JP4830418B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
- Publication number
- JP4830418B2 JP4830418B2 JP2005270844A JP2005270844A JP4830418B2 JP 4830418 B2 JP4830418 B2 JP 4830418B2 JP 2005270844 A JP2005270844 A JP 2005270844A JP 2005270844 A JP2005270844 A JP 2005270844A JP 4830418 B2 JP4830418 B2 JP 4830418B2
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- Prior art keywords
- oxide film
- silicon oxide
- semiconductor device
- film
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000004065 semiconductor Substances 0.000 title claims description 78
- 239000010408 film Substances 0.000 claims description 146
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 82
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 82
- 239000000758 substrate Substances 0.000 claims description 52
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 31
- 229920005591 polysilicon Polymers 0.000 claims description 30
- 238000000034 method Methods 0.000 claims description 24
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 19
- 229910052710 silicon Inorganic materials 0.000 claims description 19
- 239000010703 silicon Substances 0.000 claims description 19
- 239000010409 thin film Substances 0.000 claims description 16
- 230000015572 biosynthetic process Effects 0.000 claims description 10
- 238000000137 annealing Methods 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 12
- 239000007789 gas Substances 0.000 description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 7
- 239000001257 hydrogen Substances 0.000 description 7
- 229910052739 hydrogen Inorganic materials 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- DYRBFMPPJATHRF-UHFFFAOYSA-N chromium silicon Chemical compound [Si].[Cr] DYRBFMPPJATHRF-UHFFFAOYSA-N 0.000 description 6
- 239000003990 capacitor Substances 0.000 description 5
- 238000005530 etching Methods 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 238000005468 ion implantation Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000005368 silicate glass Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- UMVBXBACMIOFDO-UHFFFAOYSA-N [N].[Si] Chemical compound [N].[Si] UMVBXBACMIOFDO-UHFFFAOYSA-N 0.000 description 1
- 238000001505 atmospheric-pressure chemical vapour deposition Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035272—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions characterised by at least one potential jump barrier or surface barrier
- H01L31/035281—Shape of the body
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
- B81C1/00055—Grooves
- B81C1/00071—Channels
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/05—Microfluidics
- B81B2201/058—Microfluidics not provided for in B81B2201/051 - B81B2201/054
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/06—Bio-MEMS
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0161—Controlling physical properties of the material
- B81C2201/0163—Controlling internal stress of deposited layers
- B81C2201/0169—Controlling internal stress of deposited layers by post-annealing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Description
例えば請求項2に記載のように、前記基板表面に、ストライプ状の溝が、複数本、略平行に形成されることで、前記シリコン酸化膜の波形構造が、前記複数本の溝に挟まれた基板上に、前記線状に連なった波の山部が前記溝のストライプ方向と略垂直に交わるようにして、安定的に形成される。
また、請求項3に記載のように、前記シリコン酸化膜が、ストライプ状のパターンに形成される場合にも、前記シリコン酸化膜の波形構造が、前記線状に連なった波の山部が前記パターンのストライプ方向と略垂直に交わるようにして、安定的に形成される。
1 (シリコン半導体)基板
2,2a〜2c シリコン酸化膜
3,3a,3b ポリシリコン膜
Claims (9)
- シリコン(Si)半導体からなる基板上に、部分的に基板表面から浮き上がって形成された、立体構造のシリコン酸化膜を有してなる半導体装置であって、
前記立体構造が、前記基板表面から浮き上がって形成された部分が線状に連なった波の山部をなす、波形構造であることを特徴とする半導体装置。 - 前記基板表面に、ストライプ状の溝が、複数本、略平行に形成され、
前記シリコン酸化膜の波形構造が、前記複数本の溝に挟まれた基板上に、前記線状に連なった波の山部が前記溝のストライプ方向と略垂直に交わるようにして、形成されてなることを特徴とする請求項1に記載の半導体装置。 - 前記シリコン酸化膜が、ストライプ状のパターンに形成されてなり、
前記シリコン酸化膜の波形構造が、前記線状に連なった波の山部が前記パターンのストライプ方向と略垂直に交わるようにして、形成されてなることを特徴とする請求項1に記載の半導体装置。 - 前記シリコン酸化膜が、形成方法の異なる多層膜からなり、
前記基板との界面を構成する下層膜が、熱酸化膜であることを特徴とする請求項1乃至3のいずれか一項に記載の半導体装置。 - 前記シリコン酸化膜上に、ポリシリコン膜が形成されてなることを特徴とする請求項1乃至4のいずれか一項に記載の半導体装置。
- 前記ポリシリコン膜が、薄膜抵抗として用いられることを特徴とする請求項5に記載の半導体装置。
- 前記ポリシリコン膜が、太陽電池として用いられることを特徴とする請求項5に記載の半導体装置。
- 前記シリコン酸化膜上に、容量素子が形成されてなることを特徴とする請求項1乃至4のいずれか一項に記載の半導体装置。
- 前記シリコン酸化膜上に、センサ素子が形成されてなることを特徴とする請求項1乃至4のいずれか一項に記載の半導体装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005270844A JP4830418B2 (ja) | 2005-09-16 | 2005-09-16 | 半導体装置 |
US11/519,064 US7541257B2 (en) | 2005-09-16 | 2006-09-12 | Semiconductor device having three-dimensional construction and method for manufacturing the same |
DE102006043360A DE102006043360B4 (de) | 2005-09-16 | 2006-09-15 | Verfahren zur Herstellung einer Halbleitervorrichtung mit dreidimensionalem Aufbau |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005270844A JP4830418B2 (ja) | 2005-09-16 | 2005-09-16 | 半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007081337A JP2007081337A (ja) | 2007-03-29 |
JP4830418B2 true JP4830418B2 (ja) | 2011-12-07 |
Family
ID=37832806
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005270844A Expired - Fee Related JP4830418B2 (ja) | 2005-09-16 | 2005-09-16 | 半導体装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US7541257B2 (ja) |
JP (1) | JP4830418B2 (ja) |
DE (1) | DE102006043360B4 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102007022748B4 (de) * | 2007-05-15 | 2009-03-05 | Qimonda Ag | Verfahren zur Strukturierung eines Materials und strukturiertes Material |
WO2012043616A1 (ja) * | 2010-09-28 | 2012-04-05 | 株式会社村田製作所 | 圧電デバイス、圧電デバイスの製造方法 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4784975A (en) * | 1986-10-23 | 1988-11-15 | International Business Machines Corporation | Post-oxidation anneal of silicon dioxide |
US4851370A (en) * | 1987-12-28 | 1989-07-25 | American Telephone And Telegraph Company, At&T Bell Laboratories | Fabricating a semiconductor device with low defect density oxide |
JP3060486B2 (ja) * | 1990-05-22 | 2000-07-10 | 日本電気株式会社 | Soi基板の形成方法 |
JPH07122710A (ja) | 1993-10-28 | 1995-05-12 | Hitachi Ltd | 受動体を有する半導体装置及びその製造方法 |
FR2756847B1 (fr) * | 1996-12-09 | 1999-01-08 | Commissariat Energie Atomique | Procede de separation d'au moins deux elements d'une structure en contact entre eux par implantation ionique |
JP3187754B2 (ja) * | 1997-09-26 | 2001-07-11 | 富士電機株式会社 | 半導体センサおよびその製造方法 |
FR2767604B1 (fr) * | 1997-08-19 | 2000-12-01 | Commissariat Energie Atomique | Procede de traitement pour le collage moleculaire et le decollage de deux structures |
US6551946B1 (en) * | 1999-06-24 | 2003-04-22 | Agere Systems Inc. | Two-step oxidation process for oxidizing a silicon substrate wherein the first step is carried out at a temperature below the viscoelastic temperature of silicon dioxide and the second step is carried out at a temperature above the viscoelastic temperature |
JP2001053250A (ja) | 1999-08-06 | 2001-02-23 | Hitachi Ltd | 半導体装置およびその製造方法 |
US6864532B2 (en) * | 2000-01-14 | 2005-03-08 | Denso Corporation | Semiconductor device and method for manufacturing the same |
ITMI20010039A1 (it) * | 2000-01-14 | 2002-07-11 | Denso Corp | Dispositivo a semiconduttori e metodo per la fabbricazione dello stesso |
TW544849B (en) * | 2000-08-29 | 2003-08-01 | Samsung Electronics Co Ltd | Method for manufacturing semiconductor device |
US6620681B1 (en) * | 2000-09-08 | 2003-09-16 | Samsung Electronics Co., Ltd. | Semiconductor device having desired gate profile and method of making the same |
US6414365B1 (en) * | 2001-10-01 | 2002-07-02 | Koninklijke Philips Electronics N.V. | Thin-layer silicon-on-insulator (SOI) high-voltage device structure |
KR100464852B1 (ko) * | 2002-08-07 | 2005-01-05 | 삼성전자주식회사 | 반도체 장치의 게이트 산화막 형성방법 |
JP4046014B2 (ja) * | 2003-05-30 | 2008-02-13 | 株式会社デンソー | 構造体の製造方法 |
US7166525B2 (en) * | 2004-01-15 | 2007-01-23 | Taiwan Semiconductor Manufacturing Company, Ltd. | High temperature hydrogen annealing of a gate insulator layer to increase etching selectivity between conductive gate structure and gate insulator layer |
-
2005
- 2005-09-16 JP JP2005270844A patent/JP4830418B2/ja not_active Expired - Fee Related
-
2006
- 2006-09-12 US US11/519,064 patent/US7541257B2/en not_active Expired - Fee Related
- 2006-09-15 DE DE102006043360A patent/DE102006043360B4/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US20070066052A1 (en) | 2007-03-22 |
DE102006043360B4 (de) | 2011-12-08 |
JP2007081337A (ja) | 2007-03-29 |
US7541257B2 (en) | 2009-06-02 |
DE102006043360A1 (de) | 2007-03-29 |
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