JP5167010B2 - 研磨終点検知方法および研磨装置 - Google Patents
研磨終点検知方法および研磨装置 Download PDFInfo
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- JP5167010B2 JP5167010B2 JP2008189869A JP2008189869A JP5167010B2 JP 5167010 B2 JP5167010 B2 JP 5167010B2 JP 2008189869 A JP2008189869 A JP 2008189869A JP 2008189869 A JP2008189869 A JP 2008189869A JP 5167010 B2 JP5167010 B2 JP 5167010B2
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- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
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| Application Number | Priority Date | Filing Date | Title |
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| JP2008189869A JP5167010B2 (ja) | 2008-07-23 | 2008-07-23 | 研磨終点検知方法および研磨装置 |
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| Application Number | Priority Date | Filing Date | Title |
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| JP2008189869A JP5167010B2 (ja) | 2008-07-23 | 2008-07-23 | 研磨終点検知方法および研磨装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010023210A JP2010023210A (ja) | 2010-02-04 |
| JP2010023210A5 JP2010023210A5 (enExample) | 2011-05-12 |
| JP5167010B2 true JP5167010B2 (ja) | 2013-03-21 |
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| Application Number | Title | Priority Date | Filing Date |
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| JP2008189869A Active JP5167010B2 (ja) | 2008-07-23 | 2008-07-23 | 研磨終点検知方法および研磨装置 |
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| JP (1) | JP5167010B2 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5980476B2 (ja) | 2010-12-27 | 2016-08-31 | 株式会社荏原製作所 | ポリッシング装置およびポリッシング方法 |
| US8535115B2 (en) * | 2011-01-28 | 2013-09-17 | Applied Materials, Inc. | Gathering spectra from multiple optical heads |
| JP6025055B2 (ja) * | 2013-03-12 | 2016-11-16 | 株式会社荏原製作所 | 研磨パッドの表面性状測定方法 |
| JP6066192B2 (ja) | 2013-03-12 | 2017-01-25 | 株式会社荏原製作所 | 研磨パッドの表面性状測定装置 |
| JP6473050B2 (ja) | 2015-06-05 | 2019-02-20 | 株式会社荏原製作所 | 研磨装置 |
| JP7023063B2 (ja) * | 2017-08-08 | 2022-02-21 | 株式会社荏原製作所 | 基板研磨装置及び方法 |
| JP7503418B2 (ja) | 2020-05-14 | 2024-06-20 | 株式会社荏原製作所 | 膜厚測定装置、研磨装置及び膜厚測定方法 |
| JP2025156745A (ja) | 2024-04-02 | 2025-10-15 | 株式会社荏原製作所 | 研磨方法および研磨装置 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3550594B2 (ja) * | 1997-08-12 | 2004-08-04 | 株式会社ニコン | 多層膜試料の膜厚測定装置及びそれを有する研磨装置 |
| JP4197103B2 (ja) * | 2002-04-15 | 2008-12-17 | 株式会社荏原製作所 | ポリッシング装置 |
| JP2005340679A (ja) * | 2004-05-31 | 2005-12-08 | Matsushita Electric Ind Co Ltd | 研磨装置及び研磨終点検出方法ならびに半導体装置の製造方法 |
| KR101381341B1 (ko) * | 2006-10-06 | 2014-04-04 | 가부시끼가이샤 도시바 | 가공 종점 검지방법, 연마방법 및 연마장치 |
| JP4996331B2 (ja) * | 2007-05-17 | 2012-08-08 | 株式会社荏原製作所 | 基板研磨装置および基板研磨方法 |
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- 2008-07-23 JP JP2008189869A patent/JP5167010B2/ja active Active
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| JP2010023210A (ja) | 2010-02-04 |
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