JP4867995B2 - イオン化装置 - Google Patents
イオン化装置 Download PDFInfo
- Publication number
- JP4867995B2 JP4867995B2 JP2008550119A JP2008550119A JP4867995B2 JP 4867995 B2 JP4867995 B2 JP 4867995B2 JP 2008550119 A JP2008550119 A JP 2008550119A JP 2008550119 A JP2008550119 A JP 2008550119A JP 4867995 B2 JP4867995 B2 JP 4867995B2
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- orifice
- ionization
- charged object
- ions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 150000002500 ions Chemical class 0.000 claims description 41
- 239000007789 gas Substances 0.000 description 45
- 239000002245 particle Substances 0.000 description 16
- FAPWRFPIFSIZLT-UHFFFAOYSA-M sodium chloride Inorganic materials [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 14
- 239000011780 sodium chloride Substances 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 7
- 230000007423 decrease Effects 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- -1 NaCl ion Chemical class 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 230000006378 damage Effects 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000005215 recombination Methods 0.000 description 2
- 230000006798 recombination Effects 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 150000001793 charged compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000004924 electrostatic deposition Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
- G01N15/02—Investigating particle size or size distribution
- G01N15/0266—Investigating particle size or size distribution with electrical classification
Landscapes
- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Electrostatic Separation (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Description
4 内部空間
6 放電電極
8 オリフィス
10 対向電極
12 高電圧電源
14 イオン源ガス導入部
20 荷電室
22 荷電室内部空間
26 荷電対象物導入部
28 荷電対象物導入口
Claims (5)
- イオン化ガス導入口をもつ筐体の内部に放電電極及び対向電極をもち、前記対向電極には前記放電電極の先端に対向する位置に外部に通ずるオリフィスが形成されているイオン化室と、
前記イオン化室の前記オリフィス側に隣接して配置され、荷電対象物導入部をもち、前記オリフィスから放出されたイオンにより荷電対象物が帯電させられてイオンとなる荷電室と、を備え、
前記荷電室の荷電対象物導入部の導入口はスリット状をなし、前記オリフィスの出口に接近した位置で前記オリフィスの出口を取り囲むように配置されており、
前記オリフィスの出口から荷電室にイオンを含むガスが噴霧される際に前記導入口から前記荷電室へ前記荷電対象物が引き込まれる大きさの陰圧が生じるように前記オリフィスのサイズが設定され、前記イオン化室の方が前記荷電室よりも高圧になっているイオン化装置。 - 前記イオン化ガス導入口からのイオン化ガス導入量が1〜10L/分であり、前記オリフィスのサイズは直径が0.1〜1mm、前記イオン化室と前記荷電室との圧力差は0.4MPa以下である請求項1に記載のイオン化装置。
- 前記荷電対象物導入部は前記オリフィスがイオンを噴射する方向と直交する方向に荷電対象物を導入するように配置されている請求項1又は2に記載のイオン化装置。
- 前記イオン化室が加圧されていることによりイオン化室の方が荷電室よりも高圧になっている請求項1から3のいずれか一項に記載のイオン化装置。
- 前記荷電室が下流側に吸引ポンプを備えていることによりイオン化室の方が荷電室よりも高圧になっている請求項1から4のいずれか一項に記載のイオン化装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008550119A JP4867995B2 (ja) | 2006-12-20 | 2007-12-13 | イオン化装置 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006342110 | 2006-12-20 | ||
JP2006342110 | 2006-12-20 | ||
PCT/JP2007/073999 WO2008075606A1 (ja) | 2006-12-20 | 2007-12-13 | イオン化装置 |
JP2008550119A JP4867995B2 (ja) | 2006-12-20 | 2007-12-13 | イオン化装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2008075606A1 JPWO2008075606A1 (ja) | 2010-04-08 |
JP4867995B2 true JP4867995B2 (ja) | 2012-02-01 |
Family
ID=39536237
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008550120A Expired - Fee Related JP4851539B2 (ja) | 2006-12-20 | 2007-12-13 | イオン化装置 |
JP2008550119A Expired - Fee Related JP4867995B2 (ja) | 2006-12-20 | 2007-12-13 | イオン化装置 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008550120A Expired - Fee Related JP4851539B2 (ja) | 2006-12-20 | 2007-12-13 | イオン化装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8022362B2 (ja) |
EP (1) | EP2098858B1 (ja) |
JP (2) | JP4851539B2 (ja) |
TW (2) | TW200838613A (ja) |
WO (2) | WO2008075606A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114295616B (zh) * | 2022-03-11 | 2022-05-10 | 西南石油大学 | 基于图像识别的套管检测设备 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4339782A (en) * | 1980-03-27 | 1982-07-13 | The Bahnson Company | Supersonic jet ionizer |
JPH11176375A (ja) * | 1997-12-12 | 1999-07-02 | Hitachi Tokyo Electron Co Ltd | 大気圧イオン化質量分析計およびその方法 |
JP2003326192A (ja) * | 2002-05-10 | 2003-11-18 | Osaka Industrial Promotion Organization | イオン化装置及び該イオン化装置を含むシステム |
JP2004157057A (ja) * | 2002-11-08 | 2004-06-03 | Hitachi Ltd | 質量分析装置 |
JP2006322899A (ja) * | 2005-05-20 | 2006-11-30 | Hitachi Ltd | ガスモニタリング装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4029268C2 (de) * | 1990-09-14 | 1995-07-06 | Balzers Hochvakuum | Verfahren zur gleichspannungs-bogenentladungs-unterstützten, reaktiven Behandlung von Gut und Vakuumbehandlungsanlage zur Durchführung |
WO2001043157A1 (en) * | 1999-12-13 | 2001-06-14 | Semequip, Inc. | Ion implantation ion source, system and method |
JP3787549B2 (ja) * | 2002-10-25 | 2006-06-21 | 株式会社日立ハイテクノロジーズ | 質量分析装置及び質量分析方法 |
JP3985960B2 (ja) | 2003-07-02 | 2007-10-03 | 独立行政法人交通安全環境研究所 | 排気ガス中の微粒子計測装置および計測方法 |
-
2007
- 2007-12-13 EP EP07850521.1A patent/EP2098858B1/en not_active Not-in-force
- 2007-12-13 WO PCT/JP2007/073999 patent/WO2008075606A1/ja active Application Filing
- 2007-12-13 JP JP2008550120A patent/JP4851539B2/ja not_active Expired - Fee Related
- 2007-12-13 JP JP2008550119A patent/JP4867995B2/ja not_active Expired - Fee Related
- 2007-12-13 WO PCT/JP2007/074000 patent/WO2008075607A1/ja active Application Filing
- 2007-12-13 US US12/520,536 patent/US8022362B2/en not_active Expired - Fee Related
- 2007-12-20 TW TW096148876A patent/TW200838613A/zh not_active IP Right Cessation
- 2007-12-20 TW TW096148862A patent/TW200838612A/zh not_active IP Right Cessation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4339782A (en) * | 1980-03-27 | 1982-07-13 | The Bahnson Company | Supersonic jet ionizer |
JPH11176375A (ja) * | 1997-12-12 | 1999-07-02 | Hitachi Tokyo Electron Co Ltd | 大気圧イオン化質量分析計およびその方法 |
JP2003326192A (ja) * | 2002-05-10 | 2003-11-18 | Osaka Industrial Promotion Organization | イオン化装置及び該イオン化装置を含むシステム |
JP2004157057A (ja) * | 2002-11-08 | 2004-06-03 | Hitachi Ltd | 質量分析装置 |
JP2006322899A (ja) * | 2005-05-20 | 2006-11-30 | Hitachi Ltd | ガスモニタリング装置 |
Also Published As
Publication number | Publication date |
---|---|
US20090314953A1 (en) | 2009-12-24 |
JPWO2008075607A1 (ja) | 2010-04-08 |
TW200838612A (en) | 2008-10-01 |
TW200838613A (en) | 2008-10-01 |
EP2098858A4 (en) | 2012-05-16 |
EP2098858A1 (en) | 2009-09-09 |
TWI365770B (ja) | 2012-06-11 |
EP2098858B1 (en) | 2013-09-25 |
WO2008075606A1 (ja) | 2008-06-26 |
JPWO2008075606A1 (ja) | 2010-04-08 |
WO2008075607A1 (ja) | 2008-06-26 |
JP4851539B2 (ja) | 2012-01-11 |
US8022362B2 (en) | 2011-09-20 |
TWI335242B (ja) | 2011-01-01 |
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