JP4658897B2 - Package structure for semiconductor lighting device and method of manufacturing the same - Google Patents

Package structure for semiconductor lighting device and method of manufacturing the same Download PDF

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JP4658897B2
JP4658897B2 JP2006284812A JP2006284812A JP4658897B2 JP 4658897 B2 JP4658897 B2 JP 4658897B2 JP 2006284812 A JP2006284812 A JP 2006284812A JP 2006284812 A JP2006284812 A JP 2006284812A JP 4658897 B2 JP4658897 B2 JP 4658897B2
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silicon substrate
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ウェン リアン ツェン
ルン シン チェン
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Advanced Optoelectronic Technology Inc
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    • H—ELECTRICITY
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    • H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
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    • H01L2224/10—Bump connectors; Manufacturing methods related thereto
    • H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
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    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
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    • H01L2224/4805—Shape
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    • H01L2224/481—Disposition
    • H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
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    • H01L2924/102—Material of the semiconductor or solid state bodies
    • H01L2924/1025—Semiconducting materials
    • H01L2924/10251—Elemental semiconductors, i.e. Group IV
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    • H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/58—Optical field-shaping elements
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    • H01L33/62—Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
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    • H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/64—Heat extraction or cooling elements
    • H01L33/647—Heat extraction or cooling elements the elements conducting electric current to or from the semiconductor body

Abstract

Silicon substrates are applied to the package structure of solid-state lighting devices. Wet etching is performed to both top and bottom surfaces of the silicon substrate to form reflecting cavity and electrode access holes. Materials of the reflecting layer and electrode can be different from each other whose preferred materials can be chosen in accordance with a correspondent function. Formation of the electrode can be patterned by an etching method or a lift-off method.

Description

本発明は、半導体照明装置のためのパッケージ構造体およびその製造方法に関し、より詳しくは、シリコン基板を用いた発光ダイオード（ＬＥＤ）のためのパッケージングおよび製造方法に関する。   The present invention relates to a package structure for a semiconductor lighting device and a manufacturing method thereof, and more particularly to a packaging and manufacturing method for a light emitting diode (LED) using a silicon substrate.

ＬＥＤは、一般に、家庭電化製品の表示ランプ、照明装置、液晶ディスプレイのバックライト・モジュール、ブラウザー、車両のブレーキランプなどに適用されている。さらに、この頃では、ＬＥＤの線光源および面光源が容易に入手できる。   The LED is generally applied to a display lamp of a home appliance, a lighting device, a backlight module of a liquid crystal display, a browser, a brake lamp of a vehicle, and the like. Furthermore, at this time, LED linear and surface light sources are readily available.

現在、ＬＥＤ分野の研究開発では、光抽出および熱放散の効率に焦点が当てられている。抽出効率を改善するために、エピタキシープロセス、ウェハープロセスおよびパッケージプロセスがより重要になってくる。しかしながら、熱放散の問題は、パッケージ構造を改良することによって、実質的に解決できる。それゆえ、パッケージ構造の改良には、抽出効率だけでなく、熱放散効率にも大きな影響がある。   Currently, research and development in the LED field focuses on the efficiency of light extraction and heat dissipation. In order to improve the extraction efficiency, epitaxy process, wafer process and package process become more important. However, the problem of heat dissipation can be substantially solved by improving the package structure. Therefore, the improvement of the package structure has a great influence not only on the extraction efficiency but also on the heat dissipation efficiency.

ＬＥＤのパッケージには、ランプおよび反射カップなどいくつかのタイプがある。ＬＥＤでは、光反射の増大により抽出効率を向上させるために、反射カップを使用する。さらに、反射カップの好ましい改良設計により、熱放散効率を改善できる。特許文献１ではそのような改良設計が提案されており、特許文献３および４には同じ目的がある。さらに、特許文献４には、シリコン基板がパッケージ基板の代わりをしていることが開示されている。図１に示すように、ＭＥＭＳ（微小電気機械システム）によって、反射カップがシリコン基板１０上に形成される。絶縁層１２および金属層２０が、続いてシリコン基板１０を取り囲み、金属層２０に隣接して電極２２および２４が形成される。ＬＥＤダイ３０が反射カップ５０の内部に取り付けられ、金属線を接合することによって反射カップ５０に電気接続される。その後、エポキシ樹脂４０により、反射カップ５０内のＬＥＤダイ３０を被包する。   There are several types of LED packages such as lamps and reflective cups. In an LED, a reflection cup is used to improve extraction efficiency by increasing light reflection. In addition, the preferred improved design of the reflective cup can improve the heat dissipation efficiency. Patent Document 1 proposes such an improved design, and Patent Documents 3 and 4 have the same purpose. Further, Patent Document 4 discloses that a silicon substrate replaces a package substrate. As shown in FIG. 1, a reflective cup is formed on a silicon substrate 10 by MEMS (micro electro mechanical system). Insulating layer 12 and metal layer 20 subsequently surround silicon substrate 10 and electrodes 22 and 24 are formed adjacent to metal layer 20. The LED die 30 is mounted inside the reflective cup 50 and is electrically connected to the reflective cup 50 by joining metal wires. Thereafter, the LED die 30 in the reflection cup 50 is encapsulated with the epoxy resin 40.

図２は、図１のデバイスを製造するための流れ図である。工程２１により示されているように、これらの工程のために、最初にシリコン基板１０を提供する。その後、工程２２に示されているように、ウェットエッチングによって、シリコン基板１０の第１の表面に複数の反射空洞を形成する。工程２３を参照すると、ドライエッチングによって、第１の表面とは反対の第２の表面に電極ガイドホールを開ける。工程２４において、指示にしたがって熱酸化法または熱窒化法によって、シリコン基板１０の表面に絶縁層を堆積させる。絶縁層は、ＳｉＯ2またはＳｉ3Ｎ4から製造することができる。その後、工程２５に示されるように、電気メッキによって、絶縁層上に導電層を堆積させる。最後に、レーザ処理によって、反射空洞上に反射層を形成し、反対表面に電極２２および２４を配置する。 FIG. 2 is a flow diagram for manufacturing the device of FIG. For these steps, a silicon substrate 10 is first provided, as indicated by step 21. Thereafter, as shown in step 22, a plurality of reflective cavities are formed in the first surface of the silicon substrate 10 by wet etching. Referring to step 23, an electrode guide hole is opened on the second surface opposite to the first surface by dry etching. In step 24, an insulating layer is deposited on the surface of the silicon substrate 10 by thermal oxidation or thermal nitridation according to instructions. The insulating layer can be made from SiO 2 or Si 3 N 4 . Thereafter, as shown in step 25, a conductive layer is deposited on the insulating layer by electroplating. Finally, a laser treatment forms a reflective layer on the reflective cavity and places the electrodes 22 and 24 on opposite surfaces.

しかしながら、シリコン基板上のＬＥＤの前述の構造には、欠点がいくつかある。第１に、反射層と電極が、同じ材料から製造されている。反射とはんだ性の両方に同時に適した金属はない。さらに、様々なＬＥＤは異なる波長を持つ光を放出するが、金属の反射効率は、発光波長に直接関連する。それゆえ、電極に最適な材料は、発光波長によっても異なる。はんだは、電極の材料にとっては好ましいが、可視光を反射することのできる材料には適していない。Ａｕ、Ａｇ、ＰｄおよびＰｔは、良好な反射材料であるが、電極には適していない。   However, the aforementioned structure of LEDs on a silicon substrate has several drawbacks. First, the reflective layer and the electrode are manufactured from the same material. No metal is suitable for both reflection and solderability at the same time. Furthermore, although various LEDs emit light with different wavelengths, the reflection efficiency of metals is directly related to the emission wavelength. Therefore, the optimum material for the electrode varies depending on the emission wavelength. Solder is preferred for the electrode material, but is not suitable for a material that can reflect visible light. Au, Ag, Pd and Pt are good reflective materials but are not suitable for electrodes.

さらに、一番下側のガイドホールはドライエッチングにより形成される。エッチングされたパターンは、その後のプロセスにおける順応性が低い。金属層には、反射表面を形成するためにレーザ処理が必要であり、製造コストが高くなってしまう。   Further, the lowermost guide hole is formed by dry etching. The etched pattern is less adaptable in subsequent processes. The metal layer requires laser processing to form a reflective surface, which increases the manufacturing cost.

その結果、光電子市場では、単純な構造を持つ信頼性のあるより大きな光面積を有する高出力ＬＥＤが緊急に必要とされている。上述した問題は、そのような高出力ＬＥＤにより解決すべきである。
米国特許第６５６２６４３号明細書 米国特許第６２６８６６０号明細書 米国特許出願公開第２００４／０２１８３９０号明細書 米国特許第６５３１３２８号明細書 As a result, there is an urgent need in the optoelectronic market for a high power LED with a simple structure and a reliable larger light area. The above mentioned problems should be solved by such a high power LED.
US Pat. No. 6,562,643 US Pat. No. 6,268,660 US Patent Application Publication No. 2004/0218390 US Pat. No. 6,531,328

本発明の課題は、半導体照明装置のためのパッケージ構造およびその製造方法を提供することにある。熱放散効率を向上させるためのパッケージ基板として、シリコン基板が用いられる。さらに、ＭＥＭＳプロセスをその基板に効果的に適用できる。   An object of the present invention is to provide a package structure for a semiconductor lighting device and a manufacturing method thereof. A silicon substrate is used as a package substrate for improving the heat dissipation efficiency. Furthermore, the MEMS process can be effectively applied to the substrate.

本発明の別の課題は、反射層および電極に異なる材料を使用できることにある。反射層の材料は、電極材料の選択に影響を与えずに、特定の波長の光を反射するための要件に基づいて選択される。したがって、反射層および電極に、それぞれ最適な材料が選択される。   Another object of the present invention is that different materials can be used for the reflective layer and the electrode. The material of the reflective layer is selected based on the requirements for reflecting light of a specific wavelength without affecting the selection of the electrode material. Therefore, optimum materials are selected for the reflective layer and the electrode, respectively.

本発明の別の課題は、酸化、加硫、または他の化学物質との反応から、反射層中の金属を保護するための絶縁層を提供することにある。絶縁層の厚さは、特定の光線の構造的干渉を生じるように調節して差し支えない。   Another object of the present invention is to provide an insulating layer to protect the metal in the reflective layer from oxidation, vulcanization, or reaction with other chemicals. The thickness of the insulating layer can be adjusted to cause structural interference of specific light rays.

本発明の別の課題は、ウェットエッチングによってデバイスの底のスルーホールを介して電極を形成して、その後のプロセス・ウィンドウのためにより多くの空間を残すことにある。   Another object of the present invention is to form electrodes through through-holes at the bottom of the device by wet etching, leaving more space for subsequent process windows.

本発明の別の課題は、レーザ加工よりも費用がかからない電極製造のための単純なリソグラフィープロセスまたはリフトオフプロセスを使用することにある。   Another object of the present invention is to use a simple lithographic process or lift-off process for electrode manufacturing that is less expensive than laser processing.

本発明の別の課題は、製造コストを下げるために各工程に成熟したプロセスを使用することにある。   Another object of the present invention is to use a mature process for each step in order to reduce manufacturing costs.

これらの課題を達成するために、本発明は、半導体照明装置のためのパッケージ構造であって、第１の表面と第２の表面を有するシリコン基板、シリコン基板を取り囲む第１の絶縁層、反射層、反射層上に配置される第２の絶縁層、２つの電極パッドとして働きかつ反射層から電気的に隔離された第１の導電層、および第２の導電層を備えたパッケージ構造を開示する。シリコン基板の第１の表面は、第２の表面の反対側にあり、その上に反射空洞を有する。第２の表面は、第２の表面を通って反射空洞まで到達する２つの電極アクセスホールを有する。反射層は反射空洞上に配置されている。第１の導電層は、２つの電極アクセスホール上に形成され、２つの電極パッドとして働き、反射層から電気的に隔離されている。第２の導電層は、第２の表面下であって、２つの電極アクセスホールの内部に配置されている。   In order to achieve these objects, the present invention provides a package structure for a semiconductor lighting device, a silicon substrate having a first surface and a second surface, a first insulating layer surrounding the silicon substrate, a reflection A package structure comprising a layer, a second insulating layer disposed on the reflective layer, a first conductive layer serving as two electrode pads and electrically isolated from the reflective layer, and a second conductive layer To do. The first surface of the silicon substrate is opposite the second surface and has a reflective cavity thereon. The second surface has two electrode access holes that reach the reflective cavity through the second surface. The reflective layer is disposed on the reflective cavity. The first conductive layer is formed on the two electrode access holes, serves as two electrode pads, and is electrically isolated from the reflective layer. The second conductive layer is disposed below the second surface and inside the two electrode access holes.

本発明は、半導体照明装置のためのパッケージ構造を製造する方法も開示している。図３に示すように、この方法は、シリコン基板を提供し、ウェットエッチングによりシリコン基板の第１の表面に反射空洞を形成する工程；シリコン基板の第２の表面に、シリコン基板を通り反射空洞まで到達する２つの電極アクセスホールをウェットエッチングにより形成する工程であって、第２の表面は第１の表面とは反対にある工程；シリコン基板に第１の絶縁層を重畳させる工程；反射空洞に反射層を形成し、反射層上に第２の絶縁層を形成する工程；２つの電極アクセスホールに第１の導電層を形成する工程であって、第１の導電層は、２つの電極パッドとして働き、反射層から電気的に隔離されている工程；および、第２の表面下で２つの電極アクセスホールの内部に第２の導電層を形成する工程；の各工程を有してなる。   The present invention also discloses a method of manufacturing a package structure for a semiconductor lighting device. As shown in FIG. 3, the method provides a silicon substrate and forms a reflective cavity in the first surface of the silicon substrate by wet etching; a reflective cavity through the silicon substrate on the second surface of the silicon substrate. Forming two electrode access holes reaching to the first surface by wet etching, wherein the second surface is opposite to the first surface; superimposing the first insulating layer on the silicon substrate; Forming a reflective layer on the reflective layer and forming a second insulating layer on the reflective layer; forming a first conductive layer in the two electrode access holes, wherein the first conductive layer comprises two electrodes A step of acting as a pad and being electrically isolated from the reflective layer; and a step of forming a second conductive layer inside the two electrode access holes under the second surface. .

本発明は、半導体照明装置のためのパッケージ構造であって、第１の表面と第２の表面を有するシリコン基板、シリコン基板を取り囲む第１の絶縁層、反射層、反射層上に配置される第２の絶縁層、２つの電極パッドとして働きかつ反射層から電気的に隔離された第１の導電層、および第２の導電層を備えたパッケージ構造を開示する。シリコン基板の第１の表面は、第２の表面の反対側にあり、その上に反射空洞を有する。第２の表面は、第２の表面を通って反射空洞まで到達する、その上の２つの電極アクセスホールを有する。反射層は反射空洞上に配置されている。第１の導電層は、２つの電極アクセスホール上に形成され、２つの電極パッドとして働き、反射層から電気的に隔離されている。第２の導電層は、第２の表面下であって、２つの電極アクセスホールの内部に配置されている。   The present invention is a package structure for a semiconductor lighting device, and is disposed on a silicon substrate having a first surface and a second surface, a first insulating layer surrounding the silicon substrate, a reflective layer, and the reflective layer. Disclosed is a package structure comprising a second insulating layer, a first conductive layer serving as two electrode pads and electrically isolated from the reflective layer, and a second conductive layer. The first surface of the silicon substrate is opposite the second surface and has a reflective cavity thereon. The second surface has two electrode access holes thereon that reach the reflective cavity through the second surface. The reflective layer is disposed on the reflective cavity. The first conductive layer is formed on the two electrode access holes, serves as two electrode pads, and is electrically isolated from the reflective layer. The second conductive layer is disposed below the second surface and inside the two electrode access holes.

本発明は、半導体照明装置のためのパッケージ構造を製造する方法も開示している。図３に示すように、この方法は、シリコン基板を提供し、ウェットエッチングによりシリコン基板の第１の表面に反射空洞を形成する工程；シリコン基板の第２の表面に、シリコン基板を通り反射空洞まで到達する２つの電極アクセスホールをウェットエッチングにより形成する工程であって、第２の表面は第１の表面とは反対にある工程；シリコン基板に第１の絶縁層を重畳させる工程；反射空洞に反射層を形成し、反射層上に第２の絶縁層を形成する工程；２つの電極アクセスホールに第１の導電層を形成する工程であって、第１の導電層は、２つの電極パッドとして働き、反射層から電気的に隔離されている工程；および、第２の表面下で２つの電極アクセスホールの内部に第２の導電層を形成する工程；の各工程３１〜３８を有してなる。   The present invention also discloses a method of manufacturing a package structure for a semiconductor lighting device. As shown in FIG. 3, the method provides a silicon substrate and forms a reflective cavity in the first surface of the silicon substrate by wet etching; a reflective cavity through the silicon substrate on the second surface of the silicon substrate. Forming two electrode access holes reaching to the first surface by wet etching, wherein the second surface is opposite to the first surface; superimposing the first insulating layer on the silicon substrate; Forming a reflective layer on the reflective layer and forming a second insulating layer on the reflective layer; forming a first conductive layer in the two electrode access holes, wherein the first conductive layer comprises two electrodes Steps 31 to 38 that serve as pads and are electrically isolated from the reflective layer; and forming a second conductive layer within the two electrode access holes below the second surface. do it That.

第１の絶縁層は、熱酸化または化学気相成長法により、好ましくは熱酸化により、シリコン基板上に形成された酸化シリコンであって差し支えない。反射層は、指定された光の波長に応じて、銀、アルミニウム、金またはスズであり得る。第１の導電層と第２の導電層は、はんだ付けできる材料から製造されており、電気的に接続されている。第１の導電層と第２の導電層は、エッチングまたはリフトオフから生じるパターン形成により形成される。第２の絶縁層は、化学気相成長法により、より詳しくは、プラズマ支援化学気相成長法により、反射層上に成膜された酸化シリコンである。２つの電極アクセスホールはウェットエッチングにより形成される。半導体照明装置は、発光ダイオードまたはレーザダイオードである。本発明のパッケージ構造は、ワイヤボンディングまたはフリップチップ実装に適用できる。   The first insulating layer can be silicon oxide formed on the silicon substrate by thermal oxidation or chemical vapor deposition, preferably by thermal oxidation. The reflective layer can be silver, aluminum, gold or tin depending on the wavelength of light specified. The first conductive layer and the second conductive layer are made of a solderable material and are electrically connected. The first conductive layer and the second conductive layer are formed by pattern formation resulting from etching or lift-off. The second insulating layer is silicon oxide formed on the reflective layer by chemical vapor deposition, more specifically, plasma assisted chemical vapor deposition. The two electrode access holes are formed by wet etching. The semiconductor lighting device is a light emitting diode or a laser diode. The package structure of the present invention can be applied to wire bonding or flip chip mounting.

半導体照明装置のための上述したパッケージ構造およびその製造方法は、反射空洞まで到達するスルーホールであるさらに２つの電極アクセスホールを備えている。それゆえ、第１の導電層は４つの電極パッドを含み、一方で、第２の導電層は、４つの電極アクセスホール内に配置され、４つの電極パッドに電気的に接続されている。反射層は、電気メッキ、蒸着または電子ビームエピタキシーにより形成される。   The above-described package structure for a semiconductor lighting device and the manufacturing method thereof further include two electrode access holes, which are through holes reaching the reflection cavity. Therefore, the first conductive layer includes four electrode pads, while the second conductive layer is disposed in the four electrode access holes and is electrically connected to the four electrode pads. The reflective layer is formed by electroplating, vapor deposition, or electron beam epitaxy.

図４〜１３は、本発明による製造の各工程にそれぞれ対応する断面図である。   4 to 13 are cross-sectional views corresponding to the respective manufacturing steps according to the present invention.

図４に示すように、シリコン基板１００は、第１の表面と第２の表面を有する。ここで、第１の表面は上面であり、第２の表面は下面である。シリコン基板１００は、５インチ（約１２．５ｃｍ）、６インチ（約１５ｃｍ）、８インチ（約２０ｃｍ）または１２インチ（約３０ｃｍ）のウェハーであって差し支えない。この基板は、＜１００＞結晶配向表面を有していて差し支えない。シリコン基板により与えられるいくつかの重要な利点は、良好な熱放散およびよく発達したＭＥＭＳ加工への適性である。   As shown in FIG. 4, the silicon substrate 100 has a first surface and a second surface. Here, the first surface is the upper surface, and the second surface is the lower surface. The silicon substrate 100 can be a 5 inch (about 12.5 cm), 6 inch (about 15 cm), 8 inch (about 20 cm) or 12 inch (about 30 cm) wafer. The substrate can have a <100> crystal orientation surface. Some important advantages afforded by silicon substrates are good heat dissipation and suitability for well-developed MEMS processing.

図５に示すように、反射空洞１０２がウェットエッチングによりシリコン基板１００の第１の表面に形成されている。シリコン基板１００をウェットエッチングするために用いられる溶剤は、水酸化カリウム（ＫＯＨ）であってよい。この工程は、フォトリソグラフィープロセスを使用して行うべきである。すなわち、エッチングは、レジストコーティング、乾燥(soft baking)、露光、現像、焼成(hard baking)、エッチング、およびレジスト剥離の各工程によるパターンの転写によって完了する。ウェットエッチングにより形成された反射空洞１０２のエッチングされた外形は、ウェットエッチングの等方性のために調節可能である。   As shown in FIG. 5, the reflection cavity 102 is formed on the first surface of the silicon substrate 100 by wet etching. The solvent used for wet etching the silicon substrate 100 may be potassium hydroxide (KOH). This step should be performed using a photolithography process. That is, the etching is completed by transferring a pattern by the steps of resist coating, soft baking, exposure, development, hard baking, etching, and resist stripping. The etched profile of the reflective cavity 102 formed by wet etching is adjustable due to the isotropic nature of the wet etching.

図６に示すように、連続工程において、電極アクセスホール１０４が、ウェットエッチングによりシリコン基板１００の第２の表面に形成される。電極アクセスホール１０４の数は２つ以上である。その数は、特に２つ以上の照明装置が用いられるときに、４つまたは６つであって差し支えない。ウェットエッチングにより形成された電極アクセスホール１０４は、その後のプロセスウィンドウのための許容範囲を大きくするために大きな開口部を有する。同様に、この工程は、フォトリソグラフィープロセスに含まれる。   As shown in FIG. 6, the electrode access hole 104 is formed on the second surface of the silicon substrate 100 by wet etching in a continuous process. The number of electrode access holes 104 is two or more. The number can be four or six, especially when two or more lighting devices are used. The electrode access hole 104 formed by wet etching has a large opening to increase the tolerance for subsequent process windows. Similarly, this step is included in the photolithography process.

図７に示すように、酸化シリコン層が、第１の絶縁層１１０としてシリコン基板１００上に形成される。この酸化シリコン層は、熱酸化または化学気相成長により、好ましくは、より小型の構造が得られるように、熱酸化により、シリコン基板１００上に形成することができる。本発明において、乾式または湿式いずれの熱酸化を用いても差し支えない。さらに、第１の絶縁層１１０は窒化シリコンであっても差し支えない。   As shown in FIG. 7, a silicon oxide layer is formed on the silicon substrate 100 as the first insulating layer 110. This silicon oxide layer can be formed on the silicon substrate 100 by thermal oxidation or chemical vapor deposition, preferably by thermal oxidation so as to obtain a smaller structure. In the present invention, either dry or wet thermal oxidation may be used. Furthermore, the first insulating layer 110 may be silicon nitride.

図８に示すように、反射層１２０が反射空洞１０２に形成される。反射層１２０は、使用する光の波長に応じて、銀、アルミニウム、金またはスズから製造される。反射層１２０は、電気メッキ、蒸着または電子ビームエピタキシーにより形成される。反射層１２０はシリコン基板１００の第１の表面に成膜されるので、そのプロセス条件はより単純である。さらに、反射層１２０の形成後、反射空洞１０２の外側の反射層１２０の部分は、エッチングにより除去しても差し支えない。この工程は随意的である。   As shown in FIG. 8, the reflective layer 120 is formed in the reflective cavity 102. The reflective layer 120 is made of silver, aluminum, gold or tin depending on the wavelength of light used. The reflective layer 120 is formed by electroplating, vapor deposition, or electron beam epitaxy. Since the reflective layer 120 is formed on the first surface of the silicon substrate 100, the process conditions are simpler. Further, after the reflective layer 120 is formed, the portion of the reflective layer 120 outside the reflective cavity 102 may be removed by etching. This step is optional.

図９に示すように、第２の絶縁層１３０が反射層１２０上に重畳される。第２の絶縁層１３０は、化学気相成長により酸化シリコンまたは窒化シリコンにより製造される。ここで、酸化シリコンの成膜には、プラズマ支援化学気相成長が用いられ、窒化シリコンの成膜には、低圧化学気相成長が用いられる。成膜厚を、特定の光ビームの構造的干渉を生じるように調節しても差し支えない。反射層１２０は、酸化、加硫、または他の化学物質との反射金属の反応に対する保護のために、第２の絶縁層１３０により被覆される。特に、使用する反射金属がアルミニウムまたはスズの場合、これら二種類の金属は酸化を受けやすいので、コーティングの存在は重要である。   As shown in FIG. 9, the second insulating layer 130 is superimposed on the reflective layer 120. The second insulating layer 130 is made of silicon oxide or silicon nitride by chemical vapor deposition. Here, plasma-assisted chemical vapor deposition is used for the film formation of silicon oxide, and low-pressure chemical vapor deposition is used for the film formation of silicon nitride. The thickness of the deposited film may be adjusted to cause structural interference of a specific light beam. The reflective layer 120 is covered by a second insulating layer 130 for protection against oxidation, vulcanization, or reaction of the reflective metal with other chemicals. In particular, if the reflective metal used is aluminum or tin, the presence of the coating is important because these two metals are susceptible to oxidation.

図１０に示すように、第１の金属層が頂部電極１４０−１および１４０−２として形成される。頂部電極１４０−１および１４０−２は、照明装置にはんだ付けされるので、その後のプロセス、例えば、ワイヤボンディングまたはフリップチップボンディングによって決定されるはんだ付けできる材料である。頂部電極１４０−１および１４０−２は、電気メッキまたは蒸着により形成してよい。頂部電極１４０−１および１４０−２のパターンは、エッチングまたはリフトオフにより形成される。リフトオフおよびエッチングは、類似のパターン転写プロセスであるが、異なる順序で行われる。リフトオフプロセスにおいて、フォトレジスト層が最初に形成され、フォトレジスト層上に金属層を成膜するために、露光および現像がそれに続く。フォトレジスト層のその後の除去において、フォトレジスト上の金属層は一緒に除去される。リフトオフプロセスは、金属層を除去するためのエッチング工程をさらに必要とすることはない。それゆえ、これは、エッチングプロセスよりも１工程少ない。いずれにせよ、エッチングプロセスまたはリフトオフプロセスは、十分に開発されたプロセスであり、従来のレーザ加工よりも費用がかからない。   As shown in FIG. 10, a first metal layer is formed as top electrodes 140-1 and 140-2. Since the top electrodes 140-1 and 140-2 are soldered to the lighting device, they are solderable materials determined by subsequent processes such as wire bonding or flip chip bonding. The top electrodes 140-1 and 140-2 may be formed by electroplating or evaporation. The patterns of the top electrodes 140-1 and 140-2 are formed by etching or lift-off. Lift-off and etching are similar pattern transfer processes, but performed in a different order. In the lift-off process, a photoresist layer is first formed, followed by exposure and development to form a metal layer on the photoresist layer. In subsequent removal of the photoresist layer, the metal layer on the photoresist is removed together. The lift-off process does not require an additional etching step to remove the metal layer. This is therefore one step less than the etching process. In any case, the etching process or lift-off process is a well-developed process and costs less than conventional laser processing.

第２の絶縁層１３０が存在するために、頂部電極１４０−１および１４０−２は、漏電がデバイスを損傷させないように、反射層１２０から電気的に隔離されている。   Due to the presence of the second insulating layer 130, the top electrodes 140-1 and 140-2 are electrically isolated from the reflective layer 120 so that electrical leakage does not damage the device.

図１１に示すように、第２の金属層が底部電極１５０−１および１５０−２として形成される。底部電極１５０−１および１５０−２は、はんだ付けできる材料または通常の電極材料である。底部電極１５０−１および１５０−２は、頂部電極１４０−１および１４０−２と同じ様式で形成される。底部電極１５０−１および１５０−２がパターン転写により形成される場合、使用される形成方法は、頂部電極１４０−１および１４０−２のものと同じでも異なっても差し支えない。底部電極１５０−１および１５０−２は、導電性材料が充填された電極アクセスホール１０４によって、頂部電極１４０−１および１４０−２に電気的に接続されている。   As shown in FIG. 11, the second metal layer is formed as bottom electrodes 150-1 and 150-2. The bottom electrodes 150-1 and 150-2 are solderable materials or conventional electrode materials. Bottom electrodes 150-1 and 150-2 are formed in the same manner as top electrodes 140-1 and 140-2. When the bottom electrodes 150-1 and 150-2 are formed by pattern transfer, the formation method used may be the same as or different from that of the top electrodes 140-1 and 140-2. The bottom electrodes 150-1 and 150-2 are electrically connected to the top electrodes 140-1 and 140-2 by an electrode access hole 104 filled with a conductive material.

図１２に示すように、ＬＥＤ１６０は、ワイヤボンディング後にエポキシ樹脂１７０により封止される。エポキシ樹脂１７０に、蛍光粉末がブレンドされていてもよい。蛍光粉末は、ＹＡＧ群またはケイ酸塩群からのものであって差し支えない。エポキシ樹脂１７０の封止は、トランスファー成形または計量分配により行われる。   As shown in FIG. 12, the LED 160 is sealed with an epoxy resin 170 after wire bonding. The epoxy resin 170 may be blended with fluorescent powder. The fluorescent powder can be from the YAG group or the silicate group. The epoxy resin 170 is sealed by transfer molding or dispensing.

図１３に示すように、ＬＥＤ１６０は、フリップチップボンディング後にエポキシ樹脂１７０により封止される。同様に、エポキシ樹脂１７０に、蛍光粉末がブレンドされていてもよく、これは、ＹＡＧ群またはケイ酸塩群からのものである。エポキシ樹脂１７０の封止は、トランスファー成形または計量分配により行われる。   As shown in FIG. 13, the LED 160 is sealed with an epoxy resin 170 after flip-chip bonding. Similarly, the epoxy resin 170 may be blended with fluorescent powder, which is from the YAG group or the silicate group. The epoxy resin 170 is sealed by transfer molding or dispensing.

パッケージングのためのシリコン基板の使用は、熱放散効率を向上させ、ＭＥＭＳプロセスに適している。反射層の材料が、電極材料の選択に影響せずに、特定の波長の光を反射する必要性に基づいて選択される場合、反射層および電極のための材料が異なっても差し支えないので、反射層と電極に、最適な材料がそれぞれ選択される。本発明はまた、反射層における金属を、酸化、加硫または他の化学物質との反応から保護するための絶縁層も提供する。この絶縁層の厚さは、特定の光線の構造的干渉を生じるように調節しても差し支えない。本発明では、その後のプロセスウィンドウのための空間を大きくするために、シリコン基板の底部に電極アクセスホールを形成するのにウェットエッチングを使用する。本発明では、電極製造に単純なリソグラフィーまたはリフトオフプロセスを使用する。これらのプロセスは、レーザ加工よりも費用がかからない。本発明では、各工程に十分に開発されたプロセスを使用する。それゆえ、全体の費用が安くなる。   The use of a silicon substrate for packaging improves heat dissipation efficiency and is suitable for MEMS processes. If the material of the reflective layer is selected based on the need to reflect light of a specific wavelength without affecting the selection of the electrode material, the material for the reflective layer and the electrode can be different, so Optimal materials are selected for the reflective layer and the electrode, respectively. The present invention also provides an insulating layer for protecting the metal in the reflective layer from oxidation, vulcanization or reaction with other chemicals. The thickness of this insulating layer can be adjusted to produce structural interference of specific light rays. In the present invention, wet etching is used to form electrode access holes in the bottom of the silicon substrate in order to increase the space for subsequent process windows. The present invention uses a simple lithography or lift-off process for electrode manufacturing. These processes are less expensive than laser processing. In the present invention, a well-developed process is used for each step. Therefore, the overall cost is reduced.

本発明の上述した実施の形態は、説明のみを意図したものである。添付の特許請求の範囲から逸脱せずに、様々な代わりの実施の形態が、当業者により考えられるであろう。   The above-described embodiments of the present invention are intended to be illustrative only. Various alternative embodiments will be devised by those skilled in the art without departing from the scope of the appended claims.

ＬＥＤの従来のパッケージ構造を示す断面図Sectional drawing which shows the conventional package structure of LED 図１のパッケージ構造を製造するための流れ図Flowchart for manufacturing the package structure of FIG. 本発明によるパッケージ構造を製造するための流れ図Flowchart for manufacturing a package structure according to the invention 本発明による製造の工程に対応する断面図Sectional view corresponding to the manufacturing process according to the present invention 本発明による製造の工程に対応する断面図Sectional view corresponding to the manufacturing process according to the present invention 本発明による製造の工程に対応する断面図Sectional view corresponding to the manufacturing process according to the present invention 本発明による製造の工程に対応する断面図Sectional view corresponding to the manufacturing process according to the present invention 本発明による製造の工程に対応する断面図Sectional view corresponding to the manufacturing process according to the present invention 本発明による製造の工程に対応する断面図Sectional view corresponding to the manufacturing process according to the present invention 本発明による製造の工程に対応する断面図Sectional view corresponding to the manufacturing process according to the present invention 本発明による製造の工程に対応する断面図Sectional view corresponding to the manufacturing process according to the present invention 本発明による製造の工程に対応する断面図Sectional view corresponding to the manufacturing process according to the present invention 本発明による製造の工程に対応する断面図Sectional view corresponding to the manufacturing process according to the present invention

符号の説明Explanation of symbols

１００ シリコン基板
１０２ 反射空洞
１０４ 電極アクセスホール
１１０ 第１の絶縁層
１２０ 反射層
１３０ 第２の絶縁層
１４０−１、１４０−２ 頂部電極
１５０−１、１５０−２ 底部電極
１６０ ＬＥＤ
１７０ エポキシ樹脂 DESCRIPTION OF SYMBOLS 100 Silicon substrate 102 Reflective cavity 104 Electrode access hole 110 1st insulating layer 120 Reflective layer 130 2nd insulating layer 140-1, 140-2 Top electrode 150-1, 150-2 Bottom electrode 160 LED
170 Epoxy resin

Claims (5)

半導体照明装置のためのパッケージ構造であって、
互いに反対になった第１の表面と第２の表面を有するシリコン基板であって、前記第１の表面が反射空洞を有し、前記第２の表面が前記反射空洞に到達する少なくとも２つの電極アクセスホールを有するものであるシリコン基板、
前記シリコン基板に重畳された第１の絶縁層、
前記反射空洞に成膜された反射層、
前記反射層上に配置されかつ特定の光線の構造的干渉を生じるように調節された厚さを有する第２の絶縁層、
２つの電極パッドとして働きかつ前記反射層から電気的に隔離された、前記電極アクセスホールに配置された第１の導電層、および
前記第２の表面の下で前記電極アクセスホールに配置された第２の導電層、
を備えたパッケージ構造。 A package structure for a semiconductor lighting device,
A silicon substrate having a first surface and a second surface opposite to each other, wherein the first surface has a reflective cavity, and the second surface reaches the reflective cavity. A silicon substrate having an access hole,
A first insulating layer superimposed on the silicon substrate;
A reflective layer formed in the reflective cavity;
A second insulating layer disposed on the reflective layer and having a thickness adjusted to cause structural interference of specific light rays ;
A first conductive layer disposed in the electrode access hole, serving as two electrode pads and electrically isolated from the reflective layer; and a first conductive layer disposed in the electrode access hole under the second surface Two conductive layers,
Package structure with 前記第１の導電層および前記第２の導電層が電気的に接続されていることを特徴とする請求項１記載のパッケージ構造。   The package structure according to claim 1, wherein the first conductive layer and the second conductive layer are electrically connected. 前記第２の表面が、前記反射空洞に到達する４つの電極アクセスホールを有し、
前記第１の導電層が、前記４つの電極アクセスホール内に配置されかつ４つの電極パッドとして働き、
前記第２の導電層が、前記４つの電極アクセスホール内に配置され、前記第１の導電層と電気的に接続されていることを特徴とする請求項１記載のパッケージ構造。 It said second surface has four electrodes access holes reaching to the reflective cavity,
The first conductive layer is disposed in the four electrode access holes and serves as four electrode pads;
2. The package structure according to claim 1, wherein the second conductive layer is disposed in the four electrode access holes and is electrically connected to the first conductive layer. 半導体照明装置のためのパッケージ構造を製造する方法であって、
シリコン基板を提供する工程、
前記シリコン基板の第１の表面にウェットエッチングにより反射空洞を形成する工程、
前記シリコン基板の第２の表面にウェットエッチングにより少なくとも２つの電極アクセスホールを形成する工程であって、前記電極アクセスホールは前記シリコン基板を通り前記反射空洞まで到達し、前記第２の表面は前記第１の表面とは反対にある工程、
前記シリコン基板に第１の絶縁層を重畳させる工程、
前記反射空洞に反射層を重畳させる工程、
前記反射層上に特定の光線の構造的干渉を生じるように調節された厚さを有する第２の絶縁層を重畳させる工程、
前記電極アクセスホールに第１の導電層を形成する工程であって、前記第１の導電層は、２つの電極パッドとして働き、前記反射層から電気的に隔離されている工程、および
前記第２の表面下で前記少なくとも２つの電極アクセスホールの内部に第２の導電層を形成する工程、
を有してなる方法。 A method of manufacturing a package structure for a semiconductor lighting device, comprising:
Providing a silicon substrate;
Forming a reflective cavity in the first surface of the silicon substrate by wet etching;
Forming at least two electrode access holes on the second surface of the silicon substrate by wet etching, the electrode access holes reaching the reflective cavity through the silicon substrate, and the second surface is A step opposite to the first surface;
A step of superimposing a first insulating layer on the silicon substrate;
Superimposing a reflective layer on the reflective cavity;
Superimposing a second insulating layer having a thickness adjusted to cause structural interference of a specific light beam on the reflective layer;
Forming a first conductive layer in the electrode access hole, wherein the first conductive layer serves as two electrode pads and is electrically isolated from the reflective layer; and Forming a second conductive layer below the surface of the at least two electrode access holes;
A method comprising: 前記反射層が、銀、アルミニウム、金またはスズから製造されていることを特徴とする請求項４記載の方法。   The method of claim 4, wherein the reflective layer is made from silver, aluminum, gold or tin.
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US7989237B2 (en) 2011-08-02
US20070090510A1 (en) 2007-04-26
US20090078956A1 (en) 2009-03-26
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US7719099B2 (en) 2010-05-18
US7994628B2 (en) 2011-08-09

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