KR100811018B1 - 물품에 구조를 형성 또는 추가하는 방법 - Google Patents

물품에 구조를 형성 또는 추가하는 방법 Download PDF

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Publication number
KR100811018B1
KR100811018B1 KR1020027017027A KR20027017027A KR100811018B1 KR 100811018 B1 KR100811018 B1 KR 100811018B1 KR 1020027017027 A KR1020027017027 A KR 1020027017027A KR 20027017027 A KR20027017027 A KR 20027017027A KR 100811018 B1 KR100811018 B1 KR 100811018B1
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South Korea
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multiphoton
curable composition
curable
photosensitizer
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Expired - Fee Related
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KR1020027017027A
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English (en)
Korean (ko)
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KR20030012883A (ko
Inventor
데보로버트제이
두어브룩에프
플레밍패트릭알
칼웨이트하비더블유
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쓰리엠 이노베이티브 프로퍼티즈 캄파니
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Publication of KR20030012883A publication Critical patent/KR20030012883A/ko
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Publication of KR100811018B1 publication Critical patent/KR100811018B1/ko
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12—Chemical modification
    • C08J7/16—Chemical modification with polymerisable compounds
    • C08J7/18—Chemical modification with polymerisable compounds using wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Polymerisation Methods In General (AREA)
  • Epoxy Resins (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
KR1020027017027A 2000-06-15 2001-06-14 물품에 구조를 형성 또는 추가하는 방법 Expired - Fee Related KR100811018B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US21158800P 2000-06-15 2000-06-15
US21170600P 2000-06-15 2000-06-15
US60/211,588 2000-06-15
US60/211,706 2000-06-15
PCT/US2001/040988 WO2001096452A2 (en) 2000-06-15 2001-06-14 Method for making or adding structures to an article

Publications (2)

Publication Number Publication Date
KR20030012883A KR20030012883A (ko) 2003-02-12
KR100811018B1 true KR100811018B1 (ko) 2008-03-14

Family

ID=26906269

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020027017027A Expired - Fee Related KR100811018B1 (ko) 2000-06-15 2001-06-14 물품에 구조를 형성 또는 추가하는 방법

Country Status (5)

Country Link
EP (1) EP1295181A2 (enExample)
JP (1) JP4689936B2 (enExample)
KR (1) KR100811018B1 (enExample)
AU (1) AU2001270321A1 (enExample)
WO (1) WO2001096452A2 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7118845B2 (en) 2000-06-15 2006-10-10 3M Innovative Properties Company Multiphoton photochemical process and articles preparable thereby
US7265161B2 (en) 2002-10-02 2007-09-04 3M Innovative Properties Company Multi-photon reactive compositions with inorganic particles and method for fabricating structures
US7005229B2 (en) 2002-10-02 2006-02-28 3M Innovative Properties Company Multiphoton photosensitization method
US7381516B2 (en) * 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
US6750266B2 (en) * 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
US7232650B2 (en) 2002-10-02 2007-06-19 3M Innovative Properties Company Planar inorganic device
US7030169B2 (en) * 2003-09-26 2006-04-18 3M Innovative Properties Company Arylsulfinate salts in initiator systems for polymeric reactions
US7723126B2 (en) * 2004-03-24 2010-05-25 Wisconsin Alumni Research Foundation Plasma-enhanced functionalization of inorganic oxide surfaces
JP4880701B2 (ja) * 2005-12-21 2012-02-22 スリーエム イノベイティブ プロパティズ カンパニー 多光子硬化反応性組成物を処理するための方法及び装置
US7583444B1 (en) 2005-12-21 2009-09-01 3M Innovative Properties Company Process for making microlens arrays and masterforms
CN101448632B (zh) 2006-05-18 2012-12-12 3M创新有限公司 用于制备具有提取结构的光导的方法以及由此方法生产的光导
US8029902B2 (en) 2006-12-11 2011-10-04 Wisconsin Alumni Research Foundation Plasma-enhanced functionalization of substrate surfaces with quaternary ammonium and quaternary phosphonium groups
ES2514520T3 (es) 2009-12-04 2014-10-28 Slm Solutions Gmbh Unidad de irradiación óptica para una planta para la producción de piezas de trabajo mediante la irradiación de capas de polvo con radiación de láser
JP5703257B2 (ja) * 2011-05-13 2015-04-15 富士フイルム株式会社 非共鳴２光子吸収記録材料及び非共鳴高分子２光子吸収光情報記録媒体及び記録再生方法
JP5659189B2 (ja) * 2011-05-13 2015-01-28 富士フイルム株式会社 非共鳴２光子吸収材料、非共鳴２光子吸収記録材料、記録媒体、記録再生方法及び非共鳴２光子吸収化合物
JP6748883B2 (ja) * 2015-04-03 2020-09-02 株式会社スリーボンド 光遅延硬化性樹脂組成物、接合体および接着方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999054784A1 (en) 1998-04-21 1999-10-28 University Of Connecticut Free-form nanofabrication using multi-photon excitation

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2291216B (en) * 1994-06-30 1998-01-07 Matsushita Electric Works Ltd Method of manufacturing a printed circuit board
US6115339A (en) * 1998-06-17 2000-09-05 International Business Machines Corporation Method and system in an optical storage disc drive for conserving laser power
WO2001096915A2 (en) * 2000-06-15 2001-12-20 3M Innovative Properties Company Microfabrication of organic optical elements

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999054784A1 (en) 1998-04-21 1999-10-28 University Of Connecticut Free-form nanofabrication using multi-photon excitation

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
"Two-phone polymerization initiators for three-dimensional optical data storage and microfabrication", Nature, Vol.398,1999
"Two-photon holography in 3-D photopolymer host-guest matrix", Optical Society of America, Washington, DC, US, Vol.6, No.3, 31 January 2000

Also Published As

Publication number Publication date
WO2001096452A2 (en) 2001-12-20
WO2001096452A3 (en) 2002-04-25
JP2004518154A (ja) 2004-06-17
EP1295181A2 (en) 2003-03-26
AU2001270321A1 (en) 2001-12-24
JP4689936B2 (ja) 2011-06-01
KR20030012883A (ko) 2003-02-12

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