JP5205683B2 - 光学装置、露光装置、および露光方法 - Google Patents

光学装置、露光装置、および露光方法 Download PDF

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Publication number
JP5205683B2
JP5205683B2 JP2001110910A JP2001110910A JP5205683B2 JP 5205683 B2 JP5205683 B2 JP 5205683B2 JP 2001110910 A JP2001110910 A JP 2001110910A JP 2001110910 A JP2001110910 A JP 2001110910A JP 5205683 B2 JP5205683 B2 JP 5205683B2
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Japan
Prior art keywords
wavelength
region
exposure apparatus
optical
reflectance
Prior art date
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Expired - Lifetime
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JP2001110910A
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English (en)
Japanese (ja)
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JP2002006110A (ja
JP2002006110A5 (https=
Inventor
元夫 小山
正紀 加藤
秀史 柴野
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Nikon Corp
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Nikon Corp
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Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP2001110910A priority Critical patent/JP5205683B2/ja
Priority to US09/836,430 priority patent/US6750951B2/en
Publication of JP2002006110A publication Critical patent/JP2002006110A/ja
Publication of JP2002006110A5 publication Critical patent/JP2002006110A5/ja
Application granted granted Critical
Publication of JP5205683B2 publication Critical patent/JP5205683B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2001110910A 2000-04-19 2001-04-10 光学装置、露光装置、および露光方法 Expired - Lifetime JP5205683B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2001110910A JP5205683B2 (ja) 2000-04-19 2001-04-10 光学装置、露光装置、および露光方法
US09/836,430 US6750951B2 (en) 2000-04-19 2001-04-18 Optical apparatus, exposure apparatus, and exposure method

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2000-118026 2000-04-19
JP2000118026 2000-04-19
JP2000118026 2000-04-19
JP2001110910A JP5205683B2 (ja) 2000-04-19 2001-04-10 光学装置、露光装置、および露光方法

Publications (3)

Publication Number Publication Date
JP2002006110A JP2002006110A (ja) 2002-01-09
JP2002006110A5 JP2002006110A5 (https=) 2008-05-15
JP5205683B2 true JP5205683B2 (ja) 2013-06-05

Family

ID=26590393

Family Applications (1)

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JP2001110910A Expired - Lifetime JP5205683B2 (ja) 2000-04-19 2001-04-10 光学装置、露光装置、および露光方法

Country Status (2)

Country Link
US (1) US6750951B2 (https=)
JP (1) JP5205683B2 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10031719A1 (de) * 2000-06-29 2002-01-10 Leica Microsystems Beleuchtungseinrichtung und Koordinaten-Meßgerät mit einer Beleuchtungseinrichtung
US6960769B2 (en) * 2002-10-03 2005-11-01 Abb Inc. Infrared measuring apparatus and method for on-line application in manufacturing processes
JP3984950B2 (ja) * 2003-11-12 2007-10-03 キヤノン株式会社 照明光学系及びそれを有する露光装置
KR101547784B1 (ko) 2007-03-05 2015-08-26 가부시키가이샤 니콘 이동체 장치, 패턴 형성 장치 및 패턴 형성 방법, 디바이스 제조 방법, 이동체 장치의 제조 방법, 및 이동체 구동 방법
JP2009236819A (ja) * 2008-03-28 2009-10-15 Topcon Corp 光学装置、フォトマスク検査装置および露光装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2991554B2 (ja) * 1990-11-09 1999-12-20 旭光学工業株式会社 広波長域ゴースト防止光学系
JPH06177012A (ja) * 1992-12-03 1994-06-24 Nikon Corp アライメント装置
US6157497A (en) * 1993-06-30 2000-12-05 Nikon Corporation Exposure apparatus
JP3707060B2 (ja) * 1994-06-29 2005-10-19 株式会社ニコン 照明光学装置
JPH08211294A (ja) * 1995-02-02 1996-08-20 Nikon Corp 投影露光装置
JP3359193B2 (ja) * 1995-07-21 2002-12-24 キヤノン株式会社 露光装置及びそれを用いたデバイスの製造方法
US5920431A (en) * 1996-06-27 1999-07-06 Konica Corporation Optical member having antireflection film thereon
JPH10199800A (ja) * 1997-01-09 1998-07-31 Nikon Corp オプティカルインテグレータを備える照明光学装置
JPH11135071A (ja) * 1997-10-30 1999-05-21 Iwasaki Electric Co Ltd 蛍光高圧水銀灯
US6285424B1 (en) * 1997-11-07 2001-09-04 Sumitomo Chemical Company, Limited Black mask, color filter and liquid crystal display
JP4182304B2 (ja) 1998-05-18 2008-11-19 株式会社ニコン 走査型投影露光装置及び該露光装置に好適な投影光学系
JP4235778B2 (ja) 1998-05-21 2009-03-11 株式会社ニコン 投影光学系、投影光学装置、走査型露光装置、光加工方法および露光方法
JP2933919B1 (ja) * 1998-08-04 1999-08-16 サンテック株式会社 光アッテネータ及び光アッテネータモジュール

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Publication number Publication date
US6750951B2 (en) 2004-06-15
US20010033490A1 (en) 2001-10-25
JP2002006110A (ja) 2002-01-09

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