JP4883299B2 - 有機溶媒溶解性染料を含有するレジスト組成物及びそれを用いるカラーフィルター - Google Patents

有機溶媒溶解性染料を含有するレジスト組成物及びそれを用いるカラーフィルター Download PDF

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Publication number
JP4883299B2
JP4883299B2 JP2006540956A JP2006540956A JP4883299B2 JP 4883299 B2 JP4883299 B2 JP 4883299B2 JP 2006540956 A JP2006540956 A JP 2006540956A JP 2006540956 A JP2006540956 A JP 2006540956A JP 4883299 B2 JP4883299 B2 JP 4883299B2
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JP
Japan
Prior art keywords
dye
resist composition
compounds
group
compound
Prior art date
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Expired - Fee Related
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JP2006540956A
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English (en)
Japanese (ja)
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JPWO2006041106A1 (ja
Inventor
和義 保坂
真理子 山田
誠亮 前田
正睦 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Chemical Corp
Original Assignee
Nissan Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Priority to JP2006540956A priority Critical patent/JP4883299B2/ja
Publication of JPWO2006041106A1 publication Critical patent/JPWO2006041106A1/ja
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00—Dyes not provided for by a single group of this subclass
    • C09B69/02—Dyestuff salts, e.g. salts of acid dyes with basic dyes
    • C09B69/04—Dyestuff salts, e.g. salts of acid dyes with basic dyes of anionic dyes with nitrogen containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
JP2006540956A 2004-10-14 2005-10-12 有機溶媒溶解性染料を含有するレジスト組成物及びそれを用いるカラーフィルター Expired - Fee Related JP4883299B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006540956A JP4883299B2 (ja) 2004-10-14 2005-10-12 有機溶媒溶解性染料を含有するレジスト組成物及びそれを用いるカラーフィルター

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2004300008 2004-10-14
JP2004300008 2004-10-14
JP2006540956A JP4883299B2 (ja) 2004-10-14 2005-10-12 有機溶媒溶解性染料を含有するレジスト組成物及びそれを用いるカラーフィルター
PCT/JP2005/018815 WO2006041106A1 (ja) 2004-10-14 2005-10-12 有機溶媒溶解性染料を含有するレジスト組成物及びそれを用いるカラーフィルター

Publications (2)

Publication Number Publication Date
JPWO2006041106A1 JPWO2006041106A1 (ja) 2008-05-15
JP4883299B2 true JP4883299B2 (ja) 2012-02-22

Family

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Family Applications (1)

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JP2006540956A Expired - Fee Related JP4883299B2 (ja) 2004-10-14 2005-10-12 有機溶媒溶解性染料を含有するレジスト組成物及びそれを用いるカラーフィルター

Country Status (3)

Country Link
JP (1) JP4883299B2 (zh)
TW (1) TWI400566B (zh)
WO (1) WO2006041106A1 (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006046398A1 (ja) * 2004-10-29 2006-05-04 Nissan Chemical Industries, Ltd. 光酸発生剤を含む染料含有レジスト組成物及びそれを用いるカラーフィルター
JP4652197B2 (ja) * 2005-09-29 2011-03-16 富士フイルム株式会社 染料含有ネガ型硬化性組成物、カラーフィルタ及びその製造方法
KR101385946B1 (ko) * 2007-04-02 2014-04-16 주식회사 동진쎄미켐 포토레지스트 조성물 및 이를 이용한 포토레지스트 패턴의형성 방법
JP5473239B2 (ja) 2008-03-25 2014-04-16 富士フイルム株式会社 金属フタロシアニン染料混合物、硬化性組成物、カラーフィルタおよびカラーフィルタの製造方法
JP2010256863A (ja) * 2009-03-30 2010-11-11 Fujifilm Corp フォトレジスト材料およびフォトレジスト膜、これを用いるエッチング方法、ならびに新規アゾ色素化合物
JP5658924B2 (ja) * 2010-06-29 2015-01-28 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、並びに、該組成物を用いたレジスト膜及びパターン形成方法
CN103275519B (zh) * 2013-06-05 2014-05-14 上海雅运纺织化工股份有限公司 黄色酸性染料组合物及其染色应用
CN114839806B (zh) * 2022-05-17 2023-09-01 广州华星光电半导体显示技术有限公司 彩色滤光片及其制备方法、显示面板

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06248192A (ja) * 1990-02-02 1994-09-06 Morton Internatl Inc スルホン化アリールアゾ／ジアリール グアニジン錯染料溶液の製造方法
JPH07286105A (ja) * 1994-02-25 1995-10-31 Mitsui Toatsu Chem Inc キノフタロン系化合物及びこれを用いた偏光フィルム
JP2003344998A (ja) * 2002-05-22 2003-12-03 Fuji Photo Film Co Ltd マゼンタ用感光性着色組成物、カラーフィルターの製造方法、及びカラーフィルター
JP2004029518A (ja) * 2002-06-27 2004-01-29 Fuji Photo Film Co Ltd 染料含有硬化性組成物、並びに、それを使用したカラーフィルターおよびその製造方法
JP2004051727A (ja) * 2002-07-18 2004-02-19 Mitsui Chemicals Inc キサンテン化合物、該化合物を用いた感熱転写記録用色素、インキ組成物及び感熱転写シート
JP2004199040A (ja) * 2002-12-02 2004-07-15 Sumitomo Chem Co Ltd 着色感光性樹脂組成物

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60229953A (ja) * 1984-04-28 1985-11-15 Orient Kagaku Kogyo Kk 新規なテトラキスアゾ染料の製法
JPH0651514A (ja) * 1992-07-28 1994-02-25 Sumitomo Chem Co Ltd ネガ型レジスト組成物及びそれを用いるカラーフィルターの製造方法
JP3578356B2 (ja) * 1994-04-15 2004-10-20 日本化薬株式会社 金属錯体のジフェニルグアニジン塩及び電子写真用トナー

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06248192A (ja) * 1990-02-02 1994-09-06 Morton Internatl Inc スルホン化アリールアゾ／ジアリール グアニジン錯染料溶液の製造方法
JPH07286105A (ja) * 1994-02-25 1995-10-31 Mitsui Toatsu Chem Inc キノフタロン系化合物及びこれを用いた偏光フィルム
JP2003344998A (ja) * 2002-05-22 2003-12-03 Fuji Photo Film Co Ltd マゼンタ用感光性着色組成物、カラーフィルターの製造方法、及びカラーフィルター
JP2004029518A (ja) * 2002-06-27 2004-01-29 Fuji Photo Film Co Ltd 染料含有硬化性組成物、並びに、それを使用したカラーフィルターおよびその製造方法
JP2004051727A (ja) * 2002-07-18 2004-02-19 Mitsui Chemicals Inc キサンテン化合物、該化合物を用いた感熱転写記録用色素、インキ組成物及び感熱転写シート
JP2004199040A (ja) * 2002-12-02 2004-07-15 Sumitomo Chem Co Ltd 着色感光性樹脂組成物

Also Published As

Publication number Publication date
JPWO2006041106A1 (ja) 2008-05-15
TWI400566B (zh) 2013-07-01
TW200625009A (en) 2006-07-16
WO2006041106A1 (ja) 2006-04-20

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