TW200725696A - Supporting mechanism and mask carrier using the same - Google Patents

Supporting mechanism and mask carrier using the same

Info

Publication number
TW200725696A
TW200725696A TW095134631A TW95134631A TW200725696A TW 200725696 A TW200725696 A TW 200725696A TW 095134631 A TW095134631 A TW 095134631A TW 95134631 A TW95134631 A TW 95134631A TW 200725696 A TW200725696 A TW 200725696A
Authority
TW
Taiwan
Prior art keywords
mask
supporting body
type supporting
vacuum sucking
sucking portion
Prior art date
Application number
TW095134631A
Other languages
Chinese (zh)
Other versions
TWI391985B (en
Inventor
Yoneta Tanaka
Original Assignee
Ushio Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Electric Inc filed Critical Ushio Electric Inc
Publication of TW200725696A publication Critical patent/TW200725696A/en
Application granted granted Critical
Publication of TWI391985B publication Critical patent/TWI391985B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25B—TOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
    • B25B11/00—Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
    • B25B11/005—Vacuum work holders
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping

Abstract

The topic of the invention is using plural supporting bodies to support flat surface board with mask for compensating the deformation producing by the static load. It can maintain the flat surface board to support in the flat surface status. The solving means is installing fixed type supporting body 1 with fixed altitude and variable type supporting body 2 with changeable altitude on the carrier base 11. The total amount of supporting bodies is above four. The fixed type supporting body 1 with vacuum sucking portion is installed on the base separating by the revolving spindle. The variable type supporting body 2 is including: air pressure cylinder, making the axle moving up and down; vacuum sucking portion, installing at the front point of axle separating by the revolving spindle; altitude fixer, restricting the motion of the axle. The vacuum sucking portion of fixed type supporting body 1 keeps the mask 20 from the reverse side and supports the mask 20 by three points. The air pressure cylinder of the variable type supporting body 2 produces thrust to cancel the static load from mask 20 and presses the mask 20 at fixed position. The vacuum sucking portion keeps the mask 20 from the reverse side.
TW095134631A 2005-12-28 2006-09-19 A support mechanism and a mask stage using the support mechanism TWI391985B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005378598A JP4692276B2 (en) 2005-12-28 2005-12-28 Support stage and mask stage using support mechanism

Publications (2)

Publication Number Publication Date
TW200725696A true TW200725696A (en) 2007-07-01
TWI391985B TWI391985B (en) 2013-04-01

Family

ID=38213924

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095134631A TWI391985B (en) 2005-12-28 2006-09-19 A support mechanism and a mask stage using the support mechanism

Country Status (4)

Country Link
JP (1) JP4692276B2 (en)
KR (1) KR101025086B1 (en)
CN (1) CN1991593B (en)
TW (1) TWI391985B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI479281B (en) * 2008-04-18 2015-04-01 Applied Materials Inc Mask support, mask assembly, assembly comprising a mask support and a mask, and method of connecting a mask assembly with a mask support

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JP4495752B2 (en) * 2007-11-06 2010-07-07 東京エレクトロン株式会社 Substrate processing apparatus and coating apparatus
KR100971323B1 (en) 2008-08-21 2010-07-20 주식회사 동부하이텍 Reticle stage for multi-correcting the amount of reticle rotation and shift in exposure process and multi-correcting method using thereof
JP5117456B2 (en) * 2009-07-29 2013-01-16 株式会社日立ハイテクノロジーズ Exposure equipment
NL2006190A (en) * 2010-03-11 2011-09-13 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP5677025B2 (en) * 2010-10-22 2015-02-25 株式会社トプコン Placement stage
KR101228622B1 (en) * 2012-10-15 2013-02-01 마이다스시스템주식회사 Stage leveling device for mask aligner
KR101456661B1 (en) * 2013-01-23 2014-11-12 안성룡 Device for controlling the horizontality
CN203117640U (en) * 2013-03-19 2013-08-07 深圳市华星光电技术有限公司 Glass substrate support mechanism for exposure machine
CN103268057B (en) * 2013-04-28 2014-12-17 京东方科技集团股份有限公司 Masking system, masking method, exposure system and exposure method
KR102254042B1 (en) * 2013-08-12 2021-05-21 어플라이드 머티리얼즈 이스라엘 리미티드 System and method for attaching a mask to a mask holder
CN104570592B (en) * 2013-10-11 2019-04-30 上海微电子装备（集团）股份有限公司 A kind of big mask apparatus for shaping and method
CN104749902B (en) * 2013-12-31 2017-02-15 上海微电子装备有限公司 Mask plate face type shaping device
CN110625540B (en) * 2014-05-03 2021-10-29 株式会社半导体能源研究所 Film-like member supporting apparatus
CN106575086B (en) * 2014-08-01 2018-05-18 株式会社村田制作所 Direct write type exposure device
CN105108674A (en) * 2015-08-03 2015-12-02 合肥鑫晟光电科技有限公司 Support adsorption component, support device and operation method thereof
CN109841536A (en) * 2017-11-29 2019-06-04 长鑫存储技术有限公司 Edge compensation system, wafer carrier system and wafer installation method
CN111830789B (en) * 2019-04-17 2021-07-02 上海微电子装备（集团）股份有限公司 Balance mass device and photoetching equipment
CN112647046B (en) * 2020-11-18 2022-05-17 昆山工研院新型平板显示技术中心有限公司 Vapor deposition apparatus and vapor deposition method

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JPS62139330A (en) * 1985-12-13 1987-06-23 Toshiba Mach Co Ltd Fixation of material to be processed and device thereof
JP2748127B2 (en) * 1988-09-02 1998-05-06 キヤノン株式会社 Wafer holding method
US5253012A (en) * 1990-10-05 1993-10-12 Canon Kabushiki Kaisha Substrate holding apparatus for vertically holding a substrate in an exposure apparatus
JPH04162610A (en) * 1990-10-26 1992-06-08 Canon Inc Mask holding apparatus
JP3244894B2 (en) * 1993-11-30 2002-01-07 キヤノン株式会社 Mask holding method, mask and mask chuck, and exposure apparatus and device manufacturing method using the same
JP3349572B2 (en) * 1993-12-27 2002-11-25 東芝機械株式会社 Thin plate fixing device
DE69505448T2 (en) * 1994-03-15 1999-04-22 Canon Kk Mask and mask wearer
JP3940823B2 (en) * 1994-12-26 2007-07-04 株式会社ニコン Stage device and control method thereof
US5854819A (en) * 1996-02-07 1998-12-29 Canon Kabushiki Kaisha Mask supporting device and correction method therefor, and exposure apparatus and device producing method utilizing the same
JPH09281717A (en) * 1996-04-10 1997-10-31 Ushio Inc Mechanism for positioning mask stage
JPH11214295A (en) * 1998-01-23 1999-08-06 Nikon Corp Aligner, light exposure conditions determination, exposure method, and device manufacture
KR20010009997A (en) * 1999-07-15 2001-02-05 김영환 Reticle stage
JP2001332480A (en) * 2000-05-24 2001-11-30 Canon Inc Original chuck, aligner with original chuck, and semiconductor device-manufacturing method
JP4122922B2 (en) * 2002-10-18 2008-07-23 ウシオ電機株式会社 Flat stage device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI479281B (en) * 2008-04-18 2015-04-01 Applied Materials Inc Mask support, mask assembly, assembly comprising a mask support and a mask, and method of connecting a mask assembly with a mask support

Also Published As

Publication number Publication date
CN1991593A (en) 2007-07-04
KR20070070048A (en) 2007-07-03
KR101025086B1 (en) 2011-03-25
CN1991593B (en) 2011-12-07
JP2007178819A (en) 2007-07-12
TWI391985B (en) 2013-04-01
JP4692276B2 (en) 2011-06-01

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees