JP4638867B2 - 放電生成プラズマeuv光源 - Google Patents
放電生成プラズマeuv光源 Download PDFInfo
- Publication number
- JP4638867B2 JP4638867B2 JP2006509069A JP2006509069A JP4638867B2 JP 4638867 B2 JP4638867 B2 JP 4638867B2 JP 2006509069 A JP2006509069 A JP 2006509069A JP 2006509069 A JP2006509069 A JP 2006509069A JP 4638867 B2 JP4638867 B2 JP 4638867B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- debris
- rotational axis
- discharge
- source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
- H05H1/04—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using magnetic fields substantially generated by the discharge in the plasma
- H05H1/06—Longitudinal pinch devices
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Public Health (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Electromagnetism (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Nanotechnology (AREA)
- Environmental & Geological Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- X-Ray Techniques (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/384,967 US6904073B2 (en) | 2001-01-29 | 2003-03-08 | High power deep ultraviolet laser with long life optics |
US10/409,254 US6972421B2 (en) | 2000-06-09 | 2003-04-08 | Extreme ultraviolet light source |
US10/742,233 US7180081B2 (en) | 2000-06-09 | 2003-12-18 | Discharge produced plasma EUV light source |
PCT/US2004/006551 WO2004081503A2 (en) | 2003-03-08 | 2004-03-03 | Discharge produced plasma euv light source |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2006520107A JP2006520107A (ja) | 2006-08-31 |
JP2006520107A5 JP2006520107A5 (zh) | 2007-06-14 |
JP4638867B2 true JP4638867B2 (ja) | 2011-02-23 |
Family
ID=46205121
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006509069A Expired - Fee Related JP4638867B2 (ja) | 2003-03-08 | 2004-03-03 | 放電生成プラズマeuv光源 |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1602116A4 (zh) |
JP (1) | JP4638867B2 (zh) |
TW (1) | TWI275325B (zh) |
WO (1) | WO2004081503A2 (zh) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7410265B2 (en) * | 2000-09-13 | 2008-08-12 | Carl Zeiss Smt Ag | Focusing-device for the radiation from a light source |
US7439530B2 (en) * | 2005-06-29 | 2008-10-21 | Cymer, Inc. | LPP EUV light source drive laser system |
US7217941B2 (en) * | 2003-04-08 | 2007-05-15 | Cymer, Inc. | Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source |
US7109503B1 (en) * | 2005-02-25 | 2006-09-19 | Cymer, Inc. | Systems for protecting internal components of an EUV light source from plasma-generated debris |
JP2006202671A (ja) * | 2005-01-24 | 2006-08-03 | Ushio Inc | 極端紫外光光源装置及び極端紫外光光源装置で発生するデブリの除去方法 |
DE102005015274B4 (de) * | 2005-03-31 | 2012-02-23 | Xtreme Technologies Gmbh | Strahlungsquelle zur Erzeugung kurzwelliger Strahlung |
US7141806B1 (en) * | 2005-06-27 | 2006-11-28 | Cymer, Inc. | EUV light source collector erosion mitigation |
US7394083B2 (en) * | 2005-07-08 | 2008-07-01 | Cymer, Inc. | Systems and methods for EUV light source metrology |
US20070115443A1 (en) * | 2005-11-23 | 2007-05-24 | Asml Netherlands B.V. | Radiation system and lithographic apparatus |
US7465943B2 (en) * | 2005-12-08 | 2008-12-16 | Asml Netherlands B.V. | Controlling the flow through the collector during cleaning |
US7960701B2 (en) | 2007-12-20 | 2011-06-14 | Cymer, Inc. | EUV light source components and methods for producing, using and refurbishing same |
NL1036768A1 (nl) * | 2008-04-29 | 2009-10-30 | Asml Netherlands Bv | Radiation source. |
JP5252586B2 (ja) * | 2009-04-15 | 2013-07-31 | ウシオ電機株式会社 | レーザー駆動光源 |
US8153994B2 (en) * | 2009-12-02 | 2012-04-10 | Media Lario S.R.L. | Cooling systems and methods for grazing incidence EUV lightography collectors |
US8276866B2 (en) * | 2010-03-08 | 2012-10-02 | Media Lario, S.R.L. | Adjustable clips for grazing-incidence collectors |
US10437162B2 (en) * | 2017-09-21 | 2019-10-08 | Asml Netherlands B.V. | Methods and apparatuses for protecting a seal in a pressure vessel of a photolithography system |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58115821A (ja) * | 1981-12-28 | 1983-07-09 | Fujitsu Ltd | X線露光装置 |
JP2001144002A (ja) * | 1999-11-16 | 2001-05-25 | Canon Inc | 環境チャンバおよび半導体製造装置 |
JP2002504746A (ja) * | 1998-02-19 | 2002-02-12 | スティクティング・ヴーア・デ・テクニシェ・ウェッテンシャペン | 放射源と放射源からの放射を処理する処理機構とを含む遠紫外線リソグラフィに適した装置、ならびに放射源から放射された望ましくない原子および微小粒子を抑制するためのフィルタ |
WO2002054153A1 (en) * | 2001-01-03 | 2002-07-11 | Koninklijke Philips Electronics N.V. | Illumination system with vacuum chamber wall having transparent structure |
US6567499B2 (en) * | 2001-06-07 | 2003-05-20 | Plex Llc | Star pinch X-ray and extreme ultraviolet photon source |
JP2005005666A (ja) * | 2002-11-22 | 2005-01-06 | Asml Netherlands Bv | 複数の抑制メッシュを備えたリトグラフ投影装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6452199B1 (en) * | 1997-05-12 | 2002-09-17 | Cymer, Inc. | Plasma focus high energy photon source with blast shield |
DE10219173A1 (de) * | 2002-04-30 | 2003-11-20 | Philips Intellectual Property | Verfahren zur Erzeugung von Extrem-Ultraviolett-Strahlung |
-
2004
- 2004-02-24 TW TW93104595A patent/TWI275325B/zh not_active IP Right Cessation
- 2004-03-03 WO PCT/US2004/006551 patent/WO2004081503A2/en active Application Filing
- 2004-03-03 JP JP2006509069A patent/JP4638867B2/ja not_active Expired - Fee Related
- 2004-03-03 EP EP04716949A patent/EP1602116A4/en not_active Withdrawn
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58115821A (ja) * | 1981-12-28 | 1983-07-09 | Fujitsu Ltd | X線露光装置 |
JP2002504746A (ja) * | 1998-02-19 | 2002-02-12 | スティクティング・ヴーア・デ・テクニシェ・ウェッテンシャペン | 放射源と放射源からの放射を処理する処理機構とを含む遠紫外線リソグラフィに適した装置、ならびに放射源から放射された望ましくない原子および微小粒子を抑制するためのフィルタ |
JP2001144002A (ja) * | 1999-11-16 | 2001-05-25 | Canon Inc | 環境チャンバおよび半導体製造装置 |
WO2002054153A1 (en) * | 2001-01-03 | 2002-07-11 | Koninklijke Philips Electronics N.V. | Illumination system with vacuum chamber wall having transparent structure |
US6567499B2 (en) * | 2001-06-07 | 2003-05-20 | Plex Llc | Star pinch X-ray and extreme ultraviolet photon source |
JP2005005666A (ja) * | 2002-11-22 | 2005-01-06 | Asml Netherlands Bv | 複数の抑制メッシュを備えたリトグラフ投影装置 |
Also Published As
Publication number | Publication date |
---|---|
WO2004081503A2 (en) | 2004-09-23 |
TWI275325B (en) | 2007-03-01 |
WO2004081503A3 (en) | 2005-10-06 |
JP2006520107A (ja) | 2006-08-31 |
TW200425802A (en) | 2004-11-16 |
EP1602116A2 (en) | 2005-12-07 |
EP1602116A4 (en) | 2010-03-31 |
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