JP5150757B2 - 二酸化炭素の回収法 - Google Patents
二酸化炭素の回収法 Download PDFInfo
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- JP5150757B2 JP5150757B2 JP2011178232A JP2011178232A JP5150757B2 JP 5150757 B2 JP5150757 B2 JP 5150757B2 JP 2011178232 A JP2011178232 A JP 2011178232A JP 2011178232 A JP2011178232 A JP 2011178232A JP 5150757 B2 JP5150757 B2 JP 5150757B2
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- carbon dioxide
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D11/00—Solvent extraction
- B01D11/02—Solvent extraction of solids
- B01D11/0203—Solvent extraction of solids with a supercritical fluid
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D11/00—Solvent extraction
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D11/00—Solvent extraction
- B01D11/02—Solvent extraction of solids
- B01D11/0292—Treatment of the solvent
- B01D11/0296—Condensation of solvent vapours
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D11/00—Solvent extraction
- B01D11/04—Solvent extraction of solutions which are liquid
- B01D11/0403—Solvent extraction of solutions which are liquid with a supercritical fluid
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Water Supply & Treatment (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- Carbon And Carbon Compounds (AREA)
- Extraction Or Liquid Replacement (AREA)
- Treating Waste Gases (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Gas Separation By Absorption (AREA)
Description
(a)少なくとも1つのバッチ式処理手段から、少なくとも二酸化炭素、1種又は複数種の溶媒、及び1種又は複数種の汚染物を含む、少なくとも1種の汚染された流れを取り除き、多相汚染流を生成する各汚染流の圧力を低下させるステップと、
(b)各多相汚染流を少なくとも1個の中間圧力分離器へ運ぶステップと、
(c)多相汚染流を、主として各中間圧力分離器中で、主として蒸気溶媒を含む、中間圧力の二酸化炭素に富む流れと、汚染物に富む流れとに分離するステップと、
(d)多相汚染流の輸送を低圧分離器へ切り換えるステップと、
(e)ステップ(d)の多相汚染流を、低圧分離器中で、低圧の二酸化炭素に富む流れと低圧の溶媒及び汚染物に富む流れに分離するステップとを含む。
(a)1種又は複数種の第1の共溶媒及び精製二酸化炭素を1つ又は複数の処理手段へ供給し、各処理手段中で第1の汚染流を形成するステップと、
(b)多相の形態の各第1の汚染流を少なくとも1個の第1の中間圧力又は低圧力分離器へ運び、第1の汚染流を分離するステップと、
(c)1種又は複数種の第2の共溶媒及び精製二酸化炭素を処理手段へ供給し、処理手段中で第2の汚染流を形成するステップと、
(d)多相の形態の各第2の汚染流を少なくとも1個の第2の中間圧力又は低圧力分離器へ運び、第2の汚染流を分離するステップとを含む。
Claims (5)
- バッチ式処理手段からの少なくとも1つの二酸化炭素含有流を精製する方法であって、
(a)前記バッチ式処理手段から、少なくとも二酸化炭素、1種又は複数種の共溶媒、及び1種又は複数種の汚染物を含む少なくとも1つの汚染された流れを取り除き、多相汚染流を生成する前記少なくとも1つの汚染された流れの圧力を低下させるステップと、
(b)前記多相汚染流をゲージ圧1.38〜6.21MPa(200〜900psig)の範囲の圧力で運転される中間圧力分離器へ運ぶステップと、
(c)前記多相汚染流を、前記中間圧力分離器中で、中間圧力の二酸化炭素に富む蒸気流と中間圧力の溶媒及び汚染物に富む流れに分離するステップと、
(d)前記中間圧力分離器から取り除かれた、前記中間圧力の溶媒及び汚染物に富む流れを大気圧で運転される低圧力分離器へ運ぶステップと、
(e)ステップ(d)の前記溶媒及び汚染物に富む流れを、前記低圧力分離器中で、低圧力の二酸化炭素に富む蒸気流と低圧力の溶媒及び汚染物に富む流れに分離するステップとを含む方法。 - 前記中間圧力の二酸化炭素に富む蒸気流を、中和器及びフィルターからなるさらなる精製システムへ運び、二酸化炭素とは異なる蒸気圧を有する汚染物と共溶媒をさらに取り除いて精製流を形成するステップをさらに含む、請求項1に記載の方法。
- 前記さらなる精製システムが二酸化炭素よりも低い蒸気圧を有する汚染物を除去する、請求項2に記載の方法。
- 前記さらなる精製システムから回収された精製二酸化炭素流の一部が前記処理手段へ再循環される、請求項2に記載の方法。
- 前記中間圧力分離器が相分離器又は多段分離システムを含む、請求項1に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/430,349 US7018444B2 (en) | 2003-05-07 | 2003-05-07 | Process for carbon dioxide recovery from a process tool |
US10/430,349 | 2003-05-07 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006532470A Division JP5091479B2 (ja) | 2003-05-07 | 2004-04-27 | 二酸化炭素の回収法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012006012A JP2012006012A (ja) | 2012-01-12 |
JP5150757B2 true JP5150757B2 (ja) | 2013-02-27 |
Family
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Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006532470A Expired - Fee Related JP5091479B2 (ja) | 2003-05-07 | 2004-04-27 | 二酸化炭素の回収法 |
JP2011178232A Expired - Fee Related JP5150757B2 (ja) | 2003-05-07 | 2011-08-17 | 二酸化炭素の回収法 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006532470A Expired - Fee Related JP5091479B2 (ja) | 2003-05-07 | 2004-04-27 | 二酸化炭素の回収法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7018444B2 (ja) |
EP (1) | EP1628918A1 (ja) |
JP (2) | JP5091479B2 (ja) |
KR (1) | KR101201165B1 (ja) |
CN (1) | CN100430322C (ja) |
TW (1) | TWI348930B (ja) |
WO (1) | WO2004101450A1 (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2005506694A (ja) * | 2001-10-17 | 2005-03-03 | プラクスエア・テクノロジー・インコーポレイテッド | 中央二酸化炭素精製器 |
US20050006310A1 (en) * | 2003-07-10 | 2005-01-13 | Rajat Agrawal | Purification and recovery of fluids in processing applications |
US8500868B2 (en) * | 2009-05-01 | 2013-08-06 | Massachusetts Institute Of Technology | Systems and methods for the separation of carbon dioxide and water |
KR102101343B1 (ko) | 2013-12-05 | 2020-04-17 | 삼성전자주식회사 | 초임계 세정제의 정제방법 및 그의 정제장치 |
US10508771B2 (en) | 2016-03-30 | 2019-12-17 | Praxair Technology, Inc. | Method and system for optimizing the filling, storage and dispensing of carbon dioxide from multiple containers without overpressurization |
US10773192B1 (en) * | 2019-04-09 | 2020-09-15 | Bitfury Ip B.V. | Method and apparatus for recovering dielectric fluids used for immersion cooling |
CN110433525A (zh) * | 2019-06-27 | 2019-11-12 | 合肥通用机械研究院有限公司 | 一种带热回收的二氧化碳超临界流体萃取系统 |
CN110801639B (zh) * | 2019-11-11 | 2021-06-01 | 杭州快凯高效节能新技术有限公司 | 一种工业尾气多级液化及分级制冷回收二氧化碳方法 |
Family Cites Families (17)
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US23662A (en) * | 1859-04-19 | George clay | ||
US50096A (en) * | 1865-09-26 | Improved skate | ||
US4349415A (en) | 1979-09-28 | 1982-09-14 | Critical Fluid Systems, Inc. | Process for separating organic liquid solutes from their solvent mixtures |
US4877530A (en) | 1984-04-25 | 1989-10-31 | Cf Systems Corporation | Liquid CO2 /cosolvent extraction |
US5377705A (en) * | 1993-09-16 | 1995-01-03 | Autoclave Engineers, Inc. | Precision cleaning system |
US5849104A (en) * | 1996-09-19 | 1998-12-15 | Yieldup International | Method and apparatus for cleaning wafers using multiple tanks |
US6312528B1 (en) | 1997-03-06 | 2001-11-06 | Cri Recycling Service, Inc. | Removal of contaminants from materials |
US6612317B2 (en) | 2000-04-18 | 2003-09-02 | S.C. Fluids, Inc | Supercritical fluid delivery and recovery system for semiconductor wafer processing |
US6558475B1 (en) * | 2000-04-10 | 2003-05-06 | International Business Machines Corporation | Process for cleaning a workpiece using supercritical carbon dioxide |
AU2001253650A1 (en) * | 2000-04-18 | 2001-10-30 | S. C. Fluids, Inc. | Supercritical fluid delivery and recovery system for semiconductor wafer processing |
JP2002313764A (ja) * | 2001-04-17 | 2002-10-25 | Kobe Steel Ltd | 高圧処理装置 |
AU2002308473A1 (en) | 2001-04-24 | 2002-11-05 | Deflex Llc | Apparatus and process for treatment, delivery and recycle ofprocess fluids for dense phase carbon dioxide applications |
JP2003021533A (ja) * | 2001-07-09 | 2003-01-24 | Oki Electric Ind Co Ltd | 乗客位置検知システム |
JP2003117508A (ja) * | 2001-10-16 | 2003-04-22 | Mitsubishi Materials Corp | 洗浄装置 |
JP2005506694A (ja) * | 2001-10-17 | 2005-03-03 | プラクスエア・テクノロジー・インコーポレイテッド | 中央二酸化炭素精製器 |
JP2003249475A (ja) * | 2002-02-25 | 2003-09-05 | Sony Corp | 表面処理方法および表面処理装置 |
JP4248903B2 (ja) * | 2003-03-19 | 2009-04-02 | 大日本スクリーン製造株式会社 | 高圧処理装置および高圧処理方法 |
-
2003
- 2003-05-07 US US10/430,349 patent/US7018444B2/en not_active Expired - Lifetime
-
2004
- 2004-04-27 KR KR1020057020940A patent/KR101201165B1/ko active IP Right Grant
- 2004-04-27 CN CNB2004800191501A patent/CN100430322C/zh not_active Expired - Fee Related
- 2004-04-27 JP JP2006532470A patent/JP5091479B2/ja not_active Expired - Fee Related
- 2004-04-27 EP EP04760838A patent/EP1628918A1/en not_active Withdrawn
- 2004-04-27 WO PCT/US2004/012872 patent/WO2004101450A1/en active Search and Examination
- 2004-05-04 TW TW093112511A patent/TWI348930B/zh not_active IP Right Cessation
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2011
- 2011-08-17 JP JP2011178232A patent/JP5150757B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR20060008980A (ko) | 2006-01-27 |
WO2004101450A1 (en) | 2004-11-25 |
JP2006528912A (ja) | 2006-12-28 |
US20040222152A1 (en) | 2004-11-11 |
CN100430322C (zh) | 2008-11-05 |
JP2012006012A (ja) | 2012-01-12 |
KR101201165B1 (ko) | 2012-11-13 |
JP5091479B2 (ja) | 2012-12-05 |
TW200500129A (en) | 2005-01-01 |
US7018444B2 (en) | 2006-03-28 |
EP1628918A1 (en) | 2006-03-01 |
TWI348930B (en) | 2011-09-21 |
CN1816497A (zh) | 2006-08-09 |
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