JP5203102B2 - 半導体処理装置の運転方法 - Google Patents

半導体処理装置の運転方法 Download PDF

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Publication number
JP5203102B2
JP5203102B2 JP2008223882A JP2008223882A JP5203102B2 JP 5203102 B2 JP5203102 B2 JP 5203102B2 JP 2008223882 A JP2008223882 A JP 2008223882A JP 2008223882 A JP2008223882 A JP 2008223882A JP 5203102 B2 JP5203102 B2 JP 5203102B2
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wafer
vacuum
vacuum robot
axis sensor
chamber
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Japanese (ja)
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JP2010062215A (ja
JP2010062215A5 (enExample
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秀樹 木原
伸男 永安
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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JP2008223882A 2008-09-01 2008-09-01 半導体処理装置の運転方法 Active JP5203102B2 (ja)

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JP2008223882A JP5203102B2 (ja) 2008-09-01 2008-09-01 半導体処理装置の運転方法

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JP2008223882A JP5203102B2 (ja) 2008-09-01 2008-09-01 半導体処理装置の運転方法

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JP2010062215A JP2010062215A (ja) 2010-03-18
JP2010062215A5 JP2010062215A5 (enExample) 2011-10-13
JP5203102B2 true JP5203102B2 (ja) 2013-06-05

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Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012049357A (ja) * 2010-08-27 2012-03-08 Hitachi High-Technologies Corp 真空処理装置
JP6059934B2 (ja) * 2012-09-28 2017-01-11 株式会社日立ハイテクノロジーズ 試料搬送装置のティーチング方法
KR101686032B1 (ko) * 2013-03-28 2016-12-13 가부시키가이샤 히다치 고쿠사이 덴키 기판 처리 장치, 반도체 장치의 제조 방법 및 기록 매체
JP5858103B2 (ja) * 2014-07-16 2016-02-10 東京エレクトロン株式会社 基板搬送装置、基板搬送方法及び記憶媒体
CN113725135B (zh) * 2021-08-30 2023-08-25 上海华力微电子有限公司 一种半导体反应设备及其位置校准方法
CN119361503A (zh) * 2024-12-25 2025-01-24 湖南艾科威半导体装备有限公司 一种半导体晶圆巡边定位装置及方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0685038A (ja) * 1992-09-03 1994-03-25 Tokyo Electron Yamanashi Kk ウエハの位置合わせ方法及びその装置並びに透明ウエハの位置合わせ装置
JP2005093807A (ja) * 2003-09-18 2005-04-07 Hitachi Kokusai Electric Inc 半導体製造装置
JP4892225B2 (ja) * 2005-10-28 2012-03-07 株式会社日立ハイテクノロジーズ 真空処理方法、真空搬送装置および半導体処理装置

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