JP5020597B2 - 位置決め装置、露光装置、及びデバイス製造方法 - Google Patents

位置決め装置、露光装置、及びデバイス製造方法 Download PDF

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Publication number
JP5020597B2
JP5020597B2 JP2006293154A JP2006293154A JP5020597B2 JP 5020597 B2 JP5020597 B2 JP 5020597B2 JP 2006293154 A JP2006293154 A JP 2006293154A JP 2006293154 A JP2006293154 A JP 2006293154A JP 5020597 B2 JP5020597 B2 JP 5020597B2
Authority
JP
Japan
Prior art keywords
stage
repulsive force
magnet
repulsive
thrust
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2006293154A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008112757A (ja
JP2008112757A5 (enExample
Inventor
雄吾 柴田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2006293154A priority Critical patent/JP5020597B2/ja
Priority to KR1020070104450A priority patent/KR20080038015A/ko
Priority to TW096138890A priority patent/TW200844683A/zh
Priority to US11/874,482 priority patent/US7804207B2/en
Publication of JP2008112757A publication Critical patent/JP2008112757A/ja
Publication of JP2008112757A5 publication Critical patent/JP2008112757A5/ja
Application granted granted Critical
Publication of JP5020597B2 publication Critical patent/JP5020597B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
    • H02K41/031—Synchronous motors; Motors moving step by step; Reluctance motors of the permanent magnet type
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70766—Reaction force control means, e.g. countermass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K16/00—Machines with more than one rotor or stator
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K2201/00—Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
    • H02K2201/18—Machines moving with multiple degrees of freedom
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K7/00—Arrangements for handling mechanical energy structurally associated with dynamo-electric machines, e.g. structural association with mechanical driving motors or auxiliary dynamo-electric machines
    • H02K7/10—Structural association with clutches, brakes, gears, pulleys or mechanical starters
    • H02K7/106—Structural association with clutches, brakes, gears, pulleys or mechanical starters with dynamo-electric brakes
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K7/00—Arrangements for handling mechanical energy structurally associated with dynamo-electric machines, e.g. structural association with mechanical driving motors or auxiliary dynamo-electric machines
    • H02K7/10—Structural association with clutches, brakes, gears, pulleys or mechanical starters
    • H02K7/118—Structural association with clutches, brakes, gears, pulleys or mechanical starters with starting devices
    • H02K7/1185—Structural association with clutches, brakes, gears, pulleys or mechanical starters with starting devices with a mechanical one-way direction control, i.e. with means for reversing the direction of rotation of the rotor

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Combustion & Propulsion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Linear Motors (AREA)
JP2006293154A 2006-10-27 2006-10-27 位置決め装置、露光装置、及びデバイス製造方法 Expired - Fee Related JP5020597B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006293154A JP5020597B2 (ja) 2006-10-27 2006-10-27 位置決め装置、露光装置、及びデバイス製造方法
KR1020070104450A KR20080038015A (ko) 2006-10-27 2007-10-17 위치결정장치, 노광장치, 및 디바이스 제조방법
TW096138890A TW200844683A (en) 2006-10-27 2007-10-17 Positioning apparatus, exposure apparatus, and device manufacturing method
US11/874,482 US7804207B2 (en) 2006-10-27 2007-10-18 Positioning apparatus, exposure apparatus, and device manufacturing method using repulsion force generation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006293154A JP5020597B2 (ja) 2006-10-27 2006-10-27 位置決め装置、露光装置、及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2008112757A JP2008112757A (ja) 2008-05-15
JP2008112757A5 JP2008112757A5 (enExample) 2009-12-10
JP5020597B2 true JP5020597B2 (ja) 2012-09-05

Family

ID=39329275

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006293154A Expired - Fee Related JP5020597B2 (ja) 2006-10-27 2006-10-27 位置決め装置、露光装置、及びデバイス製造方法

Country Status (4)

Country Link
US (1) US7804207B2 (enExample)
JP (1) JP5020597B2 (enExample)
KR (1) KR20080038015A (enExample)
TW (1) TW200844683A (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5020597B2 (ja) * 2006-10-27 2012-09-05 キヤノン株式会社 位置決め装置、露光装置、及びデバイス製造方法
US7932646B2 (en) * 2007-01-15 2011-04-26 Canon Kabushiki Kaisha Exposure apparatus with a stage, driving unit,and force applying unit having a separate magnetic shield
KR20130015864A (ko) * 2011-08-05 2013-02-14 삼성전기주식회사 리니어진동장치
US9298106B1 (en) * 2011-09-07 2016-03-29 Kla-Tencor Corporation Wafer stage with reciprocating wafer stage actuation control
CN104704625B (zh) * 2012-10-09 2018-03-06 皇家飞利浦有限公司 定位设备、控制设备和控制方法
CN104049472B (zh) * 2014-06-30 2016-03-30 清华大学 一种电磁弹射启动式掩模台系统

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3614181A (en) * 1970-07-02 1971-10-19 Us Air Force Magnetic bearing for combined radial and thrust loads
US4890023A (en) * 1985-02-19 1989-12-26 Hinds Walter E Linear induction motor systems
JP3363662B2 (ja) * 1994-05-19 2003-01-08 キヤノン株式会社 走査ステージ装置およびこれを用いた露光装置
JP3720593B2 (ja) * 1998-09-09 2005-11-30 キヤノン株式会社 ステージ装置、露光装置および露光方法
US6144118A (en) * 1998-09-18 2000-11-07 General Scanning, Inc. High-speed precision positioning apparatus
JP3849932B2 (ja) * 2002-08-12 2006-11-22 キヤノン株式会社 移動ステージ装置
JP2004172557A (ja) * 2002-11-22 2004-06-17 Canon Inc ステージ装置及びその制御方法
JP2007258356A (ja) * 2006-03-22 2007-10-04 Canon Inc ステージ装置
JP2008010643A (ja) * 2006-06-29 2008-01-17 Canon Inc ステージ装置
JP5020597B2 (ja) * 2006-10-27 2012-09-05 キヤノン株式会社 位置決め装置、露光装置、及びデバイス製造方法
US20080170213A1 (en) * 2007-01-12 2008-07-17 Canon Kabushiki Kaisha Stage apparatus, exposure apparatus, and device manufacturing method
US7932646B2 (en) * 2007-01-15 2011-04-26 Canon Kabushiki Kaisha Exposure apparatus with a stage, driving unit,and force applying unit having a separate magnetic shield

Also Published As

Publication number Publication date
TW200844683A (en) 2008-11-16
KR20080038015A (ko) 2008-05-02
US20080100149A1 (en) 2008-05-01
JP2008112757A (ja) 2008-05-15
US7804207B2 (en) 2010-09-28

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