JP4992234B2 - 積層圧電セラミック素子及びその製造方法 - Google Patents

積層圧電セラミック素子及びその製造方法 Download PDF

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JP4992234B2
JP4992234B2 JP2005349292A JP2005349292A JP4992234B2 JP 4992234 B2 JP4992234 B2 JP 4992234B2 JP 2005349292 A JP2005349292 A JP 2005349292A JP 2005349292 A JP2005349292 A JP 2005349292A JP 4992234 B2 JP4992234 B2 JP 4992234B2
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piezoelectric ceramic
temperature
ceramic element
firing
tetragonal
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JP2007157910A (ja
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弘貴 久保田
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Denso Corp
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Denso Corp
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    • C01—INORGANIC CHEMISTRY
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    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/48—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates
    • C04B35/49—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates containing also titanium oxides or titanates
    • C04B35/491—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates containing also titanium oxides or titanates based on lead zirconates and lead titanates, e.g. PZT
    • C04B35/493—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates containing also titanium oxides or titanates based on lead zirconates and lead titanates, e.g. PZT containing also other lead compounds
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    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
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    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/01—Manufacture or treatment
    • H10N30/05—Manufacture of multilayered piezoelectric or electrostrictive devices, or parts thereof, e.g. by stacking piezoelectric bodies and electrodes
    • H10N30/053—Manufacture of multilayered piezoelectric or electrostrictive devices, or parts thereof, e.g. by stacking piezoelectric bodies and electrodes by integrally sintering piezoelectric or electrostrictive bodies and electrodes
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    • H10N30/00—Piezoelectric or electrostrictive devices
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    • H10N30/09—Forming piezoelectric or electrostrictive materials
    • H10N30/093—Forming inorganic materials
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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Composite Materials (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Compositions Of Oxide Ceramics (AREA)
JP2005349292A 2005-12-02 2005-12-02 積層圧電セラミック素子及びその製造方法 Expired - Fee Related JP4992234B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005349292A JP4992234B2 (ja) 2005-12-02 2005-12-02 積層圧電セラミック素子及びその製造方法
DE200610056808 DE102006056808B4 (de) 2005-12-02 2006-12-01 Piezoelektrische Keramik, geschichtetes piezoelektrisches Keramikelement, Verfahren zum Herstellen dieses Elements und Einspritzvorrichtung mit dem Element

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JP2005349292A JP4992234B2 (ja) 2005-12-02 2005-12-02 積層圧電セラミック素子及びその製造方法

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JP2007157910A JP2007157910A (ja) 2007-06-21
JP4992234B2 true JP4992234B2 (ja) 2012-08-08

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011181764A (ja) * 2010-03-02 2011-09-15 Tdk Corp 圧電体素子及びその製造方法
JP2014072329A (ja) * 2012-09-28 2014-04-21 Taiheiyo Cement Corp 圧電素子の製造方法
JP6193725B2 (ja) * 2013-10-30 2017-09-06 京セラ株式会社 圧電セラミック基体、およびそれを用いた圧電アクチュエータ基板、液体吐出ヘッドならびに記録装置
CN111344876B (zh) * 2017-11-13 2023-10-17 日商爱伯压电对策股份有限公司 膜结构体及其制造方法
JP7167626B2 (ja) * 2018-03-09 2022-11-09 株式会社リコー アクチュエータ、液体吐出ヘッド、液体吐出ユニット及び液体を吐出する装置

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60123079A (ja) * 1983-12-06 1985-07-01 Nippon Soken Inc セラミック圧電材料
JP2841911B2 (ja) * 1991-03-25 1998-12-24 三菱マテリアル株式会社 Ｐｚｔ系セラミックス組成物
JPH08268756A (ja) * 1995-03-30 1996-10-15 Toyota Central Res & Dev Lab Inc 強誘電性セラミックスの製造方法
JP3791614B2 (ja) * 2002-10-24 2006-06-28 セイコーエプソン株式会社 強誘電体膜、強誘電体メモリ装置、圧電素子、半導体素子、圧電アクチュエータ、液体噴射ヘッド及びプリンタ
JP4822664B2 (ja) * 2003-12-24 2011-11-24 京セラ株式会社 積層型圧電素子およびその製法、並びに噴射装置
JP2005056940A (ja) * 2003-08-07 2005-03-03 Tdk Corp 電子デバイス用基板、電子デバイスおよびそれらの製造方法
JP4535721B2 (ja) * 2003-11-26 2010-09-01 京セラ株式会社 圧電磁器および積層型圧電素子並びに噴射装置

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DE102006056808A1 (de) 2007-06-06
DE102006056808B4 (de) 2010-01-28

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