet are in close contact with each other and it is difficult to discharge the polishing residue. In the conventional example, the abrasive grains are in contact with each other as viewed in the plane direction, and the polishing residue is more difficult to be discharged.

そこで本発明の目的はこれ研磨砥粒の切り刃出しと切り刃を揃えることと同時に研磨残渣を効率的に排出することの3つの課題を解決し得る研磨シートを提供することにある。   Accordingly, an object of the present invention is to provide a polishing sheet that can solve the three problems of efficiently discharging polishing residues at the same time as aligning the cutting edges and cutting edges of the abrasive grains.

上記目的を達成するために本発明が提案するのは、基材と、該基材の表面上に接着材により固着される単一粒子層を形成する砥粒と、を備えてなる研磨シートであって、前記砥粒が、それぞれ被研磨体に当接する先端部を同一平面に揃えると共に、離間して分布することを特徴とする研磨シートである。 In order to achieve the above object, the present invention proposes a polishing sheet comprising a base material and abrasive grains that form a single particle layer fixed on the surface of the base material by an adhesive. The abrasive sheet is characterized in that the abrasive grains are distributed at a distance from each other while aligning the tip portions in contact with the object to be polished on the same plane.

更に本発明が提案するのは、基材上に接着材により固着される単一層の砥粒が、前記接着材から被研磨体に当接する部分を露出させると共にその先端部を同一平面状に揃えてなる研磨シートの製造方法であって、仮基材上に前記砥粒の平均粒子径より小さい数値の厚さからなる仮固着材の膜を形成する第1の工程と、前記砥粒を前記仮基材上に接するように前記仮固着材の膜に散布する第2の工程と、接着材が塗布された基を、該接着材を前記砥粒に向けて圧接する第3の工程と、圧接された前記接着材を硬化させる第4の工程、前記接着材の硬化後に、前記仮基材を剥離しさらに前記仮固着材の膜を除去する第5の工程とを備えてなることを特徴とする研磨シートの製造方法である。 Furthermore, the present invention proposes that a single layer of abrasive grains fixed on a base material by an adhesive exposes a portion of the adhesive that contacts the object to be polished and aligns the tips thereof on the same plane. A method for producing a polishing sheet comprising: a first step of forming a temporary fixing material film having a numerical value smaller than an average particle diameter of the abrasive grains on a temporary substrate; A second step of spraying the temporary adhering material film on the temporary base material so as to contact the temporary base material; and a third step of pressing the base material coated with the adhesive toward the abrasive grains. A fourth step of curing the pressure-bonded adhesive, and a fifth step of peeling the temporary base material and further removing the temporary fixing material film after the adhesive is cured. It is the manufacturing method of the characteristic abrasive sheet.

そして本発明では上記課題を解決するために仮基に砥粒の平均粒子径の1/10〜2/3の厚さの水溶性あるいは有機酸水溶性の膜を形成し、該砥粒を負または正の同一極性に帯電させ、かつ該砥粒を散布する散布装置の容器を該砥粒と同一極性に帯電させ、かつをアース電位として該水溶性あるいは有機酸水溶性の膜上に、該砥粒の先端が仮基に接するように該砥粒を散布し、次いで仮基とは反対側の該砥粒に砥粒を固着する樹脂を押し当て、該樹脂を硬化させたのちに仮基を剥離し、ついで該膜を除去するという新規な製造方法を採用し、これにより研磨性能に優れた研磨テープを得るものである。 And in this invention, in order to solve the said subject, the water-soluble or organic acid water-soluble film | membrane of the thickness of 1/10-2/3 of the average particle diameter of an abrasive grain is formed in a temporary base material, and this abrasive grain is used. negative or positive is charged to the same polarity, and a container of the spray device to spray the abrasive grains are charged to the abrasive grains of the same polarity, and the water-soluble or organic acid water-soluble film the temporary substrate as a ground potential Sprinkle the abrasive grains so that the tips of the abrasive grains are in contact with the temporary base material, and then press the resin that fixes the abrasive grains on the opposite side of the temporary base material to cure the resin. After that, a novel production method of peeling the temporary base material and then removing the film is adopted, thereby obtaining a polishing tape having excellent polishing performance.

本発明の方法ではまず砥粒を固着する仮の基を準備して、該仮基上に水溶性あるいは有機酸水溶性の薄い膜を塗布する。次いで該水溶性あるいは有機酸水溶性塗布膜上に砥粒を散布する。砥粒は該砥粒を正または負の同一極性に静電帯電させ、かつ仮基を電気的にアース電位にして散布される。 Prepare the temporary substrate to first fixing the abrasive grains by the method of the present invention, applying a water-soluble or organic acid water-soluble thin film on a provisional substrate. Next, abrasive grains are dispersed on the water-soluble or organic acid water-soluble coating film. The abrasive grains are dispersed by electrostatically charging the abrasive grains to the same positive or negative polarity and electrically setting the temporary base material to the ground potential.

またこの場合静電散布する装置の内壁を砥粒と同一極性に帯電させることにより砥粒が容器内壁に付着せずに効率良くに散布される。水溶性膜あるいは有機酸水溶性膜の厚さおよび静電帯電電圧とアース電位の間の電位差の適切な選択により、砥粒は該水溶性膜あるいは有機酸水溶性膜中に仮基と接触した状態で押し込まれ、かつ仮基と反対側の砥粒の一部が水溶性膜あるいは有機酸水溶性膜よりも突出する。 In this case, the inner wall of the electrostatic spraying device is charged to the same polarity as the abrasive grains, so that the abrasive grains are efficiently dispersed on the temporary base material without adhering to the inner wall of the container. By appropriate selection of the thickness of the water-soluble film or organic acid water-soluble film and the potential difference between the electrostatic charging voltage and the ground potential, the abrasive grains contact the temporary substrate in the water-soluble film or organic acid water-soluble film. The part of the abrasive grain that is pushed in in a state of being opposite to the temporary base material protrudes from the water-soluble film or the organic acid water-soluble film.

次に該砥粒突出部を覆うようにして樹脂等の固着材が塗布される。該固着材は固化され強固に砥粒を保持する。次いで仮基が剥離され、最後に水溶性膜あるいは有機酸水溶性膜を水あるいは酸で溶解することにより切り刃が揃い、かつ砥粒が平面方向に離間した理想的な研磨シートが得られる。以下にこの新規技術とそれにより得られる製品について詳述する。 Next, a fixing material such as a resin is applied so as to cover the protruding portion of the abrasive grains. The fixing material is solidified and firmly holds the abrasive grains. Next, the temporary base material is peeled off, and finally the water-soluble film or organic acid water-soluble film is dissolved with water or acid to obtain an ideal polishing sheet in which cutting edges are aligned and the abrasive grains are spaced apart in the plane direction. . The new technology and the resulting product are described in detail below.

本発明は、研磨傷を発生せず、かつ効率的に面粗さの良好な研磨が行える研磨材としての研磨シートを提供することができる。   The present invention can provide a polishing sheet as an abrasive that does not generate polishing scratches and can efficiently perform polishing with good surface roughness.

特に本発明によれば仮固着材として水溶性あるいは有機酸水溶性の材料を用いて、同時に砥粒を同一極性に帯電させをアース電位に保つことにより砥粒が平面方向に見て互いに離間した研磨シートが得られる。さらに切り刃が完全露出してかつ揃った状態にあり、このため研磨シートとして極めて良好な研磨性能を発揮する。 In particular, according to the present invention, a water-soluble or organic acid water-soluble material is used as a temporary fixing material, and at the same time, the abrasive grains are viewed in a planar direction by charging the abrasive grains to the same polarity and keeping the temporary substrate at the ground potential. Abrasive sheets spaced apart from one another are obtained. Further, the cutting blades are completely exposed and aligned, so that extremely excellent polishing performance is exhibited as an abrasive sheet.

以下添付図面を参照して本発明の好ましい実施形態を説明する。   Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings.

図1は本発明に係る研磨シートの一部断面図、図2(a)〜(h)は本発明に係る研磨シートの製造工程を示す概略図、図3は本発明における砥粒の静電散布装置を示す概略図、図4は本発明における砥粒散布後の砥粒の分布を示す写真図、図5は本発明に係る研磨シートを使用する試験片加工装置の概略斜視図である。   FIG. 1 is a partial cross-sectional view of an abrasive sheet according to the present invention, FIGS. 2A to 2H are schematic views showing a manufacturing process of the abrasive sheet according to the present invention, and FIG. FIG. 4 is a schematic view showing a spraying device, FIG. 4 is a photograph showing distribution of abrasive grains after spraying abrasive grains in the present invention, and FIG. 5 is a schematic perspective view of a test piece processing apparatus using a polishing sheet according to the present invention.

図1に示すように、本発明に係る研磨シートは、フィルム状の基材である基4に一方の面上に、接着樹脂5の層が密着して形成されてなり、同時に接着樹脂5は砥粒31〜33を強固に固着している。 As shown in FIG. 1, the abrasive sheet according to the present invention is formed by adhering a layer of an adhesive resin 5 on one surface to a base material 4 which is a film-like base material, and at the same time an adhesive resin 5 Firmly adheres the abrasive grains 31-33.

4はポリエチレンテレフタレート、ポリエチレンナフタレート等のポリエステル系樹脂、ポリエチレン、ポリプロピレン等のポリオレフィン系樹脂、ポリスチレン、塩化ビニール、ポリビニルアルコールまたはメタアクリルアルコールを主成分とするアクリル樹脂、ポリカーボネート等からなるものである。 The substrate 4 is made of a polyester resin such as polyethylene terephthalate or polyethylene naphthalate, a polyolefin resin such as polyethylene or polypropylene, an acrylic resin mainly composed of polystyrene, vinyl chloride, polyvinyl alcohol or methacryl alcohol, polycarbonate, or the like. is there.

砥粒31〜33は凝集が無く単一粒子層に形成されている。砥粒31〜33は、基4とは反対側の部分が切り刃であり、この切り刃は仮想線35と接する。すなわち切り刃が完全に揃った状態にあり、かつ切り刃は研磨性に悪影響を与えるような物質で覆われていないことが特徴である。さらに砥粒31〜33は隣同士密接しておらず離間した状態で保持されている。すなわち砥粒31〜33以外の図示しない砥粒も含めて、砥粒の被研磨体に接する先端部である切り刃は、同一平面上に位置するとともに離間した配置となっている。 The abrasive grains 31 to 33 have no aggregation and are formed in a single particle layer. In the abrasive grains 31 to 33, the part opposite to the base 4 is a cutting blade, and this cutting blade is in contact with the virtual line 35. That is, the cutting blades are in a completely aligned state, and the cutting blades are not covered with a substance that adversely affects the abrasiveness. Further, the abrasive grains 31 to 33 are held in a state where they are not in close contact with each other but are separated from each other. That is, the cutting blades, which are the tip portions of the abrasive grains in contact with the object to be polished, including abrasive grains (not shown) other than the abrasive grains 31 to 33 are located on the same plane and spaced apart.

接着樹脂5は基4との密着性に優れたものが選択されるが、その選択範囲は広く一般に用いられている接着樹脂を適用出来る。また接着樹脂を硬化させるに際してUV樹脂を用いる事も好適である。 Although those adhesive resin 5 having excellent adhesion to the substrate 4 is selected, the selection can be applied an adhesive resin used universally. It is also preferable to use a UV resin when the adhesive resin is cured.

図2(a)〜(h)に本発明係る研磨シートの製造工程を記す。   The manufacturing process of the abrasive sheet according to the present invention is shown in FIGS.

図2(h)は最終的に得られる研磨シートの製品概略図であり、研磨シートは、基4と、砥粒31〜33と、砥粒31〜33を強固に保持する接着樹脂5とで構成されてなり、被研磨体8に砥粒31〜33の切り刃が当接している。 FIG. 2 (h) is a product schematic diagram of the finally obtained abrasive sheet. The abrasive sheet comprises a base material 4, abrasive grains 31 to 33, and an adhesive resin 5 that firmly holds the abrasive grains 31 to 33. The cutting blades of the abrasive grains 31 to 33 are in contact with the object 8 to be polished.

かかる研磨シートは図2(a)から図2(g)に示す工程を経て作成される。まず仮基1を準備する。仮基1の材質としてはポリマー、Siウェーハー、金属等様々なものを用いることが出来る。材質そのものには大きな制約は無いがその表面は平滑にしておく必要がある。その平滑度は使用する砥粒の大きさにもよるが例えば砥粒の平均径が20ミクロンの場合には平均面粗さとして1ミクロン程度以下、砥粒平均径が5ミクロンの場合は0.5ミクロン以下の平滑度であれば差し支えない。 Such an abrasive sheet is produced through the steps shown in FIGS. 2 (a) to 2 (g). First, the temporary base material 1 is prepared. The material of the temporary substrate 1 polymer, Si wafer, it is possible to use a variety of metals. There are no major restrictions on the material itself, but the surface must be smooth. The smoothness depends on the size of the abrasive grains used. For example, when the average diameter of the abrasive grains is 20 microns, the average surface roughness is about 1 micron or less, and when the average grain diameter is 5 microns, it is 0. A smoothness of 5 microns or less is acceptable.

次いで仮基1の上に砥粒を仮固着る機能の水溶性あるいは有機酸水溶性の薄い仮固着材の膜2(適宜、「膜」と略称する)を塗布する。水溶性膜材料としては多糖類、のり、澱粉、ゼラチン等が使用される。具体的にはグリコーゲン、セルロース,デキストラン、デキストリン等の多糖類、ポリビニルアルコール、アクリル酸系ポリマー、ポリエチレンオキシド等の水溶性高分子(糊)、コーンや芋等の植物から生成した澱粉、動物性たんぱく質からなるゼラチン等が掲げられる。 Then film 2 (as appropriate, referred to as "film") of the water-soluble or organic acid water-soluble thin temporary fixing material of ability to provisionally fix the abrasive grains on the temporary substrate 1 to apply the. As the water-soluble film material, polysaccharides, glue, starch, gelatin and the like are used. Specifically, polysaccharides such as glycogen, cellulose, dextran, and dextrin, polyvinyl alcohol, acrylic acid polymers, water-soluble polymers (glue) such as polyethylene oxide, starch produced from plants such as corn and straw, animal protein The gelatin etc. which consist of are listed.

また水には溶解しにくいが有機酸を加えた溶液には溶解性を持つ有機酸水溶性材料も有用であり、例えばキチンやキチンからアセチル基を外したポリβ1,4グルコサミン(キトサン)が用いられる。特にキトサンは酢に溶解性を示し安全面でも何ら問題ないので本発明に適した材料である。   Organic acid water-soluble materials that are difficult to dissolve in water but have organic acid added are also useful. For example, chitin and polyβ1,4 glucosamine (chitosan) from which acetyl groups are removed from chitin are used. It is done. In particular, chitosan is a material suitable for the present invention because it is soluble in vinegar and has no problem in terms of safety.

これらの水溶性あるいは有機酸水溶性の仮固着材の膜2を塗布するのはすでに知られている方法を適用可能である。一般的にはスプレーコーティングやロールコーティングが良く知られた方法である。該膜2の厚さの調整は液の濃度や塗布温度、塗布速度等により制御され、その塗布厚さは砥粒平均径の1/10〜2/3が望ましい。   An already known method can be applied to apply the water-soluble or organic acid water-soluble temporary fixing material film 2. In general, spray coating and roll coating are well known methods. The adjustment of the thickness of the film 2 is controlled by the concentration of the liquid, the coating temperature, the coating speed, etc., and the coating thickness is preferably 1/10 to 2/3 of the average grain diameter.

次いで図2(b)に示したように、水溶性あるいは有機酸水溶性の膜2には砥粒31〜33が埋め込まれる。砥粒の材料としては被研磨体と砥粒の研磨性能との関係で選択すれば良く、アルミナ、シリカ、ダイヤモンド、窒化硼素、炭化珪素等の無機粒子や架橋アクリル樹脂、架橋ポリスチレン樹脂、メラミン樹脂等の有機粒子を採用することが出来る。   Next, as shown in FIG. 2B, abrasive grains 31 to 33 are embedded in the water-soluble or organic acid water-soluble film 2. The material of the abrasive grains may be selected according to the relationship between the object to be polished and the polishing performance of the abrasive grains. Inorganic particles such as alumina, silica, diamond, boron nitride, silicon carbide, crosslinked acrylic resin, crosslinked polystyrene resin, melamine resin Organic particles such as can be employed.

砥粒を単一粒子層として水溶性あるいは有機酸水溶性の膜2中に埋め込むには砥粒を静電帯電させ、かつ1をアース電位にする静電散布が適している。ここで言う静電散布は図3に示した装置を使用して行われる。 To embed the abrasive grains to the water-soluble or organic acid water-soluble film 2 as a single particle layer is electrostatically charging the abrasive grains, and electrostatic spraying to a temporary substrate 1 to the ground potential is suitable. The electrostatic spraying referred to here is performed using the apparatus shown in FIG.

図3は研磨砥粒を静電散布させる散布装置の概略図であり砥粒供給ユニット10と散布ユニット20から構成されている。砥粒は供給ホッパー12から砥粒調整チャンバー11に供給され、さらに圧送管16中で砥粒は正または負の同一極性に帯電される。いずれの極性に帯電させるかは砥粒の材質に応じて決定される。例えば砥粒がダイヤモンドの場合には負、アルミナの場合は正の電位が選択される。 FIG. 3 is a schematic view of a spraying device for electrostatically spraying abrasive grains, and is composed of an abrasive supply unit 10 and a spraying unit 20. The abrasive grains are supplied from the supply hopper 12 to the abrasive grain adjustment chamber 11, and the abrasive grains are charged to the same polarity, positive or negative, in the pressure feeding tube 16. Which polarity is charged depends on the material of the abrasive grains. For example, a negative potential is selected when the abrasive is diamond, and a positive potential is selected when the abrasive is alumina.

砥粒の帯電量は帯電センサー15で検出され、帯電量が適切な値になるように砥粒量制御ボックス13により砥粒供給量が制御される。供給量が制御された砥粒は圧送管16を介して散布ノズル21から基板ステージ22へと向かって散布される。この場合静電散布装置の容器内壁は砥粒と同一極性に帯電させられるので、砥粒は内壁から反発力を受け、容器内壁に付着することなく効率的に仮基1に到達する。 The charge amount of the abrasive grains is detected by the charge sensor 15, and the abrasive grain supply amount is controlled by the abrasive grain amount control box 13 so that the charge amount becomes an appropriate value. The abrasive grains whose supply amount is controlled are sprayed from the spray nozzle 21 toward the substrate stage 22 via the pressure feed tube 16. This inside wall of the case the electrostatic spraying device is to charge the abrasive grains of the same polarity, the abrasive grains are subjected to repulsive force from the inner wall, efficiently reach the Karimoto material 1 without adhering to the inner wall of the container.

なお圧送管の内壁との摩擦を促進するための方法として、圧送管内の圧力損失を防止するために、(a)圧送管の途中に補給ガス(ドライエアー、窒素ガス等)供給機能を付加する、(b)圧送管内を負圧にする機構、(c)複数の分岐圧送管を付加し、摩擦効率を高める方法が使用される。   In addition, as a method for promoting friction with the inner wall of the pressure feed pipe, in order to prevent pressure loss in the pressure feed pipe, (a) a function of supplying a supply gas (dry air, nitrogen gas, etc.) is added in the middle of the pressure feed pipe. , (B) a mechanism for making the inside of the pressure feed pipe negative pressure, and (c) a method of adding a plurality of branch pressure feed pipes to increase the friction efficiency.

次に、散布チャンバ20の散布ノズル21に導かれた帯電粒子は、散布ノズル21の周囲に配置された散布ノズルから排出される圧縮ガスとともに帯電した砥粒が吹き付けられる。圧縮ガスは、通常の圧縮ボンベガスが使用され、ドライエアー、窒素ガス等が使用される。   Next, the charged particles guided to the spray nozzle 21 of the spray chamber 20 are sprayed with the charged abrasive particles together with the compressed gas discharged from the spray nozzle arranged around the spray nozzle 21. As the compressed gas, ordinary compressed cylinder gas is used, and dry air, nitrogen gas, or the like is used.

水溶性の膜2あるいは有機酸水溶性の膜2が塗布された仮基1は基板ステージ22の上に設置され、そして仮基1の電位はアース電位に保たれる。散布ノズル21から散布される砥粒は1〜50kVの同一極性の電位で荷電される。そのため個々の砥粒は静電反発力を受け凝集が解かれた状態で個々の粒子のまま仮基1上の水溶性の膜2あるいは有機酸水溶性の膜2上に飛行していく。この場合静電散布チャンバー20の内壁は砥粒と同一極性の電位に保たれるので散布ノズル21から散布された砥粒はチャンバー内壁に付着することなく高歩留まりで水溶性の膜2あるいは有機酸水溶性の膜2上に飛行していく。 Temporary substrate 1 film 2 or organic acid soluble film 2 of the water-soluble is applied is placed on a substrate stage 22, and the potential of the temporary substrate 1 is kept at ground potential. The abrasive particles sprayed from the spray nozzle 21 are charged with a potential of the same polarity of 1 to 50 kV. Therefore, the individual abrasive grains fly on the water-soluble film 2 or the organic acid water-soluble film 2 on the temporary base material 1 in the state where the aggregation is released by receiving the electrostatic repulsive force. In this case, since the inner wall of the electrostatic spraying chamber 20 is kept at the same polarity as the abrasive grains, the abrasive particles sprayed from the spray nozzle 21 do not adhere to the inner wall of the chamber, and the water-soluble film 2 or organic acid can be obtained with a high yield. Fly over the water-soluble membrane 2.

またここで重要なのは仮基1、ひいては水溶性の膜2あるいは有機酸水溶性の膜2がアース電位に保たれることである。砥粒は同一極性の電位なので該砥粒はアース電位に保たれた水溶性の膜2あるいは有機酸水溶性の膜2に向かって強く電気的に吸引され、大きな運動エネルギーを持って水溶性膜あるいは有機酸水溶性膜に衝突していく。 Also is important here is Karimoto material 1, it is to turn the film 2 or organic acid soluble film 2 of the water-soluble is maintained at ground potential. Since the abrasive grains have the same polarity, the abrasive grains are strongly and electrically attracted toward the water-soluble film 2 or the organic acid water-soluble film 2 kept at the ground potential, and have a large kinetic energy. Or it collides with the organic acid water-soluble film.

水溶性の膜2あるいは有機酸水溶性の膜2は柔らかい性質を有するので、大きな運動エネルギーを有する砥粒は、水溶性の膜2あるいは有機酸水溶性の膜2に容易に食い込み、図2(b)に示すようにその先端が仮基1に当接し一直線上に揃う。 Since the water-soluble film 2 or the organic acid water-soluble film 2 has a soft property, abrasive grains having a large kinetic energy easily bite into the water-soluble film 2 or the organic acid water-soluble film 2 as shown in FIG. As shown in b), the front end abuts on the temporary substrate 1 and is aligned.

このような効果を示す電位としては1kV以上であれば効果が顕著である。50kV以上でも効果が維持されるが、現実として装置の作成が困難になる恐れがあるので、本発明では1〜50kVの電位の範囲に限定した。   If the potential showing such an effect is 1 kV or more, the effect is remarkable. Although the effect is maintained even at 50 kV or more, since it may be difficult to create a device in reality, the present invention is limited to a potential range of 1 to 50 kV.

本発明における砥粒の散布方法を従来と比較すると、従来例では砥粒を仮固着する仮基に向かって強く砥粒を吸引する力が働かない。例えば単に重力で落下させるだけでは砥粒は仮固着材の表面に付着するのみであり、仮固着材を通過して仮基に到達できない。 Compared with the conventional method of spraying abrasive grains in the present invention, in the conventional example, the force for attracting abrasive grains strongly does not work toward the temporary base material on which the abrasive grains are temporarily fixed. For example, if the particles are simply dropped by gravity, the abrasive grains only adhere to the surface of the temporary fixing material, and cannot pass through the temporary fixing material and reach the temporary base material .

さらに付け加えると本発明では各々の砥粒は同一極性に帯電しているので、水溶性の膜2あるいは有機酸水溶性の膜2に到達したときに互いに反発し、新たな凝集を引き起こすことが無い。すなわち単一粒子層で仮固着材の膜2中に仮固定される。   In addition, in the present invention, since each abrasive grain is charged to the same polarity, when it reaches the water-soluble film 2 or the organic acid water-soluble film 2, they repel each other and do not cause new aggregation. . That is, it is temporarily fixed in the film 2 of the temporary fixing material by a single particle layer.

さらに水溶性の膜2あるいは有機酸水溶性の膜2に到達した砥粒は、同一極性に帯電したまま仮固着されるので平面方向に見て互いに離間したまま固着される。従って研磨残渣の有効排出に効果的な砥粒間の距離を保ったままの研磨シートが得られるという特徴もある。   Further, since the abrasive grains that have reached the water-soluble film 2 or the organic acid water-soluble film 2 are temporarily fixed while being charged to the same polarity, they are fixed while being separated from each other when viewed in the plane direction. Therefore, there is also a feature that a polishing sheet can be obtained while maintaining a distance between abrasive grains effective for effective discharge of polishing residues.

このように静電散布を水溶性膜あるいは有機酸水溶性膜上に行うことで最終的に図2hに示したように切り刃が揃いかつ砥粒が平面方向に離間した単一粒子層研磨シートが実現できる。   By performing electrostatic spraying on the water-soluble film or organic acid water-soluble film in this way, a single particle layer polishing sheet in which the cutting edges are finally aligned and the abrasive grains are spaced apart in the plane direction as shown in FIG. 2h. Can be realized.

水溶性の膜2あるいは有機酸水溶性の膜2の厚さは砥粒の大きさと関連して決定され、砥粒の平均粒径の1/10〜2/3が望ましい。この理由は図2(d)に示すように、次の工程で砥粒の9/10〜1/3が接着樹脂5で覆われるようにするためである。   The thickness of the water-soluble film 2 or the organic acid water-soluble film 2 is determined in relation to the size of the abrasive grains, and is preferably 1/10 to 2/3 of the average grain diameter of the abrasive grains. The reason for this is to cover 9/10 to 1/3 of the abrasive grains with the adhesive resin 5 in the next step, as shown in FIG.

また従来砥粒は単一粒子層を形成するために粒度が極力狭い範囲の分布になるように、細粒および大粒の両方をカットして分級されていたので高価な砥粒となっていた。本発明では大粒が含まれていても水溶性膜あるいは有機酸水溶性膜よりも突出するだけであり、該突出部は接着樹脂5で覆われるので何ら問題はない。細粒は水溶性の膜2あるいは有機酸水溶性の膜2中に埋没して切り刃が出なくなるのでカットする必要はあるが、本発明では分級操作が細粒のみのカットで済むのでコスト的にも有利である。   In addition, since conventional abrasive grains have been classified by cutting both fine grains and large grains so that the grain size is distributed in a narrow range in order to form a single grain layer, they have become expensive abrasive grains. In the present invention, even if a large particle is contained, it only protrudes from the water-soluble film or the organic acid water-soluble film, and the protruding part is covered with the adhesive resin 5, so there is no problem. The fine particles are buried in the water-soluble film 2 or the organic acid water-soluble film 2 so that the cutting blade does not appear, so it is necessary to cut the fine particles. However, in the present invention, the classification operation can be performed by cutting only the fine particles. Is also advantageous.

砥粒の静電散布とは別個に、図2(c)に示した接着樹脂5が塗布された基4が準備される。これは最終製品としての基4であり、ポリエチレンテレフタレート、ポリエチレンナフタレート等のポリエステル系樹脂、ポリエチレン、ポリプロピレン等のポリオレフィン系樹脂、ポリスチレン、塩化ビニール、ポリビニルアルコールまたはメタアクリルアルコールを主成分とするアクリル樹脂、ポリカーボネート等の樹脂が採用される。 Separately from the electrostatic spraying of the abrasive grains, a base material 4 coated with the adhesive resin 5 shown in FIG. 2C is prepared. This is a base material 4 as a final product, and an acrylic resin mainly composed of polyester resins such as polyethylene terephthalate and polyethylene naphthalate, polyolefin resins such as polyethylene and polypropylene, polystyrene, vinyl chloride, polyvinyl alcohol or methacryl alcohol. Resins such as resin and polycarbonate are employed.

4の厚さは特に限定されないが、5ミクロン以上100ミクロンの範囲、好適には10ミクロン以上、75ミクロン以下の範囲にあることが望ましい。基4には最終製品における砥粒の固着の役割を果たす接着樹脂5が塗布される。 The thickness of the substrate 4 is not particularly limited, but is desirably in the range of 5 to 100 microns, preferably in the range of 10 to 75 microns. The base material 4 is coated with an adhesive resin 5 that plays a role of fixing the abrasive grains in the final product.

接着樹脂5としては一般に採用されているUV硬化型の樹脂や、熱硬化型の樹脂が適用される。特にUV硬化樹脂は次に述べるように硬化処理が容易であり好ましい。 As the adhesive resin 5, a generally adopted UV curable resin or thermosetting resin is applied. In particular, a UV curable resin is preferable because it can be easily cured as described below.

図2(c)で準備された基4は、その接着樹脂5が砥粒31〜33に接するように押し付けられ、カレンダーロール等の手法を用いて圧接される。この操作により砥粒の水溶性の膜2あるいは有機酸水溶性の膜2に接していない砥粒31〜33の突出部分は接着樹脂5中に食い込み、硬化処理を経て強固に保持されることになる。 The base material 4 prepared in FIG. 2C is pressed so that the adhesive resin 5 is in contact with the abrasive grains 31 to 33 and is pressed by using a method such as a calendar roll. By this operation, the protruding portions of the abrasive grains 31 to 33 which are not in contact with the water-soluble film 2 of the abrasive grains or the organic acid water-soluble film 2 bite into the adhesive resin 5 and are firmly held through the curing process. Become.

次いで接着樹脂5の硬化について説明する。図2(e)には基4がUV光透過性を示すポリエチレンテレフタレートの場合を示してあるが、裏面よりUV光6が照射されて接着UV樹脂5の硬化が完了する。勿論UV光透過性のない接着樹脂を用いる場合は所定の加熱乾燥を加えれば効果を完了できる。 Next, the curing of the adhesive resin 5 will be described. Figure 2 (e) is shown a case where the base material 4 is polyethylene terephthalate illustrating a UV light transmitting, but curing of the adhesive UV resin 5 UV light 6 from the back surface is irradiated is completed. Of course, when using an adhesive resin that does not transmit UV light, the effect can be completed by applying predetermined heat drying.

この接着樹脂5の硬化段階では、水溶性の膜2あるいは有機酸水溶性の膜2は硬化しないので、次の段階での仮基1の剥離や水溶性の膜2あるいは有機酸水溶性の膜2の除去が容易である。もし水溶性の膜2あるいは有機酸水溶性の膜2の代わりに、例えば接着強度の強いエポキシ系熱硬化型樹脂を用いると、接着樹脂5の硬化の際に該硬化型樹脂も同時に硬化作用を受けるので、接着樹脂5と仮基1との剥離が困難になる。さらに砥粒の切り刃も該硬化型樹脂で覆われ切り刃が出なくなる。従って仮固着材の膜2の材料として、水溶性あるいは有機酸水溶性の材料を用いることが本発明の重要な新規な点であることが理解できよう。 Since the water-soluble film 2 or the organic acid water-soluble film 2 is not cured at the curing stage of the adhesive resin 5, the temporary substrate 1 is peeled off or the water-soluble film 2 or the organic acid water-soluble film at the next stage. The removal of the film 2 is easy. If, for example, an epoxy thermosetting resin with strong adhesive strength is used instead of the water-soluble film 2 or the organic acid water-soluble film 2, the curable resin simultaneously cures when the adhesive resin 5 is cured. since receiving, peeling of the adhesive resin 5 and Karimoto material 1 becomes difficult. Further, the abrasive cutting blade is also covered with the curable resin, and the cutting blade does not come out. Therefore, it can be understood that the use of a water-soluble or organic acid water-soluble material as the material of the temporary fixing material film 2 is an important novel point of the present invention.

接着樹脂5の硬化が完了すると仮基1は剥離され、次いで水溶性の膜2あるいは有機酸水溶性の膜2に、水あるいは有機酸液が噴射される。キチンやキトサンのような膜2の場合はいわゆる酢を噴射することにより、膜2は容易に除去される。また多糖類、糊、澱粉の場合は水を噴射することで膜2が除去され、切り刃が露出する。このようにして得られた研磨シートは単一粒子層で切り刃が揃い、図2(h)に示したように凝集が無く、かつ揃った切り刃が被研磨体8と接するので傷のないかつ効率の高い研磨を施すことが出来る。以下に実施例を示す。 Bonding the temporary substrate 1 and the curing is completed the resin 5 is stripped and then the film 2 of 2 or organic acid-soluble water-soluble film, water or organic acid solution is injected. In the case of the membrane 2 such as chitin or chitosan, the membrane 2 is easily removed by spraying so-called vinegar. In the case of polysaccharides, glue, and starch, the film 2 is removed by spraying water, and the cutting blade is exposed. The abrasive sheet thus obtained has a single particle layer and the cutting edges are aligned, there is no agglomeration as shown in FIG. 2 (h), and the aligned cutting edges are in contact with the object to be polished 8, so there is no scratch. In addition, efficient polishing can be performed. Examples are shown below.

(1)研磨砥粒の調整
平均径10ミクロンのダイヤモンド砥粒を使用し、サイクロン方式の分級器でおよそ2ミクロン以下の細粒を除去した。分級後の顕微鏡観察では凝集が多く認められたが、そのまま該砥粒を試験に供した。
(1) Adjustment of polishing abrasive grains Diamond abrasive grains having an average diameter of 10 microns were used, and fine particles of approximately 2 microns or less were removed with a cyclone classifier. Although many agglomerations were observed by microscopic observation after classification, the abrasive grains were used for the test as they were.

(2)仮基の準備
仮基として厚さ50ミクロンで平滑性の良好なポリエチレンテレフタレートフィルムを準備した。予めその表面粗さを触針式の面粗さ計で測定したところ平均面粗さRaは0.4ミクロンであった。該フィルム上に仮固着材の膜を形成すべく、(A)キトサン溶液(B)重合度が200程度のポリビニルアルコールの10%水溶液および(C)澱粉の一種であるコーンスターチを水に溶かした液をそれぞれ塗布し、3種類のものを得た。塗布はスプレー式であり、塗布厚さについて塗布条件と押し込み式の加重計で測定した厚さのデータを積み重ね、厚さが3〜5ミクロンの範囲となるように調整した。
(2) was prepared good polyethylene terephthalate film smoothness in the thickness 50 microns preparation temporary substrate of the temporary substrate. When the surface roughness was measured in advance with a stylus type surface roughness meter, the average surface roughness Ra was 0.4 microns. In order to form a temporary fixing material film on the film, (A) a chitosan solution (B) a 10% aqueous solution of polyvinyl alcohol having a degree of polymerization of about 200 and (C) a solution obtained by dissolving corn starch, which is a kind of starch, in water Each was applied to obtain three types. The coating was spray type, and the coating thickness and the thickness data measured with an indentation type weight meter were stacked to adjust the coating thickness so that the thickness was in the range of 3 to 5 microns.

(3)砥粒の散布
上記で分級したダイヤモンド砥粒を静電散布した。散布ノズル径を5mmとしてキャリアガス3kg/cmで5秒間吐出させ、この吐出を10回繰り返した。このときの帯電電圧は5kVであった。
(3) Dispersion of abrasive grains The diamond abrasive grains classified as described above were electrostatically dispersed. The spray nozzle diameter was set to 5 mm, and the carrier gas was discharged at 3 kg / cm 2 for 5 seconds, and this discharge was repeated 10 times. The charging voltage at this time was 5 kV.

(4)基の準備および圧接、硬化
厚さ75ミクロンのポリエチレンテレフタレートの基に、接着樹脂としてのエポキシ系のUV樹脂を塗布した。塗布厚さは特にこだわらなかったが10〜15ミクロン程度を選択した。該基をUV接着樹脂が、仮固着材の膜に静電散布した砥粒に接触するようにあてがい、押し当てた。この後上記ポリエチレンテレフタレートの基側から100mmの間隔を隔ててUV光を照射して接着樹脂であるUV樹脂を完全に硬化させた。
(4) Preparation and welding of the base material, the base material of polyethylene terephthalate cured thickness 75 microns was applied an epoxy based UV resin as an adhesive resin. The coating thickness was not particularly limited, but about 10 to 15 microns was selected. The base material was applied and pressed so that the UV adhesive resin was in contact with the abrasive grains electrostatically sprayed onto the temporary fixing material film. Thereafter, UV light was irradiated at a distance of 100 mm from the polyethylene terephthalate substrate side to completely cure the UV resin as the adhesive resin.

(5)仮基、仮固着材の除去
UV光照射後に仮基を剥離した。剥離はピンセットを用いて可能な程度であった。剥離後、その表面には仮固着材の残存が認められたので水または酸で溶解した。仮固着材がキトサンの場合は市販の酢を20分間吹き付けた。重合度200のポリビニルアルコールの10%水溶液の場合は60℃程度に加温した水を吹き付けた。またコーンスターチ液の場合には室温で水道水を5分間吹き付けることにより外観上これらの仮固着材の残存が認められない程度に仮固着材の除去が完了していた。
(5) the temporary substrate was peeled off Karimoto material after removal UV irradiation of the temporary fixing material. Peeling was possible using tweezers. After peeling, the surface was found to remain temporarily fixed and dissolved with water or acid. When the temporary fixing material was chitosan, commercially available vinegar was sprayed for 20 minutes. In the case of a 10% aqueous solution of polyvinyl alcohol having a polymerization degree of 200, water heated to about 60 ° C. was sprayed. In the case of corn starch liquid, the removal of the temporary fixing material was completed by spraying tap water at room temperature for 5 minutes to such an extent that the appearance of these temporary fixing materials was not recognized.

(6)評価方法
上記の一連の工程を経た後の砥粒付着状態を顕微鏡観察した。図4はポリビニルアルコールの10%水溶液の膜中に上記ダイヤモンド砥粒を上記静電散布方法で散布した状態を顕微鏡で観察した写真である。図で白く見える部分がダイヤモンド砥粒であり、この結果から判るように各々の砥粒には凝集が見られず単一粒子層で砥粒層が形成されていることが判る。またダイヤモンド砥粒は平面方向に見て互いに離間しており研磨残渣の排出に有用な状態にあることが判る。
(6) Evaluation method The state of abrasive grain adhesion after the above series of steps was observed with a microscope. FIG. 4 is a photograph obtained by observing, with a microscope, a state in which the diamond abrasive grains are dispersed in a film of a 10% aqueous solution of polyvinyl alcohol by the electrostatic spraying method. The portion that appears white in the figure is diamond abrasive grains, and as can be seen from the results, no aggregation is observed in each abrasive grain, and it is understood that the abrasive grain layer is formed of a single grain layer. Further, it can be seen that the diamond abrasive grains are separated from each other when viewed in the plane direction, and are in a state useful for discharging polishing residues.

研磨性能の試験はベアリングボール加工試験で行われ、一定時間による研磨量、中心線表面粗さ(Ra)及び最大表面粗さ(Rmax)について比較した。 Test of polishing performance we row bearings ball machining test, the polishing amount of a certain time, were compared for the center line surface roughness (Ra) and maximum surface roughness (Rmax).

研磨テープの性能試験は試験片としてボールベアリング(玉軸受け)の鋼球(SUJ−2)、直径4mmを用いて、図5に示す加工試験研磨装置(ベアリングボール加工試験機)で研磨した。   The performance test of the polishing tape was performed with a processing test polishing apparatus (bearing ball processing tester) shown in FIG. 5 using a steel ball (SUJ-2) of a ball bearing (ball bearing) as a test piece and a diameter of 4 mm.

加工試験装置40は回転可能な定盤42の上に本発明の研磨シート43を貼り、加工試験片として前記鋼球44を治具45に固定し、主軸46に設置した研磨ヘッド42の上部より規定の荷重47が加えられるようになっている。   The processing test apparatus 40 has a polishing sheet 43 of the present invention attached on a rotatable surface plate 42, the steel balls 44 are fixed to a jig 45 as processing test pieces, and an upper part of the polishing head 42 installed on the main shaft 46. A specified load 47 is applied.

加工試験は研磨シート43を貼り付けた、定盤42を回転し、鋼球44を固定した研磨ヘッド41を該定盤42上に貼り付けた該研磨シート43の表面に一定荷重で接触させ、該定盤42の中央部から外周へ一定速度、一定距離移動させて研磨を行った。なお、試験片の加工開始、終了は支点49で支えたアーム48の上下によって自動的に行われる。加工後、鋼球44を治具44から外し、重量を量り鋼球44の重量の減量を研磨量とした。研磨試験は、鋼球5個の平均で評価した。
加工条件を下記に示す。
In the processing test, the surface plate 42 with the polishing sheet 43 attached is rotated, and the polishing head 41 with the steel balls 44 fixed is brought into contact with the surface of the polishing sheet 43 attached on the surface plate 42 with a constant load. Polishing was performed by moving the platen 42 from the center to the outer periphery at a constant speed and a constant distance. Note that the processing of the test piece is automatically started and finished by moving the arm 48 supported by the fulcrum 49 up and down. After the processing, the steel ball 44 was removed from the jig 44 and weighed to reduce the weight of the steel ball 44 as the polishing amount. The polishing test was evaluated by averaging five steel balls.
The processing conditions are shown below.

(6−1)荷重:500g
(6−2)定盤の直径:8インチ
(6−3)定盤の回転速度:300rpm
(6−4)中心から外周への移動距離:100mm
(6−5)研磨時間:12秒
(6-1) Load: 500 g
(6-2) Surface plate diameter: 8 inches (6-3) Surface plate rotation speed: 300 rpm
(6-4) Movement distance from the center to the outer periphery: 100 mm
(6-5) Polishing time: 12 seconds

一方、研磨後の鋼球の研磨面の平均表面粗さRa、及び最大高さRmaxは、表面粗さ計(東京精密株式会社製、SURFCON 480Aで測定した。 On the other hand, the average surface roughness Ra and the maximum height Rmax of the polished surface of the steel ball after polishing were measured with a surface roughness meter (manufactured by Tokyo Seimitsu Co., Ltd., SURFCON 480A ) .

(比較例)
比較例として厚さ50ミクロンのポリエチレンテレフタレートフィルムの上に上記実施例と同じUV樹脂を塗布し、さらにその上に直接平均径10ミクロンのダイヤモンド砥粒を散布した。散布は微細孔から1kg/mmの空気圧で該砥粒を噴出させ、自然落下させた。その後実施例と同様の条件でUV樹脂を硬化させ研磨シートを得た。
(Comparative example)
As a comparative example, the same UV resin as in the above example was applied on a polyethylene terephthalate film having a thickness of 50 microns, and diamond abrasive grains having an average diameter of 10 microns were directly sprayed thereon. For spraying, the abrasive grains were ejected from the fine holes at an air pressure of 1 kg / mm 2 and allowed to fall naturally. Thereafter, the UV resin was cured under the same conditions as in the examples to obtain an abrasive sheet.

(7)評価結果
実施例および比較例の評価結果を下記の表1に示す。
(7) Evaluation results The evaluation results of the examples and comparative examples are shown in Table 1 below.


また比較例では多数の傷の発生が認められたが実施例では僅か1、2本の浅い傷が認められる程度であった。本実施例の研磨シートは研磨傷を発生せず、かつ効率的に面粗さの良好な研磨が行える研磨材として有用である。特に仮固着材として水溶性あるいは有機酸水溶性の材料を用いて、同時に砥粒を同一極性に帯電させをアース電位に保つことにより砥粒が平面方向に見て互いに離間した研磨シートが得られる。さらに切り刃が完全露出してかつ揃った状態にあり、このため研磨シートとして極めて良好な研磨性能を発揮することが判明した。

In the comparative example, many scratches were observed, but only one or two shallow scratches were observed in the examples. The polishing sheet of this example is useful as an abrasive that does not cause polishing scratches and can efficiently perform polishing with good surface roughness. In particular, a polishing sheet in which abrasive grains are separated from each other when viewed in a planar direction by using a water-soluble or organic acid water-soluble material as a temporary fixing material, and simultaneously charging the abrasive grains to the same polarity and keeping the temporary base material at the ground potential. Is obtained. Further, it has been found that the cutting blades are completely exposed and aligned, and as a result, the polishing sheet exhibits extremely good polishing performance.

本発明に係る研磨シートの一部断面図。The partial sectional view of the polish sheet concerning the present invention. (a)〜(h)は本発明に係る研磨シートの製造工程を示す概略図 (A)-(h) is schematic which shows the manufacturing process of the polishing sheet which concerns on this invention . 本発明における砥粒の静電散布装置を示す概略図。Schematic which shows the electrostatic spraying apparatus of the abrasive grain in this invention. 本発明における砥粒散布後の砥粒の分布を示す写真図。The photograph figure which shows distribution of the abrasive grain after the abrasive grain distribution in this invention. 本発明に係る研磨シートを使用する試験片加工装置の概略斜視図。The schematic perspective view of the test piece processing apparatus which uses the abrasive sheet which concerns on this invention.

1:仮基
2:仮固着材の膜(膜)
4:基
5:接着樹脂
6:UV光
8:被研磨体
1: temporary substrate 2: provisional fixing material layer (film)
4: Base material 5: Adhesive resin 6: UV light 8: Object to be polished

Claims (7)

基材上に接着材により固着される単一層の砥粒が、前記接着材から被研磨体に当接する部分を露出させると共にその先端部を同一平面状に揃えてなる研磨シートの製造方法であって、
仮基材上に前記砥粒の平均粒子径より小さい数値の厚さからなる仮固着材の膜を形成する第1の工程と、
前記砥粒を前記仮基材上に接するように前記仮固着材の膜に散布する第2の工程と、
接着材が塗布された基を、該接着材を前記砥粒に向けて圧接する第3の工程と、
圧接された前記接着材を硬化させる第4の工程と、
前記接着材の硬化後に、前記仮基材を剥離しさらに前記仮固着材の膜を除去する第5の工程と、を備えてなり、
前記第2の工程では、供給量が制御された砥粒が圧送によって同一極性に静電帯電され、該静電帯電された砥粒がアース電位とされた前記仮基材の前記仮固着材の膜に散布され、前記静電帯電された砥粒を前記仮固着材の膜に散布する、散布装置の容器内壁が前記砥粒と同一極性に帯電している、ことを特徴とする研磨シートの製造方法。
A method for producing a polishing sheet in which a single layer of abrasive grains fixed by an adhesive on a substrate exposes a portion of the adhesive that abuts on the object to be polished and aligns the tips thereof on the same plane. And
A first step of forming a temporary adhering material film having a thickness smaller than the average particle diameter of the abrasive grains on the temporary base material;
A second step of dispersing the abrasive grains on the temporary fixing material film so as to be in contact with the temporary base material;
A third step of press-contacting the base material coated with the adhesive with the adhesive facing the abrasive grains;
A fourth step of curing the pressure-bonded adhesive;
And after the adhesive is cured, a fifth step of peeling the temporary base material and further removing the temporary fixing material film,
In the second step, the abrasive grains whose supply amount is controlled are electrostatically charged to the same polarity by pressure feeding, and the temporary fixing material of the temporary base material in which the electrostatically charged abrasive grains are set to the ground potential. It is sprayed film, spraying the electrostatically charged abrasive grain layer of the temporary fixing material, inside wall of the spraying device is charged with the abrasive grains of the same polarity, of the abrasive sheet, characterized in that Production method.
前記仮固着材の膜の厚さは、前記砥粒の平均粒子径の1/10〜2/3の範囲にあることを特徴とする請求項1に記載の研磨シートの製造方法。   The method for producing a polishing sheet according to claim 1, wherein the thickness of the film of the temporary fixing material is in a range of 1/10 to 2/3 of an average particle diameter of the abrasive grains. 前記仮基をアース電位として、前記同一極性に静電帯電された前記砥粒を前記仮基上の仮固着材の膜に散布することで、前記砥粒が相互に離間されると共に前記仮基材に接することを特徴とする請求項1に記載の研磨シートの製造方法。 Wherein the temporary substrate as a ground potential, by spraying the abrasive grains are electrostatically charged to the same polarity to the membrane of the temporary fixing material on said temporary substrate, together with the abrasive grains are separated from each other The method for producing an abrasive sheet according to claim 1, wherein the method is in contact with a temporary base material. 前記砥粒の同一極性に帯電される電位が1〜50kVの範囲であることを特徴とする請求項3に記載の研磨シートの製造方法。   The method for producing an abrasive sheet according to claim 3, wherein the potential charged to the same polarity of the abrasive grains is in the range of 1 to 50 kV. 前記仮基材上に形成される仮固着材の膜が、水溶性あるいは有機酸水溶性の膜であることを特徴とする請求項1ないし4のいずれか一項に記載の研磨シートの製造方法。   The method for producing an abrasive sheet according to any one of claims 1 to 4, wherein the temporary fixing material film formed on the temporary base material is a water-soluble or organic acid water-soluble film. . 前記水溶性あるいは有機酸水溶性の膜が、多糖類、のり、澱粉、キチン、キトサンであることを特徴とする請求項5に記載の研磨シートの製造方法。   6. The method for producing an abrasive sheet according to claim 5, wherein the water-soluble or organic acid water-soluble film is a polysaccharide, glue, starch, chitin, or chitosan. 前記水溶性膜がグリコーゲン、セルロースデキストラン、デキストリン、ポリビニルアルコール、植物から生成した澱粉であることを特徴とする請求項6に記載の研磨シートの製造方法。 The method for producing an abrasive sheet according to claim 6, wherein the water-soluble film is glycogen, cellulose , dextran, dextrin, polyvinyl alcohol, or starch produced from a plant.
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