JP4986391B2 - 表示装置の作製方法 - Google Patents
表示装置の作製方法 Download PDFInfo
- Publication number
- JP4986391B2 JP4986391B2 JP2004312433A JP2004312433A JP4986391B2 JP 4986391 B2 JP4986391 B2 JP 4986391B2 JP 2004312433 A JP2004312433 A JP 2004312433A JP 2004312433 A JP2004312433 A JP 2004312433A JP 4986391 B2 JP4986391 B2 JP 4986391B2
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- Prior art keywords
- layer
- gate electrode
- substrate
- tft
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Thin Film Transistor (AREA)
- Liquid Crystal (AREA)
- Electroluminescent Light Sources (AREA)
- Electrodes Of Semiconductors (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004312433A JP4986391B2 (ja) | 2003-10-28 | 2004-10-27 | 表示装置の作製方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003368160 | 2003-10-28 | ||
| JP2003368160 | 2003-10-28 | ||
| JP2004312433A JP4986391B2 (ja) | 2003-10-28 | 2004-10-27 | 表示装置の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005157323A JP2005157323A (ja) | 2005-06-16 |
| JP2005157323A5 JP2005157323A5 (enExample) | 2007-12-13 |
| JP4986391B2 true JP4986391B2 (ja) | 2012-07-25 |
Family
ID=34741102
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004312433A Expired - Fee Related JP4986391B2 (ja) | 2003-10-28 | 2004-10-27 | 表示装置の作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4986391B2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8900970B2 (en) * | 2006-04-28 | 2014-12-02 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing a semiconductor device using a flexible substrate |
| JP5616038B2 (ja) * | 2008-07-31 | 2014-10-29 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| US8603841B2 (en) * | 2010-08-27 | 2013-12-10 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing methods of semiconductor device and light-emitting display device |
| WO2015037686A1 (en) | 2013-09-13 | 2015-03-19 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| US10763249B2 (en) * | 2018-05-31 | 2020-09-01 | Sharp Kabushiki Kaisha | Image display device |
| CN114924436B (zh) * | 2022-05-17 | 2023-12-12 | 武汉华星光电技术有限公司 | 阵列基板及液晶显示面板 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003080694A (ja) * | 2001-06-26 | 2003-03-19 | Seiko Epson Corp | 膜パターンの形成方法、膜パターン形成装置、導電膜配線、電気光学装置、電子機器、並びに非接触型カード媒体 |
| JP3980312B2 (ja) * | 2001-09-26 | 2007-09-26 | 株式会社日立製作所 | 液晶表示装置およびその製造方法 |
-
2004
- 2004-10-27 JP JP2004312433A patent/JP4986391B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005157323A (ja) | 2005-06-16 |
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