JP4876708B2 - トンネル磁気抵抗効果素子の製造方法、薄膜磁気ヘッドの製造方法及び磁気メモリの製造方法 - Google Patents
トンネル磁気抵抗効果素子の製造方法、薄膜磁気ヘッドの製造方法及び磁気メモリの製造方法 Download PDFInfo
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- JP4876708B2 JP4876708B2 JP2006132410A JP2006132410A JP4876708B2 JP 4876708 B2 JP4876708 B2 JP 4876708B2 JP 2006132410 A JP2006132410 A JP 2006132410A JP 2006132410 A JP2006132410 A JP 2006132410A JP 4876708 B2 JP4876708 B2 JP 4876708B2
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/09—Magnetoresistive devices
- G01R33/093—Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/09—Magnetoresistive devices
- G01R33/098—Magnetoresistive devices comprising tunnel junctions, e.g. tunnel magnetoresistance sensors
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
- G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
- H01F10/3254—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the spacer being semiconducting or insulating, e.g. for spin tunnel junction [STJ]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/30—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE]
- H01F41/302—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F41/305—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices applying the spacer or adjusting its interface, e.g. in order to enable particular effect different from exchange coupling
- H01F41/307—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices applying the spacer or adjusting its interface, e.g. in order to enable particular effect different from exchange coupling insulating or semiconductive spacer
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/01—Manufacture or treatment
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- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Computer Hardware Design (AREA)
- Hall/Mr Elements (AREA)
- Mram Or Spin Memory Techniques (AREA)
- Magnetic Heads (AREA)
Description
11 下地絶縁層
12 下部シールド層
13 TMR積層体
14、18、136 絶縁層
15 磁区制御用バイアス層
16 上部シールド層
17 非磁性中間層
19 バッキングコイル層
20 バッキングコイル絶縁層
21 主磁極層
22 絶縁ギャップ層
23 書込みコイル層
24 書込みコイル絶縁層
24 補助磁極層
26 保護層
130 多層下地膜
130a 第1の下地膜
130b 第2の下地膜
131 シンセティック型磁化固定層
131a 反強磁性膜
131b 第1の強磁性膜
131c 非磁性膜
131d 第2の強磁性膜
132 トンネルバリア層
132a、132b Mg膜
132a′ 酸化Mg膜
133 磁化自由層
133a 高分極率膜
133b 軟磁性膜
134 キャップ層
135 TMR積層体
Claims (8)
- 強磁性層間にトンネルバリア層が挟設されてなるトンネル磁気抵抗効果素子の製造方法であって、前記トンネルバリア層を作製する工程が、前記強磁性層上に第1の金属材料膜を成膜し、該成膜した第1の金属材料膜を、酸素ガスと酸化に寄与しない清浄化ガスとを流すことにより、不純物濃度が1E−02以下の環境下でフロー酸化するものであり、前記清浄化ガスの流量が前記酸素ガスの流量の10倍以上であることを特徴とするトンネル磁気抵抗効果素子の製造方法。
- 前記酸化が、前記成膜した第1の金属材料膜を不純物濃度が1E−03以下の環境下で酸化するものであることを特徴とする請求項1に記載の製造方法。
- 前記清浄化ガスが、ヘリウムガス、ネオンガス、アルゴンガス、クリプトンガス若しくはキセノンガスを含む希ガス、窒素ガス及び水素ガスのうちの少なくとも1種類であることを特徴とする請求項1又は2に記載の製造方法。
- 前記第1の金属材料膜の酸化の後、該酸化して得た金属酸化膜上に前記第1の金属材料膜と同一金属材料の又は同一金属材料を主とする金属材料の第2の金属材料膜を成膜することを特徴とする請求項1から3のいずれか1項に記載の製造方法。
- 前記金属材料がアルミニウムよりも酸素に対して活性な金属材料であることを特徴とする請求項1から4のいずれか1項に記載の製造方法。
- 前記金属材料がマグネシウム又はマグネシウムを含む金属材料であることを特徴とする請求項1から4のいずれか1項に記載の製造方法。
- 請求項1から6のいずれか1項に記載の製造方法を用いて読出し磁気ヘッド素子を作製することを特徴とする薄膜磁気ヘッドの製造方法。
- 請求項1から6のいずれか1項に記載の製造方法を用いてセルを作製することを特徴とする磁気メモリの製造方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006132410A JP4876708B2 (ja) | 2006-05-11 | 2006-05-11 | トンネル磁気抵抗効果素子の製造方法、薄膜磁気ヘッドの製造方法及び磁気メモリの製造方法 |
US11/797,635 US20070264728A1 (en) | 2006-05-11 | 2007-05-04 | Manufacturing method of tunnel magnetoresistive effect element, manufacturing method of thin-film magnetic head, and manufacturing method of magnetic memory |
Applications Claiming Priority (1)
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JP2006132410A JP4876708B2 (ja) | 2006-05-11 | 2006-05-11 | トンネル磁気抵抗効果素子の製造方法、薄膜磁気ヘッドの製造方法及び磁気メモリの製造方法 |
Publications (2)
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JP2007305771A JP2007305771A (ja) | 2007-11-22 |
JP4876708B2 true JP4876708B2 (ja) | 2012-02-15 |
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JP2006132410A Active JP4876708B2 (ja) | 2006-05-11 | 2006-05-11 | トンネル磁気抵抗効果素子の製造方法、薄膜磁気ヘッドの製造方法及び磁気メモリの製造方法 |
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US (1) | US20070264728A1 (ja) |
JP (1) | JP4876708B2 (ja) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009158752A (ja) * | 2007-12-27 | 2009-07-16 | Fujitsu Ltd | トンネル磁気抵抗効果膜の製造方法 |
CN101960629B (zh) * | 2008-03-03 | 2013-12-18 | 佳能安内华股份有限公司 | 制造磁性隧道结器件的方法及用于制造磁性隧道结器件的设备 |
WO2011081203A1 (ja) * | 2009-12-28 | 2011-07-07 | キヤノンアネルバ株式会社 | 磁気抵抗素子の製造方法 |
KR20130017267A (ko) * | 2011-08-10 | 2013-02-20 | 에스케이하이닉스 주식회사 | 반도체 장치 및 그 제조 방법 |
JP2015179824A (ja) * | 2014-02-28 | 2015-10-08 | Tdk株式会社 | 磁性素子およびそれを備えた磁性高周波素子 |
US10438997B2 (en) | 2014-05-21 | 2019-10-08 | Avalanche Technology, Inc. | Multilayered seed structure for magnetic memory element including a CoFeB seed layer |
US9496489B2 (en) * | 2014-05-21 | 2016-11-15 | Avalanche Technology, Inc. | Magnetic random access memory with multilayered seed structure |
US10347691B2 (en) | 2014-05-21 | 2019-07-09 | Avalanche Technology, Inc. | Magnetic memory element with multilayered seed structure |
US10050083B2 (en) | 2014-05-21 | 2018-08-14 | Avalanche Technology, Inc. | Magnetic structure with multilayered seed |
JP2019021751A (ja) * | 2017-07-14 | 2019-02-07 | Tdk株式会社 | 磁気抵抗効果素子及びその製造方法 |
US11114609B2 (en) * | 2017-11-08 | 2021-09-07 | Tdk Corporation | Tunnel magnetoresistive effect element, magnetic memory, and built-in memory |
Family Cites Families (9)
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JPS59213619A (ja) * | 1983-05-20 | 1984-12-03 | Ube Ind Ltd | 高純度マグネシア微粉末の製造方法 |
JP3217703B2 (ja) * | 1995-09-01 | 2001-10-15 | 株式会社東芝 | 磁性体デバイス及びそれを用いた磁気センサ |
JP2000231706A (ja) * | 1998-12-08 | 2000-08-22 | Nec Corp | 磁気記録再生ヘッドおよびそれを用いた磁気記憶装置並びにその製造方法 |
US6710987B2 (en) * | 2000-11-17 | 2004-03-23 | Tdk Corporation | Magnetic tunnel junction read head devices having a tunneling barrier formed by multi-layer, multi-oxidation processes |
JP2002319722A (ja) * | 2001-01-22 | 2002-10-31 | Matsushita Electric Ind Co Ltd | 磁気抵抗効果素子とその製造方法 |
JP2003273421A (ja) * | 2002-03-20 | 2003-09-26 | Hitachi Ltd | 磁気抵抗効果素子及びその製造方法 |
JP3932181B2 (ja) * | 2002-07-10 | 2007-06-20 | 雄二 高桑 | 基板の表面処理方法および装置 |
JP2006093432A (ja) * | 2004-09-24 | 2006-04-06 | Sony Corp | 記憶素子及びメモリ |
US7479394B2 (en) * | 2005-12-22 | 2009-01-20 | Magic Technologies, Inc. | MgO/NiFe MTJ for high performance MRAM application |
-
2006
- 2006-05-11 JP JP2006132410A patent/JP4876708B2/ja active Active
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2007
- 2007-05-04 US US11/797,635 patent/US20070264728A1/en not_active Abandoned
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US20070264728A1 (en) | 2007-11-15 |
JP2007305771A (ja) | 2007-11-22 |
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