JP4744383B2 - プローバ - Google Patents
プローバ Download PDFInfo
- Publication number
- JP4744383B2 JP4744383B2 JP2006199649A JP2006199649A JP4744383B2 JP 4744383 B2 JP4744383 B2 JP 4744383B2 JP 2006199649 A JP2006199649 A JP 2006199649A JP 2006199649 A JP2006199649 A JP 2006199649A JP 4744383 B2 JP4744383 B2 JP 4744383B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- temperature
- alignment microscope
- heat
- heat shield
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000007246 mechanism Effects 0.000 claims description 22
- 239000000523 sample Substances 0.000 description 28
- 230000008859 change Effects 0.000 description 12
- 238000012360 testing method Methods 0.000 description 12
- 239000002826 coolant Substances 0.000 description 9
- 230000003287 optical effect Effects 0.000 description 9
- 239000000110 cooling liquid Substances 0.000 description 7
- 238000005286 illumination Methods 0.000 description 7
- 238000007689 inspection Methods 0.000 description 7
- 238000012546 transfer Methods 0.000 description 6
- 238000001816 cooling Methods 0.000 description 5
- 238000001514 detection method Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 238000004070 electrodeposition Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000004148 unit process Methods 0.000 description 1
Images
Description
19 アライメント顕微鏡
26 ヒータ
27 チャック冷却液経路
28 冷却液源
71 遮熱板
73 ヒートパイプ
81 ヒートシンク(熱交換器)
W ウエハ
Claims (1)
- ウエハ上に形成された複数のデバイスをテスタで検査をするために、前記テスタの各端子を前記デバイスの電極に接続するプローバであって、
ウエハを保持するウエハチャックと、
前記ウエハチャックを移動する移動機構と、
前記ウエハチャックの温度を調整して、保持したウエハを所定の温度にする温度調整機構と、
前記ウエハチャックに保持された前記ウエハの前記デバイスの前記電極と前記テスタの各端子との位置関係を測定するため、前記デバイスの表面画像を検出するアライメント顕微鏡と、
前記アライメント顕微鏡の下側に設けられた遮熱板と、
前記遮熱板と前記アライメント顕微鏡との間に設けられたヒートパイプと、
前記ヒートパイプにより移送される熱の熱交換器と、を備えることを特徴とするプローバ。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006199649A JP4744383B2 (ja) | 2006-07-21 | 2006-07-21 | プローバ |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006199649A JP4744383B2 (ja) | 2006-07-21 | 2006-07-21 | プローバ |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008028184A JP2008028184A (ja) | 2008-02-07 |
JP4744383B2 true JP4744383B2 (ja) | 2011-08-10 |
Family
ID=39118505
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006199649A Active JP4744383B2 (ja) | 2006-07-21 | 2006-07-21 | プローバ |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4744383B2 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105277757A (zh) * | 2014-07-24 | 2016-01-27 | 京元电子股份有限公司 | 降低镜头模块环境温度的装置及其方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01278739A (ja) * | 1988-04-30 | 1989-11-09 | Nippon Denshi Zairyo Kk | 半導体ウェハー低温試験装置 |
JPH0722480A (ja) * | 1993-07-02 | 1995-01-24 | Graphtec Corp | テレビカメラ観察装置 |
JP2002328091A (ja) * | 2001-05-01 | 2002-11-15 | Nippon Steel Corp | 高温試料のレーザ発光分析装置用プローブおよび高温試料のレーザ発光分析方法 |
-
2006
- 2006-07-21 JP JP2006199649A patent/JP4744383B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP2008028184A (ja) | 2008-02-07 |
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