JP4994894B2 - 樹脂発泡体およびそれからなる研磨パッド - Google Patents

樹脂発泡体およびそれからなる研磨パッド Download PDF

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Publication number
JP4994894B2
JP4994894B2 JP2007059909A JP2007059909A JP4994894B2 JP 4994894 B2 JP4994894 B2 JP 4994894B2 JP 2007059909 A JP2007059909 A JP 2007059909A JP 2007059909 A JP2007059909 A JP 2007059909A JP 4994894 B2 JP4994894 B2 JP 4994894B2
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Japan
Prior art keywords
resin foam
thermoplastic polyurethane
temperature
mass
polishing pad
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Expired - Fee Related
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JP2007059909A
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English (en)
Japanese (ja)
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JP2008222769A5 (enExample
JP2008222769A (ja
Inventor
博文 菊池
俊二 金田
知大 岡本
晋哉 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kuraray Co Ltd
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Kuraray Co Ltd
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Publication date
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Priority to JP2007059909A priority Critical patent/JP4994894B2/ja
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Publication of JP2008222769A5 publication Critical patent/JP2008222769A5/ja
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Publication of JP4994894B2 publication Critical patent/JP4994894B2/ja
Expired - Fee Related legal-status Critical Current
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  • Polyurethanes Or Polyureas (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
JP2007059909A 2007-03-09 2007-03-09 樹脂発泡体およびそれからなる研磨パッド Expired - Fee Related JP4994894B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007059909A JP4994894B2 (ja) 2007-03-09 2007-03-09 樹脂発泡体およびそれからなる研磨パッド

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007059909A JP4994894B2 (ja) 2007-03-09 2007-03-09 樹脂発泡体およびそれからなる研磨パッド

Publications (3)

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JP2008222769A JP2008222769A (ja) 2008-09-25
JP2008222769A5 JP2008222769A5 (enExample) 2009-11-05
JP4994894B2 true JP4994894B2 (ja) 2012-08-08

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JP2007059909A Expired - Fee Related JP4994894B2 (ja) 2007-03-09 2007-03-09 樹脂発泡体およびそれからなる研磨パッド

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JP (1) JP4994894B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5393434B2 (ja) 2008-12-26 2014-01-22 東洋ゴム工業株式会社 研磨パッド及びその製造方法
KR101352235B1 (ko) * 2009-05-27 2014-01-15 로저스코포레이션 연마 패드, 이를 위한 폴리우레탄층, 및 규소 웨이퍼의 연마 방법
JP6303482B2 (ja) * 2013-12-20 2018-04-04 Dic株式会社 ウレタン組成物、硬化物、及び、研磨材
US10106662B2 (en) * 2016-08-04 2018-10-23 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Thermoplastic poromeric polishing pad
KR20190086719A (ko) * 2016-11-14 2019-07-23 바스프 에스이 팽창된 열가소성 폴리우레탄 비드, 그의 제조 방법 및 성형품의 제조 방법
JP7097171B2 (ja) * 2017-11-20 2022-07-07 株式会社クラレ 研磨パッド
WO2021094530A1 (de) * 2019-11-13 2021-05-20 Basf Se Komfort etpu

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3649385B2 (ja) * 2000-01-12 2005-05-18 東洋ゴム工業株式会社 熱可塑性エラストマー微孔質発泡体、その製造方法および研磨シート
JP2003145414A (ja) * 2001-11-13 2003-05-20 Toyobo Co Ltd 研磨パッド及びその製造方法
JP3983610B2 (ja) * 2002-07-02 2007-09-26 株式会社クラレ 熱可塑性ポリウレタン発泡体およびそれからなる研磨パッド
JP4474208B2 (ja) * 2004-06-10 2010-06-02 株式会社クラレ 樹脂発泡体およびそれからなる研磨パッド

Also Published As

Publication number Publication date
JP2008222769A (ja) 2008-09-25

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