JP4841114B2 - 高感度のゲートを有する電界効果トランジスタ - Google Patents
高感度のゲートを有する電界効果トランジスタ Download PDFInfo
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- JP4841114B2 JP4841114B2 JP2004119697A JP2004119697A JP4841114B2 JP 4841114 B2 JP4841114 B2 JP 4841114B2 JP 2004119697 A JP2004119697 A JP 2004119697A JP 2004119697 A JP2004119697 A JP 2004119697A JP 4841114 B2 JP4841114 B2 JP 4841114B2
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- cuprate
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- 230000005669 field effect Effects 0.000 title claims description 11
- 230000035945 sensitivity Effects 0.000 title description 5
- 239000000463 material Substances 0.000 claims description 64
- 239000004065 semiconductor Substances 0.000 claims description 56
- 238000000034 method Methods 0.000 claims description 48
- 239000010409 thin film Substances 0.000 claims description 28
- 230000005684 electric field Effects 0.000 claims description 20
- 239000011575 calcium Substances 0.000 claims description 12
- 239000002019 doping agent Substances 0.000 claims description 12
- 229910052712 strontium Inorganic materials 0.000 claims description 6
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 5
- 229910052791 calcium Inorganic materials 0.000 claims description 5
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 claims description 5
- 239000002178 crystalline material Substances 0.000 claims 1
- 239000010949 copper Substances 0.000 description 34
- 239000013078 crystal Substances 0.000 description 22
- 238000000151 deposition Methods 0.000 description 22
- 230000008569 process Effects 0.000 description 19
- 238000004519 manufacturing process Methods 0.000 description 18
- 230000008021 deposition Effects 0.000 description 15
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 11
- 239000000758 substrate Substances 0.000 description 11
- 229910052802 copper Inorganic materials 0.000 description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 8
- 230000008859 change Effects 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 238000003672 processing method Methods 0.000 description 7
- 238000005520 cutting process Methods 0.000 description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 239000008188 pellet Substances 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 239000003989 dielectric material Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 244000309464 bull Species 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 239000001993 wax Substances 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910004116 SrO 2 Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000007725 thermal activation Methods 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
- H01L29/51—Insulating materials associated therewith
- H01L29/517—Insulating materials associated therewith the insulating material comprising a metallic compound, e.g. metal oxide, metal silicate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/314—Inorganic layers
- H01L21/316—Inorganic layers composed of oxides or glassy oxides or oxide based glass
- H01L21/31604—Deposition from a gas or vapour
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
- H01L29/4908—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET for thin film semiconductor, e.g. gate of TFT
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/466—Lateral bottom-gate IGFETs comprising only a single gate
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Thin Film Transistor (AREA)
Description
ゲート構造体内において、ゲート電極14の表面に対する法線ベクトルは、バルク状Sr14Cu24O41結晶の「c」格子軸に対してある小さい角度をなしている。この角度が小さいことは、その誘電体スライス22Aが元々切断された向きに起因している。この角度の大きさは少なくとも45度未満である。
Claims (10)
- 電界効果トランジスタであって、
ゲート、ソース、およびドレイン電極と、
前記トランジスタの能動チャネルとして機能するように配置され、前記能動チャネルが、前記ソース電極とドレイン電極の間で電流を伝えるように構成されると共に、前記ゲート電極に印加された電圧に応じた導電率を有する半導体層と、
擬似1Dの電荷またはスピン密度波材料を含み、前記ゲート電極と前記半導体層の間に配置されているゲート誘電体と
を備える電界効果トランジスタ。 - 前記擬似1Dの電荷またはスピン密度波材料が、結晶性材料であり、前記半導体層の表面に対する法線ベクトルと45度未満の大きさを有する角度をなす1D非等方性軸を有している、請求項1に記載のトランジスタ。
- 前記擬似1Dの電荷またはスピン密度波材料が前記半導体層と接触している、請求項1に記載のトランジスタ。
- 前記擬似1Dの電荷またはスピン密度波材料が銅酸材料を含む、請求項1に記載のトランジスタ。
- 前記銅酸材料が多結晶性薄膜である、請求項4に記載のトランジスタ。
- 前記銅酸材料がストロンチウム・ドーパント原子とカルシウム・ドーパント原子のうちの一方を含む、請求項4に記載のトランジスタ。
- 前記銅酸材料がSr14Cu24O41を含む、請求項6に記載のトランジスタ。
- ゲート電極、ソース電極、ドレイン電極、および能動半導体チャネルを有する電界効果トランジスタを動作させる方法であって、
前記ソース電極と前記ドレイン電極の両端間で電圧を印加することによって前記能動半導体チャネル内に電流を確立する工程と、
前記チャネルと前記ゲート電極の間に配置された電荷またはスピン密度波材料内で電界強度が変化するように、ゲート電圧を調整することによって前記電流を変化させる工程と、
を含む方法。 - 前記電荷またはスピン密度波材料がゲート誘電体層として機能するように配置された銅酸ラダー材料である、請求項8に記載の方法。
- 前記銅酸ラダー材料が前記半導体チャネルと接触している、請求項9に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/413,966 US6724056B1 (en) | 2003-04-15 | 2003-04-15 | Field-effect transistors with high-sensitivity gates |
US10/413966 | 2003-04-15 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2004320034A JP2004320034A (ja) | 2004-11-11 |
JP4841114B2 true JP4841114B2 (ja) | 2011-12-21 |
Family
ID=32069720
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004119697A Expired - Fee Related JP4841114B2 (ja) | 2003-04-15 | 2004-04-15 | 高感度のゲートを有する電界効果トランジスタ |
Country Status (3)
Country | Link |
---|---|
US (1) | US6724056B1 (ja) |
JP (1) | JP4841114B2 (ja) |
CN (1) | CN100409453C (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7408235B2 (en) * | 2003-07-08 | 2008-08-05 | Los Alamos National Security, Llc | Quantum coherent switch utilizing commensurate nanoelectrode and charge density periodicities |
US8139283B2 (en) | 2007-11-09 | 2012-03-20 | Alcatel Lucent | Surface plasmon polariton modulation |
JP7485280B2 (ja) * | 2020-05-15 | 2024-05-16 | 国立大学法人東北大学 | ナノシートおよびナノシートの製造方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4580110A (en) | 1984-07-26 | 1986-04-01 | Exxon Research And Engineering Co. | Frequency modulator using material having sliding charge density waves |
US4636737A (en) | 1984-07-26 | 1987-01-13 | Exxon Research And Engineering Company | Frequency modulator and demodulator using material having sliding charge density waves |
US5523282A (en) | 1988-08-18 | 1996-06-04 | Trw Inc. | High-frequency substrate material for thin-film layered perovskite superconductors |
US5572052A (en) | 1992-07-24 | 1996-11-05 | Mitsubishi Denki Kabushiki Kaisha | Electronic device using zirconate titanate and barium titanate ferroelectrics in insulating layer |
JPH06151872A (ja) * | 1992-11-09 | 1994-05-31 | Mitsubishi Kasei Corp | Fet素子 |
DE59510349D1 (de) | 1995-04-24 | 2002-10-02 | Infineon Technologies Ag | Halbleiter-Speichervorrichtung unter Verwendung eines ferroelektrischen Dielektrikums und Verfahren zur Herstellung |
US6144546A (en) | 1996-12-26 | 2000-11-07 | Kabushiki Kaisha Toshiba | Capacitor having electrodes with two-dimensional conductivity |
JP2000228516A (ja) * | 1999-02-08 | 2000-08-15 | Tdk Corp | 半導体積層薄膜、電子デバイスおよびダイオード |
JP2002270828A (ja) * | 2001-03-09 | 2002-09-20 | Toshiba Corp | 半導体装置及びその製造方法 |
-
2003
- 2003-04-15 US US10/413,966 patent/US6724056B1/en not_active Expired - Lifetime
-
2004
- 2004-04-14 CN CNB2004100348209A patent/CN100409453C/zh not_active Expired - Fee Related
- 2004-04-15 JP JP2004119697A patent/JP4841114B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN1591898A (zh) | 2005-03-09 |
JP2004320034A (ja) | 2004-11-11 |
US6724056B1 (en) | 2004-04-20 |
CN100409453C (zh) | 2008-08-06 |
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