JP4753049B2 - 微粒子表面への金属コーティング方法および該方法によって金属コーティングされた微粒子 - Google Patents

微粒子表面への金属コーティング方法および該方法によって金属コーティングされた微粒子 Download PDF

Info

Publication number
JP4753049B2
JP4753049B2 JP2007174981A JP2007174981A JP4753049B2 JP 4753049 B2 JP4753049 B2 JP 4753049B2 JP 2007174981 A JP2007174981 A JP 2007174981A JP 2007174981 A JP2007174981 A JP 2007174981A JP 4753049 B2 JP4753049 B2 JP 4753049B2
Authority
JP
Japan
Prior art keywords
fine particles
metal
metal coating
thin film
coated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2007174981A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009013454A (ja
JP2009013454A5 (enExample
Inventor
拓男 田中
伸幸 武安
聡 河田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIKEN
Original Assignee
RIKEN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIKEN filed Critical RIKEN
Priority to JP2007174981A priority Critical patent/JP4753049B2/ja
Publication of JP2009013454A publication Critical patent/JP2009013454A/ja
Publication of JP2009013454A5 publication Critical patent/JP2009013454A5/ja
Application granted granted Critical
Publication of JP4753049B2 publication Critical patent/JP4753049B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Chemically Coating (AREA)
JP2007174981A 2007-07-03 2007-07-03 微粒子表面への金属コーティング方法および該方法によって金属コーティングされた微粒子 Expired - Fee Related JP4753049B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007174981A JP4753049B2 (ja) 2007-07-03 2007-07-03 微粒子表面への金属コーティング方法および該方法によって金属コーティングされた微粒子

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007174981A JP4753049B2 (ja) 2007-07-03 2007-07-03 微粒子表面への金属コーティング方法および該方法によって金属コーティングされた微粒子

Publications (3)

Publication Number Publication Date
JP2009013454A JP2009013454A (ja) 2009-01-22
JP2009013454A5 JP2009013454A5 (enExample) 2010-08-19
JP4753049B2 true JP4753049B2 (ja) 2011-08-17

Family

ID=40354719

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007174981A Expired - Fee Related JP4753049B2 (ja) 2007-07-03 2007-07-03 微粒子表面への金属コーティング方法および該方法によって金属コーティングされた微粒子

Country Status (1)

Country Link
JP (1) JP4753049B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2535311B1 (en) * 2010-02-09 2018-12-12 Industry-University Cooperation Foundation Sogang University Particle and method for manufacturing same

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3077475B2 (ja) * 1993-10-22 2000-08-14 上村工業株式会社 粒子の無電解めっき方法及び無電解めっき装置
JP2004225138A (ja) * 2003-01-27 2004-08-12 Sumitomo Bakelite Co Ltd 導電性微粒子の製造方法
JP2007098955A (ja) * 2006-11-29 2007-04-19 Azuma Denkosha:Kk 他物体との接触摩擦により表面が摩耗することを考慮した物品

Also Published As

Publication number Publication date
JP2009013454A (ja) 2009-01-22

Similar Documents

Publication Publication Date Title
Zhang et al. One-step nanoscale assembly of complex structures via harnessing of an elastic instability
KR101114256B1 (ko) 패턴 제조 방법
Bai et al. A review of smart superwetting surfaces based on shape‐memory micro/nanostructures
Park et al. Fabrication and applications of stimuli‐responsive micro/nanopillar arrays
US20200385850A1 (en) Nanoparticle fabrication
US8802214B2 (en) Non-random array anisotropic conductive film (ACF) and manufacturing processes
Sung et al. Fabrication of superhydrophobic surfaces with nano-in-micro structures using UV-nanoimprint lithography and thermal shrinkage films
US7764004B2 (en) Large area induced assembly of nanostructures
KR101033273B1 (ko) 초소수성 폴리머 구조물의 제조
KR102254683B1 (ko) 패턴화된 나노와이어 투명 전도체들에 대한 전자 컴포넌트들의 본딩
US20110192233A1 (en) Versatile high aspect ratio actuatable nanostructured materials through replication
KR100806513B1 (ko) 전도성층의 패턴화 방법, 이를 이용한 편광소자의 제조방법 및 이 방법에 의하여 제조된 편광소자
CN101910829A (zh) 制造微阵列的方法
KR20170032093A (ko) 나노전사 프린팅 방법 및 이를 이용하여 제작되는 sers 기판, sers 바이얼 및 sers 패치
JP4753049B2 (ja) 微粒子表面への金属コーティング方法および該方法によって金属コーティングされた微粒子
JP4297919B2 (ja) 疏水性表面を有する高分子基材製造用鋳型の製造方法
US20050243268A1 (en) Pair of substrates spaced from each other by spacers having a pre-determined pattern and method of making thereof
TWI709744B (zh) 用於分子檢測的分子載體
KR20150137179A (ko) 입자 정렬을 이용한 코팅 방법
KR101940238B1 (ko) 금속 스탬프 제조 방법
KR102131301B1 (ko) 고분자 중공 입자 및 그 제조방법 및 이를 포함하는 복합체
KR101522283B1 (ko) 임베드된 패턴 구조체를 갖는 몰드 및 도금을 이용하여 나노 금속 패턴의 전사 방법 및 이를 통해 제조된 기판
JP2012011478A (ja) 微小構造体及び微細パターンの形成方法
JP6634721B2 (ja) インプリント用モールド、および、その離型処理方法
CN112041146A (zh) 用于制造包括设有表面结构的表面的构件的方法

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100702

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20100702

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20100702

A975 Report on accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A971005

Effective date: 20100728

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20110112

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110201

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110324

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20110412

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20110510

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140603

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees