JP5173673B2 - 半導体発光素子 - Google Patents
半導体発光素子 Download PDFInfo
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- JP5173673B2 JP5173673B2 JP2008213801A JP2008213801A JP5173673B2 JP 5173673 B2 JP5173673 B2 JP 5173673B2 JP 2008213801 A JP2008213801 A JP 2008213801A JP 2008213801 A JP2008213801 A JP 2008213801A JP 5173673 B2 JP5173673 B2 JP 5173673B2
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- semiconductor light
- light emitting
- emitting device
- gaas substrate
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Description
11 n型GaAs基板
12 n型GaAsバッファ層
13 n型クラッド層
14 活性層
15 p型クラッド層
16 p型電流拡散層
17 n側電極
18 p型電極
Claims (4)
- 第1導電型の半導体基板と、
前記半導体基板の表面上に形成された第1導電型クラッド層と、
前記第1導電型クラッド層上に形成された活性層と、
前記活性層上に形成された第2導電型クラッド層と、を有する半導体発光素子であって、
前記半導体基板の前記表面の二乗平均粗さが0.4ナノメートル以上0.8ナノメートル以下であることを特徴とする半導体発光素子。 - 前記半導体基板は、GaAs基板であることを特徴とする請求項1に記載の半導体発光素子。
- 前記活性層は、アルミニウムインジウムガリウムリン((Al x Ga 1−x ) y In 1−y P(0≦x≦1、0<y<1))により形成されていることを特徴とする請求項2に記載の半導体発光素子。
- 前記活性層は、量子井戸構造を含むことを特徴とする請求項1乃至3のいずれか1に記載の半導体発光素子。
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JP2008213801A JP5173673B2 (ja) | 2008-08-22 | 2008-08-22 | 半導体発光素子 |
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JP2008213801A JP5173673B2 (ja) | 2008-08-22 | 2008-08-22 | 半導体発光素子 |
Related Child Applications (1)
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JP2012258430A Division JP5355768B2 (ja) | 2012-11-27 | 2012-11-27 | 半導体積層構造の製造方法 |
Publications (2)
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JP2010050319A JP2010050319A (ja) | 2010-03-04 |
JP5173673B2 true JP5173673B2 (ja) | 2013-04-03 |
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JP2008213801A Expired - Fee Related JP5173673B2 (ja) | 2008-08-22 | 2008-08-22 | 半導体発光素子 |
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JP (1) | JP5173673B2 (ja) |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2003327497A (ja) * | 2002-05-13 | 2003-11-19 | Sumitomo Electric Ind Ltd | GaN単結晶基板、窒化物系半導体エピタキシャル基板、窒化物系半導体素子及びその製造方法 |
JP4311247B2 (ja) * | 2004-03-19 | 2009-08-12 | 日立電線株式会社 | 研磨用砥粒、研磨剤、研磨液の製造方法 |
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