JP5125357B2 - 電気光学装置の製造方法 - Google Patents
電気光学装置の製造方法 Download PDFInfo
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- JP5125357B2 JP5125357B2 JP2007250783A JP2007250783A JP5125357B2 JP 5125357 B2 JP5125357 B2 JP 5125357B2 JP 2007250783 A JP2007250783 A JP 2007250783A JP 2007250783 A JP2007250783 A JP 2007250783A JP 5125357 B2 JP5125357 B2 JP 5125357B2
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- 238000004519 manufacturing process Methods 0.000 title claims description 33
- 239000000758 substrate Substances 0.000 claims description 174
- 239000000463 material Substances 0.000 claims description 43
- 238000000034 method Methods 0.000 claims description 28
- 238000002310 reflectometry Methods 0.000 claims description 15
- 238000005498 polishing Methods 0.000 claims description 12
- 239000011347 resin Substances 0.000 claims description 12
- 229920005989 resin Polymers 0.000 claims description 12
- 239000011521 glass Substances 0.000 claims description 9
- 238000000465 moulding Methods 0.000 claims description 9
- 230000008569 process Effects 0.000 claims description 8
- 238000002844 melting Methods 0.000 claims description 6
- 229920001187 thermosetting polymer Polymers 0.000 claims description 2
- 238000003825 pressing Methods 0.000 claims 1
- 239000004973 liquid crystal related substance Substances 0.000 description 107
- 239000010410 layer Substances 0.000 description 106
- 239000010408 film Substances 0.000 description 56
- 239000003990 capacitor Substances 0.000 description 16
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 13
- 230000005669 field effect Effects 0.000 description 11
- 238000001312 dry etching Methods 0.000 description 10
- 230000003287 optical effect Effects 0.000 description 10
- 238000005530 etching Methods 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 239000011229 interlayer Substances 0.000 description 7
- 239000010453 quartz Substances 0.000 description 7
- 239000011159 matrix material Substances 0.000 description 6
- 229910052814 silicon oxide Inorganic materials 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- 230000010287 polarization Effects 0.000 description 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 229920005591 polysilicon Polymers 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000004925 Acrylic resin Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010329 laser etching Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 229910021332 silicide Inorganic materials 0.000 description 3
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 230000014509 gene expression Effects 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000003870 refractory metal Substances 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910001316 Ag alloy Inorganic materials 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229920005830 Polyurethane Foam Polymers 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- -1 acryl Chemical group 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 239000011496 polyurethane foam Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
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- Liquid Crystal (AREA)
- Projection Apparatus (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007250783A JP5125357B2 (ja) | 2007-09-27 | 2007-09-27 | 電気光学装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007250783A JP5125357B2 (ja) | 2007-09-27 | 2007-09-27 | 電気光学装置の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009080388A JP2009080388A (ja) | 2009-04-16 |
| JP2009080388A5 JP2009080388A5 (https=) | 2010-08-19 |
| JP5125357B2 true JP5125357B2 (ja) | 2013-01-23 |
Family
ID=40655161
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007250783A Expired - Fee Related JP5125357B2 (ja) | 2007-09-27 | 2007-09-27 | 電気光学装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5125357B2 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5737037B2 (ja) * | 2011-07-22 | 2015-06-17 | セイコーエプソン株式会社 | 電気光学装置および投射型表示装置 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09251162A (ja) * | 1996-03-15 | 1997-09-22 | Matsushita Electron Corp | 集光素子付画像表示装置 |
| JP3826649B2 (ja) * | 2000-01-18 | 2006-09-27 | セイコーエプソン株式会社 | 電気光学装置及び投射型表示装置 |
| JP5027969B2 (ja) * | 2001-08-27 | 2012-09-19 | 大日本印刷株式会社 | 二次元視野拡大部材の製造方法 |
| JP2004361821A (ja) * | 2003-06-06 | 2004-12-24 | Seiko Epson Corp | 空間光変調装置及びプロジェクタ |
| JP4876613B2 (ja) * | 2006-02-15 | 2012-02-15 | セイコーエプソン株式会社 | 電気光学装置、電気光学装置の製造方法、プロジェクタ及び電子機器 |
-
2007
- 2007-09-27 JP JP2007250783A patent/JP5125357B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009080388A (ja) | 2009-04-16 |
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