JP5013864B2 - 画像形成装置に用いるターゲット媒体の光学的分断方法および画像形成装置に用いる検知器コンポーネント - Google Patents
画像形成装置に用いるターゲット媒体の光学的分断方法および画像形成装置に用いる検知器コンポーネント Download PDFInfo
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- 238000000034 method Methods 0.000 title claims description 68
- 230000003287 optical effect Effects 0.000 title claims description 42
- 238000005520 cutting process Methods 0.000 title description 5
- 239000010410 layer Substances 0.000 claims description 8
- 238000009826 distribution Methods 0.000 claims description 5
- 239000002356 single layer Substances 0.000 claims description 4
- 239000011800 void material Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 description 25
- 238000004519 manufacturing process Methods 0.000 description 23
- 230000005855 radiation Effects 0.000 description 14
- 239000013078 crystal Substances 0.000 description 8
- 238000013461 design Methods 0.000 description 8
- 238000003491 array Methods 0.000 description 6
- 238000007796 conventional method Methods 0.000 description 5
- 230000006378 damage Effects 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 239000003973 paint Substances 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000012780 transparent material Substances 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000002591 computed tomography Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000004064 recycling Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000003325 tomography Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000002594 fluoroscopy Methods 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 238000009607 mammography Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000002603 single-photon emission computed tomography Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 238000004017 vitrification Methods 0.000 description 1
- 239000012463 white pigment Substances 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
- G01T1/20—Measuring radiation intensity with scintillation detectors
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B29D11/00—Producing optical elements, e.g. lenses or prisms
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
- G01T1/20—Measuring radiation intensity with scintillation detectors
- G01T1/2002—Optical details, e.g. reflecting or diffusing layers
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- B—PERFORMING OPERATIONS; TRANSPORTING
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Description
特許番号 発明者 登録日
3,936,645 A.H.Iverson 1976年2月3日
4,749,863 M.E.Casey 1988年6月7日
4,914,301 Y.Akai 1990年4月3日
4,982,096 H.Fujii他 1991年1月1日
5,059,800 M.K.Cueman他 1991年10月22日
5,453,623 W.H.Wong他 1995年9月26日
6,292,529 S.Marcovici他 2001年9月18日
特許番号 発明者 登録日
5,637,244 A.I.Erokhin 1997年6月10日
5,786,560 A.Tatah他 1998年7月28日
5,886,318 A.V.Vasiliev他 1999年3月23日
6,399,914 I.Troitski 2002年6月4日
6,417,485 I.Troitski 2002年7月9日
6,426,480 I.Troitski 2002年7月30日
6,727,460 I.Troitski 2004年4月27日
Claims (18)
- 画像形成装置に用いるターゲット媒体を光学的に分断する方法であって、
a)ターゲット媒体内の選択された場所に、光を制御するボイドを形成し、
b)光を制御するボイドを形成する前記ステップを反復して、光を制御する複数のボイドを形成するステップより成り、
光を制御する複数のボイドは協働して少なくとも1つの光学的境界を画定し、少なくとも1つの光学的境界はターゲット媒体を分断し、少なくとも1つの光学的境界は光の制御及び分配を支援することを特徴とする画像形成装置に用いるターゲット媒体の光学的分断方法。 - 光を制御するボイドを形成するステップa)は、
i)選択された波長のレーザービームをターゲット媒体内の選択された場所の焦点に集束し、
ii)焦点にあるターゲット媒体の光学的特性を変化させるステップを含み、
ボイド形成ステップを反復するステップb)は、
iii)レーザービームをターゲット媒体内の別の焦点に移動し、
iv)レーザービームの移動によりレーザービームの集束ステップを反復して光を制御する複数のボイドを形成するステップを含む請求項1の方法。 - ターゲット媒体はシンチレータであり、光はシンチレーション光であり、少なくとも1つの光学的境界は少なくとも1つの仮想解像要素を形成する少なくとも1つの光分断部分を画定する請求項1の方法。
- ターゲット媒体は光透過性部材であり、少なくとも1つの光学的境界は光透過性部材内に光ガイドを画定する請求項1の方法。
- 少なくとも1つの光学的境界は、協働して複数の光分断部分を画定する複数の光学的境界を含む請求項1の方法。
- 複数の光分断部分は直線状である請求項5の方法。
- 複数の光分断部分は非直線状である請求項5の方法。
- 複数の光分断部分は曲面状である請求項5の方法。
- 少なくとも1つの光学的境界は、光を制御する複数のボイドの単一層により画定される請求項1の方法。
- 少なくとも1つの光学的境界は、光を制御する複数のボイドの複数の層により画定される請求項1の方法。
- 光を制御する複数のボイドのサイズはそれぞれ別個に選択可能である請求項1の方法。
- 少なくとも1つの光学的境界はターゲット媒体の所与の体積部内にランダムに位置する複数のボイドにより画定される請求項1の方法。
- 画像形成装置に用いる検知器コンポーネントであって、
シンチレータと、
シンチレータ内に形成されてシンチレータを分断する少なくとも1つの光学的境界を画定し、シンチレーション光を制御する複数のボイドとより成り、
シンチレーション光を制御する複数のボイドはそれぞれ選択された波長のレーザービームをシンチレータ内の焦点に集束することにより形成され、
少なくとも1つの光学的境界はシンチレータ内に少なくとも1つの仮想解像要素を画定することを特徴とする画像形成装置に用いる検知器コンポーネント。 - 複数の光分断部分は直線状である請求項13の検知器コンポーネント。
- 複数の光分断部分は非直線状である請求項13の検知器コンポーネント。
- 画像形成装置に用いる検知器コンポーネントであって、
光透過性部材と、
光透過性部材内に形成されて光透過性部材を分断する少なくとも1つの光学的境界を画定し、シンチレーション光を制御する複数のボイドとより成り、
シンチレーション光を制御する複数のボイドはそれぞれ選択された波長のレーザービームを光透過性部材内の焦点に集束することにより形成され、
少なくとも1つの光学的境界は光透過性部材シンチレータ内に少なくとも1つの仮想解像要素を画定することを特徴とする画像形成装置に用いる検知器コンポーネント。 - 複数の光分断部分は直線状である請求項16の検知器コンポーネント。
- 複数の光分断部分は非直線状である請求項16の検知器コンポーネント。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US47443003P | 2003-05-30 | 2003-05-30 | |
US60/474,430 | 2003-05-30 | ||
PCT/US2004/017033 WO2004109870A2 (en) | 2003-05-30 | 2004-05-28 | Method for fabrication of a detector component using laser technology |
Publications (2)
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JP2007525652A JP2007525652A (ja) | 2007-09-06 |
JP5013864B2 true JP5013864B2 (ja) | 2012-08-29 |
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JP2006515021A Expired - Lifetime JP5013864B2 (ja) | 2003-05-30 | 2004-05-28 | 画像形成装置に用いるターゲット媒体の光学的分断方法および画像形成装置に用いる検知器コンポーネント |
Country Status (6)
Country | Link |
---|---|
US (1) | US8470214B2 (ja) |
EP (1) | EP1654111B1 (ja) |
JP (1) | JP5013864B2 (ja) |
ES (1) | ES2784538T3 (ja) |
HU (1) | HUE048623T2 (ja) |
WO (1) | WO2004109870A2 (ja) |
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US9804277B2 (en) | 2015-01-30 | 2017-10-31 | Hamamatsu Photonics K.K. | Radiation detector |
US10094937B2 (en) | 2015-01-30 | 2018-10-09 | Hamamatsu Photonics K.K. | Radiation detector |
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- 2004-05-28 HU HUE04753788A patent/HUE048623T2/hu unknown
- 2004-05-28 ES ES04753788T patent/ES2784538T3/es not_active Expired - Lifetime
- 2004-05-28 JP JP2006515021A patent/JP5013864B2/ja not_active Expired - Lifetime
- 2004-05-28 EP EP04753788.1A patent/EP1654111B1/en not_active Expired - Lifetime
- 2004-05-28 WO PCT/US2004/017033 patent/WO2004109870A2/en active Application Filing
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US9753149B2 (en) | 2015-01-30 | 2017-09-05 | Hamamatsu Photonics K.K. | Radiation detector |
US9804277B2 (en) | 2015-01-30 | 2017-10-31 | Hamamatsu Photonics K.K. | Radiation detector |
US10094937B2 (en) | 2015-01-30 | 2018-10-09 | Hamamatsu Photonics K.K. | Radiation detector |
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EP1654111A4 (en) | 2016-09-07 |
ES2784538T3 (es) | 2020-09-28 |
US20040262526A1 (en) | 2004-12-30 |
WO2004109870A3 (en) | 2005-12-22 |
US8470214B2 (en) | 2013-06-25 |
JP2007525652A (ja) | 2007-09-06 |
EP1654111B1 (en) | 2020-02-12 |
HUE048623T2 (hu) | 2020-08-28 |
WO2004109870A2 (en) | 2004-12-16 |
EP1654111A2 (en) | 2006-05-10 |
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