JP5159957B2 - ステージ制御用光学システム - Google Patents

ステージ制御用光学システム Download PDF

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Publication number
JP5159957B2
JP5159957B2 JP2011534488A JP2011534488A JP5159957B2 JP 5159957 B2 JP5159957 B2 JP 5159957B2 JP 2011534488 A JP2011534488 A JP 2011534488A JP 2011534488 A JP2011534488 A JP 2011534488A JP 5159957 B2 JP5159957 B2 JP 5159957B2
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JP
Japan
Prior art keywords
substrate
template
alignment
light
detector
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Expired - Fee Related
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JP2011534488A
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English (en)
Japanese (ja)
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JP2012507173A5 (OSRAM
JP2012507173A (ja
Inventor
シューメイカー，フィリップ・ディ
モカベリ，ババク
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モレキュラー・インプリンツ・インコーポレーテッド
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Publication of JP2012507173A publication Critical patent/JP2012507173A/ja
Publication of JP2012507173A5 publication Critical patent/JP2012507173A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7092—Signal processing

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
JP2011534488A 2008-10-28 2009-10-20 ステージ制御用光学システム Expired - Fee Related JP5159957B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US10894108P 2008-10-28 2008-10-28
US61/108,941 2008-10-28
US12/580,324 US8345242B2 (en) 2008-10-28 2009-10-16 Optical system for use in stage control
US12/580,324 2009-10-16
PCT/US2009/005690 WO2010051015A1 (en) 2008-10-28 2009-10-20 Optical system for use in stage control

Publications (3)

Publication Number Publication Date
JP2012507173A JP2012507173A (ja) 2012-03-22
JP2012507173A5 JP2012507173A5 (OSRAM) 2012-12-06
JP5159957B2 true JP5159957B2 (ja) 2013-03-13

Family

ID=42116699

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011534488A Expired - Fee Related JP5159957B2 (ja) 2008-10-28 2009-10-20 ステージ制御用光学システム

Country Status (3)

Country Link
US (1) US8345242B2 (OSRAM)
JP (1) JP5159957B2 (OSRAM)
WO (1) WO2010051015A1 (OSRAM)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5498448B2 (ja) * 2011-07-21 2014-05-21 株式会社東芝 インプリント方法及びインプリントシステム
CN103631086A (zh) * 2012-08-21 2014-03-12 华中科技大学 一种用于集成光电子器件的微纳图形的制作方法及应用
US10248018B2 (en) * 2015-03-30 2019-04-02 Canon Kabushiki Kaisha Imprint apparatus and method of manufacturing article
DE102015110264A1 (de) * 2015-06-25 2016-12-29 Cl Schutzrechtsverwaltungs Gmbh Vorrichtung zur generativen Herstellung wenigstens eines dreidimensionalen Objekts
JP6799397B2 (ja) * 2015-08-10 2020-12-16 キヤノン株式会社 インプリント装置、および物品の製造方法
WO2018027069A1 (en) * 2016-08-03 2018-02-08 Board Of Regents, The University Of Texas System Roll-to-roll programmable film imprint lithography
US10416576B2 (en) * 2016-09-14 2019-09-17 Canon Kabushiki Kaisha Optical system for use in stage control
US9971147B2 (en) 2016-09-26 2018-05-15 Xerox Corporation Integrated micro-channel heatsink in DMD substrate for enhanced cooling capacity
JP6818522B2 (ja) * 2016-11-17 2021-01-20 キヤノン株式会社 インプリント装置、および物品製造方法
JP6827785B2 (ja) * 2016-11-30 2021-02-10 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
US10998190B2 (en) * 2017-04-17 2021-05-04 Canon Kabushiki Kaisha Imprint apparatus and method of manufacturing article
JP6606567B2 (ja) * 2017-04-17 2019-11-13 キヤノン株式会社 インプリント装置及び物品の製造方法
CN110500968B (zh) * 2019-07-11 2021-04-20 北京理工大学 基于稀疏傅里叶变换的数字莫尔干涉相位实时测量方法

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JPH0613287A (ja) * 1992-04-27 1994-01-21 Nikon Corp アライメント装置
JPH08313842A (ja) * 1995-05-15 1996-11-29 Nikon Corp 照明光学系および該光学系を備えた露光装置
JP4136067B2 (ja) * 1997-05-02 2008-08-20 キヤノン株式会社 検出装置及びそれを用いた露光装置
TW520457B (en) * 1997-09-30 2003-02-11 Toshiba Corp Display panel and position adjusting method for the display panel
JP2003504861A (ja) * 1999-07-01 2003-02-04 エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ 空間濾波による画像向上装置および方法
US6873087B1 (en) * 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
US6462818B1 (en) * 2000-06-22 2002-10-08 Kla-Tencor Corporation Overlay alignment mark design
EP2264524A3 (en) * 2000-07-16 2011-11-30 The Board of Regents of The University of Texas System High-resolution overlay alignement methods and systems for imprint lithography
KR20030040378A (ko) * 2000-08-01 2003-05-22 보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 임프린트 리소그래피를 위한 투명한 템플릿과 기판사이의고정확성 갭 및 방향설정 감지 방법
US7317531B2 (en) * 2002-12-05 2008-01-08 Kla-Tencor Technologies Corporation Apparatus and methods for detecting overlay errors using scatterometry
JP3507865B2 (ja) * 2001-02-02 2004-03-15 和歌山大学長 Ｄｍｄを用いたｃｃｄカメラによる実時間形状計測方法と装置
US20050064344A1 (en) 2003-09-18 2005-03-24 University Of Texas System Board Of Regents Imprint lithography templates having alignment marks
WO2004007462A1 (en) * 2002-07-11 2004-01-22 Scios Inc. Improved reagents for n-amination
US6916584B2 (en) * 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
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EP1774407B1 (en) * 2004-06-03 2017-08-09 Board of Regents, The University of Texas System System and method for improvement of alignment and overlay for microlithography
US20050270516A1 (en) * 2004-06-03 2005-12-08 Molecular Imprints, Inc. System for magnification and distortion correction during nano-scale manufacturing
TWI340875B (en) 2004-08-10 2011-04-21 Asml Netherlands Bv Imprint lithographic apparatus, device manufacturing method and device manufactured thereby
US7630067B2 (en) * 2004-11-30 2009-12-08 Molecular Imprints, Inc. Interferometric analysis method for the manufacture of nano-scale devices
US20070231421A1 (en) 2006-04-03 2007-10-04 Molecular Imprints, Inc. Enhanced Multi Channel Alignment
US7292326B2 (en) * 2004-11-30 2007-11-06 Molecular Imprints, Inc. Interferometric analysis for the manufacture of nano-scale devices
JP5198071B2 (ja) * 2004-12-01 2013-05-15 モレキュラー・インプリンツ・インコーポレーテッド インプリントリソグラフィ・プロセスにおける熱管理のための露光方法
JP5306989B2 (ja) * 2006-04-03 2013-10-02 モレキュラー・インプリンツ・インコーポレーテッド 複数のフィールド及びアライメント・マークを有する基板を同時にパターニングする方法
JP4795300B2 (ja) 2006-04-18 2011-10-19 キヤノン株式会社 位置合わせ方法、インプリント方法、位置合わせ装置、インプリント装置、及び位置計測方法
US7547398B2 (en) * 2006-04-18 2009-06-16 Molecular Imprints, Inc. Self-aligned process for fabricating imprint templates containing variously etched features
US7837907B2 (en) 2007-07-20 2010-11-23 Molecular Imprints, Inc. Alignment system and method for a substrate in a nano-imprint process
US20090147237A1 (en) * 2007-12-05 2009-06-11 Molecular Imprints, Inc. Spatial Phase Feature Location

Also Published As

Publication number Publication date
US20100102487A1 (en) 2010-04-29
US8345242B2 (en) 2013-01-01
JP2012507173A (ja) 2012-03-22
WO2010051015A1 (en) 2010-05-06

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