JP4692276B2 - Support stage and mask stage using support mechanism - Google Patents

Support stage and mask stage using support mechanism Download PDF

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JP4692276B2
JP4692276B2 JP2005378598A JP2005378598A JP4692276B2 JP 4692276 B2 JP4692276 B2 JP 4692276B2 JP 2005378598 A JP2005378598 A JP 2005378598A JP 2005378598 A JP2005378598 A JP 2005378598A JP 4692276 B2 JP4692276 B2 JP 4692276B2
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mask
support
displacement
fixed
stage
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JP2007178819A (en
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米太 田中
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Ushio Denki KK
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Ushio Denki KK
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Priority to KR1020060101924A priority patent/KR101025086B1/en
Priority to CN2006101727127A priority patent/CN1991593B/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25B—TOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
    • B25B11/00—Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
    • B25B11/005—Vacuum work holders
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Description

本発明は、露光光を照射してマスクパターンをワークに転写する露光装置や、マスクを介して接着剤が塗布された領域のみに紫外線を照射して２枚のパネルを貼り合せる貼り合せ装置等に適用される、マスク等の平面板を複数の支持体により支持する支持機構およびこの支持機構を使ったマスクステージに関する。   The present invention is an exposure apparatus that irradiates exposure light to transfer a mask pattern onto a workpiece, a bonding apparatus that irradiates only an area where an adhesive is applied via a mask, and bonds two panels together. The present invention relates to a support mechanism for supporting a flat plate such as a mask by a plurality of supports, and a mask stage using the support mechanism.

例えば、露光光をパターンが形成されたマスク（レチクルと呼ばれることもある）を介して、感光剤が塗布されたワークに照射してマスクのパターンをワークに転写する露光装置や、液晶パネルの貼り合せ工程等のように遮光部が形成されたマスクを介して接着剤が塗布された領域のみに紫外線を照射し２枚のパネルを貼り合せる貼り合せ装置において、上記パターンや遮光部を形成したマスクは、装置内でマスクステージに固定保持される。 上記マスクを保持するマスクステージは、例えば特許文献１、特許文献２、特許文献３などに記載されている。
特許文献１に記載のものは、マスクステージの周辺部に真空吸着機構を設け、マスクを真空吸着により保持するようにしたものである。
また、特許文献２，３に記載のものは、マスク保持枠、あるいはマスク保持フレームを３点の支持体で支持するようにしたものである。 For example, an exposure apparatus that irradiates a workpiece coated with a photosensitive agent through a mask (also called a reticle) with a pattern of exposure light to transfer the mask pattern onto the workpiece, or a liquid crystal panel attachment. In a bonding apparatus that irradiates only an area where an adhesive is applied through a mask in which a light shielding part is formed, such as an alignment process, and bonds two panels, the mask in which the pattern and the light shielding part are formed Is fixedly held on the mask stage in the apparatus. The mask stage holding the mask is described in, for example, Patent Document 1, Patent Document 2, and Patent Document 3.
The device described in Patent Document 1 is provided with a vacuum suction mechanism in the periphery of the mask stage so that the mask is held by vacuum suction.
Further, those described in Patent Documents 2 and 3 are such that the mask holding frame or the mask holding frame is supported by three supports.

図６に従来のマスクステージの構成を示す。
マスクステージ１０は、主に、マスク２０を保持するステージベース１１と、ステージベース１１をＸＹθ（マスクの平面内の直交する２方向、およびその平面に直交する軸の回りの回転）、場合によってはＺ方向（マスクの平面に対して直交する方向）にも移動させるステージ移動機構１２とから構成される。
ステージベース１１には、マスク２０を介してワーク（図示せず）に照射される光（露光光・紫外線）が通過する開口１１ａが設けられている。
また、上記開口１１ａの周辺部には、マスク２０を保持するための真空吸着溝１１ｂが形成され、マスク２０の周辺部を吸着することにより、マスク２０をステージベース１１に保持固定する。
マスク２０は、全周にわたってステージベース１１に吸着保持されるので、ステージベース１１の平面度は精度よく加工する必要がある。
ステージベース１１の平面度が悪いと、ワークに転写されるパターンにゆがみが出たり、光が照射される位置がずれたりするなど、露光精度・光照射精度が悪くなる。
特開平１１−１８６１２４号公報 特開平９−２８１７１７号公報 特開平１０−３３５２０４号公報 FIG. 6 shows the configuration of a conventional mask stage.
The mask stage 10 is mainly composed of a stage base 11 that holds the mask 20 and the stage base 11 as XYθ (two directions orthogonal to each other in the plane of the mask and rotation about an axis orthogonal to the plane). The stage moving mechanism 12 is also configured to move in the Z direction (direction orthogonal to the plane of the mask).
The stage base 11 is provided with an opening 11a through which light (exposure light / ultraviolet light) irradiated to a work (not shown) through the mask 20 passes.
A vacuum suction groove 11b for holding the mask 20 is formed around the opening 11a. The mask 20 is held and fixed to the stage base 11 by sucking the periphery of the mask 20.
Since the mask 20 is sucked and held on the stage base 11 over the entire circumference, the flatness of the stage base 11 needs to be processed with high accuracy.
If the flatness of the stage base 11 is poor, the exposure accuracy and the light irradiation accuracy deteriorate, for example, the pattern transferred to the workpiece is distorted or the position where the light is irradiated is shifted.
JP 11-186124 A JP-A-9-281717 Japanese Patent Laid-Open No. 10-335204

露光されるワーク（例えばプリント基板）や、貼り合せを行なう液晶パネルは、年々大型化する。例えば、貼り合せを行なう液晶パネル用のガラス基板は、一辺が２ｍを超えるものも出てきた。
ワークが大型化するにつれて、光（露光光・紫外線）を照射する領域も広くなるためマスクも大型化する。マスクが大型化するにつれて、マスクを保持するマスクステージのステージベースも大型化する。
図６に示したような開口を有する大きなステージベース１１は、平面度良く加工することが難しい。開口を有する部材を平面加工することはもともと難しいし、平面加工してから開口を設けようとすると、開口を設ける加工時にそりやゆがみが発生する。
その対策として、ステージベースによりマスクの全周を吸着保持する方法に変えて、前記特許文献２，３に示されるようにステージベースの上に支持体を立て、マスクを３点で支持することが考えられる。 Workpieces to be exposed (for example, printed circuit boards) and liquid crystal panels for bonding are becoming larger year by year. For example, a glass substrate for a liquid crystal panel to be bonded has come out with a side exceeding 2 m.
As the workpiece becomes larger, the area to which light (exposure light / ultraviolet rays) is irradiated becomes wider, so that the mask becomes larger. As the mask becomes larger, the stage base of the mask stage that holds the mask also becomes larger.
It is difficult to process the large stage base 11 having an opening as shown in FIG. 6 with good flatness. It is originally difficult to planarize a member having an opening, and if an opening is to be provided after the planarization, warping or distortion occurs during the process of providing the opening.
As a countermeasure, instead of the method of sucking and holding the entire circumference of the mask by the stage base, a support is set up on the stage base as shown in Patent Documents 2 and 3, and the mask is supported at three points. Conceivable.

マスクは基本的には平面の板であるから、図７に示すように、ステージベース１１に３本の支持体１３を設け、マスク２０を３点支持すれば、理想的にはマスク２０は平面になるはずである。しかし、マスク２０が大型である場合、３点のみの支持では、図７矢印に示すように、マスク２０の支持されていない部分で自重によるたわみが生じる。マスク２０がたわむと、前記したように転写されるパターンにゆがみが出たり、光が照射される位置がずれたりするなど、露光精度・光照射精度が悪くなる。
本発明は上記問題点を解決するためになされたものであって、その目的は、マスク等の平面板を複数の支持体により支持するに際し、自重によるたわみを補償し、平面板を、平面を保った状態で支持できるようにすることである。 Since the mask is basically a flat plate, as shown in FIG. 7, if the stage base 11 is provided with three supports 13 and supports the mask 20 at three points, the mask 20 is ideally flat. Should be. However, when the mask 20 is large, when only three points are supported, deflection due to its own weight occurs in the unsupported portion of the mask 20, as shown by the arrows in FIG. If the mask 20 bends, the exposure accuracy and light irradiation accuracy deteriorate, such as distortion of the transferred pattern as described above and displacement of the light irradiation position.
The present invention has been made to solve the above-mentioned problems, and its purpose is to compensate for deflection due to its own weight when a flat plate such as a mask is supported by a plurality of supports, and to It is to be able to support in a maintained state.

上記課題を本発明においては、次のように解決する。
（１）平面板を複数の支持体により支持する支持機構において、ベース上に高さが不変の固定式の支持体と、高さが可変の変位式の支持体とを合計４個以上設ける。
上記固定式の支持体は、上記ベース上に取り付けられた台座の上に回転軸受けを介して取り付けられ、上記平面板を裏面から保持する真空吸着部を有し、上記変位式の支持体は、シャフトを上下動させるエアシリンダと、上記シャフトに連結された板状体と、該板状体を介して上記シャフトの位置を一定の位置に保持する保持手段と、上記シャフトの先端に回転軸受けを介して取り付けられ、上記平面板を裏面から保持する真空吸着部とを有する。
（２）上記（１）において、固定式の支持体を３個以下とする。
（３）上記（１）において、支持体の全てを変位式の支持体とする。
（４）上記（１）（２）（３）において、平面板を、パターンを形成したマスクとする。 In the present invention, the above problem is solved as follows.
(1) In a support mechanism for supporting a flat plate by a plurality of supports, a total of four or more fixed support members having a constant height and a displacement support member having a variable height are provided on the base.
The fixed support is mounted on a pedestal mounted on the base via a rotary bearing, and has a vacuum suction portion that holds the flat plate from the back surface, and the displacement support is An air cylinder for moving the shaft up and down, a plate-like body connected to the shaft, holding means for holding the position of the shaft at a fixed position via the plate-like body, and a rotary bearing at the tip of the shaft And a vacuum suction part that holds the flat plate from the back surface.
(2) In the above (1), the number of fixed supports is three or less.
(3) In (1) above, all of the supports are made to be displacement-type supports.
(4) In the above (1), (2) and (3), the flat plate is used as a mask on which a pattern is formed.

本発明においては、以下の効果を得ることができる。
（１）高さが不変の固定式の支持体と、高さが可変の変位式の支持体とを合計４個以上設け、この支持体により平面板を支持するようにしたので、大型の平面板を、自重によるたわみを補償しながら表面を平面を保った状態で支持することができる。また、平面板を支持するため大型の平面ステージを使用する必要が無い。
（２）支持体の全てを変位式の支持体とし、変位式支持体を固定式支持体として使用すれば、変位式支持体と固定式支持体という２つの部材を準備する必要がない。
（３）本発明を露光装置のマスクの支持に使用することで、マスクを支持するための大型の平面ステージを使用することなく、大型のマスクを、少ないたわみ量で支持することができる。このため、露光精度・光照射精度の悪化を防ぐことができる。 In the present invention, the following effects can be obtained.
(1) Since there are a total of four or more fixed-type support bodies whose heights do not change and displacement-type support bodies whose heights are variable, and the flat plates are supported by these support bodies, The face plate can be supported in a state where the surface is kept flat while compensating for deflection due to its own weight. Moreover, it is not necessary to use a large flat stage for supporting the flat plate.
(2) If all of the supports are used as displacement supports and the displacement support is used as a fixed support, there is no need to prepare two members, a displacement support and a fixed support.
(3) By using the present invention for supporting a mask of an exposure apparatus, a large mask can be supported with a small amount of deflection without using a large plane stage for supporting the mask. For this reason, deterioration of exposure accuracy and light irradiation accuracy can be prevented.

図１に本発明の実施例のマスクステージ１０の構成を示す。なお、ステージベース１１をＸＹθ（Ｚ）方向に移動させる移動機構は省略している。
ステージベース１１上に、高さが固定の３個の固定式の支持体１と、高さが可変の３個の変位式の支持体２が設けられる。なお、変位式の支持体２の個数は、３個に限るものではなく、マスクの自重たわみに応じて適宜設ける。
図２に固定式の支持体１の構造を示す。
台座１ａの上に回転軸受け１ｂを介して、表面に真空吸着溝１ｄが形成された真空吸着部１ｃが取り付けられている。真空吸着部１ｃには真空配管１ｅが接続されている。台座１ａはステージベースに取り付けられ、真空吸着部１ｃは、ステージベース１１に対して高さ方向が固定されている。 FIG. 1 shows the configuration of a mask stage 10 according to an embodiment of the present invention. A moving mechanism for moving the stage base 11 in the XYθ (Z) direction is omitted.
On the stage base 11, three fixed support bodies 1 having a fixed height and three displacement support bodies 2 having a variable height are provided. Note that the number of the displacement-type supports 2 is not limited to three, and is appropriately provided according to the self-weight deflection of the mask.
FIG. 2 shows the structure of the fixed support 1.
A vacuum suction portion 1c having a vacuum suction groove 1d formed on the surface thereof is mounted on the pedestal 1a via a rotary bearing 1b. A vacuum pipe 1e is connected to the vacuum suction portion 1c. The pedestal 1 a is attached to the stage base, and the vacuum suction portion 1 c is fixed in the height direction with respect to the stage base 11.

図３に変位式の支持体２の構造を示す。同図は断面図である。
ステージベース１１上にエアシリンダ２ａが設けられる。エアシリンダ２ａは、供給するエアの圧力を変化させることにより、シャフト２ｂが任意の推力で上下する。
エアシリンダ２ａのシャフト２ｂは中間台２ｃに接続されている。エアシリンダ２ａと中間台２ｃの間にはばね２ｇが設けられている。
中間台２ｃの両側には、固定ディスク２ｄ（例えば板ばね）が下方向に伸びて取り付けられ、固定ディスク２ｄの両側にはエアロック機構２ｆのパッド２ｅが設けられている。 エアロック機構２ｆにエアが供給されると、パッド２ｅは図中矢印方向に移動し、固定ディスク２ｄが挟み込まれ固定され、真空吸着部２ｉは上下動できなくなる。
中間台２ｃの上部には回転軸受け２ｈを介し、真空吸着部２ｉが設けられている。真空吸着部２ｉの構造は、固定式の支持体１のものと同様であり、表面に真空吸着溝２ｊが形成され真空配管２ｋが接続されている。 FIG. 3 shows the structure of the displacement support 2. This figure is a sectional view.
An air cylinder 2 a is provided on the stage base 11. In the air cylinder 2a, the shaft 2b moves up and down with an arbitrary thrust by changing the pressure of the supplied air.
The shaft 2b of the air cylinder 2a is connected to the intermediate platform 2c. A spring 2g is provided between the air cylinder 2a and the intermediate stand 2c.
Fixed disks 2d (for example, leaf springs) are attached to both sides of the intermediate platform 2c so as to extend downward, and pads 2e of an air lock mechanism 2f are provided on both sides of the fixed disks 2d. When air is supplied to the air lock mechanism 2f, the pad 2e moves in the direction of the arrow in the figure, the fixed disk 2d is sandwiched and fixed, and the vacuum suction portion 2i cannot move up and down.
A vacuum suction part 2i is provided on the upper part of the intermediate stage 2c via a rotary bearing 2h. The structure of the vacuum suction portion 2i is the same as that of the fixed support 1, and a vacuum suction groove 2j is formed on the surface and a vacuum pipe 2k is connected.

次に、図４により、マスク２０をマスクステージ１０に取り付ける手順を説明する。
図４において、固定式の支持体１は三角形で図示され、変位式の支持体２はＴ字形で図示されている。また、図４では説明の便宜上、固定式の支持体１、変位式の支持体２が直線状に配置されているように示されているが、固定式の支持体１、変位式の支持体２は、図１に示したように、それぞれ三角形の頂点位置に配置されている。
図４（ａ）に示すように、マスク２０は、ステージベース１１上に設けられた３ケ所の固定式の支持体１の真空吸着部１ｃ上に載せられ、保持固定される。このとき変位式支持体２の真空吸着部２ｉは下げられており、マスク２０とは接触しない。
マスク２０の固定式の支持体１に支持されていない部分には自重によるたわみが生じている。
変位式支持体２のエアシリンダ２ａにエアを供給し、図４（ｂ）に示すように真空吸着部２ｉを上昇させる。真空吸着部２ｉはマスク２０の裏面に接し、マスク２０を吸着保持する。この状態で変位式支持体２に、マスク２０に発生している自重によるたわみをキャンセルするだけの推力を加え、マスク２０を押し上げる。 Next, a procedure for attaching the mask 20 to the mask stage 10 will be described with reference to FIG.
In FIG. 4, the fixed support 1 is shown in a triangle, and the displacement support 2 is shown in a T shape. Further, in FIG. 4, for convenience of explanation, the fixed support 1 and the displacement support 2 are shown as being arranged in a straight line, but the fixed support 1 and the displacement support 2 are shown. As shown in FIG. 1, 2 are respectively arranged at the vertex positions of the triangles.
As shown in FIG. 4A, the mask 20 is placed on the vacuum suction portions 1c of the three fixed support members 1 provided on the stage base 11, and is held and fixed. At this time, the vacuum suction portion 2 i of the displacement support 2 is lowered and does not come into contact with the mask 20.
Deflection due to its own weight occurs in a portion of the mask 20 that is not supported by the fixed support 1.
Air is supplied to the air cylinder 2a of the displacement support 2, and the vacuum suction part 2i is raised as shown in FIG. 4 (b). The vacuum suction part 2i is in contact with the back surface of the mask 20, and holds the mask 20 by suction. In this state, a thrust force that cancels the deflection due to its own weight generated in the mask 20 is applied to the displacement support 2 to push up the mask 20.

ここで、「自重によるたわみをキャンセルするだけの推力」とは、実際には厳密な計算が必要であるが、次のように説明できる。
例えば６ｋｇのマスクを、３ケ所の固定式支持体と３ケ所の変位式支持体の、合せて６ケ所で支持する場合、理想的には、６ｋｇ÷６＝１ｋｇの１ｋｇが「自重によるたわみをキャンセルするだけの推力」となる。
実際に「自重によるたわみをキャンセルするだけの推力」を求める方法としてはシミュレーションにより、各支持部材１０にかかる重力を計算する方法が考えられる。すなわち、あらかじめ平面板１の大きさと重さおよび支持部材１０の位置に基づいて、各支持部材１０にかかる重力をコンピュータなどを用いて計算する。 Here, “thrust that only cancels deflection due to its own weight” actually requires strict calculation, but can be explained as follows.
For example, when a 6 kg mask is supported at 6 locations, including 3 fixed support bodies and 3 displacement support bodies, ideally 1 kg of 6 kg ÷ 6 = 1 kg is “deflection due to its own weight. "Thrust just to cancel".
As a method of actually obtaining “thrust that only cancels the deflection due to its own weight”, a method of calculating the gravity applied to each support member 10 by simulation can be considered. That is, based on the size and weight of the flat plate 1 and the position of the support member 10, the gravity applied to each support member 10 is calculated using a computer or the like.

例えば、図５は、２４７０ｍｍ×２１７０ｍｍ×１ｍｍで重さ約１４ｋｇの平面板を、６点で支持する場合の、各点にかかる重力のシミュレーションを行なっている図である。 同図は、コンピュータシミュレーションにより、上記平面板を６点で支持する場合に、最もたわみが少なくなる支持点の位置と、各支持点に加わる荷重と、平面板のたわみ量を求めたものである。同図中に示される２．４７ｋｇ，２．１６ｋｇ，…は各支持点に加わる荷重、各支持点を取り囲むように示された線は、変位量が等しい点を結んだ等高線である。
このようにして、コンピュータのシミュレーションにより、あらかじめマスクの大きさと重さおよび支持体の位置に基づいて、各支持体にかかる重力を計算する。ここで、上記計算に際しては、ワークのたわみ量が最も小さくなる支持点を探索し、その支持点にかかる重力を求める。なお、マスクの場合は、マスクステージの中央部に開口が設けられ、支持できる場所はマスクの周辺部なので、この点を考慮して支持点を求める。 For example, FIG. 5 is a diagram showing a simulation of gravity applied to each point when a flat plate weighing 2470 mm × 2170 mm × 1 mm and weighing approximately 14 kg is supported at six points. The figure shows, by computer simulation, the position of the support point where the deflection is minimized, the load applied to each support point, and the amount of deflection of the plane plate when the plane plate is supported at 6 points. . In the figure, 2.47 kg, 2.16 kg,... Are loads applied to the respective support points, and lines shown so as to surround the respective support points are contour lines connecting points having the same amount of displacement.
In this manner, the gravity applied to each support is calculated based on the size and weight of the mask and the position of the support in advance by computer simulation. Here, in the above calculation, a support point that minimizes the amount of deflection of the work is searched, and the gravity applied to the support point is obtained. In the case of a mask, an opening is provided in the central part of the mask stage, and the place where the mask can be supported is the peripheral part of the mask.

計算により得られた各支持部材１０にかかる重力が、例えば２．４７ｋｇ、２．１６ｋｇ、２．４７ｋｇ、２．４６ｋｇ、２．１６ｋｇ、２．４６ｋｇであり、これを３ヶ所の固定式支持体１、３ヶ所の変位式支持体２で支持するとする。
変位式支持体２のエアシリンダ２ａには、その変位式支持体２を設けた位置にかかる重力に相当する推力（保持力）が得られるように、エアを供給する。
エアシリンダ２ａは、供給するエア圧力に対して推力（保持力）は一義的に決まるので、対象となる変位式支持体２にかかる重力が２．４７ｋｇであれば、シリンダに２．４７ｋｇの推力（保持力）が得られる圧力をかけ、重力が２．１６ｋｇであれば、２．１６ｋｇの推力（保持力）が得られる圧力をかける。 The gravity applied to each support member 10 obtained by the calculation is, for example, 2.47 kg, 2.16 kg, 2.47 kg, 2.46 kg, 2.16 kg, 2.46 kg, and these are fixed support bodies at three locations. It is assumed that it is supported by one or three displacement support bodies 2.
Air is supplied to the air cylinder 2a of the displacement support 2 so that a thrust (holding force) corresponding to the gravity applied to the position where the displacement support 2 is provided.
Since the thrust (holding force) of the air cylinder 2a is uniquely determined with respect to the air pressure to be supplied, if the gravity applied to the target displacement support 2 is 2.47 kg, the cylinder has a thrust of 2.47 kg. Apply a pressure to obtain (holding force), and if gravity is 2.16 kg, apply a pressure to obtain 2.16 kg thrust (holding force).

エアの圧力は、各変位式支持体２に接続されたエア配管に設けられたレギュレータ（図示せず）により調節する。
変位式支持体２に、上記計算により求めた所定の推力をかけることにより、固定式支持体１にも計算値通りの重力がかかる。
上記のようにマスク２０に自重によるたわみをキャンセルする推力がかかった状態で、変位式支持体２のエアロック機構２ｆを動作させて固定ディスク２ｄをパッド２ｅで挟み、変位式支持体２の高さ方向の位置を固定する。固定式支持部材１と変位式支持部材２には、マスク２０の重さが均等にかかった状態になる。これにより、図４（ｂ）に示したように、マスク２０は上記固定式支持部材１、変位式支持部材２上で平面状に支持される。 以上でマスクのマスクステージへの取り付けは終了する。 The air pressure is adjusted by a regulator (not shown) provided in an air pipe connected to each displacement support 2.
By applying the predetermined thrust obtained by the above calculation to the displacement support 2, gravity is applied to the fixed support 1 as calculated.
As described above, with the thrust applied to the mask 20 to cancel the deflection due to its own weight, the air lock mechanism 2f of the displacement support 2 is operated so that the fixed disk 2d is sandwiched between the pads 2e. Fix the vertical position. The fixed support member 1 and the displacement support member 2 are in a state where the weight of the mask 20 is evenly applied. As a result, as shown in FIG. 4B, the mask 20 is supported in a planar shape on the fixed support member 1 and the displacement support member 2. This completes the attachment of the mask to the mask stage.

なお、上記では変位式支持体２を下げた状態でマスク２０を載置し、マスク載置後に変位式支持体２を所望の推力で上昇させたが、マスク２０を載せる前に、変位式支持体２に計算値から得られた推力を得る圧力を供給して、エアシリンダ２ａを上昇させておき、その上にマスク２０を載置するようにしてもよい。
なお、固定式支持体として図２の構造を例示したが、図３に示した変位式支持体２を固定式支持体として使用することができる。
固定式支持体１は高さ方向が固定され、３点で平面を出すものであるが、図３に示した変位式支持体２も、エアロック機構２ｆにより高さ方向を固定しておけば、固定式支持体１と同じ働きをすることができる。
変位式支持体２を固定式支持体１として使用すれば、変位式支持体２と固定式支持体１という２つの部材を準備する必要がない。 In the above description, the mask 20 is placed with the displacement support 2 lowered, and the displacement support 2 is raised with a desired thrust after placing the mask. However, before the mask 20 is placed, the displacement support 2 is placed. A pressure for obtaining a thrust obtained from the calculated value may be supplied to the body 2 to raise the air cylinder 2a, and the mask 20 may be placed thereon.
In addition, although the structure of FIG. 2 was illustrated as a fixed type support body, the displacement type support body 2 shown in FIG. 3 can be used as a fixed type support body.
The fixed support 1 is fixed in the height direction and has a flat surface at three points. However, the displacement support 2 shown in FIG. 3 can also be fixed in the height direction by the air lock mechanism 2f. The same function as the fixed support 1 can be achieved.
If the displacement support 2 is used as the fixed support 1, it is not necessary to prepare two members, the displacement support 2 and the fixed support 1.

次に、支持体を全て変位式支持体２にした場合の、マスク２０を保持する手段を説明する。
まず、マスクステージ１０にマスク２０を置く。マスク２０は、エアシリンダ２ａが下がった状態の変位式支持体２の真空吸着部２ｉ上に載せられ、保持固定される。
次に、各変位式支持体２のエアシリンダ２ａに、上記の実施例で示した、シミュレーションにより求めたマスク２０の自重たわみをキャンセルする推力が得られる圧力で、エアを供給する。マスク２０は各支持体２の重力バランスが取れた状態で上昇する。
この状態で、エアロック機構２ｆを動作させて固定ディスク２ｄをパッド２ｅで挟み、変位式支持体２の高さ方向の位置を固定する。各変位式支持体２には、マスク２０の重さが均等にかかっている。
例えば、露光装置に取り付けられるマスクは、その平面が、露光光の光軸に対して直交するように設けなければならない。その場合は、マスクステージ１０のステージベース１１にあおり機構を設けて、光軸に対する角度を調整する。 Next, a means for holding the mask 20 when the support body is all the displacement support body 2 will be described.
First, the mask 20 is placed on the mask stage 10. The mask 20 is placed on the vacuum suction portion 2i of the displacement support 2 with the air cylinder 2a lowered, and is held and fixed.
Next, air is supplied to the air cylinder 2a of each displacement type support body 2 at a pressure that provides a thrust force that cancels the deflection of the self-weight of the mask 20 obtained by the simulation shown in the above embodiment. The mask 20 is raised in a state where the gravity balance of each support 2 is achieved.
In this state, the air lock mechanism 2f is operated so that the fixed disk 2d is sandwiched between the pads 2e, and the position of the displacement type support body 2 in the height direction is fixed. The weight of the mask 20 is equally applied to each displacement support 2.
For example, the mask attached to the exposure apparatus must be provided so that its plane is orthogonal to the optical axis of the exposure light. In that case, a tilt mechanism is provided on the stage base 11 of the mask stage 10 to adjust the angle with respect to the optical axis.

なお、マスク２０を載せる前に、あらかじめ変位式支持体２にマスク載置時と同じ推力を得る圧力を供給して、エアシリンダ２ａを上昇させておき、その上にマスク２０を載置するようにしてもよい。
なお、上記実施例では、本実施例の支持機構を、マスク２０を支持するマスクステージ１０に用いる場合を例にして説明したが、本実施例で示した支持機構を、例えば露光装置において露光光の光路を折り返す反射ミラーを支持する機構としても用いることができる。 Before the mask 20 is placed, a pressure for obtaining the same thrust as that when the mask is placed is supplied to the displacement support 2 in advance to raise the air cylinder 2a, and the mask 20 is placed thereon. It may be.
In the above-described embodiment, the case where the support mechanism of this embodiment is used for the mask stage 10 that supports the mask 20 has been described as an example. It can also be used as a mechanism for supporting a reflection mirror that turns back the optical path.

本発明の実施例のマスクステージ１０の構成を示す図である。It is a figure which shows the structure of the mask stage 10 of the Example of this invention. 固定式の支持体の構造を示す断面図である。It is sectional drawing which shows the structure of a fixed type support body. 変位式の支持体の構造を示す断面図である。It is sectional drawing which shows the structure of a displacement type support body. マスクの取り付け手順を示す図である。It is a figure which shows the attachment procedure of a mask. 各点にかかる重力のシミュレーション結果の一例を示す図である。It is a figure which shows an example of the simulation result of the gravity concerning each point. 従来のマスクステージの構成を示す図である。It is a figure which shows the structure of the conventional mask stage. マスクを３点で支持する場合を説明する図である。It is a figure explaining the case where a mask is supported by three points.

符号の説明Explanation of symbols

１ 固定式の支持体
１ａ 台座
１ｂ 回転軸受け
１ｃ 真空吸着部
１ｄ 真空吸着溝
１ｅ 真空配管
２ 変位式の支持体
２ａ エアシリンダ
２ｂ シャフト
２ｃ 中間台
２ｄ 固定ディスク
２ｅ パッド
２ｆ エアロック機構
２ｇ ばね
２ｈ 回転軸受け
２ｉ 真空吸着部
２ｊ 真空吸着溝
２ｋ 真空配管
１０ マスクステージ
１１ ステージベース
２０ マスク

DESCRIPTION OF SYMBOLS 1 Fixed type support body 1a Base 1b Rotary bearing 1c Vacuum suction part 1d Vacuum suction groove 1e Vacuum piping 2 Displacement type support body 2a Air cylinder 2b Shaft 2c Intermediate stand 2d Fixed disk 2e Pad 2f Air lock mechanism 2g Spring 2h Rotary bearing
2i Vacuum suction part 2j Vacuum suction groove 2k Vacuum piping 10 Mask stage 11 Stage base 20 Mask

Claims (4)

平面板を複数の支持体により支持する支持機構であって、
支持体を設けたベースを有し、該支持体は、
上記ベース上に取り付けられた台座の上に回転軸受けを介して取り付けられ、上記平面板を裏面から保持する真空吸着部を有する高さが不変の固定式の支持体と、
シャフトを上下動させるエアシリンダと、上記シャフトに連結された板状体と、該板状体を介して上記シャフトの位置を一定の位置に保持する保持手段と、上記シャフトの先端に回転軸受けを介して取り付けられ、上記平面板を裏面から保持する真空吸着部とから構成される高さが可変の変位式の支持体とからなり、
上記固定式の支持体と変位式の支持体の合計は４個以上である
ことを特徴とする支持機構。 A support mechanism for supporting a flat plate by a plurality of supports,
A base provided with a support, the support comprising:
A fixed support that is attached to the base mounted on the base via a rotary bearing and has a vacuum adsorbing portion that holds the flat plate from the back surface, and has a constant height.
An air cylinder for moving the shaft up and down, a plate-like body connected to the shaft, holding means for holding the position of the shaft at a fixed position via the plate-like body, and a rotary bearing at the tip of the shaft And a displacement-type support body having a variable height composed of a vacuum suction portion that holds the flat plate from the back surface,
The total of the fixed type support body and the displacement type support body is four or more. 上記支持体のうち、固定式の支持体は３個以下である
ことを特徴とする請求項１の支持機構。 2. The support mechanism according to claim 1, wherein the number of the fixed supports is three or less. 上記支持体は、全てが変位式の支持体である
ことを特徴とする請求項１の支持機構。 2. The support mechanism according to claim 1, wherein all of the supports are displacement-type supports. 上記平面板が、パターンを形成したマスクである
ことを特徴とする請求項１，２または請求項３の支持機構を使ったマスクステージ。




4. The mask stage using the support mechanism according to claim 1, wherein the flat plate is a mask on which a pattern is formed.




JP2005378598A 2005-12-28 2005-12-28 Support stage and mask stage using support mechanism Expired - Fee Related JP4692276B2 (en)

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TW095134631A TWI391985B (en) 2005-12-28 2006-09-19 A support mechanism and a mask stage using the support mechanism
KR1020060101924A KR101025086B1 (en) 2005-12-28 2006-10-19 Supporter and mask stage using supporter
CN2006101727127A CN1991593B (en) 2005-12-28 2006-12-28 Supporting mechanism and mask carrying stage using the same

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