JP4708860B2 - 液浸露光装置 - Google Patents

液浸露光装置 Download PDF

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Publication number
JP4708860B2
JP4708860B2 JP2005149329A JP2005149329A JP4708860B2 JP 4708860 B2 JP4708860 B2 JP 4708860B2 JP 2005149329 A JP2005149329 A JP 2005149329A JP 2005149329 A JP2005149329 A JP 2005149329A JP 4708860 B2 JP4708860 B2 JP 4708860B2
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Japan
Prior art keywords
wafer
gas
optical element
liquid film
stage
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Expired - Fee Related
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JP2005149329A
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Japanese (ja)
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JP2006332100A (ja
JP2006332100A5 (enExample
Inventor
浩司 伊藤
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Canon Inc
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Canon Inc
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Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005149329A priority Critical patent/JP4708860B2/ja
Publication of JP2006332100A publication Critical patent/JP2006332100A/ja
Publication of JP2006332100A5 publication Critical patent/JP2006332100A5/ja
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Publication of JP4708860B2 publication Critical patent/JP4708860B2/ja
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005149329A 2005-05-23 2005-05-23 液浸露光装置 Expired - Fee Related JP4708860B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005149329A JP4708860B2 (ja) 2005-05-23 2005-05-23 液浸露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005149329A JP4708860B2 (ja) 2005-05-23 2005-05-23 液浸露光装置

Publications (3)

Publication Number Publication Date
JP2006332100A JP2006332100A (ja) 2006-12-07
JP2006332100A5 JP2006332100A5 (enExample) 2008-07-03
JP4708860B2 true JP4708860B2 (ja) 2011-06-22

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ID=37553519

Family Applications (1)

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JP2005149329A Expired - Fee Related JP4708860B2 (ja) 2005-05-23 2005-05-23 液浸露光装置

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JP (1) JP4708860B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4899473B2 (ja) * 2005-12-28 2012-03-21 株式会社ニコン 結像光学系、露光装置及びデバイスの製造方法
US7866637B2 (en) 2007-01-26 2011-01-11 Asml Netherlands B.V. Humidifying apparatus, lithographic apparatus and humidifying method
JP5157637B2 (ja) * 2008-05-21 2013-03-06 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1610361B1 (en) * 2003-03-25 2014-05-21 Nikon Corporation Exposure system and device production method
SG2014015176A (en) * 2003-04-10 2015-06-29 Nippon Kogaku Kk Environmental system including vacuum scavange for an immersion lithography apparatus
KR101931923B1 (ko) * 2003-06-19 2018-12-21 가부시키가이샤 니콘 노광 장치 및 디바이스 제조방법
JP2005064210A (ja) * 2003-08-12 2005-03-10 Nikon Corp 露光方法、該露光方法を利用した電子デバイスの製造方法及び露光装置

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JP2006332100A (ja) 2006-12-07

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