JP4862375B2 - 進行波形マイクロ波プラズマ発生装置 - Google Patents

進行波形マイクロ波プラズマ発生装置 Download PDF

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JP4862375B2
JP4862375B2 JP2005352121A JP2005352121A JP4862375B2 JP 4862375 B2 JP4862375 B2 JP 4862375B2 JP 2005352121 A JP2005352121 A JP 2005352121A JP 2005352121 A JP2005352121 A JP 2005352121A JP 4862375 B2 JP4862375 B2 JP 4862375B2
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plasma
microwave
generating means
plasma generating
dielectric
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JP2007157535A (ja
JP2007157535A5 (enExample
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英二 田辺
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株式会社エーイーティー
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JP2005352121A 2005-12-06 2005-12-06 進行波形マイクロ波プラズマ発生装置 Expired - Fee Related JP4862375B2 (ja)

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JP2005352121A JP4862375B2 (ja) 2005-12-06 2005-12-06 進行波形マイクロ波プラズマ発生装置

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JP2005352121A JP4862375B2 (ja) 2005-12-06 2005-12-06 進行波形マイクロ波プラズマ発生装置

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JP2007157535A JP2007157535A (ja) 2007-06-21
JP2007157535A5 JP2007157535A5 (enExample) 2007-11-08
JP4862375B2 true JP4862375B2 (ja) 2012-01-25

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Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5324137B2 (ja) * 2008-06-11 2013-10-23 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法
KR101229780B1 (ko) * 2008-06-11 2013-02-05 고쿠리츠다이가쿠호진 도호쿠다이가쿠 플라즈마 처리 장치 및 플라즈마 처리 방법
JP5421551B2 (ja) * 2008-06-11 2014-02-19 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法
JP5324138B2 (ja) * 2008-06-11 2013-10-23 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法
US12224156B2 (en) 2018-03-01 2025-02-11 Applied Materials, Inc. Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing tool
TWI826925B (zh) * 2018-03-01 2023-12-21 美商應用材料股份有限公司 電漿源組件和氣體分配組件
KR102231371B1 (ko) * 2020-01-29 2021-03-25 주식회사 피에스엠 콜드 플라즈마 발생장치 및 이를 포함하는 다중 콜드 플라즈마 어레이 장치

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6244578A (ja) * 1985-08-21 1987-02-26 Canon Inc プラズマｃｖｄ法による堆積膜形成装置
JPH07122396A (ja) * 1993-10-28 1995-05-12 Kobe Steel Ltd プラズマ装置へのマイクロ波導入装置
JPH09232099A (ja) * 1996-02-20 1997-09-05 Hitachi Ltd プラズマ処理装置
DE19801366B4 (de) * 1998-01-16 2008-07-03 Applied Materials Gmbh & Co. Kg Vorrichtung zur Erzeugung von Plasma
FR2798552B1 (fr) * 1999-09-13 2001-11-30 Centre Nat Rech Scient Dispositif assurant une division de puissance micro-onde predeterminee sur une pluralite de charges, notamment pour la production de plasma
TW492040B (en) * 2000-02-14 2002-06-21 Tokyo Electron Ltd Device and method for coupling two circuit components which have different impedances
JP2002093597A (ja) * 2000-09-14 2002-03-29 Miura Gakuen プラズマ発生用アンテナ、プラズマ処理装置、プラズマ処理方法、及び被処理物の製造方法、並びに半導体装置の製造方法
JP4564213B2 (ja) * 2001-09-14 2010-10-20 三井造船株式会社 プラズマ生成用アンテナ及びｃｖｄ装置
JP3677017B2 (ja) * 2002-10-29 2005-07-27 東京エレクトロン株式会社 スロットアレイアンテナおよびプラズマ処理装置
US7183514B2 (en) * 2003-01-30 2007-02-27 Axcelis Technologies, Inc. Helix coupled remote plasma source
JP4109213B2 (ja) * 2004-03-31 2008-07-02 株式会社アドテック プラズマ テクノロジー 同軸形マイクロ波プラズマトーチ

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