JP5030944B2 - マイクロリソグラフィ露光装置のための照明システム - Google Patents

マイクロリソグラフィ露光装置のための照明システム Download PDF

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Publication number
JP5030944B2
JP5030944B2 JP2008508146A JP2008508146A JP5030944B2 JP 5030944 B2 JP5030944 B2 JP 5030944B2 JP 2008508146 A JP2008508146 A JP 2008508146A JP 2008508146 A JP2008508146 A JP 2008508146A JP 5030944 B2 JP5030944 B2 JP 5030944B2
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Prior art keywords
illumination system
lens
plane
diaphragm
field
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JP2008508146A
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Japanese (ja)
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JP2008539569A (ja
JP2008539569A5 (enExample
Inventor
ソーマー，アレキサンダー
ドドック，アウレリアン
フェルトマン，ヘイコ
ユーリッヒ，ヴィルヘルム
フュルター，ゲルハルト
エッゲル，ラファエル
ヘーゲレ，アルトゥル
ラウム，ミヒャエル
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
JP2008508146A 2005-04-26 2006-04-26 マイクロリソグラフィ露光装置のための照明システム Active JP5030944B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US67469105P 2005-04-26 2005-04-26
US60/674,691 2005-04-26
PCT/EP2006/003864 WO2006114294A2 (en) 2005-04-26 2006-04-26 Illumination system for a microlithgraphic exposure apparatus

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012003823A Division JP2012103724A (ja) 2005-04-26 2012-01-12 マイクロリソグラフィ露光装置のための照明システム

Publications (3)

Publication Number Publication Date
JP2008539569A JP2008539569A (ja) 2008-11-13
JP2008539569A5 JP2008539569A5 (enExample) 2009-04-30
JP5030944B2 true JP5030944B2 (ja) 2012-09-19

Family

ID=36617192

Family Applications (2)

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JP2008508146A Active JP5030944B2 (ja) 2005-04-26 2006-04-26 マイクロリソグラフィ露光装置のための照明システム
JP2012003823A Pending JP2012103724A (ja) 2005-04-26 2012-01-12 マイクロリソグラフィ露光装置のための照明システム

Family Applications After (1)

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JP2012003823A Pending JP2012103724A (ja) 2005-04-26 2012-01-12 マイクロリソグラフィ露光装置のための照明システム

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Country Link
US (1) US8873151B2 (enExample)
EP (1) EP1875292A2 (enExample)
JP (2) JP5030944B2 (enExample)
WO (1) WO2006114294A2 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005042005A1 (de) 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges Objektiv mit obskurierter Pupille
JP5068271B2 (ja) 2006-02-17 2012-11-07 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ照明システム、及びこの種の照明システムを含む投影露光装置
US7724347B2 (en) * 2006-09-05 2010-05-25 Tunable Optix Corporation Tunable liquid crystal lens module
DE102007023411A1 (de) * 2006-12-28 2008-07-03 Carl Zeiss Smt Ag Optisches Element, Beleuchtungsoptik für die Mikrolithographie mit mindestens einem derartigen optischen Element sowie Beleuchtungssystem mit einer derartigen Beleuchtungsoptik
JP2010517310A (ja) 2007-01-30 2010-05-20 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影露光装置の照明システム
DE102008040181A1 (de) 2007-07-27 2009-01-29 Carl Zeiss Beleuchtungssystem einer mikrolithographischen Projektionsbelichtungsanlage
GB0800677D0 (en) * 2008-01-16 2008-02-20 Zeiss Carl Smt Ag Illumination system of a microlithographic projection exposure apparatus
JP5393055B2 (ja) * 2008-05-28 2014-01-22 キヤノン株式会社 照明光学系、及びそれを用いた画像投影装置
JP5787382B2 (ja) * 2011-02-28 2015-09-30 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の照明系
JP2015049429A (ja) * 2013-09-03 2015-03-16 セイコーエプソン株式会社 プロジェクター
TWI477808B (zh) * 2014-01-17 2015-03-21 Largan Precision Co Ltd 攝影光學鏡頭、取像裝置及車用攝影裝置
DE102015218328B4 (de) * 2015-09-24 2019-01-17 Carl Zeiss Smt Gmbh Optisches System zur Feldabbildung und/oder Pupillenabbildung
ES2869878T3 (es) * 2017-01-17 2021-10-26 Signify Holding Bv Generación de posición de luz puntual ajustable
US10942456B1 (en) * 2020-01-17 2021-03-09 National Applied Research Laboratories Device of light source with diode array emitting high-uniformity ultraviolet
CN112180578B (zh) * 2020-09-25 2021-08-17 中国科学院西安光学精密机械研究所 一种可见光-中波红外双波段共孔径光学系统
CN113721353A (zh) * 2021-08-11 2021-11-30 苏州中科行智智能科技有限公司 一种大数值孔径的像方远心物镜和飞点扫描干涉仪
CN114047614B (zh) * 2021-12-03 2025-03-04 中国科学院精密测量科学与技术创新研究院 一种长工作距离的紫外成像物镜系统

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6285443B1 (en) 1993-12-13 2001-09-04 Carl-Zeiss-Stiftung Illuminating arrangement for a projection microlithographic apparatus
US6680803B2 (en) 1996-12-21 2004-01-20 Carl-Zeiss Smt Ag Partial objective in an illuminating systems
DE19653983A1 (de) 1996-12-21 1998-06-25 Zeiss Carl Fa REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen
US7130129B2 (en) * 1996-12-21 2006-10-31 Carl Zeiss Smt Ag Reticle-masking objective with aspherical lenses
US6947124B2 (en) * 1998-05-05 2005-09-20 Carl Zeiss Smt Ag Illumination system particularly for microlithography
US6583937B1 (en) 1998-11-30 2003-06-24 Carl-Zeiss Stiftung Illuminating system of a microlithographic projection exposure arrangement
JP3279282B2 (ja) * 1999-05-10 2002-04-30 日本電気株式会社 高周波半導体装置
DE10062579A1 (de) * 1999-12-15 2001-06-21 Nikon Corp Optischer Integrierer,optische Beleuchtungseinrichtung, Photolithographie-Belichtungseinrichtung,und Beobachtungseinrichtung
JP2002055277A (ja) 2000-08-11 2002-02-20 Nikon Corp リレー結像光学系、および該光学系を備えた照明光学装置並びに露光装置
JP2002175964A (ja) * 2000-12-06 2002-06-21 Nikon Corp 観察装置およびその製造方法、露光装置、並びにマイクロデバイスの製造方法
JP2002246308A (ja) * 2000-12-14 2002-08-30 Nikon Corp コンデンサー光学系、および該光学系を備えた照明光学装置並びに露光装置
KR20020046932A (ko) 2000-12-14 2002-06-21 시마무라 테루오 콘덴서 광학계, 및 그 광학계를 구비한 조명 광학 장치그리고 노광 장치
DE10151309A1 (de) * 2001-10-17 2003-05-08 Carl Zeiss Semiconductor Mfg S Projektionsbelichtungsanlage der Mikrolithographie für Lambda <200 nm
US7551361B2 (en) * 2003-09-09 2009-06-23 Carl Zeiss Smt Ag Lithography lens system and projection exposure system provided with at least one lithography lens system of this type
JP4717813B2 (ja) * 2003-09-12 2011-07-06 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光設備のための照明系
JP4241281B2 (ja) * 2003-09-17 2009-03-18 キヤノン株式会社 露光装置
US20070216887A1 (en) * 2004-04-23 2007-09-20 Carl Zeiss Smt Ag Illumination System for a Microlithographic Projection Exposure Apparatus
US20080192224A1 (en) 2005-02-12 2008-08-14 Carl Zeiss Smt Ag Microlithographic Projection Exposure Apparatus

Also Published As

Publication number Publication date
JP2012103724A (ja) 2012-05-31
EP1875292A2 (en) 2008-01-09
WO2006114294A2 (en) 2006-11-02
JP2008539569A (ja) 2008-11-13
US20080192359A1 (en) 2008-08-14
US8873151B2 (en) 2014-10-28
WO2006114294A3 (en) 2007-05-31

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