JP5028879B2 - 薄膜付きダイヤモンド単結晶の製造方法、及び薄膜付きダイヤモンド単結晶 - Google Patents
薄膜付きダイヤモンド単結晶の製造方法、及び薄膜付きダイヤモンド単結晶 Download PDFInfo
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- JP5028879B2 JP5028879B2 JP2006175975A JP2006175975A JP5028879B2 JP 5028879 B2 JP5028879 B2 JP 5028879B2 JP 2006175975 A JP2006175975 A JP 2006175975A JP 2006175975 A JP2006175975 A JP 2006175975A JP 5028879 B2 JP5028879 B2 JP 5028879B2
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- thin film
- single crystal
- diamond
- phosphorus
- doped
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- 229910003460 diamond Inorganic materials 0.000 title claims description 127
- 239000010432 diamond Substances 0.000 title claims description 127
- 239000010409 thin film Substances 0.000 title claims description 105
- 239000013078 crystal Substances 0.000 title claims description 80
- 238000004519 manufacturing process Methods 0.000 title claims description 16
- 239000000758 substrate Substances 0.000 claims description 38
- 229910052698 phosphorus Inorganic materials 0.000 claims description 31
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 23
- 239000011574 phosphorus Substances 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 12
- 125000004437 phosphorous atom Chemical group 0.000 claims description 11
- 125000004432 carbon atom Chemical group C* 0.000 claims description 10
- 238000001947 vapour-phase growth Methods 0.000 claims description 5
- 239000007789 gas Substances 0.000 description 36
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 28
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 19
- 230000015572 biosynthetic process Effects 0.000 description 13
- 238000003786 synthesis reaction Methods 0.000 description 13
- 239000000463 material Substances 0.000 description 9
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 9
- 229910052799 carbon Inorganic materials 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- 239000012071 phase Substances 0.000 description 6
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 238000005498 polishing Methods 0.000 description 4
- YWWDBCBWQNCYNR-UHFFFAOYSA-N trimethylphosphine Chemical compound CP(C)C YWWDBCBWQNCYNR-UHFFFAOYSA-N 0.000 description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 3
- 229910052796 boron Inorganic materials 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- WMMGRPSGJRRNLN-UHFFFAOYSA-N 1-$l^{1}-phosphanylbutane Chemical group CCCC[P] WMMGRPSGJRRNLN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
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- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Description
11 単結晶基板の主面
20 リンドープダイヤモンドエピタキシャル薄膜付きダイヤモンド単結晶
21 リンドープダイヤモンドエピタキシャル薄膜
Claims (3)
- ダイヤモンド単結晶基板の主面上にリンドープエピタキシャル薄膜を気相成長させる方法であって、該ダイヤモンド単結晶基板の主面が{111}面を基準として0.50°以上2.75°以下のオフ角を有し、且つ気相成長の原料ガス中のリン原子が炭素原子の3%以上20%以下であることを特徴とする、リンドープダイヤモンドエピタキシャル薄膜付きダイヤモンド単結晶の製造方法。
- {111}面を基準としたオフ角を有する面を主面に持つダイヤモンド単結晶の該主面に低抵抗リンドープダイヤモンドエピタキシャル薄膜を成長した薄膜付きダイヤモンド単結晶であって、該主面が{111}面から0.50°以上2.75°以下のオフ角を有し、且つ、該低抵抗リンドープダイヤモンドエピタキシャル薄膜の抵抗率が300Ωcm以下であることを特徴とする低抵抗リンドープダイヤモンドエピタキシャル薄膜付きダイヤモンド単結晶。
- 前記低抵抗リンドープダイヤモンドエピタキシャル薄膜のリン濃度は5.0×1019cm−3以上であることを特徴とする、請求項2に記載の低抵抗リンドープダイヤモンドエピタキシャル薄膜付きダイヤモンド単結晶。
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JP2006175975A JP5028879B2 (ja) | 2006-06-27 | 2006-06-27 | 薄膜付きダイヤモンド単結晶の製造方法、及び薄膜付きダイヤモンド単結晶 |
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JP2006175975A JP5028879B2 (ja) | 2006-06-27 | 2006-06-27 | 薄膜付きダイヤモンド単結晶の製造方法、及び薄膜付きダイヤモンド単結晶 |
Publications (2)
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JP2008010438A JP2008010438A (ja) | 2008-01-17 |
JP5028879B2 true JP5028879B2 (ja) | 2012-09-19 |
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JP2006175975A Active JP5028879B2 (ja) | 2006-06-27 | 2006-06-27 | 薄膜付きダイヤモンド単結晶の製造方法、及び薄膜付きダイヤモンド単結晶 |
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Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP3051912B2 (ja) * | 1996-09-03 | 2000-06-12 | 科学技術庁無機材質研究所長 | リンドープダイヤモンドの合成法 |
JP2006096643A (ja) * | 2004-09-30 | 2006-04-13 | Sumitomo Electric Ind Ltd | ダイヤモンド基板及びその製造方法 |
JP4784915B2 (ja) * | 2005-02-03 | 2011-10-05 | 独立行政法人産業技術総合研究所 | リン原子がドープされたn型(100)面方位ダイヤモンド半導体単結晶膜及びその製造方法 |
EP2023381A4 (en) * | 2006-05-11 | 2011-11-09 | Nat Inst Of Advanced Ind Scien | METHOD FOR SELECTIVELY FORMING AN ATOMIC FLAT LEVEL ON A DIAMOND SURFACE, DIAMOND SUBSTRATE AND SEMICONDUCTOR ELEMENT THROUGH THE PROCESS |
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