JP4838430B2 - 露光装置及びデバイス製造方法 - Google Patents

露光装置及びデバイス製造方法 Download PDF

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Publication number
JP4838430B2
JP4838430B2 JP2001019262A JP2001019262A JP4838430B2 JP 4838430 B2 JP4838430 B2 JP 4838430B2 JP 2001019262 A JP2001019262 A JP 2001019262A JP 2001019262 A JP2001019262 A JP 2001019262A JP 4838430 B2 JP4838430 B2 JP 4838430B2
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JP
Japan
Prior art keywords
optical system
lens
illumination
light
exposure apparatus
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Expired - Fee Related
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JP2001019262A
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English (en)
Japanese (ja)
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JP2002222757A (ja
JP2002222757A5 (enExample
Inventor
道生 河野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
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Canon Inc
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Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2001019262A priority Critical patent/JP4838430B2/ja
Publication of JP2002222757A publication Critical patent/JP2002222757A/ja
Publication of JP2002222757A5 publication Critical patent/JP2002222757A5/ja
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Publication of JP4838430B2 publication Critical patent/JP4838430B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
JP2001019262A 2001-01-26 2001-01-26 露光装置及びデバイス製造方法 Expired - Fee Related JP4838430B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001019262A JP4838430B2 (ja) 2001-01-26 2001-01-26 露光装置及びデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001019262A JP4838430B2 (ja) 2001-01-26 2001-01-26 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2002222757A JP2002222757A (ja) 2002-08-09
JP2002222757A5 JP2002222757A5 (enExample) 2008-03-06
JP4838430B2 true JP4838430B2 (ja) 2011-12-14

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ID=18885170

Family Applications (1)

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JP2001019262A Expired - Fee Related JP4838430B2 (ja) 2001-01-26 2001-01-26 露光装置及びデバイス製造方法

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JP (1) JP4838430B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3984950B2 (ja) 2003-11-12 2007-10-03 キヤノン株式会社 照明光学系及びそれを有する露光装置
US7400381B2 (en) * 2004-05-26 2008-07-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2006084479A1 (en) * 2005-02-12 2006-08-17 Carl Zeiss Smt Ag Microlithographic projection exposure apparatus
JP2008172272A (ja) * 2008-03-21 2008-07-24 Carl Zeiss Smt Ag マイクロリソグラフィ投影露光装置
EP2876499B1 (en) * 2013-11-22 2017-05-24 Carl Zeiss SMT GmbH Illumination system of a microlithographic projection exposure apparatus
JPWO2024134780A1 (enExample) * 2022-12-20 2024-06-27
CN116921817B (zh) * 2023-09-15 2023-12-15 中建安装集团有限公司 自动tig焊电弧聚集度在线监测及智能预警方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62115718A (ja) * 1985-11-14 1987-05-27 Canon Inc 照明光学系
JP3101613B2 (ja) * 1998-01-30 2000-10-23 キヤノン株式会社 照明光学装置及び投影露光装置
JP4238390B2 (ja) * 1998-02-27 2009-03-18 株式会社ニコン 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法
JP2001244168A (ja) * 2000-02-25 2001-09-07 Nikon Corp 露光装置および該露光装置を用いてマイクロデバイスを製造する方法
JP3937580B2 (ja) * 1998-04-30 2007-06-27 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法

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Publication number Publication date
JP2002222757A (ja) 2002-08-09

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