JP4689936B2 - 構造を製作するか又は物品に構造を付加するための方法 - Google Patents

構造を製作するか又は物品に構造を付加するための方法 Download PDF

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Publication number
JP4689936B2
JP4689936B2 JP2002510581A JP2002510581A JP4689936B2 JP 4689936 B2 JP4689936 B2 JP 4689936B2 JP 2002510581 A JP2002510581 A JP 2002510581A JP 2002510581 A JP2002510581 A JP 2002510581A JP 4689936 B2 JP4689936 B2 JP 4689936B2
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JP
Japan
Prior art keywords
multiphoton
photosensitizer
curable
mirror
curable composition
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Expired - Fee Related
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JP2002510581A
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English (en)
Japanese (ja)
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JP2004518154A (ja
JP2004518154A5 (enExample
Inventor
ジェイ． デボー，ロバート
エフ． デューアー，ブルック
アール． フレミング，パトリック
ダブリュ． カルウェイト，ハーベイ
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3M Innovative Properties Co
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3M Innovative Properties Co
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Publication of JP2004518154A5 publication Critical patent/JP2004518154A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12—Chemical modification
    • C08J7/16—Chemical modification with polymerisable compounds
    • C08J7/18—Chemical modification with polymerisable compounds using wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Polymerisation Methods In General (AREA)
  • Epoxy Resins (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
JP2002510581A 2000-06-15 2001-06-14 構造を製作するか又は物品に構造を付加するための方法 Expired - Fee Related JP4689936B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US21170600P 2000-06-15 2000-06-15
US21158800P 2000-06-15 2000-06-15
US60/211,588 2000-06-15
US60/211,706 2000-06-15
PCT/US2001/040988 WO2001096452A2 (en) 2000-06-15 2001-06-14 Method for making or adding structures to an article

Publications (3)

Publication Number Publication Date
JP2004518154A JP2004518154A (ja) 2004-06-17
JP2004518154A5 JP2004518154A5 (enExample) 2008-08-07
JP4689936B2 true JP4689936B2 (ja) 2011-06-01

Family

ID=26906269

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002510581A Expired - Fee Related JP4689936B2 (ja) 2000-06-15 2001-06-14 構造を製作するか又は物品に構造を付加するための方法

Country Status (5)

Country Link
EP (1) EP1295181A2 (enExample)
JP (1) JP4689936B2 (enExample)
KR (1) KR100811018B1 (enExample)
AU (1) AU2001270321A1 (enExample)
WO (1) WO2001096452A2 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7265161B2 (en) * 2002-10-02 2007-09-04 3M Innovative Properties Company Multi-photon reactive compositions with inorganic particles and method for fabricating structures
US7005229B2 (en) 2002-10-02 2006-02-28 3M Innovative Properties Company Multiphoton photosensitization method
US7118845B2 (en) 2000-06-15 2006-10-10 3M Innovative Properties Company Multiphoton photochemical process and articles preparable thereby
US7381516B2 (en) 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
US6750266B2 (en) * 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
US7232650B2 (en) 2002-10-02 2007-06-19 3M Innovative Properties Company Planar inorganic device
US7030169B2 (en) * 2003-09-26 2006-04-18 3M Innovative Properties Company Arylsulfinate salts in initiator systems for polymeric reactions
US7723126B2 (en) * 2004-03-24 2010-05-25 Wisconsin Alumni Research Foundation Plasma-enhanced functionalization of inorganic oxide surfaces
WO2007073482A2 (en) * 2005-12-21 2007-06-28 3M Innovative Properties Company Method and apparatus for processing multiphoton curable photoreactive compositions
US7583444B1 (en) 2005-12-21 2009-09-01 3M Innovative Properties Company Process for making microlens arrays and masterforms
EP2468487B1 (en) 2006-05-18 2017-07-12 3M Innovative Properties Company Light extraction structures and light guides incorporating same
US8029902B2 (en) 2006-12-11 2011-10-04 Wisconsin Alumni Research Foundation Plasma-enhanced functionalization of substrate surfaces with quaternary ammonium and quaternary phosphonium groups
EP2335848B1 (de) * 2009-12-04 2014-08-20 SLM Solutions GmbH Optische Bestrahlungseinheit für eine Anlage zur Herstellung von Werkstücken durch Bestrahlen von Pulverschichten mit Laserstrahlung
JP5659189B2 (ja) * 2011-05-13 2015-01-28 富士フイルム株式会社 非共鳴２光子吸収材料、非共鳴２光子吸収記録材料、記録媒体、記録再生方法及び非共鳴２光子吸収化合物
JP5703257B2 (ja) 2011-05-13 2015-04-15 富士フイルム株式会社 非共鳴２光子吸収記録材料及び非共鳴高分子２光子吸収光情報記録媒体及び記録再生方法
JP6748883B2 (ja) * 2015-04-03 2020-09-02 株式会社スリーボンド 光遅延硬化性樹脂組成物、接合体および接着方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2291216B (en) * 1994-06-30 1998-01-07 Matsushita Electric Works Ltd Method of manufacturing a printed circuit board
WO1999054784A1 (en) 1998-04-21 1999-10-28 University Of Connecticut Free-form nanofabrication using multi-photon excitation
US6115339A (en) * 1998-06-17 2000-09-05 International Business Machines Corporation Method and system in an optical storage disc drive for conserving laser power
KR100810546B1 (ko) * 2000-06-15 2008-03-18 쓰리엠 이노베이티브 프로퍼티즈 캄파니 삼차원 광학 소자의 가공 방법

Also Published As

Publication number Publication date
WO2001096452A3 (en) 2002-04-25
JP2004518154A (ja) 2004-06-17
AU2001270321A1 (en) 2001-12-24
WO2001096452A2 (en) 2001-12-20
EP1295181A2 (en) 2003-03-26
KR20030012883A (ko) 2003-02-12
KR100811018B1 (ko) 2008-03-14

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