JP4861431B2 - 光化学センサ及びその製造方法 - Google Patents
光化学センサ及びその製造方法 Download PDFInfo
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- JP4861431B2 JP4861431B2 JP2008547266A JP2008547266A JP4861431B2 JP 4861431 B2 JP4861431 B2 JP 4861431B2 JP 2008547266 A JP2008547266 A JP 2008547266A JP 2008547266 A JP2008547266 A JP 2008547266A JP 4861431 B2 JP4861431 B2 JP 4861431B2
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- Prior art keywords
- layer
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- metal layer
- polymer
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- 238000004519 manufacturing process Methods 0.000 title claims 2
- 229920000642 polymer Polymers 0.000 claims description 46
- 238000001514 detection method Methods 0.000 claims description 37
- 229910052751 metal Inorganic materials 0.000 claims description 37
- 239000002184 metal Substances 0.000 claims description 37
- 239000000758 substrate Substances 0.000 claims description 33
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 16
- 229910052763 palladium Inorganic materials 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 7
- 238000000151 deposition Methods 0.000 claims description 4
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 3
- 229910001882 dioxygen Inorganic materials 0.000 claims description 3
- 230000001788 irregular Effects 0.000 claims description 3
- 230000008569 process Effects 0.000 claims description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 42
- 230000000052 comparative effect Effects 0.000 description 26
- 239000000463 material Substances 0.000 description 25
- 230000004044 response Effects 0.000 description 17
- 230000008859 change Effects 0.000 description 16
- 239000012491 analyte Substances 0.000 description 14
- 239000010408 film Substances 0.000 description 14
- 229910052782 aluminium Inorganic materials 0.000 description 13
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 13
- 238000000429 assembly Methods 0.000 description 13
- 230000000712 assembly Effects 0.000 description 13
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 12
- 230000003287 optical effect Effects 0.000 description 12
- 239000011148 porous material Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 7
- 239000007789 gas Substances 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 238000001179 sorption measurement Methods 0.000 description 7
- 238000004528 spin coating Methods 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 239000010931 gold Substances 0.000 description 6
- 239000012855 volatile organic compound Substances 0.000 description 6
- 230000003595 spectral effect Effects 0.000 description 5
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 229910010272 inorganic material Inorganic materials 0.000 description 3
- 239000011147 inorganic material Substances 0.000 description 3
- 229910052752 metalloid Inorganic materials 0.000 description 3
- 150000002738 metalloids Chemical class 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000000635 electron micrograph Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000001055 reflectance spectroscopy Methods 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- POFMQEVZKZVAPQ-UHFFFAOYSA-N 1,1,1',1'-tetramethyl-3,3'-spirobi[2h-indene]-5,5',6,6'-tetrol Chemical compound C12=CC(O)=C(O)C=C2C(C)(C)CC11C2=CC(O)=C(O)C=C2C(C)(C)C1 POFMQEVZKZVAPQ-UHFFFAOYSA-N 0.000 description 1
- PCRSJGWFEMHHEW-UHFFFAOYSA-N 2,3,5,6-tetrafluorobenzene-1,4-dicarbonitrile Chemical compound FC1=C(F)C(C#N)=C(F)C(F)=C1C#N PCRSJGWFEMHHEW-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- BBKFSSMUWOMYPI-UHFFFAOYSA-N gold palladium Chemical compound [Pd].[Au] BBKFSSMUWOMYPI-UHFFFAOYSA-N 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 239000012229 microporous material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000012667 polymer degradation Methods 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000013316 polymer of intrinsic microporosity Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000000985 reflectance spectrum Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 239000011540 sensing material Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
- G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
- G01N21/78—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator producing a change of colour
- G01N21/783—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator producing a change of colour for analysing gases
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
- G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
- G01N2021/7769—Measurement method of reaction-produced change in sensor
- G01N2021/7779—Measurement method of reaction-produced change in sensor interferometric
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analysing Materials By The Use Of Chemical Reactions (AREA)
- Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/275,268 | 2005-12-21 | ||
| US11/275,268 US7556774B2 (en) | 2005-12-21 | 2005-12-21 | Optochemical sensor and method of making the same |
| PCT/US2006/046386 WO2007075273A1 (en) | 2005-12-21 | 2006-12-05 | Optochemical sensor and method of making the same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009521675A JP2009521675A (ja) | 2009-06-04 |
| JP2009521675A5 JP2009521675A5 (enExample) | 2010-01-14 |
| JP4861431B2 true JP4861431B2 (ja) | 2012-01-25 |
Family
ID=38173726
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008547266A Expired - Fee Related JP4861431B2 (ja) | 2005-12-21 | 2006-12-05 | 光化学センサ及びその製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7556774B2 (enExample) |
| EP (1) | EP1963852B1 (enExample) |
| JP (1) | JP4861431B2 (enExample) |
| CN (1) | CN101331399B (enExample) |
| WO (1) | WO2007075273A1 (enExample) |
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| EP2158471A1 (en) * | 2007-06-25 | 2010-03-03 | Qinetiq Limited | Heater suitable for use in a preconcentrator device |
| KR101476487B1 (ko) * | 2007-10-05 | 2014-12-24 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 플라즈마-증착된 미공성 층을 포함하는 유기 화학적 센서와, 제조 및 사용 방법 |
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| JP2012513601A (ja) * | 2008-12-23 | 2012-06-14 | スリーエム イノベイティブ プロパティズ カンパニー | 微多孔性有機ケイ酸塩材料を有する有機化学センサ |
| DE212010000021U1 (de) * | 2009-01-29 | 2011-10-24 | 3M Innovative Properties Company | Überwachungsvorrichtung (Monitor) zur optischen Detektion von organischen Analyten |
| CN102439422B (zh) | 2009-03-30 | 2016-05-18 | 3M创新有限公司 | 用于检测被分析物的光电方法和装置 |
| US8336543B2 (en) * | 2009-05-22 | 2012-12-25 | 3M Innovative Properties Company | Filter cartridge having cover for masking service life indicator |
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| GB201015401D0 (en) | 2010-09-15 | 2010-10-27 | Univ Cardiff | Polymers, their method of manufacture and use thereof |
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| JP2013542422A (ja) | 2010-09-30 | 2013-11-21 | スリーエム イノベイティブ プロパティズ カンパニー | センサー素子、その製造方法、及びそれを含むセンサー装置 |
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| BR112013007517A2 (pt) | 2010-10-01 | 2020-09-01 | 3M Innovative Properties Company | método para correlacionar um dispositivo de mo0nitoramento ao final da vida útil de um cartucho de filtro |
| CN103443616B (zh) * | 2011-03-28 | 2017-05-31 | 3M创新有限公司 | 包含掩蔽层粘合剂的传感器 |
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Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62297223A (ja) * | 1986-05-28 | 1987-12-24 | ア−・ファウ・エル ア−・ゲ− | 光学センサのための担体材料の製造方法 |
| JPH0580049A (ja) * | 1991-07-22 | 1993-03-30 | Fuji Photo Film Co Ltd | 乾式分析要素を用いた測定方法及び乾式分析要素 |
| JPH0727696A (ja) * | 1984-07-06 | 1995-01-31 | Metricor Inc | 光共振器を具えたスペクトル変調方式センサーを使用する光学測定装置 |
| JP2002054990A (ja) * | 2000-08-09 | 2002-02-20 | Sunx Ltd | 光学式センサ |
| JP2002168790A (ja) * | 2000-11-29 | 2002-06-14 | Sony Corp | 還元性大気汚染物質の検出具、その濃度測定具、その検出方法および、その濃度測定方法 |
| US20040062682A1 (en) * | 2002-09-30 | 2004-04-01 | Rakow Neal Anthony | Colorimetric sensor |
| JP2005138434A (ja) * | 2003-11-06 | 2005-06-02 | National Institute Of Advanced Industrial & Technology | 物質の収着により色が変化する構造性変色材 |
| JP2007530940A (ja) * | 2004-03-24 | 2007-11-01 | スリーエム イノベイティブ プロパティズ カンパニー | 比色センサー |
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| US5015843A (en) | 1990-02-15 | 1991-05-14 | Polysense, Inc. | Fiber optic chemical sensors based on polymer swelling |
| AT403746B (de) | 1994-04-12 | 1998-05-25 | Avl Verbrennungskraft Messtech | Optochemischer sensor sowie verfahren zu seiner herstellung |
| JPH08184560A (ja) | 1994-12-28 | 1996-07-16 | Hoechst Japan Ltd | 有機溶剤蒸気を検出するための光センサ装置 |
| DE19545414C2 (de) | 1995-12-06 | 2002-11-14 | Inst Physikalische Hochtech Ev | Optisches Sensorelement |
| US6180318B1 (en) | 1999-05-19 | 2001-01-30 | 3M Innovative Properties Company | Method of imaging an article |
| US6396616B1 (en) | 2000-10-10 | 2002-05-28 | 3M Innovative Properties Company | Direct laser imaging system |
| US6878419B2 (en) | 2001-12-14 | 2005-04-12 | 3M Innovative Properties Co. | Plasma treatment of porous materials |
| JP2004026547A (ja) | 2002-06-24 | 2004-01-29 | Nippon Sheet Glass Co Ltd | 断熱合わせガラス |
| GB0317557D0 (en) | 2003-07-26 | 2003-08-27 | Univ Manchester | Microporous polymer material |
| US7033667B2 (en) | 2003-12-18 | 2006-04-25 | 3M Innovative Properties Company | Printed circuits on shrink film |
-
2005
- 2005-12-21 US US11/275,268 patent/US7556774B2/en not_active Expired - Fee Related
-
2006
- 2006-12-05 CN CN2006800476897A patent/CN101331399B/zh not_active Expired - Fee Related
- 2006-12-05 JP JP2008547266A patent/JP4861431B2/ja not_active Expired - Fee Related
- 2006-12-05 EP EP06838998.0A patent/EP1963852B1/en not_active Not-in-force
- 2006-12-05 WO PCT/US2006/046386 patent/WO2007075273A1/en not_active Ceased
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0727696A (ja) * | 1984-07-06 | 1995-01-31 | Metricor Inc | 光共振器を具えたスペクトル変調方式センサーを使用する光学測定装置 |
| JPS62297223A (ja) * | 1986-05-28 | 1987-12-24 | ア−・ファウ・エル ア−・ゲ− | 光学センサのための担体材料の製造方法 |
| JPH0580049A (ja) * | 1991-07-22 | 1993-03-30 | Fuji Photo Film Co Ltd | 乾式分析要素を用いた測定方法及び乾式分析要素 |
| JP2002054990A (ja) * | 2000-08-09 | 2002-02-20 | Sunx Ltd | 光学式センサ |
| JP2002168790A (ja) * | 2000-11-29 | 2002-06-14 | Sony Corp | 還元性大気汚染物質の検出具、その濃度測定具、その検出方法および、その濃度測定方法 |
| US20040062682A1 (en) * | 2002-09-30 | 2004-04-01 | Rakow Neal Anthony | Colorimetric sensor |
| JP2006501467A (ja) * | 2002-09-30 | 2006-01-12 | スリーエム イノベイティブ プロパティズ カンパニー | 反射比色センシング素子 |
| JP2005138434A (ja) * | 2003-11-06 | 2005-06-02 | National Institute Of Advanced Industrial & Technology | 物質の収着により色が変化する構造性変色材 |
| JP2007530940A (ja) * | 2004-03-24 | 2007-11-01 | スリーエム イノベイティブ プロパティズ カンパニー | 比色センサー |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101331399A (zh) | 2008-12-24 |
| WO2007075273A1 (en) | 2007-07-05 |
| EP1963852B1 (en) | 2018-09-19 |
| EP1963852A1 (en) | 2008-09-03 |
| CN101331399B (zh) | 2012-09-05 |
| US7556774B2 (en) | 2009-07-07 |
| US20070140907A1 (en) | 2007-06-21 |
| JP2009521675A (ja) | 2009-06-04 |
| EP1963852A4 (en) | 2017-09-06 |
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