JP4939742B2 - 光学フィルムの作製方法 - Google Patents

光学フィルムの作製方法 Download PDF

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Publication number
JP4939742B2
JP4939742B2 JP2004312667A JP2004312667A JP4939742B2 JP 4939742 B2 JP4939742 B2 JP 4939742B2 JP 2004312667 A JP2004312667 A JP 2004312667A JP 2004312667 A JP2004312667 A JP 2004312667A JP 4939742 B2 JP4939742 B2 JP 4939742B2
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Prior art keywords
substrate
layer
light
oxide layer
color filter
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Expired - Fee Related
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JP2004312667A
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Japanese (ja)
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JP2005157324A (ja
JP2005157324A5 (enExample
Inventor
晃央 山下
由美子 福本
裕吾 後藤
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Priority to JP2004312667A priority Critical patent/JP4939742B2/ja
Publication of JP2005157324A publication Critical patent/JP2005157324A/ja
Publication of JP2005157324A5 publication Critical patent/JP2005157324A5/ja
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Publication of JP4939742B2 publication Critical patent/JP4939742B2/ja
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  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Optical Filters (AREA)
  • Polarising Elements (AREA)
JP2004312667A 2003-10-28 2004-10-27 光学フィルムの作製方法 Expired - Fee Related JP4939742B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004312667A JP4939742B2 (ja) 2003-10-28 2004-10-27 光学フィルムの作製方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003367326 2003-10-28
JP2003367326 2003-10-28
JP2004312667A JP4939742B2 (ja) 2003-10-28 2004-10-27 光学フィルムの作製方法

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JP2005157324A JP2005157324A (ja) 2005-06-16
JP2005157324A5 JP2005157324A5 (enExample) 2007-12-13
JP4939742B2 true JP4939742B2 (ja) 2012-05-30

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JP2004312667A Expired - Fee Related JP4939742B2 (ja) 2003-10-28 2004-10-27 光学フィルムの作製方法

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Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005331796A (ja) * 2004-05-21 2005-12-02 Toppan Printing Co Ltd カラーフィルタ及びカラーディスプレイ装置
JP2007298602A (ja) * 2006-04-28 2007-11-15 Toppan Printing Co Ltd 構造体、透過型液晶表示装置、半導体回路の製造方法および透過型液晶表示装置の製造方法
JP5312728B2 (ja) * 2006-04-28 2013-10-09 凸版印刷株式会社 表示装置およびその製造方法
US7759629B2 (en) * 2007-03-20 2010-07-20 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing a semiconductor device
KR102112799B1 (ko) 2008-07-10 2020-05-19 가부시키가이샤 한도오따이 에네루기 켄큐쇼 발광장치 및 전자기기
TW201511112A (zh) 2013-07-16 2015-03-16 Sony Corp 基板之製造方法及電子器件之製造方法
JP2015195140A (ja) * 2014-03-31 2015-11-05 株式会社東芝 フレキシブル有機el表示装置の製造方法
US11183674B2 (en) 2018-02-27 2021-11-23 Sakai Display Products Corporation Method for manufacturing flexible OLED device and support substrate

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3809712B2 (ja) * 1996-08-27 2006-08-16 セイコーエプソン株式会社 薄膜デバイスの転写方法
JPH10150007A (ja) * 1996-11-18 1998-06-02 Toyo Chem Co Ltd 半導体ウエハ固定用シート
JPH11243209A (ja) * 1998-02-25 1999-09-07 Seiko Epson Corp 薄膜デバイスの転写方法、薄膜デバイス、薄膜集積回路装置、アクティブマトリクス基板、液晶表示装置および電子機器
JP3974749B2 (ja) * 2000-12-15 2007-09-12 シャープ株式会社 機能素子の転写方法
JP4027740B2 (ja) * 2001-07-16 2007-12-26 株式会社半導体エネルギー研究所 半導体装置の作製方法
US6888305B2 (en) * 2001-11-06 2005-05-03 Universal Display Corporation Encapsulation structure that acts as a multilayer mirror

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JP2005157324A (ja) 2005-06-16

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