JP5006040B2 - 異なる検査パラメータを使用する試験片の検査のための方法とシステム - Google Patents

異なる検査パラメータを使用する試験片の検査のための方法とシステム Download PDF

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Publication number
JP5006040B2
JP5006040B2 JP2006525531A JP2006525531A JP5006040B2 JP 5006040 B2 JP5006040 B2 JP 5006040B2 JP 2006525531 A JP2006525531 A JP 2006525531A JP 2006525531 A JP2006525531 A JP 2006525531A JP 5006040 B2 JP5006040 B2 JP 5006040B2
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light
wavelength
illumination
specimen
subsystem
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JP2007511739A5 (enExample
JP2007511739A (ja
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ランゲ，スティーブ・アール
マレラ，ポール・フランク
セグリオ，ナット
フアン，シオウ−フウェイ
フ，タオ−イ
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KLA Corp
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features

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  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2006525531A 2003-09-04 2004-09-03 異なる検査パラメータを使用する試験片の検査のための方法とシステム Expired - Lifetime JP5006040B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US50017403P 2003-09-04 2003-09-04
US60/500,174 2003-09-04
PCT/US2004/029189 WO2005024404A1 (en) 2003-09-04 2004-09-03 Methods and systems for inspection of a specimen using different inspection parameters
US10/933,873 2004-09-03
US10/933,873 US7738089B2 (en) 2003-09-04 2004-09-03 Methods and systems for inspection of a specimen using different inspection parameters

Related Child Applications (1)

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JP2011132931A Division JP5529806B2 (ja) 2003-09-04 2011-06-15 異なる検査パラメータを使用する試験片の検査のための方法とシステム

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JP2007511739A JP2007511739A (ja) 2007-05-10
JP2007511739A5 JP2007511739A5 (enExample) 2007-12-06
JP5006040B2 true JP5006040B2 (ja) 2012-08-22

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JP2006525531A Expired - Lifetime JP5006040B2 (ja) 2003-09-04 2004-09-03 異なる検査パラメータを使用する試験片の検査のための方法とシステム
JP2011132931A Expired - Lifetime JP5529806B2 (ja) 2003-09-04 2011-06-15 異なる検査パラメータを使用する試験片の検査のための方法とシステム

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US (2) US7738089B2 (enExample)
EP (2) EP1697729B1 (enExample)
JP (2) JP5006040B2 (enExample)
WO (1) WO2005024404A1 (enExample)

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Also Published As

Publication number Publication date
WO2005024404A1 (en) 2005-03-17
US7738089B2 (en) 2010-06-15
WO2005024404B1 (en) 2005-05-19
EP2256487B1 (en) 2019-11-06
EP1697729A1 (en) 2006-09-06
US20100238433A1 (en) 2010-09-23
EP1697729B1 (en) 2010-11-10
EP2256487A2 (en) 2010-12-01
US8384887B2 (en) 2013-02-26
US20050052643A1 (en) 2005-03-10
JP5529806B2 (ja) 2014-06-25
JP2011257405A (ja) 2011-12-22
EP2256487A3 (en) 2017-03-15
JP2007511739A (ja) 2007-05-10

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