JP5073309B2 - フィルム除去方法およびフィルム除去装置 - Google Patents
フィルム除去方法およびフィルム除去装置 Download PDFInfo
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- JP5073309B2 JP5073309B2 JP2007030739A JP2007030739A JP5073309B2 JP 5073309 B2 JP5073309 B2 JP 5073309B2 JP 2007030739 A JP2007030739 A JP 2007030739A JP 2007030739 A JP2007030739 A JP 2007030739A JP 5073309 B2 JP5073309 B2 JP 5073309B2
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- film
- plasma
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- plasma generator
- intake device
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32816—Pressure
- H01J37/32825—Working under atmospheric pressure or higher
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/427—Stripping or agents therefor using plasma means only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32366—Localised processing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
- H05H1/3463—Oblique nozzles
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Liquid Crystal (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Drying Of Semiconductors (AREA)
- Plasma Technology (AREA)
- Cleaning In General (AREA)
Description
10 基材
2 フィルム除去装置
20 ケース
21 プラズマ生成器
211 ジェットノズル
210 プラズマビーム
22 吸気装置
23 検知器
3 基板
30 フィルム
30’ 副生成物
31 微細構造
A ガス
Claims (6)
- 基板上のフィルムを除去するためのフィルム除去方法であって、
プラズマ生成器および吸気装置を用意し、前記基板の上方に設ける工程と、
前記プラズマ生成器を調整し、そこから射出されたプラズマビームが前記フィルムに対して斜めに射出されるようにし、前記吸気装置の末端の傾斜角度を調整できるように、前記吸気装置の末端を前記プラズマビームに対応する反射ルート上に斜めに設け、それによって、前記フィルムがプラズマ反応を経た後、反応が不完全なために生じた副生成物を吸い取ることで、前記基板の表面をクリーンに維持する工程と、
を備え、
前記プラズマ生成器と前記吸気装置との間に検知器が設けられ、前記検知器は、副生成物がなお生成されているかを検知すること又は前記基板の材質までを検知したか否かのことにより、前記フィルムを完全に除去したか否かを判定し、
前記プラズマ生成器、および前記吸気装置を回転軸に対向させて一体に回転させることを特徴とするフィルム除去方法。 - 前記プラズマ生成器、前記検知器、および前記吸気装置を前記基板に対して平行に移動させるようにする工程をさらに備えていることを特徴とする請求項1に記載のフィルム除去方法。
- 前記基板は、液晶パネルからなり、前記フィルムは、フォトレジストからなることを特徴とする請求項1に記載のフィルム除去方法。
- 基板上のフィルムを除去するためのフィルム除去装置において、
プラズマが前記フィルムに対して斜めに射出され、前記フィルムが前記基板上から除去されるためのプラズマ生成器と、
吸気装置の末端の傾斜角度を調整できるように、その末端が前記プラズマ生成器から射出されたプラズマに対応する反射ルート上に斜めに位置し、プラズマ反応の後、前記フィルムの反応が不完全なために生じた副生成物を吸い取ることにより、前記基板の表面をクリーンに維持するための吸気装置と、
を備え、
前記プラズマ生成器と前記吸気装置との間に検知器が設けられ、前記検知器は、副生成物がなお生成されているかを検知すること又は前記基板の材質までを検知したか否かのことにより、前記フィルムを完全に除去したか否かを判定し、
前記プラズマ生成器、および前記吸気装置は、ケースにより被覆され、モータの駆動により一体に回転されることを特徴とするフィルム除去装置。 - 前記基板は、液晶パネルからなり、前記フィルムは、フォトレジストからなることを特徴とする請求項4に記載のフィルム除去装置。
- 前記プラズマ生成器、前記検知器、および前記吸気装置は、前記基板に対して平行に移動されることを特徴とする請求項4に記載のフィルム除去装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW095117089 | 2006-05-15 | ||
TW095117089A TWI335450B (en) | 2006-05-15 | 2006-05-15 | Film cleaning method and apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007311757A JP2007311757A (ja) | 2007-11-29 |
JP5073309B2 true JP5073309B2 (ja) | 2012-11-14 |
Family
ID=38684136
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007030739A Active JP5073309B2 (ja) | 2006-05-15 | 2007-02-09 | フィルム除去方法およびフィルム除去装置 |
Country Status (4)
Country | Link |
---|---|
US (2) | US7507313B2 (ja) |
JP (1) | JP5073309B2 (ja) |
KR (1) | KR101316540B1 (ja) |
TW (1) | TWI335450B (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8986558B2 (en) * | 2008-09-01 | 2015-03-24 | Japan Science And Technology Agency | Plasma etching method, plasma etching device, and method for producing photonic crystal |
CN103212553A (zh) * | 2012-01-18 | 2013-07-24 | 杜邦太阳能有限公司 | 太阳能电池板清洁系统及清洁方法 |
CN106647182B (zh) * | 2016-12-26 | 2018-11-23 | 武汉华星光电技术有限公司 | 一种处理基板表面碳化光阻的方法及装置 |
TWI697953B (zh) * | 2018-06-28 | 2020-07-01 | 雷立強光電科技股份有限公司 | 清潔方法 |
CN113546934B (zh) * | 2021-07-15 | 2023-03-17 | 中国原子能科学研究院 | 池底清洁装置 |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH03257182A (ja) * | 1990-03-07 | 1991-11-15 | Hitachi Ltd | 表面加工装置 |
US6077384A (en) * | 1994-08-11 | 2000-06-20 | Applied Materials, Inc. | Plasma reactor having an inductive antenna coupling power through a parallel plate electrode |
US5302237A (en) * | 1992-02-13 | 1994-04-12 | The United States Of America As Represented By The Secretary Of Commerce | Localized plasma processing |
JP3194022B2 (ja) * | 1992-07-06 | 2001-07-30 | 東京エレクトロン株式会社 | プラズマ表面処理の制御装置 |
JPH06190269A (ja) * | 1992-12-25 | 1994-07-12 | Seiko Epson Corp | ドライ洗浄方法およびその装置 |
US5360980A (en) * | 1993-02-26 | 1994-11-01 | High Yield Technology | Structure and method for providing a gas purge for a vacuum particle sensor installed in a corrosive or coating environment |
US5643394A (en) * | 1994-09-16 | 1997-07-01 | Applied Materials, Inc. | Gas injection slit nozzle for a plasma process reactor |
JPH09275095A (ja) * | 1996-04-05 | 1997-10-21 | Hitachi Ltd | プロセス処理方法およびその装置 |
JPH09321013A (ja) * | 1996-05-29 | 1997-12-12 | Olympus Optical Co Ltd | 異物除去装置 |
JPH11354290A (ja) * | 1998-06-08 | 1999-12-24 | Ishikawajima Harima Heavy Ind Co Ltd | 微粉炭着火用プラズマトーチ |
US6390019B1 (en) * | 1998-06-11 | 2002-05-21 | Applied Materials, Inc. | Chamber having improved process monitoring window |
JP3704965B2 (ja) * | 1998-08-12 | 2005-10-12 | セイコーエプソン株式会社 | ドライエッチング方法及び装置 |
EP1170066A1 (de) | 2000-07-05 | 2002-01-09 | Förnsel, Peter | Verfahren und Vorrichtung zum Reinigen von Walzen oder Bänder |
JP2005347278A (ja) * | 2000-07-28 | 2005-12-15 | Sekisui Chem Co Ltd | 放電プラズマ処理装置 |
JP3853690B2 (ja) | 2002-04-10 | 2006-12-06 | 財団法人レーザー技術総合研究所 | フォトレジスト剥離除去方法 |
JP2003334436A (ja) * | 2002-05-17 | 2003-11-25 | Konica Minolta Holdings Inc | 多孔性プラズマ放電用電極、大気圧プラズマ放電処理装置、薄膜形成方法及び高機能性フィルム |
KR100464856B1 (ko) * | 2002-11-07 | 2005-01-05 | 삼성전자주식회사 | 표면 식각 방법 및 실리콘 기판 이면 식각 방법. |
JP4189324B2 (ja) * | 2003-01-27 | 2008-12-03 | パナソニック株式会社 | プラズマ処理方法及び装置 |
EP1592053B1 (en) * | 2003-02-05 | 2011-08-24 | Semiconductor Energy Laboratory Co., Ltd. | Wiring fabricating method |
JP3574654B1 (ja) * | 2003-11-06 | 2004-10-06 | 積水化学工業株式会社 | プラズマ処理装置 |
JP2005174879A (ja) * | 2003-12-15 | 2005-06-30 | Matsushita Electric Works Ltd | プラズマ処理方法及びプラズマ処理装置 |
JP2005177566A (ja) * | 2003-12-17 | 2005-07-07 | Shibaura Mechatronics Corp | 基板の処理装置及び処理方法 |
JP3716854B2 (ja) * | 2004-06-22 | 2005-11-16 | セイコーエプソン株式会社 | 液晶パネルの製造方法 |
JP2006035193A (ja) * | 2004-07-30 | 2006-02-09 | Ricoh Co Ltd | 粉体格納容器の洗浄装置および方法 |
-
2006
- 2006-05-15 TW TW095117089A patent/TWI335450B/zh active
- 2006-09-27 US US11/527,443 patent/US7507313B2/en active Active
- 2006-12-28 KR KR1020060136904A patent/KR101316540B1/ko active IP Right Grant
-
2007
- 2007-02-09 JP JP2007030739A patent/JP5073309B2/ja active Active
-
2008
- 2008-04-01 US US12/078,505 patent/US8075790B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
TW200742947A (en) | 2007-11-16 |
US20070262052A1 (en) | 2007-11-15 |
US7507313B2 (en) | 2009-03-24 |
KR101316540B1 (ko) | 2013-10-15 |
KR20070110764A (ko) | 2007-11-20 |
US8075790B2 (en) | 2011-12-13 |
TWI335450B (en) | 2011-01-01 |
US20080185017A1 (en) | 2008-08-07 |
JP2007311757A (ja) | 2007-11-29 |
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