JP5132111B2 - Substrate processing apparatus schedule creation method and program thereof - Google Patents

Description

  The present invention relates to a schedule creation method for a substrate processing apparatus for performing predetermined processing such as cleaning, etching, and drying on a glass substrate (hereinafter simply referred to as a substrate) for a semiconductor wafer or a liquid crystal display device, and a program thereof.

Conventionally, as a method of this type, a lifetime that defines the service life is set according to the time that the treatment liquid is used, and the liquid replacement process is fixed to the resources of the processing section that uses the treatment liquid for each lifetime. Deploy. Then, there is a method of arranging the use timing of each resource for each lot so as to sew the “periodic liquid replacement process” arranged as described above (see, for example, Patent Document 1). That is, the periodic liquid exchange process is first arranged, and the processing unit is scheduled to be used between the arranged periodic liquid exchange processes.
JP 2003-86562 A

However, the conventional example having such a configuration has the following problems.
That is, in the conventional apparatus, the use timing of resources is preferentially arranged, and therefore the resource use timing is uniformly shifted later, so that useless waiting time may occur. Accordingly, there is a problem that the throughput of the substrate processing is lowered.

  The present invention has been made in view of such circumstances, and the substrate processing that can reduce the wasteful waiting time and improve the throughput of the substrate processing by flexibly arranging the periodic liquid exchange processing. It is an object of the present invention to provide an apparatus schedule creation method and a program thereof.

In order to achieve such an object, the present invention has the following configuration.
That is, according to the first aspect of the present invention, when a plurality of lots are processed while using resources of the processing unit, the substrate processing apparatus including a processing unit that processes the substrate with the processing liquid actually performs processing. In the substrate processing apparatus schedule creation method in which the control unit determines the use timing of each resource before starting, the control unit determines the lifetime of the processing liquid according to the usage time of the processing liquid in the processing unit. In consideration of the periodic liquid replacement process for exchanging the processing liquid using the resources of the processing unit and the extended time that is the maximum time that can be shifted later, the lifetime is When a periodic liquid replacement process is arranged in the resource of the processing unit at the time when the process passes, and a waiting time occurs in a subsequent processing step due to the arrangement of the periodic liquid exchange process , It shifted after the periodic fluid exchange process is arranged within the extended time, and is characterized in placing a subsequent processing step preferentially.

  [Operation / Effect] According to the first aspect of the present invention, the control unit first arranges the periodic liquid replacement process in the resource of the processing unit when the lifetime elapses. After that, due to the arrangement of the periodic liquid replacement process, if the waiting time occurs in the subsequent processing process, the periodic liquid replacement process is shifted later within the extended time, and the subsequent processing process is preferentially arranged. To do. In this way, the periodic liquid exchange process is not arranged uniformly based only on the increase of the lifetime, but the periodic liquid exchange process is flexibly arranged, thereby reducing the wasteful waiting time and improving the substrate processing throughput. Can do.

  Further, in the present invention, the control unit has already been preferentially arranged in the case where a waiting time occurs in the subsequent lot processing process due to the shifting of the regular liquid replacement process later within the extended time. While maintaining the arrangement of the processing steps, the periodical liquid exchange processing is advanced and arranged between the processing step arranged after the lifetime has elapsed and the extended time, and the processing steps of the subsequent lots are advanced. It is preferable to arrange (claim 2). Due to the fact that the regular liquid exchange process is shifted later within the extended time, a waiting time may occur in the processing process of the subsequent lot. In such a situation, the control unit fixes the arrangement of the processing steps that have already been preferentially arranged, and performs a periodic liquid exchange process between the processing step that is arranged after the lifetime has elapsed and the extension time. Arrange ahead of schedule and place the next lot process ahead of schedule. Therefore, it is possible to suppress the occurrence of useless waiting time in subsequent lots.

Further, in the present invention, when the lifetime elapses at different timings in the plurality of processing units, the completion time of the previous periodic liquid replacement process is set to LTE, and the start time of the subsequent periodic liquid replacement process is set to LT2. , and ahead of schedule parameters AP ahead of schedule possible time, LT2-a when P becomes earlier than LTE, it is preferable to simultaneously perform the periodic fluid exchange process previous periodic fluid exchange and after (claim 3). When the time when the parameter AP is subtracted from the start time LT2 of the subsequent periodic liquid replacement process is earlier than the completion time LTE of the previous periodic liquid replacement process, these periodic liquid replacement processes are performed simultaneously at the start time. To. Thereby, it is possible to suppress an increase in standby time due to the periodic liquid replacement process being performed at different timings in the plurality of processing units.

According to a fourth aspect of the present invention, when a plurality of lots are processed while using resources of the processing unit by a substrate processing apparatus including a processing unit that processes a substrate with a processing liquid, the processing is actually performed. In the schedule creation program of the substrate processing apparatus in which the control unit determines the use timing of each resource before starting, the control unit determines the lifetime of the processing liquid according to the usage time of the processing liquid in the processing unit. In consideration of the periodic liquid replacement process for exchanging the processing liquid using the resources of the processing unit and the extended time that is the maximum time that can be shifted later, the lifetime is When a periodic liquid replacement process is arranged in the resource of the processing unit at the time when it elapses, and a waiting time occurs in a subsequent processing step due to the arrangement of the periodic liquid exchange process It is shifted after the periodic fluid exchange process is arranged within the extended time, and is characterized in placing a subsequent processing step preferentially.

  According to the schedule creation method of the substrate processing apparatus according to the present invention, the control unit first arranges the periodic liquid exchange process in the resource of the processing unit when the lifetime elapses. After that, due to the arrangement of the periodic liquid replacement process, if the waiting time occurs in the subsequent processing process, the periodic liquid replacement process is shifted later within the extended time, and the subsequent processing process is preferentially arranged. To do. In this way, the periodic liquid exchange process is not arranged uniformly based only on the increase of the lifetime, but the periodic liquid exchange process is flexibly arranged, thereby reducing the wasteful waiting time and improving the substrate processing throughput. Can do.

  FIG. 1 is a plan view illustrating a schematic configuration of the substrate processing apparatus according to the embodiment, and FIG. 2 is a block diagram illustrating a schematic configuration of the substrate processing apparatus according to the embodiment.

  This substrate processing apparatus is an apparatus for performing chemical liquid processing, cleaning processing, and drying processing on the substrate W, for example. A plurality of (for example, 25) substrates W are stored in a standing posture with respect to the cassette 1. The cassette 1 storing the unprocessed substrates W is placed on the input unit 3. The input unit 3 includes two mounting tables 5 on which the cassette 1 is mounted. A payout unit 7 is provided at a position adjacent to the input unit 3. The dispensing unit 7 stores the processed substrate W in the cassette 1 and dispenses the cassette 1 together. The payout unit 7 that functions in this manner includes two mounting bases 9 for mounting the cassette 1, similarly to the loading unit 3.

  A first transport mechanism 11 configured to be movable between these is disposed at a position along the input unit 3 and the payout unit 7. The first transport mechanism 11 transports a plurality of substrates W together with the cassette 1 placed on the input unit 3 to the second transport mechanism 13.

  The second transport mechanism 13 transports all the substrates W to the third transport mechanism WTR after removing all the stored substrates W from the cassette 1. Further, after receiving the processed substrate W from the third transport mechanism WTR, the substrate W is accommodated in the cassette 1 and transported to the first transport mechanism 11. The third transport mechanism WTR is configured to be movable in the longitudinal direction of the substrate processing apparatus, and includes a chuck portion 15 for holding a plurality of substrates W.

  A drying processing unit LPD for storing a plurality of substrates W in a low-pressure chamber and drying them is provided on the most front side in the moving direction of the third transport mechanism WTR.

  A first processing unit 19 is disposed at a position adjacent to the drying processing unit LPD in the moving direction of the third transport mechanism WTR. The first processing unit 19 includes a pure water cleaning processing unit ONB1 for performing pure water cleaning processing on a plurality of substrates W, and performs chemical processing on the plurality of substrates W with processing liquid. A chemical treatment unit CHB1 for application is provided. Further, the pure water cleaning processing unit ONB1 is configured to deliver the substrate W to and from the third transport mechanism WTR and to be movable up and down over a processing position in the pure water cleaning processing unit ONB1 and a delivery position above it. The lifter LF1 is provided. Similarly, the chemical processing unit CHB1 includes a lifter LF2.

  A second processing unit 21 is provided at a position adjacent to the first processing unit 19. The second processing unit 21 has the same configuration as the first processing unit 19 described above. That is, it includes a pure water cleaning processing unit ONB2, a chemical solution processing unit CHB2, and lifters LF3 and LF4.

  A chuck cleaning unit CHCL is provided at a position adjacent to the mounting table 9. The chuck cleaning unit CHCL has a function for cleaning and drying the chuck unit 15 of the third transport mechanism WTR.

  The substrate processing apparatus configured as described above is comprehensively controlled by the control unit 37 as shown in the block diagram of FIG.

  The control unit 31 includes a CPU and the like, and includes a scheduling unit 33, a liquid exchange adjustment unit 35, and a process execution instruction unit 37. A storage unit 39 connected to the control unit 31 is created in advance by a user of the substrate processing apparatus, and includes a recipe including a plurality of processing steps that define how to process a substrate, a schedule creation program, A processing program for executing the created schedule is stored in advance. In addition, a schedule created by the schedule creation program, an extended time (ET) described later, an advance parameter (AP), and the like are stored in advance.

  The scheduling unit 33 treats a plurality of substrates W accommodated in the cassette 1 and placed on the input unit 3 as one lot, and stores the recipe stored in the storage unit 39 in advance, which is instructed by the operator of the apparatus. Accordingly, before actually starting processing, a schedule is created so that processing steps for each lot can be efficiently arranged in time series.

  The liquid exchange adjustment unit 35 has a function of adjusting the arrangement of the regular liquid exchange process associated with the lifetime. The chemical liquid processing units CHB1 and CHB2 store the processing liquid containing the chemical liquid and perform the processing on the substrate W. However, since the chemical liquid deteriorates with the passage of time, the predetermined processing is performed after the processing liquid is generated. It is exchanged over time. This is the “periodic liquid exchange process”. At the stage where the scheduling unit 33 performs the scheduling, it is known at which point the periodic liquid exchange process is necessary, so the scheduling unit 33 arranges the periodic liquid exchange process in advance at predetermined intervals. Depending on the schedule, there is a possibility that useless waiting time may occur, and in order to suppress this, the liquid exchange adjustment unit 35 adjusts the arrangement position of the regular liquid exchange process (details will be described later).

  The process execution instructing unit 37 gives an operation instruction related to processing of each processing unit at an appropriate timing based on a schedule created by the scheduling unit 33 and the liquid exchange adjusting unit 35 and stored in the storage unit 39. .

  Here, specific scheduling will be described with reference to FIGS. 3 to 7 are time charts showing the schedule creation process.

  First, a specific recipe will be described with reference to FIG.

  In this example, it is assumed that a recipe including processing steps a to g is employed. The processing step a is, for example, a transport process by the processing units of the first transport mechanism 11 and the second transport mechanism 13. The processing step b is, for example, a transport process by the processing unit of the third transport mechanism WTR. The processing step c is, for example, pure water cleaning processing by the processing unit of the pure water cleaning processing unit ONB1, and the processing step d is, for example, chemical processing by the processing unit of the chemical processing unit CHB1. The processing step e is, for example, pure water cleaning processing by the processing unit of the pure water cleaning processing unit ONB2, and the processing step f is, for example, chemical processing by the processing unit of the chemical processing unit CHB2. Further, the processing step g is a drying process by the processing unit in the drying processing unit LPD.

  In this example, processing steps a, b, and c constitute block A, processing steps b, d, b, and e constitute block B, and processing steps b, f, b, and g constitute block C. It is assumed that the blocks A to C can be spaced apart. This is because the treatment steps c and e are pure water cleaning treatments, the treatment step g is a drying treatment, and the substrate W is not adversely affected even if the subsequent treatments take time. Here, the front part in each processing step ag is a preparatory work, the rear part represents rear-cleaning, and the central part (blacked part) shows the substance of the process. However, depending on the processing step, there is a case where there is no clean-up.

  In the process using the recipe as described above, for example, as shown in FIG. 3, it is assumed that the blocks A to C are arranged for the first lot so that the scheduling unit 33 uses the resources of each processing unit. In FIG. 3, the number “1-” is added before the block code to indicate that the block is the first lot. The time t1 indicates the time (LT) at which the lifetime that requires replacement of the chemical solution in the chemical solution processing unit CHB1 elapses due to the usage time. Conventionally, the regular liquid replacement process (XL) is uniformly arranged at the resource of the chemical liquid processing unit CHB1 at the time t1, but if this is done, the subsequent blocks 1-B and later are shifted later to cause a waiting time (illustration). (Omitted). Therefore, the liquid exchange adjustment unit 35 refers to the extended time ET, which is the maximum time during which the regular liquid exchange process can be shifted later, and shifts the regular liquid exchange process XL later so that the standby time is eliminated.

  In FIG. 3, the extended time ET is maximized and shifted from time t1 to time t2 when the extended time ET elapses. However, if the standby time can be suppressed, the time is shorter than the extended time ET. Also good.

  Subsequently, as shown in FIG. 4, the scheduling unit 33 arranges the blocks A to C for the second lot. In FIG. 4, “2-” is added in front of the block code to indicate that it is the block of the second lot. In such a state, since the block B of the second lot has to be arranged after the regular liquid exchange processing XL that has already been arranged, useless waiting time between the block A and the block B of the second lot wt will be generated.

  Therefore, the liquid exchange adjustment unit 35 maintains the arrangement of the blocks 1-A to 1-C of the first lot that has already been arranged with priority, and the block 1 that is arranged after the time point t1 when the lifetime LT has elapsed. Between the process step d of -B and the extended time ET, the regular liquid exchange process XL is placed forward. Specifically, as shown in FIG. 5, the liquid exchange process XL is advanced by the advance time AT and rearranged to use the resources of the chemical treatment unit CHB1 used in the process step d. As a result, the waiting time wt generated between the blocks A and B of the second lot is eliminated.

  As described above, as illustrated in FIG. 3, the control unit 31 first arranges the regular liquid replacement process XL in the resource of the processing unit at the time t1 when the lifetime LT elapses. Thereafter, when the waiting time occurs in the subsequent processing step d due to the arrangement of the regular liquid exchange process XL (not shown), the regular liquid exchange process XL is shifted later within the extended time ET. Preferentially arranges the processing step d following the regular liquid exchange processing XL. In this way, the regular liquid exchange process XL is not uniformly arranged based only on the increase of the lifetime LT, but the regular liquid exchange process XL is flexibly arranged, so that the wasteful waiting time wt is reduced and the throughput of the substrate process is reduced. Can be improved.

  Further, as shown in FIG. 4, there is a case where the waiting time wt occurs in the processing process of the subsequent second lot due to the later shift of the regular liquid exchange process XL within the extended time ET. In such a situation, as shown in FIG. 5, the control unit 31 fixes the arrangements 1-A to 1-C that have already been preferentially arranged, and the processing steps arranged after the lifetime LT has elapsed. The periodical liquid exchange process XL is moved forward between d and the extended time ET, and the process step 2-B of the subsequent second lot is moved forward. Accordingly, it is possible to suppress the occurrence of useless waiting time wt in the subsequent second lot.

Reference is now made to FIGS.
FIG. 6 shows an example in which the life lime LT1 is increased at the time point t1 in the chemical solution processing unit CHB1, and the lifetime LT2 is increased at the time point t4 in the chemical solution processing unit CHB2. As described above, when the two regular liquid replacement processes XL1 and XL2 are arranged at different timings and relatively different timings in the two chemical liquid processing units CHB1 and CHB2, useless waiting times wt1 and wt2 are generated. Since there is a case, it is preferable that the liquid exchange adjusting unit 35 adjusts as follows.

  That is, the liquid exchange adjustment unit 35 sets the completion time of the previous periodic liquid exchange process XL1 as LTE (time point t3), sets the start time of the subsequent periodic liquid exchange process XL2 as LT2 (time point t4), and sets the advance parameter as AP. (Time t2 to t4), LT2-AP <LTE, in other words, whether or not the condition that LT2-AP is earlier than LTE is satisfied. The subsequent periodic liquid replacement process XL2 is moved forward and rearranged so that the periodic liquid replacement process XL2 is performed at the same timing as the previous periodic liquid replacement process XL1 (FIG. 7). On the other hand, when the condition is not satisfied, it is arranged as it is.

  As described above, when the time t2 obtained by subtracting the parameter AP from the start time LT2 of the subsequent periodic liquid replacement process XL2 is earlier than the completion time LTE of the previous periodic liquid replacement process XL1, these periodic liquid replacement processes are performed. XL1 and XL2 are simultaneously performed at the start time LT1 of the previous periodic liquid exchange process XL1. Thereby, it is possible to suppress an increase in standby time due to the periodic liquid replacement processes XL1 and XL2 being performed at different timings in the plurality of processing units d and f.

  In the above-described embodiment, the case where two lots are scheduled is described as an example, but the same applies to the case where three or more lots are scheduled.

It is the top view which showed schematic structure of the substrate processing apparatus which concerns on an Example. It is the block diagram which showed schematic structure of the substrate processing apparatus which concerns on an Example. It is a time chart which shows the preparation process of a schedule. It is a time chart which shows the preparation process of a schedule. It is a time chart which shows the preparation process of a schedule. It is a time chart which shows the preparation process of a schedule. It is a time chart which shows the preparation process of a schedule.

Explanation of symbols

W ... Substrate 1 ... Cassette 3 ... Loading unit 5 ... Mounting table 7 ... Discharging unit 9 ... Mounting table 11 ... First transport mechanism 13 ... Second transport mechanism WTR ... Third transport mechanism 15 ... Chuck unit LPD ... Drying processing unit 19 ... 1st processing part ONB1 ... Pure water cleaning process part CHB1 ... Chemical solution processing part 21 ... 2nd processing part ONB2 ... Pure water cleaning process part CHB2 ... Chemical solution processing part CHCL ... Chuck cleaning part 31 ... Control part 33 ... Scheduling part 35 ... Liquid exchange adjustment unit 37 ... Process execution instruction unit 39 ... Storage unit XL ... Periodic liquid exchange process ET ... Extended time wt ... Standby time AT ... Advance time

Claims (4)

When a plurality of lots are processed using the processing unit resources by the substrate processing apparatus including a processing unit that processes the substrate with the processing liquid, the control unit sets each resource before starting the processing. In the substrate processing apparatus schedule creation method for determining the use timing,
The control unit, based on a lifetime that defines the life of the treatment liquid according to the use time of the treatment liquid in the treatment unit, a periodic liquid exchange process for exchanging the treatment liquid using the resources of the treatment unit, Considering the extended time, which is the maximum time that the regular liquid replacement process can be shifted later,
When a periodical liquid exchange process is arranged in the resource of the processing unit at the time when the lifetime elapses, and a waiting time occurs in a subsequent process step due to the arrangement of the periodical liquid exchange process, within the extension time A method of creating a schedule for a substrate processing apparatus, wherein the periodic liquid exchange processing is shifted later and the subsequent processing steps are preferentially arranged. In the schedule preparation method of the substrate processing apparatus of Claim 1,
The control unit maintains the arrangement of the preferentially arranged processing steps when a waiting time occurs in the subsequent lot processing steps due to the shifting of the regular liquid replacement processing within the extended time. As it is, it is characterized in that the periodic liquid exchange process is advanced and arranged between the treatment process arranged after the lifetime has elapsed and the extended time, and the treatment process of the subsequent lot is arranged in advance. Creating a schedule for a substrate processing apparatus. In the schedule preparation method of the substrate processing apparatus of Claim 1 or 2,
When the lifetime elapses at different timings in the plurality of processing units, the completion time of the previous periodic liquid exchange process is set to LTE, the start time of the subsequent periodic liquid exchange process is set to LT2, and the time that can be moved forward is determined. ahead parameters and AP, LT2-a P when is earlier than LTE after scheduling method of a substrate processing apparatus and performs periodic fluid exchange at the same time as the previous periodic fluid exchange of. When a plurality of lots are processed using the processing unit resources by the substrate processing apparatus including a processing unit that processes the substrate with the processing liquid, the control unit sets each resource before starting the processing. In the schedule creation program of the substrate processing apparatus that determines the use timing,
The control unit, based on a lifetime that defines the life of the treatment liquid according to the use time of the treatment liquid in the treatment unit, a periodic liquid exchange process for exchanging the treatment liquid using the resources of the treatment unit, Considering the extended time, which is the maximum time that the regular liquid replacement process can be shifted later,
When a periodical liquid exchange process is arranged in the resource of the processing unit at the time when the lifetime elapses, and a waiting time occurs in a subsequent process step due to the arrangement of the periodical liquid exchange process, within the extension time A program for creating a schedule for a substrate processing apparatus, wherein the periodic liquid exchange processing is shifted later and the subsequent processing steps are preferentially arranged.

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