JP4874540B2 - センサー装置を制御する方法及び装置 - Google Patents
センサー装置を制御する方法及び装置 Download PDFInfo
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- JP4874540B2 JP4874540B2 JP2004344135A JP2004344135A JP4874540B2 JP 4874540 B2 JP4874540 B2 JP 4874540B2 JP 2004344135 A JP2004344135 A JP 2004344135A JP 2004344135 A JP2004344135 A JP 2004344135A JP 4874540 B2 JP4874540 B2 JP 4874540B2
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- Prior art keywords
- sensor device
- maintenance unit
- primary coil
- power
- coil
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- 238000000034 method Methods 0.000 title claims description 61
- 238000012423 maintenance Methods 0.000 claims description 285
- 238000012545 processing Methods 0.000 claims description 78
- 235000012431 wafers Nutrition 0.000 claims description 72
- 230000006854 communication Effects 0.000 claims description 68
- 238000004891 communication Methods 0.000 claims description 68
- 239000004065 semiconductor Substances 0.000 claims description 42
- 230000008859 change Effects 0.000 claims description 29
- 238000004519 manufacturing process Methods 0.000 claims description 25
- 239000000758 substrate Substances 0.000 claims description 25
- 230000008569 process Effects 0.000 claims description 19
- 238000003860 storage Methods 0.000 claims description 17
- 238000005229 chemical vapour deposition Methods 0.000 claims description 8
- 239000003990 capacitor Substances 0.000 claims description 7
- 238000001020 plasma etching Methods 0.000 claims description 4
- 238000004544 sputter deposition Methods 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 238000005530 etching Methods 0.000 claims description 3
- 238000005468 ion implantation Methods 0.000 claims description 3
- 229920002120 photoresistant polymer Polymers 0.000 claims description 3
- 230000010355 oscillation Effects 0.000 claims description 2
- 230000006698 induction Effects 0.000 description 86
- 230000005540 biological transmission Effects 0.000 description 15
- 238000010586 diagram Methods 0.000 description 14
- 230000006870 function Effects 0.000 description 13
- 230000008901 benefit Effects 0.000 description 11
- 238000013461 design Methods 0.000 description 9
- 230000004044 response Effects 0.000 description 7
- 238000013480 data collection Methods 0.000 description 6
- 238000004804 winding Methods 0.000 description 6
- 230000001939 inductive effect Effects 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 238000001514 detection method Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 238000012544 monitoring process Methods 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 230000001276 controlling effect Effects 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 230000007175 bidirectional communication Effects 0.000 description 2
- 239000011162 core material Substances 0.000 description 2
- 238000011982 device technology Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004590 computer program Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000007405 data analysis Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000002847 impedance measurement Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000011017 operating method Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000009993 protective function Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Images
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- Charge And Discharge Circuits For Batteries Or The Like (AREA)
- Arrangements For Transmission Of Measured Signals (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US52571003P | 2003-11-29 | 2003-11-29 | |
| US60/525,710 | 2003-11-29 | ||
| US10/888,526 US7282889B2 (en) | 2001-04-19 | 2004-07-10 | Maintenance unit for a sensor apparatus |
| US10/888,526 | 2004-07-10 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005202933A JP2005202933A (ja) | 2005-07-28 |
| JP2005202933A5 JP2005202933A5 (enExample) | 2011-08-11 |
| JP4874540B2 true JP4874540B2 (ja) | 2012-02-15 |
Family
ID=34830427
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004344135A Expired - Fee Related JP4874540B2 (ja) | 2003-11-29 | 2004-11-29 | センサー装置を制御する方法及び装置 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP4874540B2 (enExample) |
| TW (1) | TWI268429B (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20220096733A (ko) * | 2020-12-31 | 2022-07-07 | 세메스 주식회사 | 버퍼 유닛 및 온도 변화가 수반되는 기판 지지 부재의 수평 측정용 기판형 센서의 보관 방법 |
| KR20220161808A (ko) * | 2021-05-31 | 2022-12-07 | 세메스 주식회사 | 용기 및 기판 처리 시스템 |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7839124B2 (en) * | 2006-09-29 | 2010-11-23 | Semiconductor Energy Laboratory Co., Ltd. | Wireless power storage device comprising battery, semiconductor device including battery, and method for operating the wireless power storage device |
| US8853995B2 (en) | 2009-06-12 | 2014-10-07 | Qualcomm Incorporated | Devices for conveying wireless power and methods of operation thereof |
| US8547057B2 (en) * | 2009-11-17 | 2013-10-01 | Qualcomm Incorporated | Systems and methods for selective wireless power transfer |
| KR101356623B1 (ko) * | 2011-11-10 | 2014-02-03 | 주식회사 스파콘 | 전력전송코일 및 무선 전력전송장치 |
| JP6083652B2 (ja) * | 2012-05-28 | 2017-02-22 | パナソニックIpマネジメント株式会社 | 無接点コネクタシステム |
| US9356822B2 (en) * | 2012-10-30 | 2016-05-31 | Kla-Tencor Corporation | Automated interface apparatus and method for use in semiconductor wafer handling systems |
| JP5954788B2 (ja) * | 2012-12-28 | 2016-07-20 | セイコーインスツル株式会社 | 電子部品、受電装置、及び給電システム |
| JP2014029860A (ja) * | 2013-08-27 | 2014-02-13 | Advantest Corp | 電源装置および測定用デバイス |
| JP6855774B2 (ja) * | 2016-12-13 | 2021-04-07 | Tdk株式会社 | ウエハ搬送容器内雰囲気計測装置、ウエハ搬送容器、ウエハ搬送容器内清浄化装置及びウエハ搬送容器内清浄化方法 |
| US20180366354A1 (en) * | 2017-06-19 | 2018-12-20 | Applied Materials, Inc. | In-situ semiconductor processing chamber temperature apparatus |
| CN120663299A (zh) * | 2019-07-26 | 2025-09-19 | 朗姆研究公司 | 用于自动化晶片搬运机械手教导与健康检查的整合适应性定位系统及例程 |
| JP7467152B2 (ja) | 2020-02-13 | 2024-04-15 | 東京エレクトロン株式会社 | 収容容器及び基板状センサの充電方法 |
| KR102650610B1 (ko) * | 2021-05-31 | 2024-03-26 | 세메스 주식회사 | 기판 처리 장치 및 기판 처리 시스템 |
| KR102858235B1 (ko) * | 2021-07-15 | 2025-09-09 | 삼성전자주식회사 | 웨이퍼 이송 시스템 및 이를 이용한 반도체 소자 제조 방법 |
| WO2023089795A1 (ja) * | 2021-11-22 | 2023-05-25 | 三菱電機株式会社 | 送電装置、無線電力伝送システム及び電圧制御装置 |
| US11817724B2 (en) * | 2022-03-02 | 2023-11-14 | Applied Materials, Inc. | Enclosure system with charging assembly |
| CN120642042A (zh) * | 2023-02-09 | 2025-09-12 | 东京毅力科创株式会社 | 基片处理装置 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5466614A (en) * | 1993-09-20 | 1995-11-14 | At&T Global Information Solutions Company | Structure and method for remotely measuring process data |
| JPH10142068A (ja) * | 1996-11-14 | 1998-05-29 | Sony Corp | 温度測定装置及びこれを用いた温度測定方法 |
| US6691068B1 (en) * | 2000-08-22 | 2004-02-10 | Onwafer Technologies, Inc. | Methods and apparatus for obtaining data for process operation, optimization, monitoring, and control |
| US7289230B2 (en) * | 2002-02-06 | 2007-10-30 | Cyberoptics Semiconductors, Inc. | Wireless substrate-like sensor |
-
2004
- 2004-11-25 TW TW093136293A patent/TWI268429B/zh not_active IP Right Cessation
- 2004-11-29 JP JP2004344135A patent/JP4874540B2/ja not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20220096733A (ko) * | 2020-12-31 | 2022-07-07 | 세메스 주식회사 | 버퍼 유닛 및 온도 변화가 수반되는 기판 지지 부재의 수평 측정용 기판형 센서의 보관 방법 |
| KR102584512B1 (ko) * | 2020-12-31 | 2023-10-05 | 세메스 주식회사 | 버퍼 유닛 및 온도 변화가 수반되는 기판 지지 부재의 수평 측정용 기판형 센서의 보관 방법 |
| US11933808B2 (en) | 2020-12-31 | 2024-03-19 | Semes Co., Ltd. | Buffer unit and method for storaging substrate type sensor for measuring of horizontality of a substrate support member provided on a temperature varying atmosphere |
| KR20220161808A (ko) * | 2021-05-31 | 2022-12-07 | 세메스 주식회사 | 용기 및 기판 처리 시스템 |
| KR102594075B1 (ko) | 2021-05-31 | 2023-10-24 | 세메스 주식회사 | 용기 및 기판 처리 시스템 |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI268429B (en) | 2006-12-11 |
| JP2005202933A (ja) | 2005-07-28 |
| TW200532465A (en) | 2005-10-01 |
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