JP2010027772A - Schedule generating method for substrate processing apparatus, and program thereof - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To prevent the availability of an apparatus from decreasing by determining whether use of a resource is extended and thus preventing a process from being stopped owing to a schedule. <P>SOLUTION: A control unit 25 adds a virtual end mark indicating use end time of a virtual resource of a warm water unit HDIW in timing to discharging of a lot from a processing stage using the warm water unit HDIW in a schedule for a single batch. When a whole schedule is generated, the virtual end mark of the virtual resource is put backward in terms of time if the discharging is delayed in terms of time to postpone the use of the virtual resource up to the virtual end mark. Consequently, a schedule for a single batch which is arranged thereafter is excluded by the virtual resource of the warm water unit HDIW. A process is prevented from being stopped as an alarm is generated owing to conflict for a resource, and the availability of the apparatus is prevented from decreasing. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a method for creating a schedule of a substrate processing apparatus for performing a predetermined process on a semiconductor wafer or a glass substrate (hereinafter simply referred to as a substrate) of a liquid crystal display device, and a program therefor, and more particularly, a direct process for a substrate. The present invention relates to a technique for performing a schedule of a substrate processing apparatus including a unit (separate unit) separate from a processing unit that performs the processing.

  Conventionally, as a method of this type, a plurality of processing liquid processing units that perform processing by immersing a substrate in a processing liquid, and these processing liquid processing units are common to each of the processing liquid processing units, and are separately provided. In a substrate processing apparatus schedule creation method for creating a schedule for processing a plurality of lots using a substrate processing apparatus having a supply unit for supplying a processing liquid to a processing liquid processing section, only a single lot is processed. There is a method in which a schedule of a single batch is taken into account, and thereafter, a single batch of all lots is arranged on one time axis to perform the schedule (see, for example, Patent Document 1).

In this schedule creation method, when creating a single batch schedule, scheduling is performed so that the resources of the supply unit are used in parallel with the use of resources of the processing liquid processing unit. Therefore, when the resources of the processing liquid processing unit are arranged in a single batch, the resources of the supply unit are arranged accompanying it, so the arrangement of the processing liquid processing unit and the arrangement of the supply unit are arranged in pairs in the entire schedule. Is done. As the supply unit, for example, there is a hot water unit that heats pure water to a predetermined temperature and supplies it as hot water. In that case, as shown in the single batch schedule of lots 1 to 3 in FIG. There are a case where hot water treatment is performed at the end of water treatment (FIG. 10A and FIG. 10B) and a case where warm water treatment is performed in the middle of pure water treatment (FIG. 10C).
JP 2003-59890 A

However, the conventional example having such a configuration has the following problems.
That is, when the conventional apparatus performs the hot water treatment at the end of the pure water treatment, as shown in FIG. 11, the time until the lot 2 is paid out from the pure water treatment section ONB2 when creating the entire schedule. However, at the time of creating the entire schedule, since it is not considered that the time from the hot water treatment to the payout is extended, the single batch schedule of the lot 3 can be arranged as shown in FIG. Then, since the hot water treatment in the lot 3 and the hot water treatment extended in the lot 2 compete with each other in the resources of the hot water unit, when the processing is actually started after the entire schedule is created, the hot water treatment in the lot 3 is performed. There is a problem that processing cannot be performed due to an alarm. As a result, the operating rate of the apparatus is reduced.

  The present invention has been made in view of such circumstances, and by making it possible to determine that the use of resources has been extended, it is possible to prevent processing from being stopped due to a schedule, It is an object of the present invention to provide a schedule creation method for a substrate processing apparatus and a program thereof that can prevent a reduction in the operating rate of the apparatus.

In order to achieve such an object, the present invention has the following configuration.
That is, the invention described in claim 1 is configured by a plurality of processing units that perform processing on a substrate and each processing unit separately, and performs processing associated with processing on the substrate in each processing unit. A substrate processing apparatus having a plurality of resources including a separate unit allows the control unit to use each resource based on each recipe for each lot and process the timing to use each resource. In the method of creating a schedule for a substrate processing apparatus that is determined in advance, the control unit defines a virtual resource that is different from the actual resource of the separately placed unit, and for each single lot, depending on the recipe For the processing steps that use the resource of the separate unit, the virtual resource is used in accordance with the use of the resource of the separate unit. In the process of creating a single batch schedule to use a single batch, and for a single batch schedule that uses a separate unit, according to the lot payout from the process using the resource of the separate unit, The process of adding a virtual end mark at the timing of ending the use of virtual resources, and the processing of using resources of separate units are delayed in time when a single batch schedule is placed and an overall schedule is created In the case of shifting to the virtual end mark, the virtual end mark of the virtual resource is shifted backward and the use of the virtual resource is extended to the virtual end mark accordingly.

  [Operation / Effect] According to the invention described in claim 1, the control unit defines the virtual resource of the separately placed unit, and when using the separately placed unit in a single batch schedule, A virtual end mark indicating the end of use of the virtual resource of the separately placed unit is added in accordance with the timing at which the lot is paid out from the processing step using the placed unit. Then, when creating the entire schedule, if the payout from the processing step using the resource of the separately placed unit is shifted backward in time, the virtual end mark of the virtual resource is also shifted backward in time accordingly. . Furthermore, the use of the virtual resource is extended to the virtual end mark. Therefore, even if the lot payout timing in the processing process that uses a separate unit is shifted back in time at the time of the entire schedule, it is determined from the state of the virtual resource that the use of the resource of the separate unit has been extended. can do. As a result, the single batch schedule that is placed after that is excluded by the virtual resource of the separately placed unit, so that it is possible to prevent the processing from being stopped due to resource conflict when executing the entire schedule. . Therefore, it is possible to prevent the apparatus operation rate from decreasing.

  In the present invention, it is preferable that the virtual end mark is added only when the separate unit is used at the end of the processing (claim 2). This is particularly effective when a separate unit is used at the end of the process.

  In the present invention, the separate unit is preferably a hot water unit for supplying warm water obtained by heating pure water to a predetermined temperature. Since the hot water unit is often shared by a plurality of processing units, resource competition is likely to occur. Therefore, the effect of exclusive processing is great.

  According to the schedule creation method of the substrate processing apparatus according to the present invention, the control unit defines the virtual resource of the separately placed unit, and when using the separately placed unit in the single batch schedule, A virtual end mark indicating the end of use of the virtual resource of the separately placed unit is added in accordance with the timing when the lot is paid out from the processing step using the unit. Then, when creating the entire schedule, if the payout from the processing step using the resource of the separately placed unit is shifted backward in time, the virtual end mark of the virtual resource is also shifted backward in time accordingly. . Furthermore, the use of the virtual resource is extended to the virtual end mark. Therefore, even if the lot payout timing in the processing process that uses a separate unit is shifted back in time at the time of the entire schedule, it is determined from the state of the virtual resource that the use of the resource of the separate unit has been extended. can do. As a result, the schedule of a single batch that is placed after that is excluded by the virtual resource of the separately placed unit, so that it is possible to prevent the processing from being stopped due to the occurrence of an alarm due to resource conflict when executing the entire schedule. . Therefore, it is possible to prevent the apparatus operation rate from decreasing.

An embodiment of the present invention will be described below with reference to the drawings.
FIG. 1 is a plan view illustrating a schematic configuration of the substrate processing apparatus according to the embodiment, and FIG. 2 is a block diagram illustrating a schematic configuration of the substrate processing apparatus according to the embodiment.

  This substrate processing apparatus is an apparatus for performing chemical liquid processing, pure water processing, and drying processing on the substrate W, for example. A plurality of (for example, 25) substrates W are stacked and stored in the cassette 1 in a horizontal posture. The cassette 1 storing the unprocessed substrates W is placed on the input unit 3. The input unit 3 includes two mounting tables 5 on which the cassette 1 is mounted. On the opposite side of the loading unit 3 across the center of the substrate processing apparatus, a dispensing unit 7 is provided. The dispensing unit 7 stores the processed substrate W in the cassette 1 and dispenses the cassette 1 together. The payout unit 7 that functions in this manner includes two mounting bases 9 for mounting the cassette 1, similarly to the loading unit 3.

  A first transport mechanism CTC configured to be movable between these is provided at a position along the input unit 3 and the payout unit 7. The first transport mechanism CTC takes out all the substrates W stored in the cassette 1 placed on the input unit 3 and then transports them to the second transport mechanism WTR. The first transport mechanism CTC stores the processed substrate W from the second transport mechanism WTR and then stores the substrate W in the cassette 1. The second transport mechanism WTR is configured to be movable along the longitudinal direction of the substrate processing apparatus.

  On the payout unit 7 side in the moving direction of the second transport mechanism WTR described above, a drying processing unit LPD for storing and drying a plurality of substrates W in a low-pressure chamber is provided.

  A first processing unit 19 is disposed at a position adjacent to the drying processing unit LPD in the moving direction of the second transport mechanism WTR. The first processing unit 19 includes a pure water processing unit ONB1 for performing pure water processing on a plurality of substrates W, and chemical processing is performed on the plurality of substrates W with a processing liquid containing a chemical. A chemical treatment unit CHB1 is provided. The first processing unit 19 includes a sub-transport mechanism LFS1 that delivers the substrate W to and from the second transport mechanism WTR and can be moved up and down only by the pure water processing unit ONB1 and the chemical solution processing unit CHB1.

  A second processing unit 21 is provided at a position adjacent to the first processing unit 19. The second processing unit 21 has the same configuration as the first processing unit 19 described above. That is, the apparatus includes the pure water treatment unit ONB2, the chemical solution treatment unit CHB2, and the sub-transport mechanism LFS2.

  In addition, the substrate processing apparatus includes a hot water unit HDIW configured separately from the processing units 19 and 21 described above. The hot water unit HDIW is shared by the pure water treatment units ONB1 and ONB2 described above, and has a function of supplying pure water heated to a predetermined temperature (hereinafter referred to as hot water) to them.

  The hot water unit HDIW described above corresponds to the “separate unit” in the present invention.

  The substrate processing apparatus configured as described above is comprehensively controlled by the control unit 25 as shown in the block diagram of FIG. FIG. 2 is a block diagram illustrating a schematic configuration of the substrate processing apparatus according to the embodiment. The control unit 25 corresponds to a “computer” in the present invention.

  The control unit 25 includes a CPU, a counter / timer, and the like, and includes a scheduling unit 27 and a process execution instruction unit 31. The storage unit 33 connected to the control unit 25 is prepared in advance by a user of the substrate processing apparatus, and includes a recipe including a plurality of processing steps that define how to process the substrate W, and a schedule creation program A processing program for executing the created schedule is stored in advance.

  The scheduling unit 27 handles the substrates W stored in the cassette 1 and placed on the input unit 3 as one lot, and in accordance with a recipe stored in advance in the storage unit 33 instructed by the operator of the apparatus. Before actually starting the processing, a single batch schedule using each resource is created for each single lot. In addition, the scheduling unit 27 defines a resource different from the hot water unit HDIW as a virtual resource IR, and creates a single batch schedule so that the virtual resource IR is used in accordance with the use of the hot water unit HDIW. Furthermore, for a single batch schedule that uses the hot water unit HDIW, a virtual end mark IM is added at the end of use of the hot water unit HDIW at the end of the use timing of the virtual resource IR. However, the virtual end mark IM is preferably added only when the hot water unit HDIW is used at the end of the process. Furthermore, all the single batch schedules are arranged on the same time axis to create the entire schedule. In the case of the entire schedule, when the payout of the process using the hot water unit HDIW is shifted backward in time, the virtual end mark IM of the virtual resource IR of the hot water unit HDIW is also shifted backward, and the virtual resource Extend the use of IR to the virtual end mark IM. The schedule created in this way is stored in the storage unit 33.

  Here, the resources include control of the first transport mechanism CTC, the second transport mechanism WTR, the drying processing unit LPD, the pure water processing units ONB1, ONB2, the chemical processing units CHB1, CHB2, the sub transport mechanisms LFS1, LFS2, etc. Refers to resources used for lot processing under the control of section 25. However, the hot water unit HDIW is not used as a single resource, and is used along with the processing when the hot water cleaning process is performed in the pure water processing units ONB1 and ONB2. Further, the virtual resource IR is not used as a single resource but is used in accordance with the hot water unit HDIW.

  The process execution instructing unit 31 instructs an operation related to processing of each processing unit at an appropriate timing based on a schedule created by the scheduling unit 27 and stored in the storage unit 33.

  Next, a specific schedule creation method will be described with reference to FIGS. FIG. 3 is a flowchart showing schedule creation, and FIG. 4 is a flowchart showing creation of the entire schedule. FIGS. 5A to 5C are time charts showing a single batch schedule of each lot, and FIGS. 6 to 9 are time charts showing the entire schedule creation process.

  In the following, in order to facilitate the understanding of the explanation, a case where only three lots of lots 1 to 3 are scheduled will be described as an example, but the same applies to two lots or four or more lots. Can be scheduled.

  The recipe for lot 1 in this example is, for example, as shown in FIG. Here, the first number indicates the lot number, and the alphabet after “−” indicates the processing step number. In each of the processing steps 1-A to 1-D, the portion corresponding to the preceding blank is a pre-operation corresponding to preparation for using the resource, and the portion corresponding to the trailing blank is a post-operation corresponding to cleaning up the used resource ( Lot payout). As shown in FIG. 5, the dot-hatched portion in the hot water unit HDIW is a processing step that accompanies when the resources of the pure water processing units ONB 1 and 2 are used.

  The process step 1-A is a transfer process by the first transfer mechanism CTC, and the process step 1-B is a transfer process by the second transfer mechanism WTR, a chemical process by the chemical processing unit CHB1, and a second transfer mechanism WTR. These are a transfer process, a cleaning process by the pure water processing unit ONB1, and a hot water cleaning process finally performed by the hot water unit HDIW in this cleaning process. Further, the process step 1-C is a transfer process by the second transfer mechanism WTR and a drying process by the drying processing unit LPD, and the process step 1-D is performed by the transfer process by the second transfer mechanism WTR and the first transfer mechanism CTC. It is a conveyance process.

  Further, the lot 2 recipe in this example is different from the lot 1 recipe described above in that the resources in the processing step 2-B are the chemical treatment unit CHB2 and the pure water treatment unit ONB2. The recipe for the lot 3 is different from the recipe for the lot 1 described above in that the processing of the hot water unit HDIW is performed not in the last but in the middle.

Steps S1-S3
The operator of the apparatus places the cassette 1 storing the unprocessed substrates W on the placing table 5 of the loading table 3 (Step S1). The above-described recipe is instructed from an instruction unit (not shown) (step S2). Then, the control part 25 reads the recipe data memorize | stored in the memory | storage part 33 (step S3). In the present embodiment, the three cassettes 1 are continuously placed on the placing table 5 and the above-described recipe is instructed in each.

Step S4
The scheduling unit 27 creates a single batch schedule for each of the lots 1 to 3 based on the read recipe data. Specifically, the time of each processing step 1-A to 1-D is calculated for lot 1, and based on the time required for each processing step 1-A to 1-D as shown in FIG. Create a schedule. Similarly, the time calculation of each processing step 2-A to 2-D is performed for lot 2, and the schedule is based on the time required for each processing step 2-A to 2-D as shown in FIG. Create Further, the lot 3 is similarly calculated for each of the processing steps 3-A to 3-D, and a schedule based on the time required for each of the processing steps 3-A to 3-D as shown in FIG. Create

Step S5
The scheduling unit 27 schedules the virtual resource IR to be used in accordance with the use of the created single batch schedule that uses the hot water unit HDIW. Further, among those using the hot water unit HDIW, for those whose use timing is the last of the processing, a virtual end mark IM indicating that the use of the hot water unit HDIW ends at the end of the use timing of the virtual resource IR. Is added. In this embodiment, only the lot 1 (FIG. 5A) and the lot 2 (FIG. 5B) are added with the virtual end mark IM.

Step S6
The scheduling unit 27 arranges all the single batch schedules (FIGS. 5A to 5C) created as described above on the same time axis, and creates the entire schedule. That is, single batch schedules for 3 lots are arranged on the same time chart. At that time, the timing is adjusted so that the same resource is not used redundantly at the same time. Although not a single resource, redundant use of the resource of the hot water unit HDIW and the virtual resource IR associated with the pure water treatment units ONB1 and ONB2 is similarly avoided.

  Next, the scheduling unit 27 creates the entire schedule as follows, for example.

Steps S11 and S12
The scheduling unit 27 arranges a single batch schedule of the lot 1 from the schedule reference time (process start scheduled time). Specifically, in the single batch schedule of lot 1, a position where each processing step 1-A to 1-D can be arranged is searched and sequentially arranged. As a result, for example, assume that it becomes as shown in FIG.

Step S13
The process branches depending on whether there is a virtual end mark IM and there is a gap between the virtual end mark IM and the process. If there is a gap, the process proceeds to step S14, and if there is no gap, the process proceeds to step S15. Here, only lot 1 is arranged, and there is no gap between the virtual end mark IM and the process, so the process proceeds to step S15, and lots 2 and 3 remain, so the process proceeds to step S11. Transition.

Steps S11 to S15
Next, a lot 2 processing step is arranged.
As a result, as shown in FIG. 7, it is assumed that the payout of the lot 2 in the processing step 2-B is shifted backward due to the arrangement of the processing step 2-C. In accordance with this, the schedule creation unit 27 also shifts the virtual end mark IM of the virtual resource IR backward. Therefore, since it is determined that there is a gap between the process and the virtual end mark IM in step S13, the use of the virtual resource IR is extended to the virtual end mark IM in step S14 (FIG. 8). Then, the arrangement moves to lot 3.

Steps S11-S13, S15
Next, lot 3 is arranged.
As a result, it is assumed that the processing steps 3-A to 3-D are arranged as shown in FIG. Conventionally, due to the use timing of the hot water unit HDIW, the processing step 3-B of the lot 3 can be arranged up to the time T, but in this embodiment the virtual resource IR is the virtual end mark IM of the lot 2 Since it is occupied, it cannot be placed exclusively. For lot 3, since the virtual end mark IM does not exist in the single batch schedule, the process proceeds from step S13 to step S15, and the entire schedule is completed.

  As described above, after the single batch schedule of each of the lots 1 to 3 is arranged, the schedule process is terminated, and the created entire schedule is stored in the storage unit 33. The stored entire schedule is referred to by the process execution instructing unit 31 and processes each of the lots 1 to 3 while actually using each resource.

  As described above, according to the present embodiment, the control unit 25 defines the virtual resource IR of the hot water unit HDIW, and when the hot water unit HDIW is used in a single batch schedule, the hot water unit HDIW is A virtual end mark IM indicating the end of use of the virtual resource IR of the hot water unit HDIW is added in accordance with the timing when the lot is paid out from the processing process to be used. When the entire schedule is created, if the payout from the process using the resources of the hot water unit HDIW is shifted backward in time, the virtual end mark IM of the virtual resource IR is also shifted in time accordingly. Shift to Further, the use of the virtual resource IR is extended to the virtual end mark IM. Therefore, even if the lot payout timing in the processing step using the hot water unit HDIW is shifted backward in time at the time of the entire schedule, it is confirmed from the state of the virtual resource IR that the use of the resource of the hot water unit HDIW is extended. Can be determined. As a result, the schedule of a single batch placed after that is excluded by the virtual resource IR of the hot water unit HDIW, so that when the entire schedule is executed, an alarm is generated due to resource contention and processing is prevented from stopping. it can. Therefore, it is possible to prevent the apparatus operation rate from decreasing.

  The present invention is not limited to the above embodiment, and can be modified as follows.

  (1) In the above-described embodiment, the hot water unit HDIW that supplies hot water as the treatment liquid has been described as an example of the separate unit. However, as the separate unit, for example, the chemical liquid processing units CHB1 and CHB2 may be provided with the chemical liquid. And a chemical supply unit (ozone water supply unit) for supplying a treatment liquid containing gas, a gas supply unit for supplying a processing gas, and the like.

  (2) In the above-described embodiment, in the above-described embodiment, a single batch schedule is arranged in order from lot 1 to lot 3 to create an overall schedule. For example, each processing step of each lot 1 to 3 is sequentially performed. In addition, a method may be employed in which processing steps subsequent to the processing step that ends the earliest among the previous processing steps of each lot are arranged.

It is the top view which showed schematic structure of the substrate processing apparatus which concerns on an Example. It is the block diagram which showed schematic structure of the substrate processing apparatus which concerns on an Example. It is a flowchart which shows schedule creation. It is a flowchart which shows preparation of a whole schedule. (A)-(c) is a time chart which shows the schedule of the single batch of each lot. It is a time chart which shows the whole schedule preparation process. It is a time chart which shows the whole schedule preparation process. It is a time chart which shows the whole schedule preparation process. It is a time chart which shows the whole schedule preparation process. (A)-(c) is a time chart which shows the schedule of the single batch of each lot in a prior art example. It is a time chart which shows the whole schedule preparation process in a prior art example.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Cassette 3 ... Loading part 5 ... Mounting stand 7 ... Discharge part CTR ... 1st conveyance mechanism WTR ... 2nd conveyance mechanism LPD ... Drying process part 19 ... 1st process part 21 ... 2nd process part ONB1, ONB2 ... Pure water Processing unit CHB1, CHB2 ... Chemical solution processing unit LFS1, LFS2 ... Sub-transport mechanism HDIW ... Hot water unit 25 ... Control unit 27 ... Scheduling unit 31 ... Processing execution instruction unit 33 ... Storage unit IR ... Virtual resource IM ... Virtual end mark

Claims (5)

A plurality of resources including a plurality of processing units that perform processing on a substrate and a separate unit that is configured separately from each processing unit and that performs processing associated with processing on the substrate in each processing unit. A substrate processing apparatus schedule for predetermining the timing of using each resource before actual processing when the control unit performs processing using each resource for each lot based on each recipe by the provided substrate processing apparatus In the creation method,
The controller is
Define virtual resources that are different from the actual resources of the separate unit, use each resource according to the recipe for a single lot, and use separate units for processing steps that use the resources of the separate unit Creating a single batch schedule to use virtual resources to use
For a single batch schedule that uses a separate unit, a virtual end mark is added at the timing when the use of the virtual resource ends in accordance with the lot payout from the processing using the resource of the separate unit. Process,
When a single batch schedule is placed and an overall schedule is created, if the payout of processing using resources of a separate unit shifts behind in time, the virtual end mark of the virtual resource will be moved back accordingly. A process of extending the use of the virtual resource to the virtual end mark,
A method for creating a schedule for a substrate processing apparatus, comprising: In the schedule preparation method of the substrate processing apparatus of Claim 1,
The virtual end mark is added only when the separate unit is used at the end of processing, and the schedule processing method for a substrate processing apparatus is characterized. In the schedule preparation method of the substrate processing apparatus of Claim 1 or 2,
The method for creating a schedule for a substrate processing apparatus, wherein the separate unit is a hot water unit for supplying hot water obtained by heating pure water to a predetermined temperature. In the schedule preparation method of the substrate processing apparatus of Claim 3,
The processing step using the separate unit is a substrate processing apparatus schedule characterized in that after performing the processing with the processing liquid in the processing step, the hot water processing by the separate unit is continued until the lot is dispensed. How to make. A plurality of resources including a plurality of processing units that perform processing on a substrate and a separate unit that is configured separately from each processing unit and that performs processing associated with processing on the substrate in each processing unit. A substrate processing apparatus schedule for predetermining the timing of using each resource before actual processing when the control unit performs processing using each resource for each lot based on each recipe by the provided substrate processing apparatus In the creation program,
Define virtual resources that are different from the actual resources of the separate unit, use each resource according to the recipe for a single lot, and use separate units for processing steps that use the resources of the separate unit The ability to create a single batch schedule to use virtual resources to use the same resources,
For a single batch schedule that uses a separate unit, a virtual end mark is added at the timing when the use of the virtual resource ends in accordance with the lot payout from the processing using the resource of the separate unit. Function and
When a single batch schedule is placed and an overall schedule is created, if the payout of processing using resources of a separate unit shifts behind in time, the virtual end mark of the virtual resource will be moved back accordingly. A function of extending the use of virtual resources to the virtual end mark,
A program for creating a schedule for a substrate processing apparatus, wherein the control unit is a computer.

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