JP4685306B2 - 電界放出ディスプレイのフィールドエミッタの製造方法 - Google Patents

電界放出ディスプレイのフィールドエミッタの製造方法 Download PDF

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Publication number
JP4685306B2
JP4685306B2 JP2001520086A JP2001520086A JP4685306B2 JP 4685306 B2 JP4685306 B2 JP 4685306B2 JP 2001520086 A JP2001520086 A JP 2001520086A JP 2001520086 A JP2001520086 A JP 2001520086A JP 4685306 B2 JP4685306 B2 JP 4685306B2
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JP
Japan
Prior art keywords
light
layer
gate
wavelength
track
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001520086A
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English (en)
Japanese (ja)
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JP2003508747A (ja
JP2003508747A5 (https=
Inventor
フィールド、ジョン・イー
エロウェイ、ドナルド・ジェイ
ポング、チャングディー
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Canon Inc
Original Assignee
Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of JP2003508747A publication Critical patent/JP2003508747A/ja
Publication of JP2003508747A5 publication Critical patent/JP2003508747A5/ja
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Publication of JP4685306B2 publication Critical patent/JP4685306B2/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP2001520086A 1999-08-31 2000-08-22 電界放出ディスプレイのフィールドエミッタの製造方法 Expired - Fee Related JP4685306B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/387,632 1999-08-31
US09/387,632 US6392750B1 (en) 1999-08-31 1999-08-31 Use of scattered and/or transmitted light in determining characteristics, including dimensional information, of object such as part of flat-panel display
PCT/US2000/023192 WO2001016580A1 (en) 1999-08-31 2000-08-22 Use of scattered and/or transmitted light in determining characteristics, including dimensional information, of object such as part of flat-panel display

Publications (3)

Publication Number Publication Date
JP2003508747A JP2003508747A (ja) 2003-03-04
JP2003508747A5 JP2003508747A5 (https=) 2010-04-15
JP4685306B2 true JP4685306B2 (ja) 2011-05-18

Family

ID=23530730

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001520086A Expired - Fee Related JP4685306B2 (ja) 1999-08-31 2000-08-22 電界放出ディスプレイのフィールドエミッタの製造方法

Country Status (8)

Country Link
US (1) US6392750B1 (https=)
EP (1) EP1212602A4 (https=)
JP (1) JP4685306B2 (https=)
KR (1) KR20020067030A (https=)
AU (1) AU7067600A (https=)
MY (1) MY133784A (https=)
TW (1) TW548404B (https=)
WO (1) WO2001016580A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6947857B2 (en) * 2001-03-16 2005-09-20 Mindspeed Technologies, Inc. Optical sequence time domain reflectometry during data transmission
US20030068024A1 (en) * 2001-10-05 2003-04-10 Jones William W. Communication system activation
US8750341B2 (en) 2008-01-04 2014-06-10 Mindspeed Technologies, Inc. Method and apparatus for reducing optical signal speckle

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4678324A (en) * 1985-12-04 1987-07-07 Thomas De Witt Range finding by diffraction
GB8908871D0 (en) * 1989-04-19 1989-06-07 Hugle William B Manufacture of flat panel displays
US5559389A (en) 1993-09-08 1996-09-24 Silicon Video Corporation Electron-emitting devices having variously constituted electron-emissive elements, including cones or pedestals
US5564959A (en) 1993-09-08 1996-10-15 Silicon Video Corporation Use of charged-particle tracks in fabricating gated electron-emitting devices
US5538450A (en) * 1994-04-29 1996-07-23 Texas Instruments Incorporated Method of forming a size-arrayed emitter matrix for use in a flat panel display
JPH08124479A (ja) * 1994-10-21 1996-05-17 Toppan Printing Co Ltd シャドウマスクの製造方法
KR100343222B1 (ko) * 1995-01-28 2002-11-23 삼성에스디아이 주식회사 전계방출표시소자의제조방법
US5766446A (en) 1996-03-05 1998-06-16 Candescent Technologies Corporation Electrochemical removal of material, particularly excess emitter material in electron-emitting device
US5893967A (en) 1996-03-05 1999-04-13 Candescent Technologies Corporation Impedance-assisted electrochemical removal of material, particularly excess emitter material in electron-emitting device
JP3588212B2 (ja) * 1996-12-20 2004-11-10 株式会社ルネサステクノロジ 露光用マスク及びその作製方法並びに半導体装置の製造方法
US5920151A (en) 1997-05-30 1999-07-06 Candescent Technologies Corporation Structure and fabrication of electron-emitting device having focus coating contacted through underlying access conductor
US6010383A (en) * 1997-10-31 2000-01-04 Candescent Technologies Corporation Protection of electron-emissive elements prior to removing excess emitter material during fabrication of electron-emitting device

Also Published As

Publication number Publication date
TW548404B (en) 2003-08-21
US6392750B1 (en) 2002-05-21
JP2003508747A (ja) 2003-03-04
MY133784A (en) 2007-11-30
AU7067600A (en) 2001-03-26
KR20020067030A (ko) 2002-08-21
EP1212602A1 (en) 2002-06-12
EP1212602A4 (en) 2003-04-02
WO2001016580A1 (en) 2001-03-08

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