JP5150384B2 - Semiconductor light emitting device - Google Patents

Semiconductor light emitting device Download PDF

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JP5150384B2
JP5150384B2 JP2008165987A JP2008165987A JP5150384B2 JP 5150384 B2 JP5150384 B2 JP 5150384B2 JP 2008165987 A JP2008165987 A JP 2008165987A JP 2008165987 A JP2008165987 A JP 2008165987A JP 5150384 B2 JP5150384 B2 JP 5150384B2
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semiconductor light
light emitting
conductor pattern
emitting device
hole
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JP2010010287A (en
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亮介 近藤
美香 望月
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Stanley Electric Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

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Description

本発明は半導体発光装置に関するものであり、詳しくは、積層基板で構成された凹部内に半導体発光素子と封止樹脂を備えた半導体発光装置に関する。   The present invention relates to a semiconductor light-emitting device, and more particularly to a semiconductor light-emitting device including a semiconductor light-emitting element and a sealing resin in a recess formed of a laminated substrate.

従来、半導体発光素子を実装した半導体発光装置は、該半導体発光装置の高輝度化(照射光量の増大化)のために発光源となる半導体発光素子の高出力化が求められ、そのために半導体発光素子の光変換効率の高効率化及び半導体発光素子の駆動電力の大電力化が図られてきた。   2. Description of the Related Art Conventionally, a semiconductor light emitting device mounted with a semiconductor light emitting element has been required to increase the output of a semiconductor light emitting element as a light emission source in order to increase the brightness of the semiconductor light emitting device (increase the amount of irradiation light). High efficiency of the light conversion efficiency of the device and high driving power of the semiconductor light emitting device have been attempted.

但し、半導体発光素子を大電力で駆動すると発光時の自己発熱で半導体発光素子自体の温度が上昇し、光変換効率の低下及び発光寿命の短縮等の性能劣化を招くことになる。そこで、発光時の自己発熱による半導体発光素子自体の温度上昇を抑制するために、半導体発光素子を高熱伝導率の基板に実装する、或いは半導体発光素子が実装された基板を更にヒートシンク等の金属放熱部材に搭載する、等の放熱手段が施されている。   However, when the semiconductor light emitting device is driven with high power, the temperature of the semiconductor light emitting device itself rises due to self-heating during light emission, leading to performance degradation such as a decrease in light conversion efficiency and a shortened light emission lifetime. Therefore, in order to suppress the temperature rise of the semiconductor light emitting element itself due to self-heating during light emission, the semiconductor light emitting element is mounted on a substrate with high thermal conductivity, or the substrate on which the semiconductor light emitting element is mounted is further dissipated in a metal such as a heat sink. A heat dissipating means such as mounting on a member is provided.

ところで、半導体発光素子を駆動(発光)させるためには、配線パターン及び回路部品(例えば、抵抗、ダイオード、コネクタ等)からなる駆動制御回路が必要であるが、放熱手段が施された上記半導体発光装置にはこのような駆動回路は備えられておらず、広範な用途に対応するものとはなっていない。   Incidentally, in order to drive (emit) the semiconductor light emitting element, a drive control circuit including a wiring pattern and circuit components (for example, a resistor, a diode, a connector, etc.) is necessary. The device is not equipped with such a drive circuit and does not support a wide range of applications.

そこで、良好な放熱性能を有し、且つ駆動制御回路の搭載が可能な半導体発光装置の提案がなされている。それは、図5に示すように、半導体発光装置50を下側から順次位置する、放熱用支持フィルム51、底部基板52、絶縁性中間層53、及び上部基板54の多層構造としている。   Therefore, there has been proposed a semiconductor light emitting device that has good heat dissipation performance and can be mounted with a drive control circuit. As shown in FIG. 5, the semiconductor light emitting device 50 has a multilayer structure of a heat radiation support film 51, a bottom substrate 52, an insulating intermediate layer 53, and an upper substrate 54, which are sequentially positioned from the lower side.

絶縁性中間層53は、絶縁層55と該絶縁層55の両面に設けられた絶縁性接着層56からなり、一方の絶縁性接着層56を挟んだ上側に上部基板54が位置し、他方の絶縁性接着層56を挟んだ下側に底部基板52が位置しており、底部基板52の下側に銅箔等からなる放熱用支持フィルム51が位置している。   The insulating intermediate layer 53 includes an insulating layer 55 and an insulating adhesive layer 56 provided on both surfaces of the insulating layer 55. The upper substrate 54 is located on the upper side of one insulating adhesive layer 56, and the other The bottom substrate 52 is located below the insulating adhesive layer 56, and the heat dissipation support film 51 made of copper foil or the like is located below the bottom substrate 52.

底部基板52には導体層57が設けられており、該導体層57には更にAgメッキ層71が設けられて反射部72(導体層57とAgメッキ層71の2層構造)とされ、後述する半導体発光素子62からの出射光を照射方向に向けて光の利用効率を高めるようにしている。   The bottom substrate 52 is provided with a conductor layer 57. The conductor layer 57 is further provided with an Ag plating layer 71 to form a reflection portion 72 (a two-layer structure of the conductor layer 57 and the Ag plating layer 71). The emitted light from the semiconductor light emitting element 62 to be directed is directed in the irradiation direction so as to improve the light use efficiency.

底部基板52、絶縁性中間層53及び上部基板54には夫々第1貫通孔58、第2貫通孔59及び第3貫通孔60が設けられており、第2貫通孔59と第3貫通孔60は略同一の大きさであり、第1貫通孔58は第2貫通孔59及び第3貫通孔60よりも小さく形成されている。   The bottom substrate 52, the insulating intermediate layer 53, and the upper substrate 54 are provided with a first through hole 58, a second through hole 59, and a third through hole 60, respectively, and the second through hole 59 and the third through hole 60 are provided. Are substantially the same size, and the first through hole 58 is smaller than the second through hole 59 and the third through hole 60.

放熱用支持フィルム51上には接合層61を介して半導体発光素子62が載置され、底部基板52の第1貫通孔58内に位置する半導体発光素子62の電極(図示せず)と底部基板52の電極部(導体層57とAgメッキ層71の2層構造)73がボンディングワイヤ63を介して電気的に接続されている。   A semiconductor light emitting device 62 is mounted on the heat dissipation support film 51 via a bonding layer 61, and an electrode (not shown) of the semiconductor light emitting device 62 located in the first through hole 58 of the bottom substrate 52 and the bottom substrate. 52 electrode portions (a two-layer structure of a conductor layer 57 and an Ag plating layer 71) 73 are electrically connected via a bonding wire 63.

第1貫通孔58、第2貫通孔59及び第3貫通孔60の内部には、透光性樹脂64に蛍光体65及び透光性粒子66を混入した封止樹脂67が充填され、半導体発光素子62及びボンディングワイヤ63が樹脂封止されている。   The first through-hole 58, the second through-hole 59, and the third through-hole 60 are filled with a sealing resin 67 in which a phosphor 65 and a light-transmitting particle 66 are mixed in a light-transmitting resin 64, and semiconductor light emission. The element 62 and the bonding wire 63 are sealed with resin.

これにより、半導体発光素子62の発光時の自己発熱が放熱用支持フィルム51によって放散されることにより、且つ石英ガラス粒子等の比熱容量が大きい透光性粒子66を含有する封止樹脂67で樹脂封止されることにより半導体発光素子62の温度上昇が抑制されると共に、上部基板54に駆動制御回路を配設することが可能になったことにより半導体発光素子62を密に配置できるようになっている。また、半導体発光素子62を透光性樹脂64に蛍光体65を混入した封止樹脂67で樹脂封止することにより、半導体発光素子62の光源光とは異なる色調の光を出射することが可能な半導体発光装置50が実現している(例えば、特許文献1参照。)。
特開2007−150228号公報
As a result, the self-heating during light emission of the semiconductor light emitting element 62 is dissipated by the support film 51 for heat dissipation, and the sealing resin 67 containing translucent particles 66 having a large specific heat capacity such as quartz glass particles is used as the resin. By sealing, the temperature rise of the semiconductor light emitting element 62 is suppressed, and since the drive control circuit can be disposed on the upper substrate 54, the semiconductor light emitting elements 62 can be densely disposed. ing. Further, by sealing the semiconductor light emitting element 62 with a sealing resin 67 in which a phosphor 65 is mixed in a translucent resin 64, it is possible to emit light having a color tone different from the light source light of the semiconductor light emitting element 62. The semiconductor light emitting device 50 is realized (for example, refer to Patent Document 1).
JP 2007-150228 A

ところで、上記構成の半導体発光装置のように、複数の基板を積層して構成される半導体発光装置においては、絶縁性接着層を介した貼り合わせにより構成されることが多く、この絶縁性接着層がはみ出すことにより、ワイヤボンディング領域を含む電極部73やワイヤボンディング領域の上方を汚染する、紫外光により絶縁性接着層が劣化するという問題を生じていた。   By the way, in a semiconductor light emitting device configured by laminating a plurality of substrates as in the semiconductor light emitting device having the above configuration, the insulating adhesive layer is often configured by bonding via an insulating adhesive layer. As a result, the insulating adhesive layer deteriorates due to ultraviolet light that contaminates the electrode portion 73 including the wire bonding region and the upper portion of the wire bonding region.

ここで、発明者らは、絶縁性接着層のはみ出しを防止するため、少なくとも基板の貫通孔で形成される凹部に露出する絶縁性接着層の端部を貫通孔の内周面よりも外側に窪んだ形状に形成することを考えた。   Here, in order to prevent the insulating adhesive layer from protruding, the inventors have at least the end of the insulating adhesive layer exposed in the recess formed by the through hole of the substrate outside the inner peripheral surface of the through hole. It was considered to form a concave shape.

ところが、絶縁性接着層56の窪み部分には、封止樹脂67を充填する際に封止樹脂67が流れ込みにくく、空気層が形成されることがある。この空気層は、熱硬化時に低粘度化した封止樹脂67によって押し出され、封止樹脂67内で気泡となる。このとき、封止樹脂67の熱硬化が徐々に進行しているため気泡70が封止樹脂67外に放出される前に封止樹脂67が硬化し、気泡70は封止樹脂67内に溜まる。   However, when the sealing resin 67 is filled, the sealing resin 67 is difficult to flow into the recessed portion of the insulating adhesive layer 56, and an air layer may be formed. This air layer is pushed out by the sealing resin 67 whose viscosity has been reduced during thermosetting, and becomes air bubbles in the sealing resin 67. At this time, since the thermosetting of the sealing resin 67 is gradually progressing, the sealing resin 67 is cured before the bubbles 70 are released to the outside of the sealing resin 67, and the bubbles 70 are accumulated in the sealing resin 67. .

この気泡70は、ボンディングワイヤ63の方向に向かって進行すると該ボンディングワイヤ63に接触し、ボンディングワイヤ63を切断する等の不具合の要因となる。特に、底部基板52上に、電極部73以外に配線目的以外で電極部73と分離した反射部72等の金属層を設けた場合には、電極部73と反射部72との間隙において、空気層が形成されやすく、気泡がボンディングワイヤ方向へ進行することによる不具合が発生しやすいものとなっていた。   When the bubble 70 travels in the direction of the bonding wire 63, it comes into contact with the bonding wire 63 and causes a problem such as cutting the bonding wire 63. In particular, when a metal layer such as the reflective portion 72 separated from the electrode portion 73 is provided on the bottom substrate 52 in addition to the electrode portion 73 other than for the purpose of wiring, air is formed in the gap between the electrode portion 73 and the reflective portion 72. Layers are easily formed, and defects due to bubbles traveling toward the bonding wire are likely to occur.

そこで、本発明は上記問題に鑑みて創案なされたもので、その目的とするところは、半導体発光素子を封止する封止樹脂の加熱硬化時に発生する気泡をボンディングワイヤから離れる方向に向けることにより、気泡がボンディングワイヤに接触することに起因する電気的な不具合の発生を防止することが可能な半導体発光装置を提供することにある。   Therefore, the present invention was devised in view of the above problems, and the object of the present invention is to direct the bubbles generated during the heat curing of the sealing resin for sealing the semiconductor light emitting element in a direction away from the bonding wire. An object of the present invention is to provide a semiconductor light emitting device capable of preventing the occurrence of an electrical failure caused by bubbles coming into contact with a bonding wire.

上記課題を解決するために、本発明の請求項1に記載された発明は、
第一の絶縁基板と、
前記第一の絶縁基板上に絶縁性接着層を介して貼り合わされた、貫通孔を有する第二の絶縁基板と、
少なくとも前記貫通孔を含む凹部内に配置された半導体発光素子と、
前記凹部内に充填された封止樹脂とを有する半導体発光装置であって、
前記第一の絶縁基板上に形成され、前記半導体発光素子とボンディングワイヤを介して電気的に接続された第一の導体パターンと、
前記第一の絶縁基板上に形成され、前記第一の導体パターンと分離して形成された第二の導体パターンとを有し、
前記絶縁性接着層の前記凹部内に露出した端部の少なくとも一部は、前記貫通孔の内周面よりも後退した位置に配置され、
前記第一の導体パターンと前記第二の導体パターンは、前記第一の絶縁基板上においてそれぞれ前記絶縁性接着層が形成される領域から前記凹部内に露出する領域にまで延在し、前記第一の導体パターンの厚みは前記第二の導体パターンの厚みより厚いことを特徴とするものである。
In order to solve the above problems, the invention described in claim 1 of the present invention is:
A first insulating substrate;
A second insulating substrate having a through-hole bonded to the first insulating substrate via an insulating adhesive layer;
A semiconductor light emitting device disposed in a recess including at least the through hole;
A semiconductor light emitting device having a sealing resin filled in the recess,
A first conductor pattern formed on the first insulating substrate and electrically connected to the semiconductor light emitting element via a bonding wire;
A second conductor pattern formed on the first insulating substrate and formed separately from the first conductor pattern;
At least a part of the end portion exposed in the concave portion of the insulating adhesive layer is disposed at a position retracted from the inner peripheral surface of the through hole,
The first conductor pattern and the second conductor pattern each extend from a region where the insulating adhesive layer is formed on the first insulating substrate to a region exposed in the recess, The thickness of one conductor pattern is thicker than the thickness of the second conductor pattern.

また、本発明の請求項2に記載された発明は、請求項1において、前記第一の絶縁基板は、前記貫通孔より小さい第二の貫通孔と、前記第一の絶縁基板の前記第二の絶縁基板の貼り合わされた面と反対側に前記第二の貫通孔を塞ぐように配設された支持板とを有し、前記支持板上に前記半導体発光素子が載置されていることを特徴とするものである。 Further, the invention described in claim 2 of the present invention, in claim 1, wherein the first insulating substrate includes a second through hole smaller than the through hole, the second of said first insulating substrate A support plate disposed so as to close the second through hole on the opposite side of the surface to which the insulating substrate is bonded, and the semiconductor light emitting element is mounted on the support plate. It is a feature.

また、本発明の請求項3に記載された発明は、請求項1又は2のいずれか1項において、前記第一の導体パターンと前記第二の導体パターンの間隙と前記絶縁性接着層の端部が少なくとも一箇所以上で交差することを特徴とするものである。   According to a third aspect of the present invention, in any one of the first and second aspects, the gap between the first conductor pattern and the second conductor pattern, and the end of the insulating adhesive layer. The parts intersect at least at one place or more.

また、本発明の請求項4に記載された発明は、請求項1乃至3のいずれか1項において、前記第一の導体パターンの厚みは、前記第二の導体パターンの厚みより前記絶縁性接着層の厚みの2分の1以上厚いことを特徴とするものである。   According to a fourth aspect of the present invention, in any one of the first to third aspects, the thickness of the first conductor pattern is greater than the thickness of the second conductor pattern. It is characterized by being thicker than half the thickness of the layer.

本発明の半導体発光装置は、絶縁性接着層を介して貼り合わされた、第一の絶縁基板と、貫通孔を有する第二の絶縁基板の少なくとも前記貫通孔を含む凹部内に、半導体発光素子と封止樹脂とを有する半導体発光装置であって、第一の絶縁基板上に、半導体発光素子とボンディングワイヤを介して電気的に接続された第一の導体パターンと前記第一の導体パターンと分離した第二の導体パターンとを形成し、絶縁性接着層の前記凹部内に露出した端部の少なくとも一部を貫通孔の内周面よりも後退した位置に配置する構成とした。   The semiconductor light emitting device of the present invention includes a semiconductor light emitting element and a first insulating substrate bonded together via an insulating adhesive layer and a semiconductor light emitting element in a recess including at least the through hole of the second insulating substrate having a through hole. A semiconductor light emitting device having a sealing resin, wherein the first conductor pattern electrically connected to the semiconductor light emitting element via a bonding wire on the first insulating substrate and the first conductor pattern are separated The second conductor pattern is formed, and at least a part of the end portion exposed in the concave portion of the insulating adhesive layer is disposed at a position retracted from the inner peripheral surface of the through hole.

このとき、第一の導体パターンの厚みが第二の導体パターンよりも厚く形成されており、封止樹脂の充填、加熱硬化時に第一の導体パターンと第二の導体パターンとの間隙で発生した気泡が第一の導体パターンの端面が障壁となって第二の導体パターンの方向に向けられる。   At this time, the thickness of the first conductor pattern is formed to be thicker than that of the second conductor pattern, and is generated in the gap between the first conductor pattern and the second conductor pattern when the sealing resin is filled and heat-cured. Air bubbles are directed in the direction of the second conductor pattern with the end face of the first conductor pattern serving as a barrier.

その結果、第一の導体パターンと第二の導体パターンとの間隙で発生した気泡はボンディングワイヤから離れる方向に向かい、気泡がボンディングワイヤに接触することに起因する電気的な不具合の発生を防止することが可能となった。   As a result, the bubbles generated in the gap between the first conductor pattern and the second conductor pattern are directed away from the bonding wire, thereby preventing the occurrence of electrical problems caused by the bubbles contacting the bonding wire. It became possible.

以下、この発明の好適な実施形態を図1〜図4を参照しながら、詳細に説明する(同一部分については同じ符号を付す)。尚、以下に述べる実施形態は、本発明の好適な具体例であるから、技術的に好ましい種々の限定が付されているが、本発明の範囲は、以下の説明において特に本発明を限定する旨の記載がない限り、これらの実施形態に限られるものではない。   Hereinafter, a preferred embodiment of the present invention will be described in detail with reference to FIGS. 1 to 4 (the same reference numerals are given to the same parts). The embodiments described below are preferable specific examples of the present invention, and thus various technically preferable limitations are given. However, the scope of the present invention particularly limits the present invention in the following description. Unless stated to the effect, the present invention is not limited to these embodiments.

本発明の半導体発光装置は、半導体発光装置の発光源となる半導体発光素子を樹脂封止する際に、封止樹脂の加熱硬化時に該封止樹脂内に発生する気泡をその近傍に位置するボンディングワイヤから離れる方向に向ける構造とし、よって、気泡がボンディングワイヤに接触することに起因する電気的及び光学的な不具合の発生を防止して信頼性の高い半導体発光装置を実現するものである。   In the semiconductor light emitting device of the present invention, when the semiconductor light emitting element serving as the light emitting source of the semiconductor light emitting device is resin-sealed, the bubbles generated in the sealing resin during the heat curing of the sealing resin are located in the vicinity thereof. The structure is directed toward the direction away from the wire. Therefore, the occurrence of electrical and optical defects caused by bubbles contacting the bonding wire is prevented, and a highly reliable semiconductor light emitting device is realized.

図1〜図3は半導体発光装置の構造を示すものであり、図1は上面図、図2は図1のA−A断面図、図3は図1のB−B断面図である。   1 to 3 show the structure of a semiconductor light emitting device. FIG. 1 is a top view, FIG. 2 is a cross-sectional view taken along line AA in FIG. 1, and FIG. 3 is a cross-sectional view taken along line BB in FIG.

半導体発光装置1は、夫々絶縁材料からなる下部基板2と上部基板3が絶縁性接着層4を介して貼り合わされ、下部基板2の上部基板3と反対側(下面側)に例えば銅等からなる金属箔5による支持板が配設されている。絶縁性接着層4は例えばプリプレグが用いられ、厚みを約0.1mmとしている。   In the semiconductor light emitting device 1, a lower substrate 2 and an upper substrate 3 each made of an insulating material are bonded together via an insulating adhesive layer 4, and the lower substrate 2 is made of, for example, copper or the like on the opposite side (lower surface side) of the upper substrate 3. A support plate made of metal foil 5 is provided. The insulating adhesive layer 4 is made of, for example, prepreg and has a thickness of about 0.1 mm.

上部基板3及び下部基板2には夫々、第一の貫通孔6、第二の貫通孔7が設けられ、上部基板3の第一の貫通孔6は下部基板2の第二の貫通孔7よりも大きく形成されている。絶縁性接着層4の端部8は上部基板3の第一の貫通孔6の内周面9よりも外側に窪んだ凹形状に形成されており、具体的には第一の貫通孔6の内周面9より約0.1mm後退した位置に位置している。本実施形態においては、上部基板と下部基板には、ガラスエポキシ基板、絶縁性接着層には、ガラス繊維に未硬化のエポキシ樹脂を含浸したプリプレグを用いた。また、約0.1mmの絶縁性接着層の貫通孔側の端部は、上部基板の内周面より0.1mm後退して配置した。   The upper substrate 3 and the lower substrate 2 are respectively provided with a first through hole 6 and a second through hole 7, and the first through hole 6 of the upper substrate 3 is more than the second through hole 7 of the lower substrate 2. Is also formed large. The end portion 8 of the insulating adhesive layer 4 is formed in a concave shape that is recessed outward from the inner peripheral surface 9 of the first through hole 6 of the upper substrate 3. It is located at a position retracted about 0.1 mm from the inner peripheral surface 9. In the present embodiment, glass epoxy substrates are used for the upper substrate and the lower substrate, and prepregs in which glass fibers are impregnated with an uncured epoxy resin are used for the insulating adhesive layer. Further, the end portion on the through hole side of the insulating adhesive layer of about 0.1 mm was disposed so as to recede by 0.1 mm from the inner peripheral surface of the upper substrate.

下部基板2の、下部基板2の第二の貫通孔7、上部基板3の第一の貫通孔6及び金属箔5で構成された凹部10内に露出した領域11には夫々間隙12を介して分離・独立して形成された電極パターン13と反射パターン14が形成されている。   The region 11 exposed in the recess 10 formed of the second through hole 7 of the lower substrate 2, the first through hole 6 of the upper substrate 3 and the metal foil 5 of the lower substrate 2 is interposed via a gap 12. An electrode pattern 13 and a reflection pattern 14 formed separately and independently are formed.

電極パターン13は下部基板2の上面の凹部10内の露出領域11から端部15まで延長され、反射パターン14は、下部基板2の凹部10内露出領域11の電極パターン13以外の残りの領域に形成されている。電極パターン13と反射パターン14は、約0.1〜0.2mmの間隔で分離して下部基板上に形成されている。   The electrode pattern 13 extends from the exposed region 11 in the recess 10 on the upper surface of the lower substrate 2 to the end 15, and the reflection pattern 14 is formed on the remaining region other than the electrode pattern 13 in the exposed region 11 in the recess 10 of the lower substrate 2. Is formed. The electrode pattern 13 and the reflective pattern 14 are formed on the lower substrate while being separated by an interval of about 0.1 to 0.2 mm.

電極パターン13は、下部基板2上に形成されたCuパターン上に順次Cuメッキ、Niメッキ及びAgメッキが施された4層構造となっており、約35μmのCuパターン、約50μmのCuメッキ、約5μmのNiメッキ、約2μmの銀メッキで形成されている。
反射パターン14は、Cuパターン上に順次Niメッキ及びAgメッキが施された3層構造となっており、約20μmの銅パターン、約5μmのNiメッキ、約2μmの銀メッキで形成されている。夫々のパターン13、14の厚みは互いに異なっており、電極パターン13が反射パターン14よりも厚く形成されている。本実施形態においては、電極パターン厚みが反射パターン厚みより約65μm厚く形成された。
いずれのパターン13、14も、同じメッキ工程で形成し、反射パターン部分については、Cuメッキ工程後にCuパターンとCuメッキ層のエッチングを施すことにより約20μmのCuパターン層を形成した。このように、電極パターン13と反射パターン14の厚みの差は4層構造のうちCuメッキの厚みを制御することにより設定される。
また、気泡の大きさは、上部基板と下部基板との間隔に影響するため、電極パターン厚みは、反射パターン厚みより、上部基板と下部基板との間隔の2分の1以上厚く形成することが好ましい。すなわち、絶縁性接着層の厚みの2分の1以上厚く形成することが好ましい。本実施形態においても、上部基板と下部基板との間隔が約0.1mmであるのに対し、直径約0.1mmの気泡の発生が確認されたが、約65μmの厚みの差が形成されていることにより、ボンディングワイヤとの接触は起こらなかった。
The electrode pattern 13 has a four-layer structure in which a Cu pattern formed on the lower substrate 2 is sequentially subjected to Cu plating, Ni plating, and Ag plating, and has an approximately 35 μm Cu pattern, approximately 50 μm Cu plating, It is formed by Ni plating of about 5 μm and silver plating of about 2 μm.
The reflection pattern 14 has a three-layer structure in which Ni plating and Ag plating are sequentially performed on the Cu pattern, and is formed by a copper pattern of about 20 μm, a Ni plating of about 5 μm, and a silver plating of about 2 μm. The thicknesses of the patterns 13 and 14 are different from each other, and the electrode pattern 13 is formed thicker than the reflection pattern 14. In this embodiment, the electrode pattern thickness is formed to be about 65 μm thicker than the reflection pattern thickness.
Both patterns 13 and 14 were formed by the same plating process, and the reflection pattern portion was formed by etching the Cu pattern and the Cu plating layer after the Cu plating process to form a Cu pattern layer of about 20 μm. Thus, the difference in thickness between the electrode pattern 13 and the reflection pattern 14 is set by controlling the thickness of the Cu plating in the four-layer structure.
In addition, since the size of the bubble affects the interval between the upper substrate and the lower substrate, the electrode pattern thickness may be formed to be more than half the interval between the upper substrate and the lower substrate than the reflective pattern thickness. preferable. That is, it is preferable that the insulating adhesive layer is formed to be thicker than half the thickness. Also in this embodiment, although the generation of bubbles having a diameter of about 0.1 mm was confirmed while the distance between the upper substrate and the lower substrate was about 0.1 mm, a difference in thickness of about 65 μm was formed. As a result, contact with the bonding wire did not occur.

第二の貫通孔7の底部に位置する金属箔5上には半導体発光素子16が、はんだ或いは銀ペースト等の導電部材(図示せず)を介してダイボンディングされ、半導体発光素子16の電極に一方の端部が接続されたボンディングワイヤ17の他方の端部が下部基板2の上面の凹部10内露出領域11に形成された電極パターン13にワイヤボンディングされて半導体発光素子16の電極と電極パターン13がボンディングワイヤ17を介して電気的に接続されている。   A semiconductor light-emitting element 16 is die-bonded on the metal foil 5 located at the bottom of the second through-hole 7 via a conductive member (not shown) such as solder or silver paste, and is used as an electrode of the semiconductor light-emitting element 16. The other end of the bonding wire 17 to which one end is connected is wire-bonded to the electrode pattern 13 formed in the exposed region 11 in the recess 10 on the upper surface of the lower substrate 2, and the electrode and the electrode pattern of the semiconductor light emitting element 16. 13 is electrically connected via a bonding wire 17.

半導体発光素子16が位置する凹部10内には透光性樹脂からなる封止樹脂18が充填され、半導体発光素子16及びボンディングワイヤ17を樹脂封止している。この場合、封止樹脂18は半導体発光素子16を水分、塵埃及びガス等の外部環境から保護し、且つボンディングワイヤ17を振動及び衝撃等の機械的応力から保護する。また、封止樹脂18は半導体発光素子16の光出射面とで界面を形成しており、半導体発光素子16の発光光を半導体発光素子16の光出射面から封止樹脂18内に効率良く出射させる機能も有している。本実施形態では封止樹脂18としてシリコーン樹脂を用いた。   The recess 10 in which the semiconductor light emitting element 16 is located is filled with a sealing resin 18 made of a translucent resin, and the semiconductor light emitting element 16 and the bonding wire 17 are sealed with resin. In this case, the sealing resin 18 protects the semiconductor light emitting element 16 from the external environment such as moisture, dust, and gas, and protects the bonding wire 17 from mechanical stress such as vibration and impact. Further, the sealing resin 18 forms an interface with the light emitting surface of the semiconductor light emitting element 16, and the emitted light of the semiconductor light emitting element 16 is efficiently emitted from the light emitting surface of the semiconductor light emitting element 16 into the sealing resin 18. It also has a function to make it. In this embodiment, a silicone resin is used as the sealing resin 18.

なお、封止樹脂は透光性樹脂に限られるものではなく、透光性樹脂に蛍光体を分散してなる封止樹脂で半導体発光素子及びボンディングワイヤを樹脂封止することも可能である。その場合、半導体発光装置は、発光源となる半導体発光素子の光源光とは異なる波長の光を出射する発光装置となる。   Note that the sealing resin is not limited to the light-transmitting resin, and the semiconductor light-emitting element and the bonding wire can be resin-sealed with a sealing resin obtained by dispersing a phosphor in the light-transmitting resin. In that case, the semiconductor light-emitting device is a light-emitting device that emits light having a wavelength different from that of the light source light of the semiconductor light-emitting element serving as the light-emitting source.

ところで、このような構造の半導体発光装置1において、半導体発光素子16及びボンディンングワイヤ17を封止する封止樹脂18は、下部基板2の第一の貫通孔6、上部基板3の第二の貫通孔7及び金属箔5で構成された凹部10内に充填され、その後加熱硬化される。   By the way, in the semiconductor light emitting device 1 having such a structure, the sealing resin 18 for sealing the semiconductor light emitting element 16 and the bonding wire 17 is the first through hole 6 of the lower substrate 2 and the second of the upper substrate 3. The through hole 7 and the metal foil 5 are filled in the recess 10 and then heated and cured.

そこで、封止樹脂が充填される凹部に溝や窪み等の小さな凹部があると、封止樹脂の充填時にその部分に封止樹脂が流れ込まず、空気の溜まりができる。この空気の溜まりは封止樹脂の熱硬化時に低粘度化した封止樹脂によって押し出され、封止樹脂内で気泡となる。このとき、封止樹脂の熱硬化が徐々に進行しているため気泡が封止樹脂外に放出されるまえに封止樹脂が硬化し、気泡は封止樹脂内に留まる。   Therefore, if there is a small recess such as a groove or a recess in the recess filled with the sealing resin, the sealing resin does not flow into the portion when the sealing resin is filled, and air can be trapped. This pool of air is pushed out by the sealing resin whose viscosity has been reduced during the thermosetting of the sealing resin, and becomes bubbles in the sealing resin. At this time, since the thermosetting of the sealing resin is gradually progressing, the sealing resin is cured before the bubbles are released out of the sealing resin, and the bubbles remain in the sealing resin.

上記半導体発光装置においては、特に図3に示すように、封止樹脂18の充填時に絶縁性接着層4の窪み部19と、底部基板2上に位置する電極パターン13と反射パターン14との間隙12とが重なる部分に空気の溜まりが生じ易く、熱硬化後にはその近傍に気泡20として残りやすい。   In the semiconductor light emitting device, as shown in FIG. 3 in particular, the gap between the recess 19 of the insulating adhesive layer 4 and the electrode pattern 13 and the reflective pattern 14 located on the bottom substrate 2 when the sealing resin 18 is filled. Air easily accumulates in a portion overlapping with 12 and tends to remain as bubbles 20 in the vicinity thereof after thermosetting.

気泡20は、該気泡が20発生する位置の、電極パターン13の厚みと反射パターン14の厚みが同じ場合はその向く方向が一定ではなく不確定である。そのため、ボンディングワイヤ17に接触してボンディングワイヤ17を切断する等の不具合の要因となる恐れがある。それに対し、本発明の半導体発光装置は、ボンディングワイヤの17の端部が接続された電極パターン13の厚みを反射パターン14の厚みよりも厚くしており、電極パターン13と反射パターン14との間隙12部分で発生した気泡20は電極パターンの端面21が障壁となって反射パターン14の方向に向けられる。   If the thickness of the electrode pattern 13 and the thickness of the reflective pattern 14 are the same at the position where the bubble 20 is generated, the direction of the bubble 20 is not constant and is uncertain. For this reason, there is a risk of causing a problem such as contact with the bonding wire 17 and cutting the bonding wire 17. On the other hand, in the semiconductor light emitting device of the present invention, the thickness of the electrode pattern 13 to which the end portion of the bonding wire 17 is connected is made larger than the thickness of the reflective pattern 14, and the gap between the electrode pattern 13 and the reflective pattern 14 is increased. The bubbles 20 generated in the 12 portions are directed toward the reflective pattern 14 with the end face 21 of the electrode pattern serving as a barrier.

その結果、絶縁性接着層4の窪み部19と、電極パターン13と反射パターン14との間隙12とが重なる部分で発生した気泡20はボンディングワイヤ17から離れる方向に向かい、気泡20がボンディングワイヤ17に接触することに起因する電気的な不具合の発生を防止することが可能となる。   As a result, the bubble 20 generated in the portion where the recess 19 of the insulating adhesive layer 4 and the gap 12 between the electrode pattern 13 and the reflection pattern 14 overlap is directed away from the bonding wire 17, and the bubble 20 is bonded to the bonding wire 17. It is possible to prevent the occurrence of an electrical failure due to contact with the.

なお、上記半導体発光装置においては、半導体発光素子が下部基板2の下面側に位置する金属箔5上に配置されているが必ずしもこの構造に限定されるものではなく、金属箔5の替わりに図4のように下部基板2に掘り込み部(凹部)22を設け、掘り込み部22の底面23に半導体発光素子16を実装してボンディングワイヤ17を架空配線し、上部基板3の第二の貫通孔7と下部基板2の掘り込み部22で形成された凹部24に封止樹脂18を充填する構造とすることも可能である。   In the semiconductor light emitting device, the semiconductor light emitting element is disposed on the metal foil 5 located on the lower surface side of the lower substrate 2. However, the structure is not necessarily limited to this structure. 4, a digging portion (concave portion) 22 is provided in the lower substrate 2, the semiconductor light emitting element 16 is mounted on the bottom surface 23 of the digging portion 22, the bonding wire 17 is overlaid, and the second penetration of the upper substrate 3 is performed. It is also possible to have a structure in which the recess 24 formed by the hole 7 and the digging portion 22 of the lower substrate 2 is filled with the sealing resin 18.

なお、上記実施形態において、絶縁性接着層4には、ガラス繊維に未硬化のエポキシ樹脂を含浸したプリプレグを用いて説明したが、エポキシ樹脂等からなる接着シート、あるいは、ガラスエポキシ基板の両面に接着シートが配置された多層構造のものを用いるなど、用途や仕様に応じて変更したものを用いることができる。また、多層構造のものを絶縁性接着層として使用する際には、上部基板内周面より後退させる層を、はみ出しの懸念される層のみの一部としてもよいが、絶縁性接着層全部としてもよい。
なお、上記実施形態において、電極パターンと分離して反射パターンが形成された構成で説明したが、反射を目的とする反射パターンに限らず、用途や改良に応じて他の目的で形成された導体パターンを用いることができる。
以上、実施形態に沿って本発明を説明したが、本発明はこれらに限定されるものではない。種々の変更、改良、組み合わせが可能であり、例えば、半導体発光素子を複数としたり、異なる製法により金属箔からなる支持板を有さない構成とすることができる。
In the above embodiment, the insulating adhesive layer 4 has been described using a prepreg in which glass fiber is impregnated with an uncured epoxy resin. However, an adhesive sheet made of an epoxy resin or the like, or both surfaces of a glass epoxy substrate are used. The thing changed according to the use and specification, such as using the thing of the multilayer structure by which the adhesive sheet is arrange | positioned, can be used. In addition, when using a multi-layer structure as the insulating adhesive layer, the layer that recedes from the inner peripheral surface of the upper substrate may be a part of the layer that is likely to protrude, but the entire insulating adhesive layer Also good.
In addition, in the said embodiment, although demonstrated with the structure by which the reflective pattern was formed separately from the electrode pattern, it is not restricted to the reflective pattern aiming at reflection, The conductor formed for the other objective according to a use or improvement A pattern can be used.
As mentioned above, although this invention was demonstrated along embodiment, this invention is not limited to these. Various modifications, improvements, and combinations are possible. For example, a plurality of semiconductor light-emitting elements can be used, or a support plate made of a metal foil can be provided by different manufacturing methods.

本発明に係る実施形態の上面図である。It is a top view of the embodiment concerning the present invention. 図1のA−A断面図である。It is AA sectional drawing of FIG. 図1のB−B断面図である。It is BB sectional drawing of FIG. 本発明に係る実施形態の応用例を示す説明図である。It is explanatory drawing which shows the application example of embodiment which concerns on this invention. 従来例の説明図である。It is explanatory drawing of a prior art example.

符号の説明Explanation of symbols

1 半導体発光装置
2 下部基板
3 上部基板
4 絶縁性接着層
5 金属箔
6 第一の貫通孔
7 第二の貫通孔
8 端部
9 内周面
10 凹部
11 露出領域
12 間隙
13 電極パターン
14 反射パターン
15 端部
16 半導体発光素子
17 ボンディングワイヤ
18 封止樹脂
19 窪み部
20 気泡
21 端面
22 掘り込み部
23 底面
24 凹部
DESCRIPTION OF SYMBOLS 1 Semiconductor light-emitting device 2 Lower board | substrate 3 Upper board | substrate 4 Insulating adhesive layer 5 Metal foil 6 1st through-hole 7 2nd through-hole 8 End part 9 Inner peripheral surface 10 Recessed part 11 Exposed area | region 12 Gap | interval 13 Electrode pattern 14 Reflective pattern DESCRIPTION OF SYMBOLS 15 End part 16 Semiconductor light-emitting element 17 Bonding wire 18 Sealing resin 19 Depression part 20 Bubble 21 End surface 22 Dimming part 23 Bottom face 24 Recessed part

Claims (4)

第一の絶縁基板と、
前記第一の絶縁基板上に絶縁性接着層を介して貼り合わされた、貫通孔を有する第二の絶縁基板と、
少なくとも前記貫通孔を含む凹部内に配置された半導体発光素子と、
前記凹部内に充填された封止樹脂とを有する半導体発光装置であって、
前記第一の絶縁基板上に形成され、前記半導体発光素子とボンディングワイヤを介して電気的に接続された第一の導体パターンと、
前記第一の絶縁基板上に形成され、前記第一の導体パターンと分離して形成された第二の導体パターンとを有し、
前記絶縁性接着層の前記凹部内に露出した端部の少なくとも一部は、前記貫通孔の内周面よりも後退した位置に配置され、
前記第一の導体パターンと前記第二の導体パターンは、前記第一の絶縁基板上においてそれぞれ前記絶縁性接着層が形成される領域から前記凹部内に露出する領域にまで延在し、前記第一の導体パターンの厚みは前記第二の導体パターンの厚みより厚いことを特徴とする半導体発光装置。
A first insulating substrate;
A second insulating substrate having a through-hole bonded to the first insulating substrate via an insulating adhesive layer;
A semiconductor light emitting device disposed in a recess including at least the through hole;
A semiconductor light emitting device having a sealing resin filled in the recess,
A first conductor pattern formed on the first insulating substrate and electrically connected to the semiconductor light emitting element via a bonding wire;
A second conductor pattern formed on the first insulating substrate and formed separately from the first conductor pattern;
At least a part of the end portion exposed in the concave portion of the insulating adhesive layer is disposed at a position retracted from the inner peripheral surface of the through hole,
The first conductor pattern and the second conductor pattern each extend from a region where the insulating adhesive layer is formed on the first insulating substrate to a region exposed in the recess, The thickness of one conductor pattern is thicker than the thickness of said 2nd conductor pattern, The semiconductor light-emitting device characterized by the above-mentioned.
前記第一の絶縁基板は、前記貫通孔より小さい第二の貫通孔と、前記第一の絶縁基板の前記第二の絶縁基板の貼り合わされた面と反対側に前記第二の貫通孔を塞ぐように配設された支持板とを有し、前記支持板上に前記半導体発光素子が載置されていることを特徴とする請求項1に記載の半導体発光装置。 Said first insulating substrate, closes the second through hole smaller than the through hole, the second through-hole on the opposite side of the first insulating said second insulating bonded together the surface of the substrate of the substrate The semiconductor light-emitting device according to claim 1, wherein the semiconductor light-emitting element is placed on the support plate. 前記第一の導体パターンと前記第二の導体パターンの間隙と前記絶縁性接着層の端部が少なくとも一箇所以上で交差することを特徴とする請求項1又は2のいずれか1項に記載の半導体発光装置。   The gap between the first conductor pattern and the second conductor pattern and the end of the insulating adhesive layer intersect at at least one place. Semiconductor light emitting device. 前記第一の導体パターンの厚みは、前記第二の導体パターンの厚みより前記絶縁性接着層の厚みの2分の1以上厚いことを特徴とする請求項1乃至3のいずれか1項に記載の半導体発光装置。   4. The thickness of the first conductor pattern is one half or more of the thickness of the insulating adhesive layer than the thickness of the second conductor pattern. 5. Semiconductor light emitting device.
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