JP4745092B2 - 黒色感光性組成物、この黒色感光性組成物より製造された遮光膜及びｅｌ素子 - Google Patents
黒色感光性組成物、この黒色感光性組成物より製造された遮光膜及びｅｌ素子 Download PDFInfo
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- JP4745092B2 JP4745092B2 JP2006075272A JP2006075272A JP4745092B2 JP 4745092 B2 JP4745092 B2 JP 4745092B2 JP 2006075272 A JP2006075272 A JP 2006075272A JP 2006075272 A JP2006075272 A JP 2006075272A JP 4745092 B2 JP4745092 B2 JP 4745092B2
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- photosensitive composition
- black
- shielding film
- pigment
- black photosensitive
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Materials For Photolithography (AREA)
- Electroluminescent Light Sources (AREA)
- Optical Filters (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006075272A JP4745092B2 (ja) | 2006-03-17 | 2006-03-17 | 黒色感光性組成物、この黒色感光性組成物より製造された遮光膜及びｅｌ素子 |
| KR1020070011945A KR20070094459A (ko) | 2006-03-17 | 2007-02-06 | 흑색 감광성 조성물, 이 흑색 감광성 조성물로 제조된차광막 및 ｅｌ 소자 |
| TW096104848A TW200745746A (en) | 2006-03-17 | 2007-02-09 | Black photosensitive composition, light shielding film produced from the same and EL device |
| CNA200710087762XA CN101038437A (zh) | 2006-03-17 | 2007-03-08 | 黑色感光性组合物以及由其制备的遮光膜和el元件 |
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| JP2006075272A JP4745092B2 (ja) | 2006-03-17 | 2006-03-17 | 黒色感光性組成物、この黒色感光性組成物より製造された遮光膜及びｅｌ素子 |
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| Publication Number | Publication Date |
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| JP2007249045A JP2007249045A (ja) | 2007-09-27 |
| JP4745092B2 true JP4745092B2 (ja) | 2011-08-10 |
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| JP2006075272A Active JP4745092B2 (ja) | 2006-03-17 | 2006-03-17 | 黒色感光性組成物、この黒色感光性組成物より製造された遮光膜及びｅｌ素子 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4745092B2 (ko) |
| KR (1) | KR20070094459A (ko) |
| CN (1) | CN101038437A (ko) |
| TW (1) | TW200745746A (ko) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4745093B2 (ja) * | 2006-03-17 | 2011-08-10 | 東京応化工業株式会社 | 黒色感光性組成物 |
| KR100937201B1 (ko) * | 2007-11-30 | 2010-01-19 | 제일모직주식회사 | 흑색 감광성 수지 조성물 |
| TWI459051B (zh) * | 2012-03-01 | 2014-11-01 | Chi Mei Corp | 感光性樹脂組成物、黑色矩陣、彩色濾光片及其液晶顯示元件 |
| KR101858766B1 (ko) * | 2013-07-31 | 2018-05-16 | 동우 화인켐 주식회사 | 흑색 감광성 수지 조성물, 컬러필터 및 이를 구비한 액정표시장치 |
| CN106547168B (zh) * | 2016-10-28 | 2020-09-01 | 深圳市华星光电技术有限公司 | 一种黑色矩阵材料组合物及应用 |
| CN115466543B (zh) * | 2022-10-19 | 2024-02-27 | 福斯特(安吉)新材料有限公司 | 光固化黑色喷墨用封装组合物、封装结构和其应用 |
| CN116107164B (zh) * | 2022-12-30 | 2024-02-20 | 浙江鑫柔科技有限公司 | 光刻胶组合物、金属导电图案、其制备方法及触控屏 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0463870A (ja) * | 1990-07-03 | 1992-02-28 | Ube Ind Ltd | 黒色光硬化性ポリマー組成物及び黒色の光硬化膜の形成方法 |
| JPH0728236A (ja) * | 1993-05-12 | 1995-01-31 | Fuji Photo Film Co Ltd | 遮光性感光性樹脂組成物および遮光性画像の形成方法 |
| JP2005227797A (ja) * | 1997-02-28 | 2005-08-25 | Mitsubishi Chemicals Corp | ブラックマトリックス形成用ブラックレジスト組成物 |
| JP2005242279A (ja) * | 2003-04-24 | 2005-09-08 | Sumitomo Chemical Co Ltd | 黒色感光性樹脂組成物 |
-
2006
- 2006-03-17 JP JP2006075272A patent/JP4745092B2/ja active Active
-
2007
- 2007-02-06 KR KR1020070011945A patent/KR20070094459A/ko not_active Application Discontinuation
- 2007-02-09 TW TW096104848A patent/TW200745746A/zh unknown
- 2007-03-08 CN CNA200710087762XA patent/CN101038437A/zh active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0463870A (ja) * | 1990-07-03 | 1992-02-28 | Ube Ind Ltd | 黒色光硬化性ポリマー組成物及び黒色の光硬化膜の形成方法 |
| JPH0728236A (ja) * | 1993-05-12 | 1995-01-31 | Fuji Photo Film Co Ltd | 遮光性感光性樹脂組成物および遮光性画像の形成方法 |
| JP2005227797A (ja) * | 1997-02-28 | 2005-08-25 | Mitsubishi Chemicals Corp | ブラックマトリックス形成用ブラックレジスト組成物 |
| JP2005242279A (ja) * | 2003-04-24 | 2005-09-08 | Sumitomo Chemical Co Ltd | 黒色感光性樹脂組成物 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200745746A (en) | 2007-12-16 |
| CN101038437A (zh) | 2007-09-19 |
| JP2007249045A (ja) | 2007-09-27 |
| KR20070094459A (ko) | 2007-09-20 |
| TWI377441B (ko) | 2012-11-21 |
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