JP5001541B2 - 半導体リソグラフィー用共重合体及び組成物 - Google Patents

半導体リソグラフィー用共重合体及び組成物 Download PDF

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Publication number
JP5001541B2
JP5001541B2 JP2005266620A JP2005266620A JP5001541B2 JP 5001541 B2 JP5001541 B2 JP 5001541B2 JP 2005266620 A JP2005266620 A JP 2005266620A JP 2005266620 A JP2005266620 A JP 2005266620A JP 5001541 B2 JP5001541 B2 JP 5001541B2
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group
formula
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carbon atoms
hydrogen atom
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JP2007077261A (ja
JP2007077261A5 (enExample
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孝則 山岸
由貴子 羽根
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Maruzen Petrochemical Co Ltd
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Maruzen Petrochemical Co Ltd
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JP2005266620A 2005-09-14 2005-09-14 半導体リソグラフィー用共重合体及び組成物 Expired - Lifetime JP5001541B2 (ja)

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JP2005266620A JP5001541B2 (ja) 2005-09-14 2005-09-14 半導体リソグラフィー用共重合体及び組成物

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JP2005266620A JP5001541B2 (ja) 2005-09-14 2005-09-14 半導体リソグラフィー用共重合体及び組成物

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JP2007077261A JP2007077261A (ja) 2007-03-29
JP2007077261A5 JP2007077261A5 (enExample) 2008-09-18
JP5001541B2 true JP5001541B2 (ja) 2012-08-15

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Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4808574B2 (ja) * 2006-05-25 2011-11-02 東京応化工業株式会社 ポジ型レジスト組成物、レジストパターン形成方法および樹脂
JP4762821B2 (ja) * 2006-08-02 2011-08-31 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法
JP4911456B2 (ja) * 2006-11-21 2012-04-04 富士フイルム株式会社 ポジ型感光性組成物、該ポジ型感光性組成物に用いられる高分子化合物、該高分子化合物の製造方法及びポジ型感光性組成物を用いたパターン形成方法
JP5150109B2 (ja) * 2007-02-21 2013-02-20 富士フイルム株式会社 ポジ型レジスト組成物、樹脂および重合性化合物、それを用いたパターン形成方法
JP4951395B2 (ja) * 2007-04-19 2012-06-13 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法
JP5250291B2 (ja) * 2008-01-15 2013-07-31 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法
TWI462938B (zh) * 2008-05-21 2014-12-01 Sumitomo Chemical Co 聚合物及含有該聚合物之化學放大型阻劑組成物
JP5401086B2 (ja) 2008-10-07 2014-01-29 東京応化工業株式会社 液浸露光用レジスト組成物、レジストパターン形成方法および含フッ素樹脂
JP5750272B2 (ja) 2010-02-18 2015-07-15 東京応化工業株式会社 レジストパターン形成方法
JP5387601B2 (ja) * 2010-03-24 2014-01-15 信越化学工業株式会社 アセタール化合物、高分子化合物、レジスト材料及びパターン形成方法
JP5820719B2 (ja) 2011-12-21 2015-11-24 東京応化工業株式会社 レジストパターン形成方法
JP5802785B2 (ja) * 2014-03-24 2015-11-04 富士フイルム株式会社 パターン形成方法及びレジスト組成物
KR102658620B1 (ko) 2020-02-27 2024-04-18 후지필름 가부시키가이샤 감활성광선성 또는 감방사선성 수지 조성물의 제조 방법, 패턴 형성 방법, 및 전자 디바이스의 제조 방법

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3547047B2 (ja) * 1999-05-26 2004-07-28 富士写真フイルム株式会社 遠紫外線露光用ポジ型フォトレジスト組成物
JP2003330195A (ja) * 2002-03-06 2003-11-19 Fuji Photo Film Co Ltd ポジ型レジスト組成物
JP2004069981A (ja) * 2002-08-06 2004-03-04 Fuji Photo Film Co Ltd ポジ型レジスト組成物
JP4289121B2 (ja) * 2002-10-30 2009-07-01 住友化学株式会社 化学増幅型ポジ型レジスト組成物
JP4079799B2 (ja) * 2003-02-24 2008-04-23 セントラル硝子株式会社 含フッ素化合物の製法
JP4213107B2 (ja) * 2004-10-07 2009-01-21 東京応化工業株式会社 レジスト組成物およびレジストパターン形成方法

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