JP4986137B2 - ナノ構造体を有する光学素子用又はナノ構造体用成形型の製造方法 - Google Patents
ナノ構造体を有する光学素子用又はナノ構造体用成形型の製造方法 Download PDFInfo
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
- B29C45/17—Component parts, details or accessories; Auxiliary operations
- B29C45/26—Moulds
- B29C45/263—Moulds with mould wall parts provided with fine grooves or impressions, e.g. for record discs
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C99/00—Subject matter not provided for in other groups of this subclass
- B81C99/0075—Manufacture of substrate-free structures
- B81C99/009—Manufacturing the stamps or the moulds
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2011/00—Optical elements, e.g. lenses, prisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/03—Processes for manufacturing substrate-free structures
- B81C2201/034—Moulding
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2204/00—Glasses, glazes or enamels with special properties
- C03C2204/08—Glass having a rough surface
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/42—Coatings comprising at least one inhomogeneous layer consisting of particles only
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/34—Masking
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/355—Temporary coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mechanical Engineering (AREA)
- Dispersion Chemistry (AREA)
- Composite Materials (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
Description
(1)本発明に係るナノ構造体を有する光学素子用又はナノ構造体用成形型は、大面積で且つ複雑な形状の構造体から成るナノ構造体を基板表面に、均一に安定してナノ構造体を有し、バイオや医療分野の蛍光分析、偏光分析などに用いる光学素子において、より検出感度を向上させることができるものである。
(2)本発明に係る光学素子用成形型若しくはナノ構造体の製造方法は、少ない行程で、且つ生産性の高いドライプロセスのみで製造することができる方法である。
(3)本発明に係る光学素子は、基板表面に微細な凹凸面のナノ構造を有し、ランダムに配置されて成る高アスペクト比のナノパターンを備え、好ましくは、このナノパターンは、光源の波長以下の間隔を保たれている構成であるナノパターンを備えた光学素子である。
(1)本発明に係る光学素子用成形型は、大面積で且つ複雑な自由曲面を持つ基板表面に、均一に安定してナノ構造体を有し、より安価に大面積の、バイオや医療に用いる高感度センサーチップを製造することができる。
(2)本発明に係るナノ構造体を有する光学素子用又はナノ構造体用成形型の製造方法は、少ない行程で、且つ生産性の高いドライプロセスのみで製造することができる。
(3)本発明に係る光学素子は、基板表面に微細な凹凸面のナノ構造を有し、ランダムに配置されて成る高アスペクト比のナノパターンを備え、好ましくは、このナノパターンは、光源の波長以下の間隔を保たれている構成であるナノパターンを備えた光学素子である。
(1)基板上への薄膜の形成工程
基板上に複数のエッチング転写層を形成し、さらに、一括に薄膜を形成する。これらの形成工程は、真空ドライプロセスで行う。
熱反応、光反応、ガス反応のいずれか、またはこれらの反応を2以上組み合わせた複合反応を用いて、上記薄膜に、薄膜物質の凝集作用、分解作用、または核形成を生じさせて、ナノメータオーダの微細な半球状の島状微粒子が、対象とする光源の波長以下の間隔でランダムに存在するナノパターンを形成する。
次に、図5に示す模式図を用いて、上記説明したナノ構造体を有する光学素子用成形型1から射出成形用型の製造方法を説明するとともに、この射出成型用型を用いるナノ構造体を有する光学素子の量産方法の一例を説明する。
2 基板
3 エッチング転写層
4 島状微粒子作製の為の薄膜
5 島状微粒子
6 ナノ構造体を有する光学素子用成形型
7 基板
8 射出成形型
9 ナノ構造体を有する光学素子
10 射出成形型
11 ナノ構造体を有する光学素子
Claims (6)
- 基板表面に微細な凹凸面のナノ構造を有する光学素子又はナノ構造体を成形するための、光学素子用又はナノ構造体用成形型の製造方法であって、
基板上に1層以上のエッチング転写層を形成し、該エッチング転写層上に島状微粒子生成用の薄膜を形成し、
前記薄膜に、熱反応、光反応、化学反応のいずれか、またはそれらの複合反応を用いて、薄膜物質の凝集作用、分解作用、または核形成作用を生じさせて、島状微粒子を複数、形成し、
前記複数の島状微粒子を保護マスクとしてエッチング転写層及び前記基板を順次エッチングして、基板表面に微細な凹凸のナノパターンを形成することを特徴とするナノ構造体を有する光学素子用又はナノ構造体用成形型の製造方法。 - 前記複数の島状微粒子は半球状であり、それぞれの大きさはナノメータオーダであって、互いに対象とする光源の波長以下の間隔を保ちながら、ランダムに配置されて成るナノパターンを形成する事を特徴とする請求項1記載のナノ構造体を有する光学素子用又はナノ構造体用成形型の製造方法。
- 前記薄膜の材料は、銀、金、白金、若しくはパラジウムを主成分とする物質、又は、銀、金、白金、パラジウム、タングステン、ビスマス、テルルのいずれかの成分を主成分とする酸化物若しく窒化物であることを特徴とする請求項1又は2記載のナノ構造体を有する光学素子用又はナノ構造体用成形型の製造方法。
- 前記島状微粒子は、その平均粒径は5nm〜1000nmであり、複数の島状微粒子の平均間隔は、10nm〜2000nmであることを特徴とする請求項1〜3のいずれか1項に記載のナノ構造体を有する光学素子用又はナノ構造体用成形型の製造方法。
- 前記基板は、石英ガラス、樹脂、シリコン、窒化ガリウム、砒化ガリウム、インジウム燐、ニッケル、鉄、チタン、炭素、サファイヤ、又は窒化カーボンを主成分とする金属または非金属であることを特徴とする請求項1〜4のいずれか1項に記載のナノ構造体を有する光学素子用又はナノ構造体用成形型の製造方法。
- 前記エッチング転写層は、酸化物、窒化物若しくは炭化物の1層、又は酸化物、窒化物及び炭化物のいずれかから成る多層で構成される事を特徴とする請求項1〜5のいずれか1項に記載のナノ構造体を有する光学素子用又はナノ構造体用成形型の製造方法。
Priority Applications (3)
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JP2007109956A JP4986137B2 (ja) | 2006-12-13 | 2007-04-19 | ナノ構造体を有する光学素子用又はナノ構造体用成形型の製造方法 |
PCT/JP2007/073321 WO2008072498A1 (ja) | 2006-12-13 | 2007-12-03 | ナノ構造体を有する光学素子用成形型、ナノ構造体用成形型、その製造方法および光学素子 |
US12/519,052 US20100075114A1 (en) | 2006-12-13 | 2007-12-03 | Mold for optical element, having nanostructure, mold for nanostructure, method for manufacturing the mold, and optical element |
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JP2007109956A JP4986137B2 (ja) | 2006-12-13 | 2007-04-19 | ナノ構造体を有する光学素子用又はナノ構造体用成形型の製造方法 |
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CN102753651B (zh) | 2010-02-25 | 2014-09-10 | 旭化成电子材料株式会社 | 氧化铜用蚀刻液以及使用其的蚀刻方法 |
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KR101215299B1 (ko) * | 2010-12-30 | 2012-12-26 | 포항공과대학교 산학협력단 | 나노 임프린트 몰드 제조방법, 이 방법에 의해 제조된 나노 임프린트 몰드를 이용한 발광다이오드 제조방법 및 이 방법에 의해 제조된 발광다이오드 |
KR20140003591A (ko) | 2011-06-30 | 2014-01-09 | 아사히 가세이 이-매터리얼즈 가부시키가이샤 | 에칭액 및 그것을 이용한 에칭 방법 |
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JP2014145868A (ja) | 2013-01-29 | 2014-08-14 | Ricoh Co Ltd | 光学素子、モールド、光学装置 |
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JP6383976B2 (ja) * | 2014-05-30 | 2018-09-05 | Agc株式会社 | 反射防止構造体およびその製造方法 |
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JP2006251543A (ja) * | 2005-03-11 | 2006-09-21 | Olympus Corp | フレーム一体型光学部品、及びフレーム一体型光学部品の製造方法 |
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US20100075114A1 (en) | 2010-03-25 |
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