JP4759760B2 - Fine atomization particle cleaning equipment - Google Patents

Fine atomization particle cleaning equipment Download PDF

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JP4759760B2
JP4759760B2 JP2005212039A JP2005212039A JP4759760B2 JP 4759760 B2 JP4759760 B2 JP 4759760B2 JP 2005212039 A JP2005212039 A JP 2005212039A JP 2005212039 A JP2005212039 A JP 2005212039A JP 4759760 B2 JP4759760 B2 JP 4759760B2
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atomized
atomized particles
fine
atomizing
carrier gas
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年昭 宮本
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Honda Electronics Co Ltd
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Description

本発明は、半導体ウエハ、液晶硝子基板等の被洗浄物を洗浄するようにした微細霧化粒子洗浄装置に関するものである。   The present invention relates to a fine atomized particle cleaning apparatus configured to clean an object to be cleaned such as a semiconductor wafer or a liquid crystal glass substrate.

従来の超音波洗浄装置としては、図３に示すように、ノズル１に装着した洗浄液供給管２からノズル１の内部に洗浄液を供給し、超音波発振器からリード線３を介してノズル１内の超音波振動子に発振出力を供給することにより、回転する半導体ウエハのような被洗浄物５の上にノズル１から洗浄液４が供給されるとともに、この洗浄液４に超音波振動子からの超音波を乗せて被洗浄物５に照射して洗浄するようにした洗浄装置が提案されている。   As shown in FIG. 3, a conventional ultrasonic cleaning apparatus supplies cleaning liquid into the nozzle 1 from a cleaning liquid supply pipe 2 attached to the nozzle 1, and the inside of the nozzle 1 through a lead wire 3 from an ultrasonic oscillator. By supplying the oscillation output to the ultrasonic vibrator, the cleaning liquid 4 is supplied from the nozzle 1 onto the object to be cleaned 5 such as a rotating semiconductor wafer, and the ultrasonic wave from the ultrasonic vibrator is applied to the cleaning liquid 4. A cleaning apparatus has been proposed in which an object to be cleaned 5 is irradiated and cleaned.

しかしながら、最近の半導体製造技術では、０．１５μｍ以細レベルの超微細パターンによって半導体ウエハを形成しているが、このような微細パターンにおいて、その障害となる超微粒子の許容形状は０．０３μｍのオーダであり、このような障害となる超微粒子を除去するには、図３に示すような超音波洗浄装置では、対応することができないという問題があり、又、流水が半導体の表面に吹き付けられるために、被洗浄体である半導体の表面を乾燥しなければならないという問題があった。
特願２０００−３６９４９０ However, in the recent semiconductor manufacturing technology, a semiconductor wafer is formed with an ultrafine pattern of a level of 0.15 μm or less. In order to remove the ultrafine particles that are in the order, such an obstacle, there is a problem that the ultrasonic cleaning apparatus as shown in FIG. For this reason, there has been a problem that the surface of the semiconductor to be cleaned must be dried.
Japanese Patent Application 2000-369490

解決しようとする問題点は、従来の超音波洗浄装置では、微細粒子を除去することができないという点であり、又、洗浄した後の乾燥に問題があるという点である。   The problem to be solved is that the conventional ultrasonic cleaning apparatus cannot remove fine particles, and there is a problem in drying after cleaning.

本発明では、液体供給装置から霧化液体が供給され、該供給された霧化液体を霧化する超音波振動子が底部に装着され、該超音波振動子の上部に装着され、前記霧化液体の近傍に掛けて内部に傾斜して仕切板を設け、超音波振動子で霧化された霧化粒子に、前記超音波振動子の上部に装着された吹き出し口から、搬送ガス供給装置からの搬送ガスを前記仕切板に吹き付けて大径の霧化粒子が除去される霧化部と、該霧化部から搬送管を通って搬送された微小霧化粒子から大径の霧化粒子を除去するフィルタを備えたデミスタ部と、該デミスタ部から搬送ガスとともに搬送された微小霧化粒子を吹き出すノズル部とを備え、該ノズル部から吹き出された微小霧化粒子を被洗浄体に吹き付けて洗浄することを特徴とするものであり、又、前記デミスタ部から搬送ガスとともに搬送された霧化粒子を冷却装置で冷却して、さらに大径の霧化粒子を除去し、前記ノズル部から前記被洗浄体に吹き付けて洗浄するものであり、さらに、前記搬送ガス供給装置から搬送されるガスは窒素ガス、アルゴン、炭酸ガス又はドライエアーであり、又、前記霧化液体は機能水又は電解イオン水である。 In the present invention, an atomizing liquid is supplied from a liquid supply device, an ultrasonic vibrator for atomizing the supplied atomizing liquid is attached to the bottom , and the atomizing liquid is attached to the top of the ultrasonic vibrator. From the carrier gas supply device to the atomized particles atomized by the ultrasonic vibrator, from the outlet attached to the upper part of the ultrasonic vibrator , provided with a partition plate inclined near the liquid and inclined inside The atomizing part from which the large diameter atomized particles are removed by spraying the carrier gas to the partition plate, and the large atomized particles from the fine atomized particles conveyed from the atomizing part through the conveying pipe. A demister unit having a filter to be removed, and a nozzle unit that blows out the fine atomized particles conveyed together with the carrier gas from the demister unit, and sprays the fine atomized particles blown out from the nozzle unit onto the object to be cleaned. Cleaning, and the demi The atomized particles conveyed together with the carrier gas from the nozzle unit are cooled by a cooling device, and further the larger diameter atomized particles are removed, and the object to be cleaned is sprayed and washed from the nozzle unit, gas is conveyed from the carrier gas supply unit is a nitrogen gas, argon, carbon dioxide gas or dry air, also, the atomized liquid is functioning water or electrolytic ionic water.

本発明の微細粒子洗浄装置では、超音波振動子によって霧化液体が霧化された霧化粒子をデミスタ部のフィルタを通すことによって、大径の霧化粒子を除去し、微細な霧化粒子のみをノズル部から被洗浄体に吹き付けることによって、被洗浄体の表面に付着している障害となる微細粒子を除去することにより、被洗浄物を洗浄することができるという利点がある。   In the fine particle cleaning apparatus of the present invention, the atomized particles, in which the atomized liquid is atomized by the ultrasonic vibrator, are passed through the filter of the demister part, thereby removing the large-diameter atomized particles. There is an advantage that the object to be cleaned can be cleaned by spraying only the nozzle part from the nozzle part onto the object to be cleaned, thereby removing the fine particles that become an obstacle attached to the surface of the object to be cleaned.

図１は本発明の実施例の微細霧化粒子洗浄装置の構成図で、霧化部６は霧化液体供給装置７から霧化液体８が供給され、霧化液体８の中に超音波振動子９が装着されて、超音波振動子９に発振器１０から発振出力が供給されることにより霧化液体８が霧化されて霧化粒子１１が発生し、又、霧化部６の上部に搬送ガス供給装置１２が接続され、霧化部６内に超音波振動子の上部に装着され、前記霧化液体の近傍に掛けて内部に傾斜して仕切板６ａが形成され、搬送ガス供給装置１２から供給された搬送ガスによって、超音波振動子９で発生した霧化粒子１１は仕切板６ａで大径の霧化粒子が除去され、微小霧化粒子が霧化部６から搬送管１３を通ってデミスタ部１４に搬送される。霧化された液には当然粒子の大小のものが混在している。そこで、搬送ガスを斜めに設置した仕切り板６ａに吹き付けると、ガスは仕切り板６ａに当たって反射して霧化粒子を下に抑え込むように流れる。この時、大粒の液粒子は液面に衝突して液化してしまうが、微細粒子は搬送ガスに乗って霧化槽から搬送管を通ってデミスタ部１４へ送られる。 FIG. 1 is a configuration diagram of a fine atomization particle cleaning apparatus according to an embodiment of the present invention. An atomization unit 6 is supplied with an atomization liquid 8 from an atomization liquid supply apparatus 7, and ultrasonic vibration is generated in the atomization liquid 8. When the child 9 is attached and the oscillation output is supplied from the oscillator 10 to the ultrasonic vibrator 9, the atomized liquid 8 is atomized to generate atomized particles 11. A carrier gas supply device 12 is connected , attached to the upper part of the ultrasonic transducer in the atomizing section 6, is inclined near the atomizing liquid and is formed inside the partition plate 6 a, and the carrier gas supply device The atomized particles 11 generated by the ultrasonic vibrator 9 are removed from the atomizing particle 11 by the partition plate 6a by the carrier gas supplied from 12, and the fine atomized particles are transferred from the atomizing unit 6 through the conveying tube 13 to the atomized particles 11. Then, it is conveyed to the demister unit 14. Naturally, the atomized liquid contains small and large particles. Therefore, when the carrier gas is sprayed on the partition plate 6a installed at an angle, the gas flows against the partition plate 6a so as to be reflected and suppress the atomized particles downward. At this time, the large liquid particles collide with the liquid surface and are liquefied, but the fine particles ride on the carrier gas and are sent from the atomization tank to the demister section 14 through the carrier pipe.

デミスタ部１４にフィルタ１５が装着され、搬送ガスとともに搬送された微小霧化粒子の中でさらに大径の霧化粒子は除去され、フィルタ１５を通過した搬送ガスで搬送される微細霧化粒子は搬送管１６からノズル部１７に搬送され、ノズル部１７から被洗浄体１８に吹き付けられて、被洗浄体１８の微細パターン及びその間に付着している微細粒子が微細霧化粒子によって除去される。   A filter 15 is attached to the demister unit 14, and the atomized particles having a larger diameter are removed from the fine atomized particles conveyed together with the carrier gas, and the fine atomized particles conveyed by the carrier gas that has passed through the filter 15 are It is conveyed to the nozzle part 17 from the conveyance pipe | tube 16, and is sprayed to the to-be-cleaned body 18 from the nozzle part 17, and the fine pattern of the to-be-cleaned body 18 and the fine particle adhering between them are removed by the fine atomization particle | grains.

このように構成された本実施例の微細粒子洗浄装置では、霧化部６で超音波振動子９により発生した微小霧化粒子は搬送ガスとともに搬送管１３を通ってデミスタ部１４に搬送され、デミスタ部１４で微細粒子のみが通過されるフィルタ１５で大径の霧化粒子及び微小霧化粒子が除去され、微小霧化粒子のみが搬送管１４を通ってノズル部１７から被洗浄体１８に吹き付けられることにより、被洗浄体１８の微細パターン及びその間に付着している微細粒子がノズル部１７から吹き付けられる微細霧化粒子によって被洗浄体１８の微細パターン及びその間に付着している微細粒子が除去される。   In the fine particle cleaning apparatus of the present embodiment configured as described above, the fine atomized particles generated by the ultrasonic vibrator 9 in the atomization unit 6 are conveyed to the demister unit 14 through the conveyance tube 13 together with the carrier gas, Large diameter atomized particles and minute atomized particles are removed by a filter 15 through which only fine particles pass in the demister unit 14, and only the minute atomized particles pass from the nozzle unit 17 to the object 18 to be cleaned through the transport pipe 14. By being sprayed, the fine pattern of the object to be cleaned 18 and the fine particles adhering therebetween are sprayed from the nozzle portion 17 so that the fine pattern of the object to be cleaned 18 and the fine particles adhering between them are Removed.

図２は本発明の他の実施例の微細霧化粒子洗浄装置の構成図で、６は霧化部、６ａは仕切板、７は霧化液体供給装置、８は霧化液体、９は超音波振動子、１０は発振器、１１は霧化粒子、１２は搬送ガス供給装置、１３は搬送管、１４はデミスタ部、１５はフィルタ、１６は搬送管、１７はノズル部、１８は被洗浄体であり、これらの構成は上記実施例と同じであるので、説明は省略するが、本実施例では、デミスタ部１４に接続された搬送管１３は冷却装置１９を装着した冷却部２０に接続され、冷却部２０に接続された搬送管２１にノズル部１７が接続されている。   FIG. 2 is a configuration diagram of a fine atomizing particle cleaning apparatus according to another embodiment of the present invention, in which 6 is an atomizing section, 6a is a partition plate, 7 is an atomizing liquid supply apparatus, 8 is an atomizing liquid, and 9 is super Sonic vibrator, 10 oscillator, 11 atomized particles, 12 carrier gas supply device, 13 carrier tube, 14 demister unit, 15 filter, 16 carrier tube, 17 nozzle unit, 18 object to be cleaned Since these configurations are the same as those in the above embodiment, the description is omitted, but in this embodiment, the transport pipe 13 connected to the demister section 14 is connected to the cooling section 20 equipped with the cooling device 19. The nozzle unit 17 is connected to the transport pipe 21 connected to the cooling unit 20.

このように構成された本実施例の微細霧化粒子洗浄装置では、デミスタ部１４のフィルタ１５で微小霧化粒子となって搬送ガスとともに搬送された霧化粒子は冷却部２０で冷却されて、さらに微小霧化粒子が除去され、微細霧化粒子のみが搬送ガスとともに搬送管２１からノズル部１７に搬送され、ノズル部１７から被洗浄体１８に吹き付けられ、被洗浄体１８の微細パターン及びその間に付着している微細粒子が除去される。   In the fine atomized particle cleaning apparatus of the present embodiment configured as described above, the atomized particles that are transported along with the carrier gas by the filter 15 of the demister unit 14 are cooled by the cooling unit 20, Further, the fine atomized particles are removed, and only the fine atomized particles are transported from the transport pipe 21 to the nozzle unit 17 together with the transport gas, and are sprayed from the nozzle unit 17 to the object 18 to be cleaned. Fine particles adhering to are removed.

本実施例は、このように構成することにより、ノズル部１７から被洗浄体１８に吹き付けられる霧化粒子乾燥され、それによってさらに微細な霧化粒子を作ることにより、被洗浄体１８の微細パターン及びその間に付着しているさらに微細な粒子が除去される。   In the present embodiment, the atomized particles sprayed from the nozzle portion 17 to the object to be cleaned 18 are dried by this configuration, and thereby finer atomized particles are produced, whereby the fine pattern of the object to be cleaned 18 is obtained. And finer particles adhering between them are removed.

なお、上記実施例では、霧化部６に仕切板６ａを入れて大径の霧化粒子を除去するようにしたが、霧化部６で霧化した霧化粒子をそのまま搬送ガスとともに搬送してもよいし、他の構成で大径の霧化粒子を除去してもよいし、霧化部６は霧化粒子を発生すればよく、又、搬送ガス供給装置１２から供給されるガスとしては窒素ガス、アルゴン、炭酸ガス又はドライエアーが有効であり、又、霧化液体としては、機能水、純水、電解イオン水が使用され、さらに、上記図１及び図２のノズル部１７の近傍に別の搬送ガス供給装置を接続して、ノズル部１７から噴射するガスの加速用に使用してもよい。 In the above embodiment, the partition plate 6a is inserted into the atomizing unit 6 to remove the large-diameter atomized particles, but the atomized particles atomized by the atomizing unit 6 are transported together with the carrier gas. Alternatively, the atomized particles having a large diameter may be removed by another configuration, the atomizing unit 6 may generate the atomized particles, and the gas supplied from the carrier gas supply device 12 may be used. Nitrogen gas, argon, carbon dioxide gas or dry air is effective, and functional water, pure water, or electrolytic ion water is used as the atomizing liquid, and the nozzle portion 17 of FIGS. Another carrier gas supply device may be connected in the vicinity and used for accelerating the gas injected from the nozzle unit 17.

本発明の実施例の微細霧化粒子洗浄装置の構成図である。It is a block diagram of the fine atomization particle cleaning apparatus of the Example of this invention. 本発明の他の実施例の微細霧化粒子洗浄装置の構成図である。It is a block diagram of the fine atomization particle | grain washing apparatus of the other Example of this invention. 従来の超音波洗浄装置の斜視図である。It is a perspective view of the conventional ultrasonic cleaning apparatus.

６ 霧化部
６ａ 仕切板
７ 霧化液体供給装置
８ 霧化液体
９ 超音波振動子
１０ 発振器
１１ 霧化粒子
１２ 搬送ガス供給装置
１３ 搬送管
１４ デミスタ部
１５ フィルタ
１６ 搬送管
１７ ノズル部
１８ 被洗浄体
１９ 冷却装置
２０ 冷却部
２１ 搬送管 DESCRIPTION OF SYMBOLS 6 Atomization part 6a Partition plate 7 Atomization liquid supply apparatus 8 Atomization liquid 9 Ultrasonic vibrator 10 Oscillator 11 Atomization particle 12 Carrier gas supply apparatus 13 Conveyance pipe 14 Demister part 15 Filter 16 Conveyance pipe 17 Nozzle part 18 To be cleaned Body 19 Cooling device 20 Cooling unit 21 Transport pipe

Claims (4)

液体供給装置から霧化液体が供給され、該供給された霧化液体を霧化する超音波振動子が底部に装着され、該超音波振動子の上部に装着され、前記霧化液体の近傍に掛けて内部に傾斜して仕切板を設け、超音波振動子で霧化された霧化粒子に、前記超音波振動子の上部に装着された吹き出し口から、搬送ガス供給装置からの搬送ガスを前記仕切板に吹き付けて大径の霧化粒子が除去される霧化部と、該霧化部から搬送管を通って搬送された微小霧化粒子から大径の霧化粒子を除去するフィルタを備えたデミスタ部と、該デミスタ部から搬送ガスとともに搬送された微小霧化粒子を吹き出すノズル部とを備え、該ノズル部から吹き出された微小霧化粒子を被洗浄体に吹き付けて洗浄することを特徴とする微細霧化粒子洗浄装置。 An atomizing liquid is supplied from a liquid supply device, and an ultrasonic vibrator for atomizing the supplied atomizing liquid is attached to the bottom, attached to the top of the ultrasonic vibrator, and in the vicinity of the atomizing liquid. multiplied provided partition plates inclined therein, the atomized particles atomized by the ultrasonic vibrator, from said outlet mounted on the top of the ultrasonic transducer, the carrier gas from the carrier gas supply device An atomizing section that sprays the partition plate to remove large-diameter atomized particles, and a filter that removes large-diameter atomized particles from the micro-atomized particles conveyed from the atomizing section through a conveying tube. A demister unit provided and a nozzle unit for blowing out the fine atomized particles conveyed from the demister unit together with the carrier gas, and spraying the fine atomized particles blown out from the nozzle unit on the object to be cleaned. Features a fine atomized particle cleaning device. 前記デミスタ部から搬送ガスとともに搬送された霧化粒子を冷却装置で冷却して、さらに大径の霧化粒子を除去し、前記ノズル部から前記被洗浄体に吹き付けて洗浄することを特徴とする請求項１記載の微細霧化粒子洗浄装置。   The atomized particles conveyed together with the carrier gas from the demister unit are cooled by a cooling device, and further, the large-diameter atomized particles are removed, and the object to be cleaned is sprayed and washed from the nozzle unit. The fine atomized particle cleaning apparatus according to claim 1. 前記搬送ガス供給装置から搬送されるガスは窒素ガス、アルゴン、炭酸ガス又はドライエアーであることを特徴とする請求項１及び２のいずれか１項記載の微細霧化粒子洗浄装置。   The fine atomized particle cleaning apparatus according to any one of claims 1 and 2, wherein the gas conveyed from the carrier gas supply device is nitrogen gas, argon, carbon dioxide gas, or dry air. 前記霧化液体は機能水又は電解イオン水であることを特徴とする請求項１及び２のいずれか１項記載の微細霧化粒子洗浄装置。 The atomized liquid is finely atomized particles cleaning device according to any one of claims 1 and 2 characterized in that it is a function water or electrolytic ionic water.
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