JP4805740B2 - 振動に敏感な要素を支持する支持装置 - Google Patents
振動に敏感な要素を支持する支持装置 Download PDFInfo
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- JP4805740B2 JP4805740B2 JP2006193740A JP2006193740A JP4805740B2 JP 4805740 B2 JP4805740 B2 JP 4805740B2 JP 2006193740 A JP2006193740 A JP 2006193740A JP 2006193740 A JP2006193740 A JP 2006193740A JP 4805740 B2 JP4805740 B2 JP 4805740B2
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- 239000012530 fluid Substances 0.000 claims description 15
- 230000003068 static effect Effects 0.000 claims description 12
- 230000008859 change Effects 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 230000005534 acoustic noise Effects 0.000 claims description 2
- 238000001459 lithography Methods 0.000 description 18
- 230000005540 biological transmission Effects 0.000 description 11
- 238000005259 measurement Methods 0.000 description 10
- 238000005452 bending Methods 0.000 description 7
- 230000008901 benefit Effects 0.000 description 5
- 230000001105 regulatory effect Effects 0.000 description 5
- 238000007789 sealing Methods 0.000 description 5
- 230000033001 locomotion Effects 0.000 description 4
- 238000003466 welding Methods 0.000 description 4
- 238000011109 contamination Methods 0.000 description 3
- 230000001276 controlling effect Effects 0.000 description 3
- 230000007774 longterm Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000021715 photosynthesis, light harvesting Effects 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000011217 control strategy Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000010720 hydraulic oil Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
- F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
- F16F15/04—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using elastic means
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
- F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
- F16F15/023—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means
- F16F15/027—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means comprising control arrangements
- F16F15/0275—Control of stiffness
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Aviation & Aerospace Engineering (AREA)
- Health & Medical Sciences (AREA)
- Acoustics & Sound (AREA)
- General Physics & Mathematics (AREA)
- Environmental & Geological Engineering (AREA)
- Public Health (AREA)
- Epidemiology (AREA)
- Toxicology (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Vibration Prevention Devices (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Diaphragms And Bellows (AREA)
- Fluid-Damping Devices (AREA)
Description
・オープンガス(開放ガス)システムであり、漏れがある。静的(固定式)気体ベアリングは、空気供給ユニットからの連続した気体流を必要とする。
・このシステムは、リソグラフィ/計測ツールのウェハ及びその他の汚染に敏感な部分/要素のための汚染を防止するために、超微細(<0.003um)粒子フィルタを有する必要がある。
・既知のシステムに対して大きな変更を行わずして、真空用途で使用することができない。
・使用される気体ベアリングは、高精度部(許容範囲はおよそ+/−1μm)を必要とする。
・気体ベアリングは、汚染に非常に敏感である。
2 ベースフレーム
3 ペイロード
5 支持装置
8 気体バネ(圧力室)
8a 上部室
8b 下部室
8c 縁溶接ベローズ
8d 追加容積部
8e 接続管路
9 弾性ヒンジ
11 一次元バネ
12 ローレンツモータ
23 バネ/負の剛性モジュール
24 絞り
26 圧力供給装置
31 加圧器
32 圧力供給室
33 プランジャ
34 コントローラ
Claims (23)
- リソグラフィ装置又は計測装置で使用し、基部に対して荷重を相対的に支持する支持装置であって、
荷重側部分と、基部側部分と、前記荷重側部分に支持を与え、前記基部側及び前記荷重側を基準にして支持方向を規定する中間部分とを備え、
該中間部分は、室壁で囲まれた圧力室を有し、
前記支持方向に平行に変形可能に設けられ、かつ前記支持方向に垂直な方向には実質的に変形せず、さらに、前記支持方向に直交する2つの垂直軸まわりに屈曲可能とされていて、前記荷重側部分よりも前記基部側部分の近くに配置される部分を、該室壁が少なくとも有し、
前記室壁の部分は、前記圧力室の一部分を囲む鉛直部分を含み、該鉛直部分の主要部分は、前記荷重側部分よりも前記基部側部分の近くに配置され、
前記室壁の部分は、前記圧力室を上部圧力室と流通圧力室とに分割し、前記上部圧力室は剛性の室壁で囲まれ、接続部材を介して前記荷重側部分に接続され、
前記支持方向に平行な方向においては屈曲せず、前記支持方向に直交する2つの垂直軸まわりに屈曲することができる前記接続部材により、前記上部圧力室が前記荷重側部分に接続される、
支持装置。 - 前記圧力室は、流通圧力室に連通接続する下部圧力室をさらに備える、請求項1に記載の支持装置。
- 前記室壁の部分はダイアフラム状構造で構成されている、請求項1に記載の支持装置。
- 前記ダイアフラム状構造はダイアフラムリングを備え、該ダイアフラムリングは、内側及び外側が共に縁溶接されて縁溶接ベローズを形成する、請求項3に記載の支持装置。
- 前記ダイアフラムリングは金属で形成されている、請求項4に記載の支持装置。
- 前記圧力室に接続する外部圧力室をさらに備える、請求項1ないし5のいずれか一項に記載の支持装置。
- 前記圧力室に流体圧力を供給する手段を備え、前記圧力室に流体が封入される、請求項1ないし6のいずれか一項に記載の支持装置。
- 前記圧力供給手段は、圧力発生手段と、前記圧力室を該圧力供給手段に相互接続する供給管路とを備える、請求項7に記載の支持装置。
- 前記圧力供給手段は、前記供給管路を制限する絞りをさらに備える、請求項8に記載の支持装置。
- 前記圧力供給手段は、前記圧力を低圧から高圧に変える手段をさらに備える、請求項8又は9に記載の支持装置。
- 前記圧力発生手段は、或る容積を含む圧力供給室及び該室の該容積を低減する手段を備える、請求項8に記載の支持装置。
- 前記圧力供給手段は、圧力調整手段及び/又は圧力制御手段を備える、請求項7ないし11のいずれか一項に記載の支持装置。
- 前記接続部材は金属で形成された弾性ヒンジである、請求項1に記載の支持装置。
- 前記支持方向に垂直な方向において前記荷重側部分に作用する少なくとも1つの一次元バネを備える、請求項1ないし13のいずれか一項に記載の支持装置。
- 前記圧力室は負の剛性モジュールに連結される、請求項1に記載の支持装置。
- 前記負の剛性モジュールは前記支持方向に平行に作用する、請求項15に記載の支持装置。
- 一対のローレンツアクチュエータを前記荷重側部分と前記基部側部分の間にさらに備える、請求項1ないし16のいずれか一項に記載の支持装置。
- 音響雑音を含む外乱力とステージ及びモータからの残留力とを含む静的力、前記圧力室内の圧力変化、及び/又は前記圧力室内の気体を含む圧力流体の温度変化を制御する制御手段が設けられる、請求項1ないし17のいずれか一項に記載の支持装置。
- 振動に敏感な装置を担持する荷重担持組立体であって、
ベースフレームと、
振動に敏感な装置を担持するペイロードと、
少なくとも3つの、請求項1ないし18のいずれか一項に記載の支持装置と
を備える、振動に敏感な装置を担持する荷重担持組立体。 - 請求項19に記載の荷重担持組立体であって、
前記支持装置は、前記ベースフレームと前記ペイロードとの間、及び/又は該荷重担持組立体の設置場所と前記ベースフレームとの間に設けられる、請求項19に記載の荷重担持組立体。 - 前記支持装置及び/又は前記組立体は真空室に設けられる、請求項19又は20に記載の荷重担持組立体。
- 請求項19ないし21のいずれか一項に記載の荷重担持組立体を備える計測装置。
- 請求項19ないし21のいずれか一項に記載の荷重担持組立体を備えるリソグラフィ装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP05015497A EP1744215B1 (en) | 2005-07-16 | 2005-07-16 | Supporting device for supporting vibration sensitive components |
EP05015497.0 | 2005-07-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007024313A JP2007024313A (ja) | 2007-02-01 |
JP4805740B2 true JP4805740B2 (ja) | 2011-11-02 |
Family
ID=36264024
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006193740A Active JP4805740B2 (ja) | 2005-07-16 | 2006-07-14 | 振動に敏感な要素を支持する支持装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US8256735B2 (ja) |
EP (1) | EP1744215B1 (ja) |
JP (1) | JP4805740B2 (ja) |
Families Citing this family (28)
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DE502005008008D1 (de) * | 2005-12-30 | 2009-10-08 | Integrated Dynamics Eng Gmbh | Hybrides Steifigkeitsmodul zur Schwingungsisolation |
US20080061948A1 (en) * | 2006-08-18 | 2008-03-13 | Daniel Perez | System and method for communicating with gate operators via a power line |
US20080094186A1 (en) * | 2006-10-04 | 2008-04-24 | Viking Access Systems, Llc | Apparatus and method for monitoring and controlling gate operators via power line communication |
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US20090085719A1 (en) * | 2007-09-28 | 2009-04-02 | Daniel Perez | System and method for monitoring and controlling a movable barrier operator utilizing satellite communication capabilities |
DE102007059631B4 (de) * | 2007-12-10 | 2009-09-17 | Integrated Dynamics Engineering Gmbh | Schwingungsisolator zur Verwendung im Vakuum |
US20090188166A1 (en) * | 2008-01-24 | 2009-07-30 | Hassan Taheri | System for gearless operation of a movable barrier utilizing lorentz forces |
US7816875B2 (en) * | 2008-01-24 | 2010-10-19 | Viking Access Systems, Llc | High torque gearless actuation at low speeds for swing gate, roll-up gate, slide gate, and vehicular barrier operators |
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-
2005
- 2005-07-16 EP EP05015497A patent/EP1744215B1/en active Active
-
2006
- 2006-07-14 JP JP2006193740A patent/JP4805740B2/ja active Active
- 2006-07-14 US US11/457,582 patent/US8256735B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
EP1744215A1 (en) | 2007-01-17 |
US8256735B2 (en) | 2012-09-04 |
EP1744215B1 (en) | 2012-09-12 |
JP2007024313A (ja) | 2007-02-01 |
US20070052946A1 (en) | 2007-03-08 |
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