JP4850190B2 - 水分含量が低減された(メタ)アクリル酸の製造プロセス - Google Patents
水分含量が低減された(メタ)アクリル酸の製造プロセス Download PDFInfo
- Publication number
- JP4850190B2 JP4850190B2 JP2008002963A JP2008002963A JP4850190B2 JP 4850190 B2 JP4850190 B2 JP 4850190B2 JP 2008002963 A JP2008002963 A JP 2008002963A JP 2008002963 A JP2008002963 A JP 2008002963A JP 4850190 B2 JP4850190 B2 JP 4850190B2
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- Prior art keywords
- acrylic acid
- stream
- meth
- aldehyde
- column
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C67/00—Preparation of carboxylic acid esters
- C07C67/48—Separation; Purification; Stabilisation; Use of additives
- C07C67/52—Separation; Purification; Stabilisation; Use of additives by change in the physical state, e.g. crystallisation
- C07C67/54—Separation; Purification; Stabilisation; Use of additives by change in the physical state, e.g. crystallisation by distillation
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
- C07C51/42—Separation; Purification; Stabilisation; Use of additives
- C07C51/43—Separation; Purification; Stabilisation; Use of additives by change of the physical state, e.g. crystallisation
- C07C51/44—Separation; Purification; Stabilisation; Use of additives by change of the physical state, e.g. crystallisation by distillation
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
- C07C51/42—Separation; Purification; Stabilisation; Use of additives
- C07C51/487—Separation; Purification; Stabilisation; Use of additives by treatment giving rise to chemical modification
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
組み立てる前に、三つ口丸底フラスコをオーブンで乾燥させ、そして、各試験を始める前に、任意の水蒸気を蒸発させるため、器具を乾燥窒素でパージした。すべての試験の間、窒素パージを続けた。各試験は、200ppmのPTZで抑制された150グラムのアクリル酸をフラスコへ添加することから構成された。温度計をフラスコの一つのポートに配置し、(窒素ラインおよびバブラーに取り付けられた)凝縮器を第二のポートに配置し、セプタムを第三のポートに配置した。ポットを撹拌して90℃に加熱し、この時点で、試験対象の反応性乾燥剤を導入した。比較を容易化するため、すべての実施例において、2:1のモル比の乾燥剤:アクリル酸流れ中における初期水分含量を用いた。乾燥剤を添加して直ぐにサンプルを回収し、その後、既知の間隔でサンプルを回収した。サンプルは直ちにドライアイス中で凍結され、カールフィッシャー滴定法で分析することにより水分濃度が決定された。
2 底部流れ
3 塔頂部流れ
4 塔頂部留分流れ
5 底部流れ
6 蒸気流れ
7 最終生成物アクリル酸流れ
8 ライン
9 ライン
10 粗アクリル酸流れ
11 混合フィード流れ
12 蒸気流れ
13 最終生成物アクリル酸流れ
14 底部流れ
100 蒸留系
101 第一蒸留塔
102 最終蒸留塔
103 底部留分回収塔
104,105,106 凝縮器
111,112,113 サンプ
Claims (3)
- (メタ)アクリル酸を精製する方法であって:
(a)少なくとも水分を含有する(メタ)アクリル酸流れを蒸留系へ差し向けるステップ;
(b)少なくとも1種の反応性乾燥剤を蒸留系に添加するステップであって、ここで、該少なくとも1種の反応性乾燥剤は該水分と反応することができ、該少なくとも1種の反応性乾燥剤がアセタール類、ケタール類、ハロゲン化無水物類、イソシアネート類、1,3−フェニレンジイソシアネート、テトラメトキシ−1,4シクロヘキサジエン、トリフルオロ酢酸無水物、およびそれらの組合せからなる群から選択され、これにより、該少なくとも1種の反応性乾燥剤が該水分と反応して、(メタ)アクリル酸よりも高い沸点温度を有する生成物を生成するステップ;および
(c)該(メタ)アクリル酸流れから該生成物を分離するステップであって、これにより、精製された(メタ)アクリル酸流れを生成するステップ;
を含む、(メタ)アクリル酸を精製する方法。 - 少なくとも1種の反応性乾燥剤が該水分と反応して、少なくとも1種のアルデヒド処理化合物を生成する、請求項1記載の方法。
- 該(メタ)アクリル酸が、該蒸留系へ差し向けられる前に3000ppm以下のマレイン酸化合物を含む、請求項1記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US52525803P | 2003-11-26 | 2003-11-26 | |
US60/525258 | 2003-11-26 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004339877A Division JP4090465B2 (ja) | 2003-11-26 | 2004-11-25 | 水分含量が低減された(メタ)アクリル酸の製造プロセス |
Related Child Applications (1)
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---|---|---|---|
JP2011182554A Division JP2011231133A (ja) | 2003-11-26 | 2011-08-24 | 水分含量が低減された(メタ)アクリル酸の製造プロセス |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008120823A JP2008120823A (ja) | 2008-05-29 |
JP4850190B2 true JP4850190B2 (ja) | 2012-01-11 |
Family
ID=34465394
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004339877A Expired - Fee Related JP4090465B2 (ja) | 2003-11-26 | 2004-11-25 | 水分含量が低減された(メタ)アクリル酸の製造プロセス |
JP2008002963A Expired - Fee Related JP4850190B2 (ja) | 2003-11-26 | 2008-01-10 | 水分含量が低減された(メタ)アクリル酸の製造プロセス |
JP2011182554A Pending JP2011231133A (ja) | 2003-11-26 | 2011-08-24 | 水分含量が低減された(メタ)アクリル酸の製造プロセス |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004339877A Expired - Fee Related JP4090465B2 (ja) | 2003-11-26 | 2004-11-25 | 水分含量が低減された(メタ)アクリル酸の製造プロセス |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
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JP2011182554A Pending JP2011231133A (ja) | 2003-11-26 | 2011-08-24 | 水分含量が低減された(メタ)アクリル酸の製造プロセス |
Country Status (8)
Country | Link |
---|---|
US (3) | US7393976B2 (ja) |
EP (1) | EP1535894B1 (ja) |
JP (3) | JP4090465B2 (ja) |
KR (2) | KR100710858B1 (ja) |
CN (3) | CN100494156C (ja) |
BR (1) | BRPI0405080B1 (ja) |
DE (1) | DE602004017107D1 (ja) |
TW (1) | TWI263634B (ja) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7615806B2 (en) | 2005-10-31 | 2009-11-10 | Freescale Semiconductor, Inc. | Method for forming a semiconductor structure and structure thereof |
DE102006062258A1 (de) * | 2006-12-22 | 2008-06-26 | Basf Se | Verfahren zum Übertragen von Wärme auf ein wenigstens ein (Meth)acrylmonomeres enthaltendes flüssiges Gemsich |
JP5739600B2 (ja) * | 2007-12-17 | 2015-06-24 | 三菱レイヨン株式会社 | ヒドロキシエチルメタクリレートの製造方法 |
EP2135656A1 (en) * | 2008-05-30 | 2009-12-23 | Rohm and Haas Company | Method for production of purified (Meth)acrylic acid |
DE102008043609A1 (de) * | 2008-11-10 | 2010-05-12 | Evonik Röhm Gmbh | Verfahren zur Reduzierung des Wassergehalts in (Meth)acrylsäure |
CN102549028B (zh) * | 2009-09-30 | 2016-03-02 | 株式会社日本触媒 | 聚丙烯酸(盐)系吸水树脂及其制造方法 |
US20130281737A1 (en) * | 2010-12-29 | 2013-10-24 | Rohm And Haas Company | Method for reducing equipment fouling in (meth)acrylic acid production process |
US10421836B2 (en) * | 2014-07-03 | 2019-09-24 | Covestro Deutschland Ag | Process for purifying polycarbonate polyols and purifying apparatus therefor |
EP3333150B1 (en) * | 2015-08-07 | 2020-09-16 | Daikin Industries, Ltd. | Method for purifying acrylic acid derivative |
DE102016116078B3 (de) | 2016-08-29 | 2018-01-04 | Epc Engineering Consulting Gmbh | Verfahren zur Herstellung eines Polycarbonats unter Einsatz einer Strippvorrichtung |
GB201621975D0 (en) | 2016-12-22 | 2017-02-08 | Johnson Matthey Davy Technologies Ltd | Process |
GB201621985D0 (en) | 2016-12-22 | 2017-02-08 | Johnson Matthey Davy Technologies Ltd | Process |
FR3064630B1 (fr) * | 2017-04-04 | 2019-09-13 | Arkema France | Procede de purification d'acide (meth)acrylique incluant une colonne de distillation a paroi separatrice |
FR3094716B1 (fr) | 2019-04-02 | 2021-06-04 | Arkema France | Production d’acide acrylique de grade polymere |
CN110563943A (zh) * | 2019-09-09 | 2019-12-13 | 中国科学院长春应用化学研究所 | 一种生物基聚合物及其制备方法 |
FR3108906B1 (fr) | 2020-04-06 | 2022-03-04 | Arkema France | Procede de purification d’acide (meth)acrylique |
JP7537681B2 (ja) | 2020-09-15 | 2024-08-21 | 株式会社日本触媒 | アクリル酸の製造方法 |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
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US3725208A (en) * | 1971-08-20 | 1973-04-03 | Nippon Kayaku Kk | Process for purification of acrylic acid from aldehydes by distillation with a reagent |
CA962698A (en) * | 1972-01-31 | 1975-02-11 | The Standard Oil Company | Process for purification of acrylic acid |
DE4335172A1 (de) * | 1993-10-15 | 1995-04-20 | Basf Ag | Verfahren zur Reinigung von Roh-(Meth)acrylsäure |
US5523480A (en) * | 1994-03-28 | 1996-06-04 | Rohm And Haas Company | Process for purifying unsaturated carboxylic acids using distillation and melt crystallization |
US5759358A (en) * | 1994-05-31 | 1998-06-02 | Rohm And Haas Company | Process for pure grade acrylic acid |
US5571386A (en) * | 1994-05-31 | 1996-11-05 | Rohm And Haas Company | Process for grade acrylic acid |
JP3937462B2 (ja) * | 1994-08-04 | 2007-06-27 | 三菱化学株式会社 | アクリル酸精製法 |
US5482597A (en) * | 1994-11-23 | 1996-01-09 | Basf Aktiengesellschaft | Purification of crude (meth)acrylic acid |
JPH09208515A (ja) * | 1996-02-07 | 1997-08-12 | Idemitsu Petrochem Co Ltd | アクリル酸の製造方法 |
DE19624674A1 (de) | 1996-06-20 | 1998-01-02 | Basf Ag | Verfahren zur Entsorgung von bei der Acrylsäure- oder Methacrylsäure-Herstellung anfallenden Nebenkomponenten |
JPH1087552A (ja) * | 1996-09-11 | 1998-04-07 | Mitsubishi Chem Corp | 高純度アクリル酸の製造方法 |
DE19814449A1 (de) * | 1998-03-31 | 1999-10-07 | Basf Ag | Verfahren zur Herstellung von (Meth)acrylsäure und (Meth)acrylsäureestern |
DE60005870T2 (de) | 1999-03-05 | 2004-08-19 | Rohm And Haas Co. | Verfahren zur Herstellung von Acrylsäure |
JP5073129B2 (ja) | 1999-03-31 | 2012-11-14 | 株式会社日本触媒 | (メタ)アクリル酸の精製方法 |
EP1065197B1 (en) * | 1999-06-28 | 2002-11-06 | Rohm And Haas Company | Process for preparing (meth)acrylic acid |
US6639106B1 (en) | 1999-07-23 | 2003-10-28 | Rohm And Haas Company | Process for preparing and purifying acrylic acid from propylene having improved capacity |
JP3938646B2 (ja) * | 2000-01-14 | 2007-06-27 | 株式会社日本触媒 | アクリル酸の製造方法 |
JP4601120B2 (ja) * | 2000-05-08 | 2010-12-22 | 出光興産株式会社 | アクリル酸の製造方法 |
US6927268B2 (en) * | 2000-06-21 | 2005-08-09 | Nippon Shokubai Co., Ltd. | Production process for water-absorbent resin |
JP4765165B2 (ja) * | 2000-12-13 | 2011-09-07 | 東亞合成株式会社 | 高純度アクリル酸の製造方法 |
JP4759153B2 (ja) * | 2001-03-21 | 2011-08-31 | 株式会社日本触媒 | (メタ)アクリル酸溶液の蒸留方法 |
JP4034559B2 (ja) * | 2001-12-11 | 2008-01-16 | 三菱化学株式会社 | (メタ)アクリル酸類の蒸留方法 |
JP4440518B2 (ja) * | 2002-07-16 | 2010-03-24 | 株式会社日本触媒 | アクリル酸の製造方法 |
JP3905810B2 (ja) * | 2002-09-03 | 2007-04-18 | 株式会社日本触媒 | アクリル酸製造プロセスにおける重合防止方法 |
-
2004
- 2004-11-01 US US10/978,855 patent/US7393976B2/en active Active
- 2004-11-15 TW TW093134958A patent/TWI263634B/zh not_active IP Right Cessation
- 2004-11-15 DE DE602004017107T patent/DE602004017107D1/de active Active
- 2004-11-15 EP EP04257061A patent/EP1535894B1/en not_active Not-in-force
- 2004-11-17 BR BRPI0405080-0A patent/BRPI0405080B1/pt not_active IP Right Cessation
- 2004-11-19 CN CNB2004100953352A patent/CN100494156C/zh not_active Expired - Fee Related
- 2004-11-19 CN CN2009101414037A patent/CN101555200B/zh not_active Expired - Fee Related
- 2004-11-19 CN CN201210297096.3A patent/CN102786408B/zh not_active Expired - Fee Related
- 2004-11-23 KR KR1020040096297A patent/KR100710858B1/ko active IP Right Grant
- 2004-11-25 JP JP2004339877A patent/JP4090465B2/ja not_active Expired - Fee Related
-
2006
- 2006-09-18 KR KR1020060090154A patent/KR100766830B1/ko active IP Right Grant
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2008
- 2008-01-10 JP JP2008002963A patent/JP4850190B2/ja not_active Expired - Fee Related
- 2008-07-21 US US12/220,024 patent/US20090030165A1/en not_active Abandoned
-
2010
- 2010-10-28 US US12/914,396 patent/US20110105708A1/en not_active Abandoned
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2011
- 2011-08-24 JP JP2011182554A patent/JP2011231133A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
CN102786408A (zh) | 2012-11-21 |
CN101555200A (zh) | 2009-10-14 |
DE602004017107D1 (de) | 2008-11-27 |
TW200524853A (en) | 2005-08-01 |
KR100710858B1 (ko) | 2007-04-25 |
CN1636958A (zh) | 2005-07-13 |
CN102786408B (zh) | 2014-12-03 |
EP1535894B1 (en) | 2008-10-15 |
KR20060107963A (ko) | 2006-10-16 |
JP4090465B2 (ja) | 2008-05-28 |
CN101555200B (zh) | 2012-11-14 |
EP1535894A1 (en) | 2005-06-01 |
KR20050050552A (ko) | 2005-05-31 |
TWI263634B (en) | 2006-10-11 |
KR100766830B1 (ko) | 2007-10-17 |
US20050113605A1 (en) | 2005-05-26 |
BRPI0405080A (pt) | 2005-07-19 |
US20090030165A1 (en) | 2009-01-29 |
US20110105708A1 (en) | 2011-05-05 |
US7393976B2 (en) | 2008-07-01 |
CN100494156C (zh) | 2009-06-03 |
JP2008120823A (ja) | 2008-05-29 |
BRPI0405080B1 (pt) | 2015-04-22 |
JP2005154445A (ja) | 2005-06-16 |
JP2011231133A (ja) | 2011-11-17 |
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