JP5110649B2 - 半導体製造装置 - Google Patents

半導体製造装置 Download PDF

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Publication number
JP5110649B2
JP5110649B2 JP2008111444A JP2008111444A JP5110649B2 JP 5110649 B2 JP5110649 B2 JP 5110649B2 JP 2008111444 A JP2008111444 A JP 2008111444A JP 2008111444 A JP2008111444 A JP 2008111444A JP 5110649 B2 JP5110649 B2 JP 5110649B2
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Japan
Prior art keywords
window
flange
flange portion
reaction vessel
susceptor
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JP2008111444A
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English (en)
Japanese (ja)
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JP2009266887A5 (enExample
JP2009266887A (ja
Inventor
智則 山岡
誠一 中村
彰二 野上
隆之 新行内
巧 柴田
剛 山本
信博 辻
好伸 柳沢
晃 岡部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumco Corp
Denso Corp
Epicrew Corp
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Sumco Corp
Denso Corp
Epicrew Corp
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Priority to JP2008111444A priority Critical patent/JP5110649B2/ja
Publication of JP2009266887A publication Critical patent/JP2009266887A/ja
Publication of JP2009266887A5 publication Critical patent/JP2009266887A5/ja
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Publication of JP5110649B2 publication Critical patent/JP5110649B2/ja
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JP2008111444A 2008-04-22 2008-04-22 半導体製造装置 Active JP5110649B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008111444A JP5110649B2 (ja) 2008-04-22 2008-04-22 半導体製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008111444A JP5110649B2 (ja) 2008-04-22 2008-04-22 半導体製造装置

Publications (3)

Publication Number Publication Date
JP2009266887A JP2009266887A (ja) 2009-11-12
JP2009266887A5 JP2009266887A5 (enExample) 2011-05-12
JP5110649B2 true JP5110649B2 (ja) 2012-12-26

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ID=41392394

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008111444A Active JP5110649B2 (ja) 2008-04-22 2008-04-22 半導体製造装置

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JP (1) JP5110649B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013229494A (ja) * 2012-04-26 2013-11-07 Sharp Corp 半導体成長装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62219912A (ja) * 1986-03-20 1987-09-28 Toshiba Mach Co Ltd プラズマｃｖｄ装置
JP2884556B2 (ja) * 1994-06-10 1999-04-19 信越石英株式会社 枚葉式ウェーハ熱処理装置
US6406543B1 (en) * 1998-07-23 2002-06-18 Applied Materials, Inc. Infra-red transparent thermal reactor cover member
JP2003124206A (ja) * 2001-10-18 2003-04-25 Tokyo Electron Ltd 熱処理装置

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JP2009266887A (ja) 2009-11-12

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