JP4683825B2 - 半導体装置およびその作製方法 - Google Patents

半導体装置およびその作製方法 Download PDF

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Publication number
JP4683825B2
JP4683825B2 JP2003120581A JP2003120581A JP4683825B2 JP 4683825 B2 JP4683825 B2 JP 4683825B2 JP 2003120581 A JP2003120581 A JP 2003120581A JP 2003120581 A JP2003120581 A JP 2003120581A JP 4683825 B2 JP4683825 B2 JP 4683825B2
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electrode
organic compound
layer containing
semiconductor device
light
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JP2003120581A
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Japanese (ja)
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JP2004006332A5 (enExample
JP2004006332A (ja
Inventor
舜平 山崎
哲史 瀬尾
秀明 桑原
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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JP2003120581A 2002-04-24 2003-04-24 半導体装置およびその作製方法 Expired - Fee Related JP4683825B2 (ja)

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JP2003120581A JP4683825B2 (ja) 2002-04-24 2003-04-24 半導体装置およびその作製方法

Applications Claiming Priority (2)

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JP2002123188 2002-04-24
JP2003120581A JP4683825B2 (ja) 2002-04-24 2003-04-24 半導体装置およびその作製方法

Related Child Applications (1)

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JP2010278874A Division JP5106622B2 (ja) 2002-04-24 2010-12-15 発光装置及び光源装置

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JP2004006332A JP2004006332A (ja) 2004-01-08
JP2004006332A5 JP2004006332A5 (enExample) 2006-06-08
JP4683825B2 true JP4683825B2 (ja) 2011-05-18

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Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004002587B4 (de) * 2004-01-16 2006-06-01 Novaled Gmbh Bildelement für eine Aktiv-Matrix-Anzeige
JP4884675B2 (ja) * 2004-01-26 2012-02-29 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP4489472B2 (ja) * 2004-03-19 2010-06-23 株式会社 日立ディスプレイズ 有機エレクトロルミネッセンス表示装置
KR100606817B1 (ko) 2004-04-27 2006-08-01 엘지전자 주식회사 유기 ｅｌ 소자의 제조방법
US8030643B2 (en) 2005-03-28 2011-10-04 Semiconductor Energy Laboratory Co., Ltd. Memory device and manufacturing method the same
JP2006294261A (ja) * 2005-04-05 2006-10-26 Fuji Electric Holdings Co Ltd 有機ｅｌ発光素子およびその製造方法
JP4916859B2 (ja) * 2005-12-20 2012-04-18 株式会社半導体エネルギー研究所 半導体装置、表示装置、電子機器、及び半導体装置の製造方法
US8513678B2 (en) 2007-05-18 2013-08-20 Semiconductor Energy Laboratory Co., Ltd. Light-emitting device
US7977678B2 (en) * 2007-12-21 2011-07-12 Semiconductor Energy Laboratory Co., Ltd. Semiconductor display device
JP4561935B2 (ja) * 2010-02-01 2010-10-13 日本電気株式会社 有機ｅｌ表示装置の製造方法
US8569754B2 (en) * 2010-11-05 2013-10-29 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
JP5969216B2 (ja) 2011-02-11 2016-08-17 株式会社半導体エネルギー研究所 発光素子、表示装置、照明装置、及びこれらの作製方法
WO2013027510A1 (ja) * 2011-08-22 2013-02-28 コニカミノルタホールディングス株式会社 有機エレクトロルミネッセンス素子及び照明装置
US12334332B2 (en) 2012-06-12 2025-06-17 Lam Research Corporation Remote plasma based deposition of silicon carbide films using silicon-containing and carbon-containing precursors
US20180347035A1 (en) 2012-06-12 2018-12-06 Lam Research Corporation Conformal deposition of silicon carbide films using heterogeneous precursor interaction
US9234276B2 (en) 2013-05-31 2016-01-12 Novellus Systems, Inc. Method to obtain SiC class of films of desired composition and film properties
US10325773B2 (en) 2012-06-12 2019-06-18 Novellus Systems, Inc. Conformal deposition of silicon carbide films
JP6656817B2 (ja) * 2014-04-25 2020-03-04 株式会社半導体エネルギー研究所 発光装置
WO2017183355A1 (ja) * 2016-04-22 2017-10-26 ソニー株式会社 表示装置および電子機器
US9837270B1 (en) * 2016-12-16 2017-12-05 Lam Research Corporation Densification of silicon carbide film using remote plasma treatment
KR102781934B1 (ko) * 2016-12-30 2025-03-19 삼성디스플레이 주식회사 도전 패턴 및 이를 구비하는 표시 장치
WO2018179212A1 (ja) * 2017-03-30 2018-10-04 シャープ株式会社 有機ｅｌ表示装置および有機ｅｌ表示装置の製造方法
US11997910B2 (en) 2018-10-11 2024-05-28 Semiconductor Energy Laboratory Co., Ltd. Sensor device and semiconductor device
CN113195786A (zh) 2018-10-19 2021-07-30 朗姆研究公司 用于间隙填充的远程氢等离子体暴露以及掺杂或未掺杂硅碳化物沉积
WO2021225139A1 (ja) * 2020-05-08 2021-11-11 ソニーグループ株式会社 表示装置および電子機器
CN116261923A (zh) * 2020-07-16 2023-06-13 应用材料公司 用于oled显示像素的分级斜面反射结构
CN114497118B (zh) * 2020-10-23 2025-07-25 京东方科技集团股份有限公司 显示基板及其制备方法、显示装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4666722B2 (ja) * 1999-06-28 2011-04-06 株式会社半導体エネルギー研究所 Ｅｌ表示装置及び電子装置
JP2001043980A (ja) * 1999-07-29 2001-02-16 Sony Corp 有機エレクトロルミネッセンス素子及び表示装置
JP2001148291A (ja) * 1999-11-19 2001-05-29 Sony Corp 表示装置及びその製造方法
TWI282697B (en) * 2000-02-25 2007-06-11 Seiko Epson Corp Organic electroluminescence device
JP2001351787A (ja) * 2000-06-07 2001-12-21 Sharp Corp 有機ｌｅｄ素子とその製造方法および有機ｌｅｄディスプレイ
JP2002083689A (ja) * 2000-06-29 2002-03-22 Semiconductor Energy Lab Co Ltd 発光装置
JP2003017273A (ja) * 2001-07-05 2003-01-17 Sony Corp 表示装置および表示装置の製造方法

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